专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08729507B2 Multi charged particle beam writing method and multi charged particle beam writing apparatus 有权
标题翻译：多带电粒子束写入方法和多带电粒子束写入装置
公开(公告)号：US08729507B2
公开(公告)日：2014-05-20
申请号：US13896767
申请日：2013-05-17
申请人： NuFlare Technology, Inc.
发明人： Ryoichi Yoshikawa , Muehiro Ogasawara
IPC分类号： H01J37/28 , H01L21/30 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3045 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3177 , H01J2237/216 , H01L21/30
摘要： A multi charged particle beam writing method includes calculating first shot positions of multiple beams, each of which includes a distortion amount of an irradiating corresponding beam, in a case of irradiating each beam, based on control grid intervals, calculating first condition positions based on a pre-set condition, each of which is arranged in a corresponding first region surrounded by closest second shot positions of 2×2 in length and width of the first shot positions, calculating, for each of second regions respectively surrounded by closest second condition positions of the first condition positions, an area density of a figure pattern in overlapping with a second region concerned, calculating an irradiation amount or an irradiation time of each beam whose corresponding first shot position is in a corresponding second region, based on an area density, and writing a pattern by irradiating a beam of the calculated irradiation amount or time.
摘要翻译：多带电粒子束写入方法包括：计算多个光束的第一射出位置，每个光束在每个光束的照射的情况下包括照射对应光束的失真量，基于控制网格间隔，基于预置条件，其中每个被布置在由最接近的第二射击位置围绕的对应的第一区域中，所述最近的第二射击位置的长度和宽度为第一射击位置的长度和宽度，对于分别被最接近的第二条件位置第一条件位置，与相关的第二区域重叠的图形图案的面积密度，基于面积密度计算相应的第一拍摄位置在相应的第二区域中的每个光束的照射量或照射时间，以及通过照射所计算的照射量或时间的光束来写入图案。

IPRDB

热门服务

关于我们

友情链接

联系方式