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    • 8. 发明授权
    • Method of manufacturing a silicon-type charge transporting material
    • 硅型电荷输送材料的制造方法
    • US5688961A
    • 1997-11-18
    • US740738
    • 1996-11-04
    • Nobuo KushibikiKikuko Takeuchi
    • Nobuo KushibikiKikuko Takeuchi
    • C07F7/18C08G77/26C08L83/04G03G5/05G03G5/06G03G5/07C07F7/08C07F7/10G03G13/05
    • G03G5/0614C07F7/1876G03G5/0578G03G5/078
    • A method of manufacturing charge transporting materials which impart a charge transporting property to a polysiloxane resin, and which is soluble in the resin. The charge transporting material is an aromatic substituted tertiary amine with a plurality of aromatic groups, and a silyl group introduced via a hydrocarbon group, into at least one of the aromatic groups. The method is characterized by using an unsaturated aliphatic group bonded to an aromatic group which makes up the silicon-type charge transporting compound, or using a newly bonded unsaturated aliphatic group which is bonded to a silane in which the substituent for silicon is hydrogen or a hydrolyzable group. This is conducted in the presence of a platinum compound as catalyst by means of hydrosilylation. The silicon-type charge transporting material is then brought into contact with an adsorbent for the platinum compound, causing the platinum compound to be adsorbed onto the adsorbent. The platinum compound is removed along with the adsorbent, so that the concentration of residual platinum compound is less than 10 ppm.
    • 制造赋予聚硅氧烷树脂电荷输送性且可溶于树脂的电荷输送材料的方法。 电荷传输材料是具有多个芳族基团的芳族取代的叔胺和经由烃基引入的甲硅烷基,至少一个芳族基团。 该方法的特征在于使用与构成硅型电荷输送性化合物的芳香族基团键合的不饱和脂肪族基团,或者使用与硅取代基键合的新键合的不饱和脂肪族基团, 可水解组。 这是通过氢化硅烷化在铂化合物作为催化剂的存在下进行的。 然后使硅型电荷输送材料与铂化合物的吸附剂接触,使铂化合物吸附在吸附剂上。 铂化合物与吸附剂一起除去,使得残余铂化合物的浓度小于10ppm。
    • 9. 发明授权
    • Method for forming low surface energy coating
    • 低表面能涂层的形成方法
    • US06045962A
    • 2000-04-04
    • US40890
    • 1998-03-18
    • Nobuo KushibikiKikuko Takeuchi
    • Nobuo KushibikiKikuko Takeuchi
    • G03G5/00B05D5/00B05D7/24C09D5/00C09D183/08G03G5/05G03G5/147
    • G03G5/14773G03G5/147G03G5/14704G03G5/14726
    • A method for forming a low surface energy coating for electrophotographic photosensitive body substrates does not require performing a physical surface reforming treatment such as corona discharge, plasma treatment, and the like. The process comprises: forming on the substrate at least one polysiloxane coating material, (B), that has a water contact angle greater than the water contact angle of the substrate; and thereafter forming an outermost surface coating material, (A), on top of coating material (B). The water contact angle of coating material (B) is smaller than the water contact angle of coating material (A). Coating material (A) comprises finely divided silica and a resin of the formula RSiO.sub.3/2, wherein not less than 1 mol % and not more than 80 mol % of the R groups are fluorohydrocarbon groups of 3 to 12 carbon atoms.
    • 用于形成电子照相感光体基材的低表面能涂层的方法不需要进行诸如电晕放电,等离子体处理等的物理表面重整处理。 该方法包括:在基底上形成至少一种聚硅氧烷涂层材料(B),其具有大于基底的水接触角的水接触角; 然后在涂层材料(B)的顶部上形成最外表面涂层材料(A)。 涂料(B)的水接触角小于涂料(A)的水接触角。 涂料(A)包含细碎的二氧化硅和式RSiO 3/2的树脂,其中不小于1摩尔%且不大于80摩尔%的R基团是3至12个碳原子的氟代烃基。