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1. 发明申请

US20170038680A1 FLUORINATED PHOTORESIST WITH INTEGRATED SENSITIZER 审中-公开
标题翻译：具有综合敏感元件的荧光光电元件
公开(公告)号：US20170038680A1
公开(公告)日：2017-02-09
申请号：US15296193
申请日：2016-10-18
申请人： Orthogonal, Inc.
发明人： Charles Warren Wright , Douglas Robert Robello
IPC分类号： G03F7/004 , G03F7/32 , G03F7/039 , G03F7/40 , G03F7/42 , G03F7/16 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/162 , G03F7/168 , G03F7/2002 , G03F7/325 , G03F7/40 , G03F7/422 , G03F7/426
摘要： A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having a sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.
摘要翻译：一种图案化装置的方法包括在装置基板上提供含有至少三个不同重复单元的氟化光聚合物层，所述重复单元包括具有含氟基团的第一重复单元，具有酸或醇形成前体的第二重复单元和具有敏化染料的第三重复单元。光聚合物的总氟含量为15〜60重量％。将光聚合物层暴露于图案化光并与显影剂接触以根据图案化的光去除一部分暴露的光聚合物层，从而形成显影结构，其具有覆盖基材的第一图案的光聚合物和未覆盖的互补的第二图案对应于光敏聚合物的去除部分的基材。显影剂包含至少50体积％的氟化溶剂。

2. 发明授权

US09541829B2 Cross-linkable fluorinated photopolymer 有权
标题翻译：可交联的氟化光聚合物
公开(公告)号：US09541829B2
公开(公告)日：2017-01-10
申请号：US14335406
申请日：2014-07-18
申请人： Orthogonal, Inc.
发明人： Douglas Robert Robello , Charles Warren Wright
IPC分类号： G03F7/004 , G03F7/038 , G03F7/32 , C08F220/18 , H01L21/027 , C08F222/18 , G03F7/40 , C08F220/22 , C08F220/24 , G03F7/00
CPC分类号： G03F7/0388 , C08F220/18 , C08F220/22 , C08F220/24 , C08F222/18 , C08F2222/185 , C09B1/00 , C09B57/02 , C09B69/008 , C09B69/101 , C09B69/109 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/32 , G03F7/40 , H01L21/0274 , C08F2220/325 , C08F2220/1891
摘要： A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
摘要翻译：光敏组合物包含氟化溶剂，光酸产生剂和共聚物。该共聚物包含至少三个不同的重复单元，包括具有含氟基团的第一重复单元，具有酸催化的可交联基团的第二重复单元和具有敏化染料的第三重复单元。该组合物可用于制造电子器件，特别是有机电子和生物电子器件。

3. 发明授权

US09298088B2 Fluorinated photopolymer with fluorinated sensitizer 有权
标题翻译：氟化光敏聚合物与氟化敏化剂
公开(公告)号：US09298088B2
公开(公告)日：2016-03-29
申请号：US14335476
申请日：2014-07-18
申请人： Orthogonal, Inc.
发明人： Douglas Robert Robello , Charles Warren Wright
IPC分类号： G03F7/004 , G03F7/40 , G03F7/027 , G03F7/038 , G03F7/20 , G03F7/30 , G03F7/32 , H01L21/027 , C08F220/18 , C08F220/24 , C08F222/18
CPC分类号： G03F7/027 , C08F220/18 , C08F220/24 , C08F222/18 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/0392 , G03F7/0758 , G03F7/11 , G03F7/2002 , G03F7/30 , G03F7/32 , G03F7/40 , G03F7/425 , H01L21/0274
摘要： A photosensitive composition useful for fabricating organic electronic devices comprises a fluorinated solvent a fluorinated sensitizing dye and a copolymer. The copolymer comprises at least two distinct repeating units, including a first repeating unit having a fluorine-containing group and a second repeating unit having a solubility-altering reactive group. The presence of the fluorinated sensitizing dye improves photosensitivity.
摘要翻译：用于制造有机电子器件的光敏组合物包括含氟溶剂氟化增感染料和共聚物。共聚物包含至少两个不同的重复单元，包括具有含氟基团的第一重复单元和具有溶解度改变的反应性基团的第二重复单元。氟化感光染料的存在提高了光敏性。

4. 发明申请

US20140342287A1 METHOD OF PATTERNING A DEVICE 有权
标题翻译：方法设计方法
公开(公告)号：US20140342287A1
公开(公告)日：2014-11-20
申请号：US14260705
申请日：2014-04-24
申请人： Orthogonal, Inc.
发明人： Charles Warren Wright , Diane Carol Freeman , Frank Xavier Byrne , John Andrew DeFranco , Sandra Rubsam , Terrrence Robert O'Toole , Douglas Robert Robello
IPC分类号： G03F7/038 , G03F7/42 , G03F7/20
CPC分类号： G03F7/038 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/325 , G03F7/40 , G03F7/422 , G03F7/426
摘要： A fluorinated photopolymer is formed on a device substrate and exposed to patterned radiation. The photopolymer has a total fluorine content in a weight range of 15 to 60% and comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit different from the first and second repeating units. The pattern-exposed photopolymer layer is contacted with a developing solution comprising at least a first fluorinated solvent that dissolves the unexposed photopolymer thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate. The developing solution is selected to provide a maximum photopolymer contrast in a range of 1.9 to 5.0.
摘要翻译：氟化光聚合物形成在器件衬底上并暴露于图案化辐射。光聚合物的总氟含量为15〜60重量％，含有至少三个不同的重复单元，包括具有含氟基团的第一重复单元，具有酸或醇形成前体的第二重复单元和与第一和第二重复单元不同的第三重复单元。图案曝光的光聚合物层与包含至少第一氟化溶剂的显影溶液接触，其溶解未曝光的光聚合物，从而形成具有覆盖基材的第一图案的光聚合物的显影结构和未覆盖的基材的互补的第二图案。选择显影溶液以提供在1.9至5.0的范围内的最大光聚合物对比度。

5. 发明授权

US10503074B2 Photolithographic patterning of devices 有权
公开(公告)号：US10503074B2
公开(公告)日：2019-12-10
申请号：US15501116
申请日：2015-07-31
申请人： ORTHOGONAL, INC.
发明人： John Andrew Defranco , Charles Warren Wright , Douglas Robert Robello , Frank Xavier Byrne , Diane Carol Freeman , Terrence Robert O'Toole
IPC分类号： G03F7/42 , H01L51/00 , G03F7/40 , H01L21/027 , G03F7/09 , H01L51/56
CPC分类号： G03F7/42 , G03F7/094 , G03F7/40 , H01L21/0272 , H01L21/0274 , H01L51/0018 , H01L51/0016 , H01L51/56 , Y02E10/549 , Y02P70/521
摘要： A method of making a device includes providing a fluorinated material layer over the device substrate having one or more target areas for patterning. One or more lift-off structures are formed at least in part by developing a first pattern of one or more open areas in the fluorinated material layer in alignment with the one or more target areas by contact with a developing agent including a fluorinated solvent which dissolves the fluorinated material at a first rate. After patterning, the lift-off structures are removed by contact with a lift-off agent including a fluorinated solvent wherein the lift-off agent dissolves the fluorinated material at a second rate that is at least 150 nm/sec and higher than the first rate.

6. 发明授权

US10078262B2 Patterning devices using branched fluorinated photopolymers 有权
公开(公告)号：US10078262B2
公开(公告)日：2018-09-18
申请号：US15728017
申请日：2017-10-09
申请人： Orthogonal, Inc.
发明人： Douglas Robert Robello , Charles Warren Wright , Diane Carol Freeman , Frank Xavier Byrne , John Andrew DeFranco , Sandra Rubsam , Terrence Robert O'Toole
IPC分类号： G03F7/038 , G03F7/039 , G03F7/32 , G03F7/004
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/0397 , G03F7/325
摘要： A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.

7. 发明授权

US09958778B2 Cross-linkable fluorinated photopolymer 有权
公开(公告)号：US09958778B2
公开(公告)日：2018-05-01
申请号：US15117032
申请日：2015-02-04
申请人： Orthogonal, Inc.
发明人： Charles Warren Wright , Douglas Robert Robello , John Andrew DeFranco , Diane Carol Freeman , Frank Xavier Byrne
IPC分类号： G03F7/004 , G03F7/038 , G03F7/40 , G03F7/20 , G03F7/30 , H01L21/027 , C08F220/34 , G03F7/075
CPC分类号： G03F7/0388 , C08F220/34 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0758 , G03F7/20 , G03F7/30 , G03F7/40 , H01L21/0274
摘要： A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

8. 发明申请

US20140356789A1 FLUORINATED PHOTOPOLYMER WITH INTEGRATED ANTHRACENE SENSITIZER 审中-公开
标题翻译：氟化光电聚合物与一体化的蒽醌敏化剂
公开(公告)号：US20140356789A1
公开(公告)日：2014-12-04
申请号：US14291767
申请日：2014-05-30
申请人： Orthogonal, Inc.
发明人： Charles Warren Wright , Ralph Rainer Dammel
IPC分类号： G03F7/038 , G03F7/42 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/325 , G03F7/426
摘要： A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.
摘要翻译：一种图案化装置的方法包括在装置基板上提供含有至少三个不同重复单元的氟化光聚合物层，所述重复单元包括具有含氟基团的第一重复单元，具有酸或醇形成前体的第二重复单元和具有蒽系敏化染料的第三重复单元。光聚合物的总氟含量为15〜60重量％。将光聚合物层暴露于图案化光并与显影剂接触以根据图案化的光去除一部分暴露的光聚合物层，从而形成显影结构，其具有覆盖基材的第一图案的光聚合物和未覆盖的互补的第二图案对应于光敏聚合物的去除部分的基材。显影剂包含至少50体积％的氟化溶剂。

9. 发明授权

US09817310B2 Branched fluorinated photopolymers 有权
公开(公告)号：US09817310B2
公开(公告)日：2017-11-14
申请号：US14539574
申请日：2014-11-12
申请人： Orthogonal, Inc.
发明人： Douglas Robert Robello , Charles Warren Wright , Diane Carol Freeman , Frank Xavier Byrne , John Andrew DeFranco , Sandra Rubsam , Terrence Robert O'Toole
IPC分类号： G03F7/039 , G03F7/038 , G03F7/004 , G03F7/32
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/0397 , G03F7/325
摘要： A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.

10. 发明授权

US09122167B2 Method of patterning a device 有权
标题翻译：图案化装置的方法
公开(公告)号：US09122167B2
公开(公告)日：2015-09-01
申请号：US14274816
申请日：2014-05-12
申请人： ORTHOGONAL, INC.
发明人： John Andrew Defranco , Francis Houlihan , Charles Warren Wright , Diane Carol Freeman , Frank Xavier Byrne , Douglas Robert Robello , Sandra Rubsam , Terrence Robert O'Toole
IPC分类号： G03F7/26 , G03F7/42 , G03F7/004 , G03F7/039 , G03F7/32
CPC分类号： G03F7/42 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/16 , G03F7/20 , G03F7/325 , G03F7/426 , G03F7/427
摘要： A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
摘要翻译：在有机器件衬底上形成光敏聚合物层并暴露于图案化辐射。感光聚合物层包括至少包含具有酸催化的溶解性变化反应性基团的第一重复单元的光聚合物，其中光聚合物的总氟含量小于30重量％。将图案曝光的光聚合物与显影剂如显影液接触以除去未曝光的光聚合物，从而形成显影结构，其具有覆盖基材的曝光的光聚合物的第一图案和对应于未曝光的光聚合物的互补的未覆盖的基材图案。显影剂包含至少50体积％的氢氟醚显影溶剂。

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