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    • 4. 发明授权
    • Phototherapy method for treatment of acne
    • 治疗痤疮的光疗法
    • US06663658B1
    • 2003-12-16
    • US09559139
    • 2000-04-27
    • Nikiforos KolliasRobert GilliesWei Dong Tian
    • Nikiforos KolliasRobert GilliesWei Dong Tian
    • A61B1818
    • A61N5/0616A61N2005/0661A61N2005/067
    • The present invention is directed to methods for treating acne. The methods include exposing the subject afflicted with acne to ultraviolet light having a wavelength between about 320 to about 350 nm, such that the acne is treated, e.g., inhibited, diminished, eradicated or prevented. In a preferred embodiment, the wavelength is 335 nm and is emitted by either a nitrogen laser or a third harmonic of a NdYAG laser. Treatments can be administered over a several week period, where the subject is exposed to sequential doses of ultraviolet light to obtain beneficial effects, e.g., a reduction or elimination of the acne, e.g., an eradication or diminishment of the bacteria responsible for acne, e.g., Propionibacterium acnes.
    • 本发明涉及治疗痤疮的方法。 所述方法包括将患有痤疮的受试者暴露于波长在约320至约350nm之间的紫外线,使得治疗,例如抑制,减少,消除或预防痤疮。 在优选实施例中,波长为335nm,并且由氮激光器或NdYAG激光器的三次谐波发射。 治疗可以在几周的时间内施用,其中受试者暴露于连续剂量的紫外线以获得有益效果,例如减少或消除痤疮,例如消除或减少负责痤疮的细菌,例如 ,丙酸杆菌属。