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    • 3. 发明申请
    • SINGLE-SHOT CORRECTION OF RESONANT OPTICAL COMPONENTS
    • 谐波光学元件的单次校正
    • US20160238791A1
    • 2016-08-18
    • US14625023
    • 2015-02-18
    • Oracle International Corporation
    • Stevan S. DjordjevicShiyun LinIvan ShubinXuezhe ZhengJohn E. CunninghamAshok V. Krishnamoorthy
    • G02B6/293B01J37/12B01J37/34G02B6/13G02F1/225
    • G02B6/29395G02B6/13G02B6/2934G02F1/2257
    • An optical device is described. This optical device includes optical components having resonance wavelengths that match target values with a predefined accuracy (such as 0.1 nm) and with a predefined time stability (such as permanent or an infinite time stability) without thermal tuning and/or electronic tuning. The stable, accurate resonance wavelengths may be achieved using a wafer-scale, single (sub-second) shot trimming technique that permanently corrects the phase errors induced by material variations and fabrication inaccuracies in the optical components (and, more generally, resonant silicon-photonic optical components). In particular, the trimming technique may use photolithographic exposure of the optical components on the wafer in parallel, with time-modulation for each individual optical component based on active-element control. Note that the physical mechanism in the trimming technique may involve superficial room-temperature oxidation of the silicon surface, which is induced by deep-ultraviolet radiation in the presence of oxygen.
    • 描述光学装置。 该光学装置包括具有与预定精度(例如0.1nm)匹配的目标值的谐振波长的光学部件,并且具有预定的时间稳定性(例如永久或无限时间稳定性),而不需要热调谐和/或电子调谐。 稳定,准确的共振波长可以使用晶片级单次(亚秒级)拍摄微调技术来实现,该技术永久地校正由光学部件中的材料变化和制造不精确性引起的相位误差(以及更一般地,谐振硅 - 光子学组件)。 特别地,修剪技术可以使用基于有源元件控制的每个单独光学部件的时间调制来并行地对晶片上的光学部件进行光刻曝光。 注意,修整技术中的物理机制可能涉及在氧存在下由深紫外线辐射诱导的硅表面的室温室温氧化。
    • 9. 发明申请
    • OPTICAL MODE CONVERTER HAVING MULTIPLE REGIONS
    • 具有多个区域的光模转换器
    • US20170045686A1
    • 2017-02-16
    • US14823954
    • 2015-08-11
    • ORACLE INTERNATIONAL CORPORATION
    • Jin-Hyoung LeeIvan ShubinXuezhe ZhengAshok V. Krishnamoorthy
    • G02B6/14G02B6/122
    • G02B6/14G02B6/1228
    • A standard-CMOS-process-compatible optical mode converter transitions an optical mode size using a series of adjacent regions having different optical mode sizes. In particular, in a partial-slab-mode region, which is adjacent to an initial rib-optical-waveguide-mode region, a width of a slab portion of the rib-type optical waveguide decreases and a width of a rib portion of the rib-type optical waveguide decreases to a first minimum tip size. Then, in a slab-mode region, which is adjacent to the partial-slab-mode region, the width of the slab portion decreases to a second minimum tip size. In addition, a dielectric layer is disposed over the slab portion, the rib portion and the BOX layer in the partial-slab-mode region, the slab portion and the BOX layer in the slab-mode region, and the BOX layer in a released-mode region that is adjacent to the slab-mode region and that does not include the semiconductor layer.
    • 标准CMOS工艺兼容光学模式转换器使用具有不同光学模式尺寸的一系列相邻区域来转换光学模式尺寸。 特别地,在与初始肋 - 光波导模式区域相邻的局部平板模式区域中,肋型光波导的板坯部分的宽度减小,并且肋部分的肋部分的宽度 肋型光波导减小到第一最小尖端尺寸。 然后,在与部分板坯模式区域相邻的板坯模式区域中,板坯部分的宽度减小到第二最小端部尺寸。 此外,介电层设置在部分平板模式区域中的板坯部分,肋部分和BOX层上,板模块区域中的板坯部分和BOX层,以及释放的BOX层 模式区域,其与slab模式区域相邻并且不包括半导体层。