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1. 发明授权

US06416651B1 Multi-electrode composition measuring device and method 有权
标题翻译：多电极组成测量装置及方法
公开(公告)号：US06416651B1
公开(公告)日：2002-07-09
申请号：US09258550
申请日：1999-02-26
申请人： Ord Millar
发明人： Ord Millar
IPC分类号： G01N2748
CPC分类号： G01N27/49
摘要： The Applicant's invention comprises an apparatus and method for determining the amount of one or more components in a pulping liquor. At a first electrode, a varying voltage is supplied in a voltage range including the half-wave potential of each component of a liquor to be measured, and accounting for variations in the half-wave potential caused by changing process parameters. At a second electrode, which is roughly ⅓ to ¼ the size of the first electrode, the derivative of current intensity is monitored near the known half-wave potential for the various liquor components. Using curve-fitting means, the derivative of current intensity and selected other process condition data is used to determine concentrations of the various liquor components.
摘要翻译：申请人的发明包括用于确定制浆液中一种或多种组分的量的装置和方法。在第一电极处，在包括要测量的液体的每个组分的半波电位的电压范围内提供变化的电压，并且考虑由改变的工艺参数引起的半波电位的变化。在大约为第一电极尺寸的1/3至1/4的第二电极处，在各种液体组分的已知半波电位附近监测电流强度的导数。使用曲线拟合方法，使用电流强度的导数和选定的其他工艺条件数据来确定各种液体组分的浓度。

2. 发明授权

US06235123B1 Chemical cleaning system for electrodes used in a liquid environment 失效
标题翻译：用于液体环境的电极化学清洗系统
公开(公告)号：US06235123B1
公开(公告)日：2001-05-22
申请号：US09072519
申请日：1998-05-04
申请人： Ord Millar
发明人： Ord Millar
IPC分类号： B08B300
CPC分类号： G01N27/38
摘要： A apparatus and method for in-situ treatment of electrodes in liquid environments in which a solution supply orifice is located near an electrode to be cleaned, and when cleaning is desired, a treatment solution from the solution supply orifice is directed against the electrode or electrodes. A cleaning baffle may be placed over the electrodes to better direct the treatment solution. The electrodes may be cleaned of the treatment solution by directing a flow of gas or a second treatment solution against the electrodes, subsequent use of the first treatment solution.
摘要翻译：一种用于在液体环境中原位处理电极的设备和方法，其中溶液供应孔位于要清洁的电极附近，并且当需要清洁时，来自溶液供应孔的处理溶液被引导到电极或电极。可以在电极上放置清洁挡板以更好地引导处理溶液。可以通过将气体流或第二处理溶液引导到电极上，随后使用第一处理溶液来清洁电极。

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