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    • 2. 发明授权
    • Layout method for semiconductor integrated circuit and layout apparatus
for semiconductor integrated circuit
    • 半导体集成电路布图方法及半导体集成电路布图装置
    • US5745374A
    • 1998-04-28
    • US505735
    • 1995-07-21
    • Nobu Matsumoto
    • Nobu Matsumoto
    • H01L21/82G06F17/50H01L27/02H01L21/60H01L21/74
    • G06F17/5068H01L27/0207
    • There is disclosed a layout method for a semiconductor integrated circuit for use in design by a symbolic layout which expresses a configuration of the semiconductor integrated circuit by symbols. The layout method comprises the steps of extracting a mask layout to be processed, changing dimensions of a symbolic layout included in the mask layout, replacing transistor symbols included in the mask layout with symbols having diffusion layer terminals each having a constant length in the channel width direction and not having extent in the channel length direction, shortening a length of wiring included in the mask layout in the channel width direction of the transistor, and compacting the mask layout in the channel length direction of the transistor.
    • 公开了通过符号布局在设计中使用的半导体集成电路的布局方法,其通过符号表示半导体集成电路的配置。 布局方法包括以下步骤:提取要处理的掩模布局,改变包括在掩模布局中的符号布局的尺寸,用掩模布局中包括的晶体管符号代替具有扩散层端子的符号,每个扩散层端子在沟道宽度中具有恒定的长度 方向而不具有通道长度方向的范围,缩短了晶体管的通道宽度方向上包括在掩模布局中的布线的长度,并且在晶体管的沟道长度方向压实掩模布局。
    • 5. 发明申请
    • PROGRAM PARALLELIZATION SUPPORTING APPARATUS AND PROGRAM PARALLELIZATION SUPPORTING METHOD
    • 支持方案的程序并行化和程序并行化支持方法
    • US20090138862A1
    • 2009-05-28
    • US12211420
    • 2008-09-16
    • Ken TanabeYutaka OtaNobu Matsumoto
    • Ken TanabeYutaka OtaNobu Matsumoto
    • G06F9/45
    • G06F8/456
    • A program parallelization supporting apparatus determines a determinacy in at least one dependency relationship of a data dependency, a control dependency and a pointer dependency in a program, extracts a critical path in the program, and extracts a processing instruction which exists on the critical path and has a non-deterministic determinacy in the dependency relationship. Furthermore, if a process related to a path of the extracted non-deterministic processing instruction is parallelized and the path of the non-deterministic processing instruction is deleted, the program parallelization supporting apparatus outputs parallelization labor hour information depending on the number of dependency relationships disturbing the parallelization and parallelization effect information depending on the number of processing instructions which are shortened by the parallelization.
    • 程序并行化支持装置确定程序中数据依赖性,控制依赖性和指针相关性的至少一个依赖关系的确定性,提取程序中的关键路径,并提取存在于关键路径上的处理指令, 在依赖关系中具有非确定性的确定性。 此外,如果与所提取的非确定性处理指令的路径相关的处理被并行并且删除非确定性处理指令的路径,则程序并行化支持装置根据依赖关系的数量来输出并行劳动时间信息 并行化和并行效应信息取决于通过并行化缩短的处理指令的数量。
    • 7. 发明授权
    • Method of and apparatus for generating mask layouts
    • 用于生成蒙版布局的方法和设备
    • US5493509A
    • 1996-02-20
    • US115144
    • 1993-09-02
    • Nobu MatsumotoShojiro Mori
    • Nobu MatsumotoShojiro Mori
    • G03F1/70G06F17/50H01L21/027
    • G06F17/5081
    • In graphic data representing a symbolic layout for a semiconductor integrated circuit, a plurality of first cutting lines and a plurality of second cutting lines crossing the first cutting lines at right angles are set. First, the graphic data is cut along said first cutting lines to produce a plurality of first segment data items. These first segment data items are each compacted in the direction of the second cutting line. These compacted first segment data items are connected according to the first cutting lines. This connected first segment data is cut along the second cutting lines to produce a plurality of second segment data items. These second segment data items are each compacted in the direction of the first cutting line. These compacted second segment data items are connected to one another to produce a compacted mask layout.
    • 在表示半导体集成电路的符号布局的图形数据中,设置多个第一切割线和与第一切割线成直角交叉的多个第二切割线。 首先,沿着所述第一切割线切割图形数据以产生多个第一段数据项。 这些第一段数据项目在第二切割线的方向上都被压实。 这些压实的第一段数据项根据第一切割线连接。 该连接的第一段数据沿着第二切割线切割以产生多个第二段数据项。 这些第二段数据项目在第一切割线的方向上都被压实。 这些压实的第二段数据项彼此连接以产生压实的掩模布局。