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1. 发明授权

US5296123A In-tank electrochemical sensor 失效
标题翻译：内置电化学传感器
公开(公告)号：US5296123A
公开(公告)日：1994-03-22
申请号：US945751
申请日：1992-09-16
申请人： Vilambi N. R. K. Reddy , Frank A. Ludwig , Bruce M. Eliash , Nguyet H. Phan
发明人： Vilambi N. R. K. Reddy , Frank A. Ludwig , Bruce M. Eliash , Nguyet H. Phan
IPC分类号： G01N27/28 , G01N27/416 , G01N27/26
CPC分类号： G01N27/28
摘要： An electrochemical sensor adapted for use in the electrochemical analysis of liquids. The sensor includes a cell assembly having a liquid flow control chamber, sensing chamber and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber. The sensing chamber includes a working electrode and a counter-electrode. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber where it is contacted with a reference electrode. The liquid then exits the sensor. The sensor is well-suited for use in the electrochemical analysis of plating bath solutions where sub-milliampere type AC and DC voltammetric measurements are required in order to generate electrochemical spectra which are indicative of constituents present in the solution.
摘要翻译：适用于液体电化学分析的电化学传感器。传感器包括具有液体流动控制室，感测室和液体出口室的电池组件。要测量的液体被泵送到液体流动控制室中，其中液体中的任何湍流被抑制。非湍流液体从液体流动控制室传递到感测室。检测室包括工作电极和对电极。非湍流液体从感测室传送到液体出口室，在那里与参比电极接触。然后液体离开传感器。传感器非常适合用于电镀浴溶液的电化学分析，其中需要亚毫安级AC和DC伏安法测量，以产生指示溶液中存在的组分的电化学光谱。

2. 发明授权

US5298132A Method for monitoring purification treatment in plating baths 失效
标题翻译：电镀浴净化处理方法
公开(公告)号：US5298132A
公开(公告)日：1994-03-29
申请号：US37159
申请日：1993-03-25
申请人： Vilambi N. R. K. Reddy , Bruce M. Eliash , Frank A. Ludwig , Nguyet H. Phan
发明人： Vilambi N. R. K. Reddy , Bruce M. Eliash , Frank A. Ludwig , Nguyet H. Phan
IPC分类号： C25D21/12 , C25D21/18 , G01N27/38 , G01N27/416 , G01N27/48 , G01N27/49 , G01N27/26
CPC分类号： G01N27/48
摘要： A method for monitoring the status of a plating bath purification treatment cycle. The method involves applying a swept dc measurement signal to a pretreated electrode which is in contact with the plating solution, and monitoring the resultant response current signal. The electrode potential corresponding to the peak current density in the cathodic sweep of the response current signal provides an accurate indication of the status of the purification treatment cycle. The method tracks the progress of the purification process thereby ensuring the optimal termination points for the treatment process. The method can be used in conjunction with voltammetric plating bath analysis methods and equipment, as part of an overall plating bath monitoring and control system.
摘要翻译：一种用于监测电镀浴净化处理循环的状态的方法。该方法包括将扫描直流测量信号施加到与电镀溶液接触的预处理电极，并监测所得到的响应电流信号。对应于响应电流信号的阴极扫描中的峰值电流密度的电极电位提供了净化处理循环的状态的精确指示。该方法跟踪净化过程的进展，从而确保处理过程的最佳终止点。该方法可与伏安电镀浴分析方法和设备结合使用，作为整体电镀浴监测和控制系统的一部分。

3. 发明授权

US5320724A Method of monitoring constituents in plating baths 失效
标题翻译：监测电镀液中成分的方法
公开(公告)号：US5320724A
公开(公告)日：1994-06-14
申请号：US977344
申请日：1992-11-17
申请人： Frank A. Ludwig , Bruce M. Eliash , Nguyet H. Phan , Vilambi N. R. K. Reddy
发明人： Frank A. Ludwig , Bruce M. Eliash , Nguyet H. Phan , Vilambi N. R. K. Reddy
IPC分类号： C25D21/12 , C25D21/14 , G01N27/416 , G01N27/48 , G01N27/49 , G01N27/26
CPC分类号： G01N27/49
摘要： A method of monitoring a plating bath which combines ac and dc voltammetry to accurately measure major and trace constituent concentrations. The method involves applying both ac and dc voltammetric signals to a pretreated electrode in contact with the plating bath solution, measuring the ac and dc response current spectra, and comparing the resultant spectra to determine which provides maximum spectral detail for monitoring particular constituents with minimum interference from other constituents. Then, the ac and dc response current spectra are each used to monitor the particular constituents for which each provides the best accuracy. The method complements and is easily integrated with known voltammetric techniques and equipment.
摘要翻译：一种监测电镀浴的方法，其结合了交流和直流伏安法以精确测量主要和微量成分浓度。该方法包括将ac和dc伏安信号应用于与镀浴溶液接触的预处理电极，测量交流和直流响应电流光谱，并比较所得到的光谱，以确定哪个提供用于以最小干扰监测特定组分的最大光谱细节来自其他成分。然后，交流和直流响应电流谱分别用于监测各自提供最佳精度的特定组分。该方法与已知的伏安技术和设备相辅相成并易于集成。

4. 发明授权

US5336380A Method of monitoring major constituents in plating baths 失效
标题翻译：电镀浴主要成分的方法
公开(公告)号：US5336380A
公开(公告)日：1994-08-09
申请号：US37158
申请日：1993-03-25
申请人： Nguyet H. Phan , Vilambi N. R. K. Reddy , Frank A. Ludwig , Bruce M. Eliash
发明人： Nguyet H. Phan , Vilambi N. R. K. Reddy , Frank A. Ludwig , Bruce M. Eliash
IPC分类号： C25D21/12 , G01N27/416 , G01N27/48 , G01N27/49 , G01N27/26
CPC分类号： G01N27/49 , G01N27/48
摘要： A method of monitoring major constituents within a plating bath. The method involves applying an electrical signal to a working electrode positioned within the plating bath solution, varying signal parameters, and measuring the resultant response signal. The characteristics of the response signal indicate major constituent concentration levels. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.
摘要翻译：监测镀浴中主要成分的方法。该方法包括将电信号施加到位于镀浴溶液内的工作电极，改变信号参数并测量所得到的响应信号。响应信号的特征表明主要成分浓度水平。该方法与已知的伏安技术相结合，可以很容易地与痕量成分的分析结合，从而形成了一个有效的整体电镀浴分析系统的组成部分。通过根据使用本发明的方法进行的测量来调整主要成分浓度水平，可以容易且廉价地维持高质量的电镀浴。

5. 发明授权

US5296124A Method of in-situ formation of a stable reference electrode for in-tank plating bath analysis 失效
标题翻译：用于罐内电镀浴分析的稳定参比电极的原位形成方法
公开(公告)号：US5296124A
公开(公告)日：1994-03-22
申请号：US974650
申请日：1992-11-10
申请人： Bruce M. Eliash , Vilambi N. R. K. Reddy , Frank A. Ludwig , Nguyet H. Phan
发明人： Bruce M. Eliash , Vilambi N. R. K. Reddy , Frank A. Ludwig , Nguyet H. Phan
IPC分类号： G01N27/30 , G01N27/26
CPC分类号： G01N27/301
摘要： A method of forming a reference electrode having a continuously stable reference voltage and particularly well-suited for use in an in-tank electrochemical sensor. The method utilizes an inert substrate and a counter electrode, both immersed in electroplating fluid. Current is passed between the inert substrate and the counter electrode to strip and subsequently replate the inert substrate, which then serves as the reference electrode. The steps of stripping and replating the reference electrode are periodically repeated to maintain the stability of the reference electrode voltage.
摘要翻译：一种形成具有连续稳定的参考电压的参考电极的方法，特别适用于在槽内电化学传感器中。该方法使用惰性基板和对电极，两者都浸在电镀液中。电流在惰性衬底和对电极之间通过以剥离并随后重复惰性衬底，然后惰性衬底用作参考电极。周期性地重复剥离和重复参考电极的步骤，以保持参考电极电压的稳定性。

6. 发明授权

US5298131A Method of monitoring metal ion content in plating baths 失效
标题翻译：监测电镀液中金属离子含量的方法
公开(公告)号：US5298131A
公开(公告)日：1994-03-29
申请号：US68030
申请日：1993-05-28
申请人： Bruce M. Eliash , Frank A. Ludwig , Nguyet H. Phan , Vilambi N. Reddy
发明人： Bruce M. Eliash , Frank A. Ludwig , Nguyet H. Phan , Vilambi N. Reddy
IPC分类号： G01N27/48 , C25D21/14 , G01N27/42 , G01N27/26
CPC分类号： G01N27/42 , Y10S204/08
摘要： A method of monitoring in-tank and on-line metal ion content within a plating bath. The method involves the steps of applying a pretreatment signal to a sensing electrode positioned within the plating bath, applying a sweep signal to the pretreated sensing electrode, and measuring the voltammetric peak current of the resultant response signal. The voltammetric peak current is proportional to the metal ion content of the plating bath. The method complements and is easily integrated with known voltammetric techniques for analysis of trace and major constituents, and is thus an integral part of an efficient overall plating bath analysis system.
摘要翻译：监测电镀槽内的罐内和在线金属离子含量的方法。该方法包括以下步骤：将预处理信号施加到位于镀浴内的感测电极，向预处理的感测电极施加扫描信号，以及测量所得响应信号的伏安峰值电流。伏安峰值电流与镀液的金属离子含量成比例。该方法与现有的伏安技术相结合，易于与痕量和主要成分的分析相结合，因此是有效整体镀浴分析系统的组成部分。

7. 发明授权

US5324400A Electrode preconditioning method for a plating bath monitoring process 失效
标题翻译：电镀预处理方法电镀浴监测过程
公开(公告)号：US5324400A
公开(公告)日：1994-06-28
申请号：US986846
申请日：1992-12-04
申请人： Bruce M. Eliash , Nguyet H. Phan , Frank A. Ludwig , Vilambi N. Reddy
发明人： Bruce M. Eliash , Nguyet H. Phan , Frank A. Ludwig , Vilambi N. Reddy
IPC分类号： G01N27/38 , G01N27/26
CPC分类号： G01N27/38
摘要： A method of preconditioning an electrode for use in a plating bath monitoring process. The method involves applying at least one anodic signal to an electrode in contact with the plating bath solution in order to yield a reproducibly clean and stabilized electrode surface, and then applying a plating signal to deposit a layer of metal on the anodically treated electrode. The resultant preconditioned electrode improves the accuracy and precision of subsequent voltammetric monitoring measurements for a variety of different plating baths. The method is easily integrated with and thereby enhances the capabilities of known voltammetric plating bath monitoring processes.
摘要翻译：一种预处理用于电镀浴监测过程中的电极的方法。该方法包括向与电镀浴溶液接触的电极施加至少一个阳极信号，以产生可再现的清洁和稳定的电极表面，然后施加电镀信号以在阳极处理的电极上沉积金属层。所得到的预处理电极提高了各种不同电镀浴的后续伏安监测测量的精度和精度。该方法易于与已知的伏安电镀浴监测过程结合并由此增强其功能。

8. 发明授权

US5287060A In-tank conductivity sensor 失效
标题翻译： In-tank电导率传感器
公开(公告)号：US5287060A
公开(公告)日：1994-02-15
申请号：US977389
申请日：1992-11-17
申请人： Vilambi N. Reddy , Bruce M. Eliash , Frank A. Ludwig , Nguyet H. Phan
发明人： Vilambi N. Reddy , Bruce M. Eliash , Frank A. Ludwig , Nguyet H. Phan
IPC分类号： G01N27/06 , G01N27/07 , G01R27/22 , G01N33/18
CPC分类号： G01N27/07 , G01R27/22
摘要： A conductivity sensor adapted for use in the conductimetric analysis of liquids includes a pair of conductivity electrodes incorporated into a conductivity cell assembly having a liquid flow control chamber, sensing chamber, and liquid exit chamber. Liquids to be measured are pumped into the liquid flow control chamber, where any turbulence in the liquid is dampened. The non-turbulent liquid is passed from the liquid flow control chamber to the sensing chamber, where the conductivity of the liquid is determined. The sensing chamber is adapted for changing the height of a column of liquid between the pair of conductivity electrodes in order to vary the cell constant of the sensor. The non-turbulent liquid is passed from the sensing chamber to the liquid exit chamber, where it exits the sensor. The sensor is well-suited for use in measuring conductivities of plating bath solutions and monitoring concentrations of major constituents of plating bath solutions.
摘要翻译：适用于液体电导率分析的电导率传感器包括一对导电电极，其结合到具有液体流动控制室，感测室和液体出口室的电导率电池组件中。要测量的液体被泵送到液体流动控制室中，其中液体中的任何湍流被抑制。非湍流液体从液体流动控制室传送到确定液体的电导率的感测室。感测室适于改变一对导电电极之间的一列液体的高度，以便改变传感器的电池常数。非湍流液体从传感室传送到液体出口室，在那里它离开传感器。该传感器非常适用于测量电镀浴溶液的电导率和监测电镀浴溶液主要成分的浓度。

9. 发明授权

US5516419A Hard iron plating of aluminum/aluminum alloys using sulfamate/sulfate solutions 失效
标题翻译：使用氨基磺酸盐/硫酸盐溶液的铝/铝合金硬镀铁
公开(公告)号：US5516419A
公开(公告)日：1996-05-14
申请号：US249422
申请日：1994-05-26
申请人： Nguyet H. Phan , Sue Troup-Packman
发明人： Nguyet H. Phan , Sue Troup-Packman
IPC分类号： C25D3/20 , C23C28/02 , C23C20/00 , C25D3/56
CPC分类号： C23C28/023 , C25D3/20
摘要： Aluminum and aluminum alloy parts, such as pistons, are electroplated with iron employing a ferrous electroplating solution. The solution comprises (a) ferrous iron having a concentration ranging from about 0.65 to 2.0 Moles of Fe.sup.2+ per liter of solution; (b) at least one anion selected from the group consisting of sulfamate and ammonium sulfate and associated with the Fe.sup.2+ ions; (c) a reducing agent, such as ascorbic acid, in an amount sufficient to prevent oxidation of Fe.sup.2+ to Fe.sup.3+ ; (d) Cl.sup.- anion in an amount sufficient to promote dissolution of the iron anode; and (e) a wetting agent in an amount sufficient to prevent pitting of the aluminum cathode. The ferrous electroplating bath of the present invention permits plating of relatively thick layers of iron on aluminum, typically on the order of about 0.6 to 2 mils (0.0015 to 0.0051 cm), with a microhardness of at least about 40 (Rockwell C scale).
摘要翻译：铝和铝合金部件，如活塞，用铁电镀电镀电镀。该溶液包含（a）浓度为每升溶液约0.65-2.0摩尔Fe 2+的二价铁; （b）至少一种选自氨基磺酸盐和硫酸铵并与Fe 2+离子相关的阴离子; （c）还原剂，如抗坏血酸，其量足以防止Fe2 +氧化成Fe3 +; （d）足以促进铁阳极溶解的量的Cl-阴离子; 和（e）足以防止铝阴极点蚀的量的润湿剂。本发明的铁电镀浴允许在铝上电镀相对较厚的铁，通常为约0.6至2密耳（0.0015至0.0051厘米），显微硬度至少为40（洛氏C级）。

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