专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06569215B2 Composition for polishing magnetic disk substrate 失效
标题翻译：抛光磁盘基板的组成
公开(公告)号：US06569215B2
公开(公告)日：2003-05-27
申请号：US09835315
申请日：2001-04-17
申请人： Norihiko Miyata
发明人： Norihiko Miyata
IPC分类号： C09C168
CPC分类号： G11B5/84 , B24B37/044 , C09G1/02
摘要： An object of the present invention is to provide a composition for polishing a magnetic disk substrate that is used as a storage device for a computer or the like, and is capable of producing a magnetic disk substrate polished with high precision suitable for use in combination with a magnetic head that floats at a low level. Another object of the present invention is to provide a method of producing the composition for polishing the magnetic disk substrate. A polishing composition includes alkali metal ions, abrasive grains, a carboxylic acid, an oxidizing agent, and an anti-gelling agent contained in an aqueous medium. In a method of the present invention for preparing a polishing composition, a pH value of an aqueous medium, in which abrasive grains, a carboxylic acid, an oxidizing agent, and an anti-gelling agent are contained, is adjusted to a range of about 1 to about 5 by the addition of alkali metal hydroxide to the aqueous medium.
摘要翻译：本发明的目的是提供一种用于研磨用作计算机等的存储装置的磁盘基板的组合物，并且能够制造高精度抛光的磁盘基板，其适用于与一个浮在低水平的磁头。本发明的另一个目的是提供一种制备用于抛光磁盘基片的组合物的方法。抛光组合物包含含水介质中的碱金属离子，磨粒，羧酸，氧化剂和抗凝胶剂。在本发明的制备抛光组合物的方法中，将含有磨粒，羧酸，氧化剂和抗胶凝剂的水性介质的pH值调节至约通过向水性介质中加入碱金属氢氧化物1至约5。

2. 发明授权

US06478835B2 Abrasive composition for polishing magnetic recording disk substrates 有权
标题翻译：用于抛光磁记录盘基片的磨料组合物
公开(公告)号：US06478835B2
公开(公告)日：2002-11-12
申请号：US09767024
申请日：2001-01-23
申请人： Norihiko Miyata , Kiyoshi Tada , Kenji Tomita
发明人： Norihiko Miyata , Kiyoshi Tada , Kenji Tomita
IPC分类号： C09K314
CPC分类号： C09G1/02
摘要： The present invention provides an abrasive composition for polishing magnetic recording disk substrates that results in a low surface roughness of the magnetic recording disk, allows the attaining of high-density recording without the occurrence of protrusions or polishing scratches, and enables polishing to be performed at an economical speed. The present invention discloses an abrasive composition for polishing magnetic recording disk substrates comprising water, silicon dioxide, antigelling agent, aluminum nitrate and hydrogen peroxide.
摘要翻译：本发明提供了一种用于研磨磁记录盘基片的研磨组合物，其导致磁记录盘的低表面粗糙度，允许获得高密度记录而不发生突起或抛光划痕，并且能够进行抛光一个经济的速度。本发明公开了一种用于抛光包含水，二氧化硅，抗凝胶剂，硝酸铝和过氧化氢的磁记录盘基片的磨料组合物。

3. 发明授权

US6152976A Abrasive composition for disc substrate, and process for polishing disc substrate 失效
标题翻译：用于盘基片的磨料组合物，以及抛光盘基片的方法
公开(公告)号：US6152976A
公开(公告)日：2000-11-28
申请号：US917717
申请日：1997-08-27
申请人： Ken Ishitobi , Norihiko Miyata
发明人： Ken Ishitobi , Norihiko Miyata
IPC分类号： C09G1/02 , C09K3/14 , B24B1/00 , C09G1/04
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： An abrasive composition for polishing a substrate for a magnetic recording disc is described, which comprises finely divided titanium oxide particles, an abrasion promoter, an optional water-soluble oxidizing agent, and water. This abrasive composition is used for polishing a substrate for a magnetic recording disc by a process wherein the substrate is polished with a pad while the abrasive composition is supplied between the substrate and the pad, and at least one of the pad and the substrate is rotated. The contents of the finely divided titanium oxide particles, the abrasion promoter and the optional water-soluble oxidizing agent are 2-20 wt. %, 1-20 wt. % and up to 10 wt. %, respectively, based on the weight of the abrasive composition as used for polishing the substrate.
摘要翻译：描述了用于抛光用于磁记录盘的基底的研磨组合物，其包括细碎的氧化钛颗粒，磨损助剂，任选的水溶性氧化剂和水。这种研磨组合物用于通过其中衬底在衬底和衬垫之间被提供的衬底抛光的过程中用于抛光磁记录盘的衬底，并且衬垫和衬底中的至少一个被旋转。细碎的二氧化钛颗粒，磨耗助剂和任选的水溶性氧化剂的含量为2-20wt。％，1-20重量％％和高达10wt。％，分别基于用于研磨基材的磨料组合物的重量。

4. 发明申请

US20050028449A1 Polishing composition 审中-公开
标题翻译：抛光组成
公开(公告)号：US20050028449A1
公开(公告)日：2005-02-10
申请号：US10488296
申请日：2002-09-03
申请人： Norihiko Miyata , Gong-Hong Hong , Junichiro Ando
发明人： Norihiko Miyata , Gong-Hong Hong , Junichiro Ando
IPC分类号： C09G1/02 , B24D3/02
CPC分类号： C09G1/02
摘要： A polishing composition of abrasive grains, a phosphorus-containing inorganic acid or salt thereof and another inorganic acid or salt thereof contained in an aqueous medium is used for the polishing of magnetic disk substrates or the like.
摘要翻译：包含在水性介质中的磨粒的研磨用组合物，含磷无机酸或其盐以及其它无机酸或盐用于研磨磁盘基板等。

5. 发明授权

US06478837B1 Abrasive composition substrate for magnetic recording disks and process for producing substrates for magnetic recording disk 有权
标题翻译：用于磁记录盘的基片用磨料组合物及用于制造磁记录盘用基材的方法
公开(公告)号：US06478837B1
公开(公告)日：2002-11-12
申请号：US09701042
申请日：2001-04-05
申请人： Norihiko Miyata
发明人： Norihiko Miyata
IPC分类号： C09K314
CPC分类号： C09G1/02 , C09K3/1463 , G11B5/8404
摘要： An abrasive composition for substrates for magnetic recording disks and a process for producing a substrate for a magnetic recording disk are provided, which enable lowering of surface roughness of a substrate for a magnetic recording disk; form no nodules, polishing scratches, and minute defects such as micropits; and enable polishing at economical speeds. The abrasive composition comprises at least water, titanium oxide fine particles and an abrasion promoter, wherein 90-100% of the titanium oxide is constituted by a single crystal structure.
摘要翻译：提供了一种用于磁记录盘的基片用磨料组合物和用于制造磁记录盘用基材的方法，能够降低用于磁记录盘的基材的表面粗糙度; 不形成结节，抛光划痕和微小缺陷等微小缺陷; 并以经济的速度进行抛光。磨料组合物至少包含水，氧化钛微粒和磨耗助剂，其中90-100％的氧化钛由单晶结构构成。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式