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    • 8. 发明授权
    • Photosensitizer, visible light curable resin composition using the same,
and use of the composition
    • 光敏剂,使用其的可见光固化树脂组合物,以及组合物的用途
    • US06106999A
    • 2000-08-22
    • US131418
    • 1998-08-10
    • Akira OgisoTsutami MisawaTaizo NishimotoHisashi TsukaharaKeisuke TakumaKenichi SugimotoTakeshi TsudaGenji ImaiHideo Kogure
    • Akira OgisoTsutami MisawaTaizo NishimotoHisashi TsukaharaKeisuke TakumaKenichi SugimotoTakeshi TsudaGenji ImaiHideo Kogure
    • C08F2/00G03F7/029G03C1/105
    • G03F7/029Y10S430/114Y10S430/127
    • A visible light curable resin composition containing a photocurable resin, a photoreaction initiator and a photosensitizer having the formula (1). The composition has a very high sensitivity to a general-purpose visible light laser, so that a high-speed scanning exposure is possible by the laser, and an extremely fine high resolution can be obtained. In addition, the composition can be used for coating or printing under safelight irradiating conditions and under bright circumstantial conditions without any thickening of the composition, and hence the composition can exert excellent noticeable effects in points of safe operativity, operational efficiency and the stability of products. Formula (1) is as follows: ##STR1## wherein rings X.sub.1 and X.sub.2 are each an optionally substituted pyrrole ring; Y is H, CN, optionally substituted alkyl, aralkyl, aryl, heteroaryl or alkenyl group; and Z.sub.1 and Z.sub.2 are halogen, optionally substituted alkyl, alkoxy, alkylthio, aralkyl, aralkyloxy, aryl, aryloxy, arylthio, heteroaryl, heteroaryloxy or heteroarylthio group, provided that at least one of substituents on the pyrrole rings X.sub.1 and X.sub.2, groups Z.sub.1 and Z.sub.2 is the alkoxy, aralkyloxy or aryloxy group.
    • 一种含有光固化树脂,光反应引发剂和具有式(1)的光敏剂的可见光固化树脂组合物。 该组合物对通用可见光激光器具有非常高的灵敏度,使得可以通过激光进行高速扫描曝光,并且可以获得非常好的高分辨率。 此外,该组合物可以在安全照射条件下和明亮的环境条件下用于涂布或印刷,而不会使组合物变厚,因此组合物可以在安全操作性,操作效率和产品稳定性方面发挥出色的显着效果 。 式(1)如下:其中环X1和X2各自为任选取代的吡咯环; Y是H,CN,任选取代的烷基,芳烷基,芳基,杂芳基或烯基; 并且Z 1和Z 2是卤素,任选取代的烷基,烷氧基,烷硫基,芳烷基,芳烷氧基,芳基,芳氧基,芳硫基,杂芳基,杂芳氧基或杂芳硫基,条件是吡咯环X1和X2上的至少一个取代基, Z2是烷氧基,芳烷氧基或芳氧基。