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1. 发明授权

US09117632B2 Charged particle beam writing apparatus and charged particle beam writing method 有权
标题翻译：带电粒子束写入装置和带电粒子束写入方法
公开(公告)号：US09117632B2
公开(公告)日：2015-08-25
申请号：US14065588
申请日：2013-10-29
申请人： NuFlare Technology, Inc.
发明人： Saori Gomi , Yusuke Sakai
IPC分类号： H01L21/26 , H01J3/14 , H01J37/302 , H01J37/30 , G03F7/20 , H01L21/263 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01L21/263
摘要： A charged particle beam writing apparatus includes a map generation unit to generate a map where a parameter concerning a chip is defined for each mesh region obtained by virtually dividing a region including the chip including a plurality of figure patterns into a plurality of mesh regions, an exchange unit to, when performing at least one data processing of reversal and rotation for data of the chip, centering on the center of the chip or the center of the region including the chip, exchange parameters each being the parameter defined for each mesh region in the map, to be corresponding to the position of a figure pattern for which the data processing was performed, and a writing unit to write the figure pattern in the chip for which at least one data processing of reversal and rotation was performed on a target object with a charged particle beam.
摘要翻译：带电粒子束写入装置包括地图生成单元，用于生成对于通过将包括多个图形图案的芯片实际划分为多个网格区域而获得的每个网格区域来定义关于芯片的参数的映射，交换单元，当以芯片的中心或包括芯片的区域的中心为中心进行芯片数据的反转和旋转的至少一个数据处理时，交换参数各自是为每个网格区域定义的参数所述映射对应于执行数据处理的图形模式的位置;以及写入单元，用于将图形模式写入到对目标对象执行了至少一个反转和旋转的数据处理的芯片中带有带电粒子束。

2. 发明授权

US09779913B2 Charged particle beam drawing apparatus and drawing data generation method 有权
公开(公告)号：US09779913B2
公开(公告)日：2017-10-03
申请号：US15056300
申请日：2016-02-29
申请人： NuFlare Technology, Inc.
发明人： Shigehiro Hara , Kenichi Yasui , Hiroshi Yamashita , Yasuo Kato , Saori Gomi , Shinji Sakamoto , Takao Tamura , Hideo Tsuchiya , Noriaki Nakayamada , Hironobu Matsumoto
IPC分类号： H01J37/304 , H01J37/20 , H01J37/302 , H01J37/317
CPC分类号： H01J37/3026 , H01J37/3174 , H01J2237/31762 , H01J2237/31776
摘要： In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry. The drawing data with the hierarchical map includes a plurality of files in which division maps are respectively described in files in units of subframes. Each division map includes dose correction information associated with corresponding one of blocks of the drawing area. The process further includes generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.

3. 发明授权

US09734981B2 Charged particle beam writing apparatus and charged particle beam writing method 有权
公开(公告)号：US09734981B2
公开(公告)日：2017-08-15
申请号：US15088487
申请日：2016-04-01
申请人： NuFlare Technology, Inc.
发明人： Saori Gomi , Hitoshi Higurashi
IPC分类号： H01J37/30 , H01J3/26 , G21K1/08 , G06F9/455 , H01J37/147 , H01J37/302 , H01J37/317 , H01J37/20
CPC分类号： H01J37/1472 , H01J37/20 , H01J37/3023 , H01J37/3026 , H01J37/3174 , H01J2237/1504 , H01J2237/202 , H01J2237/3175 , H01J2237/31754 , H01J2237/31762 , H01J2237/31766
摘要： A charged particle beam writing apparatus includes a circuitry to set, when a charged particle beam is deflected to move between plural small regions by a deflector, plural first mesh regions obtained by virtually dividing a chip region into regions by length and width sizes same as those of each of the plural small regions; determine whether a shot figure having been assigned exists in each of the plural first mesh regions; a circuitry to perform, for the plural first mesh regions, merging of two or more adjacent first mesh regions; a circuitry to measure, for each of plural second mesh regions each obtained by merging, the number of first mesh regions each having been determined that an assigned shot figure exists therein; and a circuitry to generate a map for each chip, where measured number of first mesh regions with the shot figure is defined as a map value.

4. 发明申请

US20160284510A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND DRAWING DATA GENERATION METHOD 有权
标题翻译：充电颗粒光束绘图仪和绘图数据生成方法
公开(公告)号：US20160284510A1
公开(公告)日：2016-09-29
申请号：US15056300
申请日：2016-02-29
申请人： NuFlare Technology, Inc.
发明人： Shigehiro HARA , Kenichi Yasui , Hiroshi Yamashita , Yasuo Kato , Saori Gomi , Shinji Sakamoto , Takao Tamura , Hideo Tsuchiya , Noriaki Nakayamada , Hironobu Matsumoto
IPC分类号： H01J37/302 , H01J37/317 , H01J37/24
CPC分类号： H01J37/3026 , H01J37/3174 , H01J2237/31762 , H01J2237/31776
摘要： In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry, the drawing data with the hierarchical map including a plurality of files in which division maps are respectively described in files in units of subframes, each division map including dose information associated with corresponding one of blocks of the drawing area, and the process further including generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.
摘要翻译：在一个实施例中，带电粒子束描绘装置包括绘制单元，其绘制在基板上的绘图区域中的图案;以及控制处理电路，控制处理电路通过包括接收绘图数据的处理来控制绘图单元，该处理包括输入到控制处理电路，具有包括多个文件的分层映射的绘图数据，其中分割图分别以子帧为单位在文件中描述，每个分割映射包括与绘图区域的对应的一个块相关联的剂量信息，以及处理进一步包括通过对绘图数据进行数据转换处理来生成拍摄数据，读取与从分层校正图中绘出的区域中的块对应的分割图，计算剂量，以及基于拍摄数据控制绘制单位和计算剂量。

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