会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Method for production of solid-state imaging element, solid-state imaging element, and imaging apparatus
    • 固体摄像元件,固体摄像元件及成像装置的制造方法
    • US08697477B2
    • 2014-04-15
    • US13116539
    • 2011-05-26
    • Sanghoon HaHiroaki Ishiwata
    • Sanghoon HaHiroaki Ishiwata
    • H01L21/00
    • H01L27/14806H01L27/14616H01L27/14643H01L27/14689H01L31/03529H01L31/103H01L31/18Y02E10/50
    • Disclosed herein is a method for producing a solid-state imaging element which has pixels, each including a sensor section that performs photoelectric conversion and a charge transfer section that transfers charges generated by the sensor section. The method includes: forming an impurity region of the first conduction type and a second impurity region of the second conduction type on the impurity region of the first conduction type by ion implantation by using the same mask; forming on the surface of the semiconductor substrate a transfer gate constituting the charge transfer section which extends over the second impurity region of the second conduction type; forming a charge accumulating region of the first conduction type constituting the sensor section by ion implantation; and forming a first impurity region of the second conduction type, which has a higher impurity concentration than the second impurity region of the second conduction type, by ion implantation.
    • 本发明公开了一种具有像素的固体摄像元件的制造方法,每个像素包括执行光电转换的传感器部分和传送由传感器部分产生的电荷的电荷转移部分。 该方法包括:通过使用相同的掩模通过离子注入在第一导电类型的杂质区上形成第一导电类型的杂质区和第二导电类型的第二杂质区; 在所述半导体衬底的表面上形成构成所述电荷转移部的传输门,所述电荷转移部在所述第二导电类型的所述第二杂质区上延伸; 通过离子注入形成构成传感器部分的第一导电类型的电荷累积区域; 并且通过离子注入形成具有比第二导电类型的第二杂质区更高的杂质浓度的第二导电类型的第一杂质区。
    • 7. 发明申请
    • METHOD FOR PRODUCTION OF SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING ELEMENT, AND IMAGING APPARATUS
    • 固态成像元件,固态成像元件和成像装置的制造方法
    • US20110298078A1
    • 2011-12-08
    • US13116539
    • 2011-05-26
    • Sanghoon HaHiroaki Ishiwata
    • Sanghoon HaHiroaki Ishiwata
    • H01L31/02
    • H01L27/14806H01L27/14616H01L27/14643H01L27/14689H01L31/03529H01L31/103H01L31/18Y02E10/50
    • Disclosed herein is a method for producing a solid-state imaging element which has pixels, each including a sensor section that performs photoelectric conversion and a charge transfer section that transfers charges generated by the sensor section. The method includes: forming an impurity region of the first conduction type and a second impurity region of the second conduction type on the impurity region of the first conduction type by ion implantation by using the same mask; forming on the surface of the semiconductor substrate a transfer gate constituting the charge transfer section which extends over the second impurity region of the second conduction type; forming a charge accumulating region of the first conduction type constituting the sensor section by ion implantation; and forming a first impurity region of the second conduction type, which has a higher impurity concentration than the second impurity region of the second conduction type, by ion implantation.
    • 本发明公开了一种具有像素的固体摄像元件的制造方法,每个像素包括执行光电转换的传感器部分和传送由传感器部分产生的电荷的电荷转移部分。 该方法包括:通过使用相同的掩模通过离子注入在第一导电类型的杂质区上形成第一导电类型的杂质区和第二导电类型的第二杂质区; 在所述半导体衬底的表面上形成构成所述电荷转移部的传输门,所述电荷转移部在所述第二导电类型的所述第二杂质区上延伸; 通过离子注入形成构成传感器部分的第一导电类型的电荷累积区域; 以及通过离子注入形成具有比第二导电类型的第二杂质区更高的杂质浓度的第二导电类型的第一杂质区。
    • 10. 发明授权
    • Solid-state image sensor
    • 固态图像传感器
    • US06521925B1
    • 2003-02-18
    • US09537745
    • 2000-03-30
    • Akiko MoriHisanori IharaTetsuya YamaguchiHiroaki IshiwataHidetoshi Nozaki
    • Akiko MoriHisanori IharaTetsuya YamaguchiHiroaki IshiwataHidetoshi Nozaki
    • H01L31062
    • H01L29/0847H01L27/14603H01L27/14609H01L27/14643H01L27/14654H01L31/0352
    • A solid-state image sensor comprises a photodiode which is provided in a p-type substrate or a p-type well and composed of a first n-type region for storing photoelectrically converted signal charges, a gate electrode provided above the substrate or well so as to be adjacent to one end of the photodiode, and a n-type drain provided at the surface of the substrate or well opposite to the photodiode, with the gate electrode interviewing therebetween. There is provided a second n-type region which is formed so as to be in contact with the upper part of the first n-type region on the gate electrode side and one end of which is formed to self-align with one end of the gate electrode to be part of the photodiode. This construction prevents the short-channel effect of the signal read transistor section and reduces or eradicates the left-over signal charges stored in the photodiode, thereby reducing noise and improving the sensitivity of the sensor.
    • 固态图像传感器包括设置在p型衬底或p型阱中并由用于存储光电转换的信号电荷的第一n型区域,设置在衬底或阱上方的栅电极组成的光电二极管, 与光电二极管的一端相邻,以及设置在基板的表面或与光电二极管相对的阱的n型漏极,门电极与其间进行访问。 提供了第二n型区域,其形成为与栅极电极侧上的第一n型区域的上部接触,并且其一端形成为与第一n型区域的一端自对准 栅电极成为光电二极管的一部分。 这种结构防止信号读取晶体管部分的短沟道效应,并且减少或消除存储在光电二极管中的剩余信号电荷,从而降低噪声并提高传感器的灵敏度。