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1. 发明申请

US20080196515A1 CONTAMINATION ANALYSIS UNIT AND METHOD THEREOF, AND RETICLE CLEANING SYSTEM 失效
标题翻译：污染物分析单元及其方法及其清洗系统
公开(公告)号：US20080196515A1
公开(公告)日：2008-08-21
申请号：US12031086
申请日：2008-02-14
申请人： Ok-Sun Lee , Hyung-Seok Choi , Yo-Han Ahn , Ji-Young Kim
发明人： Ok-Sun Lee , Hyung-Seok Choi , Yo-Han Ahn , Ji-Young Kim
IPC分类号： G01N1/14
CPC分类号： G03F1/82 , G01N2015/0687
摘要： A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.
摘要翻译：提供了一种污染分析单元和用于检查在清洁物体之后残留在诸如掩模版之类的检查对象的目标侧上的污染物的方法。在将目标侧浸入溶液中之后，可以在预定时间之后从其中抽取取样液体并进行分析。

2. 发明授权

US08146447B2 Contamination analysis unit and method thereof, and reticle cleaning system 失效
标题翻译：污染分析单元及其方法，以及掩模版清洁系统
公开(公告)号：US08146447B2
公开(公告)日：2012-04-03
申请号：US12031086
申请日：2008-02-14
申请人： Ok-Sun Lee , Hyung-Seok Choi , Yo-Han Ahn , Ji-Young Kim
发明人： Ok-Sun Lee , Hyung-Seok Choi , Yo-Han Ahn , Ji-Young Kim
IPC分类号： G01N1/14
CPC分类号： G03F1/82 , G01N2015/0687
摘要： A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.
摘要翻译：提供了一种污染分析单元和用于检查在清洁物体之后残留在诸如掩模版之类的检查对象的目标侧上的污染物的方法。在将目标侧浸入溶液中之后，可以在预定时间之后从其中抽取取样液体并进行分析。

3. 发明申请

US20070035715A1 Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles 审中-公开
标题翻译：制造半导体的曝光装置及检查薄膜的方法
公开(公告)号：US20070035715A1
公开(公告)日：2007-02-15
申请号：US11502400
申请日：2006-08-11
申请人： Hyung-Seok Choi , Yong-Hoon Lee , Yo-Han Ahn , Ok-Sun Lee
发明人： Hyung-Seok Choi , Yong-Hoon Lee , Yo-Han Ahn , Ok-Sun Lee
IPC分类号： G03B27/62
CPC分类号： G03F7/70933 , G03F7/707 , G03F7/70983
摘要： Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention relate to an exposure apparatus for manufacturing semiconductors. The apparatus may include a reticle, a pellicle and a reticle chuck. The reticle may be mounted on an upper surface of the reticle chuck and the pellicle may be attached to a lower surface of the reticle chuck so that the pellicle may be detached again. There may be an empty space formed between the pellicle and the reticle. The reticle chuck may include holes for supplying or exhausting a purging gas from the empty space. Because a simpler yet more efficient purging system may be installed to the reticle chuck, an effective measure may be provided against contaminations on the pattern surface of the reticle.
摘要翻译：本发明的示例性实施例涉及半导体制造装置和检查防护薄膜组件的方法。本发明的其他示例性实施例涉及用于制造半导体的曝光装置。该设备可以包括掩模版，防护薄膜和掩模版卡盘。标线片可以安装在标线盘卡盘的上表面上，并且防护薄膜组件可以附着在光罩卡盘的下表面上，从而可以再次剥离防护薄膜组件。防护薄膜组件和掩模版之间可能存在空白空间。标线卡盘可以包括用于从空的空间供给或排出净化气体的孔。因为可以将更简单而更有效的清洗系统安装到标线盘卡盘上，所以可以提供对掩模版图案表面上的污染物的有效措施。

4. 发明授权

US07914594B2 Air filtering device and cleaning system of semiconductor manufacturing apparatus with the same 失效
标题翻译：具有相同的半导体制造装置的空气过滤装置和清洗系统
公开(公告)号：US07914594B2
公开(公告)日：2011-03-29
申请号：US12180289
申请日：2008-07-25
申请人： Chang-Min Cho , Joo-Young Kim , Ji-Young Kim , Ju-A Ryu , Yo-Han Ahn , Hyung-Seok Choi , Dong-Seok Ham
发明人： Chang-Min Cho , Joo-Young Kim , Ji-Young Kim , Ju-A Ryu , Yo-Han Ahn , Hyung-Seok Choi , Dong-Seok Ham
IPC分类号： B01D46/00
CPC分类号： B01D46/0058 , B01D46/002 , B01D46/24 , B01D46/4272 , Y10S55/31
摘要： An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.
摘要翻译：一种半导体制造装置的空气过滤装置和空气净化系统，以降低成本并提高制造生产率。空气过滤装置可以包括具有联接到空气供应管线的开口孔的框架。被构造成插入到框架中的缓冲框架可以包括多个狭槽部分，每个狭槽部分具有多个空气进/出孔，空气可以通过空气进入或离开缓冲器框架。多个过滤器可以可释放地紧固到多个槽部分，以过滤包含在流过空气进/出孔的空气中的污染物质。当更换多个过滤器时，可以使用用于中断通过空气入口/出口的空气的空气断路器，从而在更换期间向半导体制造装置提供净化的空气。

5. 发明申请

US20080137046A1 Apparatus and method for exposing substrate 审中-公开
标题翻译：用于曝光衬底的装置和方法
公开(公告)号：US20080137046A1
公开(公告)日：2008-06-12
申请号：US11999526
申请日：2007-12-06
申请人： Ju-A Ryu , Chang-Su Lim , Yo-Han Ahn , Hyung-Seok Choi , Kyung-Log Moon
发明人： Ju-A Ryu , Chang-Su Lim , Yo-Han Ahn , Hyung-Seok Choi , Kyung-Log Moon
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A substrate exposing apparatus includes an immersion exposure unit, disposed between a projection optical system and a substrate, including a vessel disposed on an optical path and filled with a liquid, a supply line connected to one side of the vessel to supply the liquid to the vessel, a first drain line connected to the other side of the vessel to drain the liquid from the vessel, and a monitoring unit including at least one first measuring unit connected to the first drain line to detect a property of the liquid flowing through the first drain line. The monitoring unit can include a collection line connected to the first drain line to collect the liquid, a first bath storing the collected liquid, and a first distribution line through which the liquid in the first bath can flow. The first measuring unit is installed on the first distribution line.
摘要翻译：基板曝光装置包括设置在投影光学系统和基板之间的浸没曝光单元，包括设置在光路上并填充有液体的容器，连接到容器的一侧以将液体供应到容器，连接到容器的另一侧的第一排出管线，以从容器排出液体;以及监测单元，其包括连接到第一排泄管线的至少一个第一测量单元，以检测流过第一流体的液体的性质排水管线。监视单元可以包括连接到第一排水管线以收集液体的收集管线，存储收集的液体的第一浴槽和第一浴液中的液体可以流过的第一分配管线。第一个测量单元安装在第一个配线上。

6. 发明申请

US20070144559A1 UNIT FOR PREVENTING A SUBSTRATE FROM DRYING, SUBSTRATE CLEANING APPARATUS HAVING THE UNIT AND METHOD OF CLEANING THE SUBSTRATE USING THE UNIT 审中-公开
标题翻译：用于防止基材干燥的单元，具有单元的基板清洁装置和使用单元清洁基板的方法
公开(公告)号：US20070144559A1
公开(公告)日：2007-06-28
申请号：US11611524
申请日：2006-12-15
申请人： Kwang-Shin Lim , Sung-Jae Han , Yong-Hoon Lee , Hyung-Seok Choi , Ju-Ah Ryu , Yong-Joo Choi
发明人： Kwang-Shin Lim , Sung-Jae Han , Yong-Hoon Lee , Hyung-Seok Choi , Ju-Ah Ryu , Yong-Joo Choi
IPC分类号： B08B3/00 , B08B3/04
CPC分类号： B08B3/04 , H01L21/67051 , H01L21/67751 , H01L21/68707
摘要： A unit for preventing a substrate from drying includes a transfer arm for transferring a substrate from a first bath containing a first cleaning solution to a second bath containing a second cleaning solution, a spraying part connected to the transfer arm, wherein the spraying part sprays a drying prevention solution from an upper portion of the substrate to a lower portion of the substrate, and a drainage container connected to the transfer arm, wherein the drainage container receives the drying prevention solution.
摘要翻译：用于防止基材干燥的单元包括用于将基材从含有第一清洗溶液的第一浴转移到含有第二清洗溶液的第二浴的转移臂，连接到转移臂的喷射部分，其中喷雾部分喷雾从所述基板的上部到所述基板的下部的防干燥溶液和与所述输送臂连接的排水容器，其中所述排水容器接收所述干燥防止溶液。

7. 发明申请

US20060002833A1 Apparatus to suppress ascending gas flow and method for exhaust control thereof 审中-公开
标题翻译：抑制上升气流的装置及其排气控制方法
公开(公告)号：US20060002833A1
公开(公告)日：2006-01-05
申请号：US11150208
申请日：2005-06-13
申请人： Hyung-Seok Choi , Jung-Sung Hwang , Kyoung-Ho Park , Kil-Sun Ko , Yong-Woon Oh
发明人： Hyung-Seok Choi , Jung-Sung Hwang , Kyoung-Ho Park , Kil-Sun Ko , Yong-Woon Oh
IPC分类号： B01J8/04
CPC分类号： H01L21/67017 , H01L21/67034 , H01L21/67051 , H01L21/6715 , H01L21/67253
摘要： An apparatus and method for exhaust control. The apparatus may include a vessel to accommodate a gas flow of a gas, a sensor mounted on the vessel to sense a direction of the gas flow in the vessel, a conduit coupled to the vessel to exhaust the gas from the vessel, and a control unit that adjusts a flow rate of the gas through the conduit based on the direction of the gas flow in vessel sensed by the sensor. The method may include providing a gas flow of a gas in a vessel, sensing a direction of the gas flow in the vessel, exhausting the gas from the vessel at an exhaust flow rate, and adjusting the exhaust flow rate based on the sensed direction of the gas flow in the vessel.
摘要翻译：一种排气控制装置和方法。该装置可以包括容纳气体的气流的容器，安装在容器上的传感器以感测容器中的气体流动的方向，连接到容器以从容器排出气体的管道，以及控制器单元，其基于由传感器感测的容器中的气体流的方向来调节通过导管的气体的流速。该方法可以包括在容器中提供气体的气流，感测容器中的气体流动的方向，以排气流量从容器排出气体，并且基于检测到的方向调节排气流量容器内的气体流动。

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