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    • 3. 发明授权
    • Coating material for forming titanium oxide film, method for forming titanium oxide film and use of said coating material
    • 用于形成氧化钛膜的涂料,用于形成氧化钛膜的方法和所述涂料的用途
    • US06736890B2
    • 2004-05-18
    • US10312571
    • 2003-01-14
    • Yasuhiko HarutaJun AkuiOsamu Isozaki
    • Yasuhiko HarutaJun AkuiOsamu Isozaki
    • C01G23053
    • C23C22/34C09D1/00C23C18/1216C23C18/1241C23C22/83C23C30/00
    • The present invention provides: a coating composition for forming a titanium oxide film, comprising (A) a titanium-containing aqueous liquid obtained by mixing at least one titanium compound selected from the group consisting of hydrolyzable titanium compounds, low condensates of hydrolyzable titanium compounds, titanium hydroxide and low condensates of titanium hydroxide with aqueous hydrogen peroxide, and (B) at least one halide selected from the group consisting of titanium halides, titanium halide salts, zirconium halides, zirconium halide salts, silicon halides and silicon halide salts; a process for forming a titanium oxide film, comprising applying the coating composition to a metal substrate and drying the resulting coat; and an undercoating material for metal substrates and a post-treating agent for phosphate undercoats on metal substrates, the material and agent being the above coating composition.
    • 本发明提供:一种用于形成氧化钛膜的涂料组合物,其包含(A)通过混合至少一种钛化合物而获得的含钛水性液体,所述钛化合物选自可水解的钛化合物,可水解的钛化合物的低缩合物, 氢氧化钛和氢氧化钛与过氧化氢水溶液的低冷凝物,和(B)至少一种选自卤化钛,卤化钛盐,卤化锆,卤化锆盐,卤化硅和卤化硅盐的卤化物; 一种形成氧化钛膜的方法,包括将所述涂料组合物涂覆在金属基材上并干燥所得涂层; 以及用于金属基材的底漆材料和金属基材上的磷酸盐底漆的后处理剂,作为上述涂料组合物的材料和试剂。
    • 8. 发明授权
    • Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same
    • 液体光固化性组合物,水性光固化性组合物及其抗蚀剂图案形成方法
    • US06420090B1
    • 2002-07-16
    • US09453504
    • 1999-12-03
    • Daisuke KojimaGenji ImaiJun AkuiHideo KogureOsamu Isozaki
    • Daisuke KojimaGenji ImaiJun AkuiHideo KogureOsamu Isozaki
    • G03F7037
    • G03F7/164G03F7/027
    • A liquid photocurable composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other, and optionally containing a photopolymerizable compound other than the photopolymerizable polyurethane compound.
    • 含有具有由下式表示的重复单元的光聚合性聚氨酯化合物的液体光固化性组合物:B- [X] n [Y] mB,其中X由下式表示:Y由下式表示:-OOCHN-A -NHCOO(R2) - ,A是衍生自多异氰酸酯化合物的结构单元,B相同或不同,并且衍生自在分子末端具有至少一个光聚合性不饱和基团且任选地含有醚键的羟基化合物的结构单元, R1是衍生自含羧基的多元醇化合物的结构单元,R2是来自多元醇化合物的结构单元,n是1〜10的整数,m是1〜10的整数,条件是一个X和一个 Y彼此键合,或者X和/或Y中的三个或更多个彼此键合,并且任选地含有除光聚合性聚氨酯化合物以外的光聚合性化合物。
    • 10. 发明授权
    • Organic-solvent-based photocurable resist composition and resist pattern-forming method
    • 有机溶剂型光固化抗蚀剂组合物和抗蚀剂图案形成方法
    • US06331376B1
    • 2001-12-18
    • US09582846
    • 2000-07-05
    • Daisuke KojimaGenji ImaiJun AkuiHideo KogureOsamu Isozaki
    • Daisuke KojimaGenji ImaiJun AkuiHideo KogureOsamu Isozaki
    • G03F7029
    • G03F7/027C08F290/067C08G18/672C08G18/7642G03F7/0388C08G18/48C08G18/0823
    • An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.
    • 含有具有下式表示的重复单元的光聚合性聚氨酯化合物的有机溶剂型光固化抗蚀剂组合物:B- [X] n [Y] mB,其中X由下式表示:Y由下式表示: - OOCHN-A-NHCOO(R2) - ,A是衍生自多异氰酸酯化合物的结构单元,B相同或不同,并且衍生自在分子末端具有至少一个光聚合性不饱和基团的羟基化合物的结构单元,并且任选地含有 醚键,R1是衍生自含羧基的多元醇化合物的结构单元,R2是衍生自多元醇化合物的结构单元,n是1〜10的整数,m是1〜10的整数,条件是一个 X和一个Y彼此键合,或者X和/或Y中的三个或更多个彼此键合。