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1. 发明申请

US20080067400A1 Ion source and metals used in making components thereof and method of making same 失效
标题翻译：用于制造组分的离子源和金属及其制备方法
公开(公告)号：US20080067400A1
公开(公告)日：2008-03-20
申请号：US11523089
申请日：2006-09-19
申请人： Nestor P. Murphy , David E. Rock , Hugh A. Walton , Maximo Frati
发明人： Nestor P. Murphy , David E. Rock , Hugh A. Walton , Maximo Frati
IPC分类号： H01J3/14
CPC分类号： H01J27/143
摘要： An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.
摘要翻译：离子源能够产生和/或发射可用于在衬底上沉积层或执行其它功能的离子束。在某些示例性实施例中，提供了用于降低与产生离子源和/或其元件相关的成本的技术。这样的技术可以包括例如从1018个软钢和/或分段件形成内部和/或外部阴极。这些技术也可以包括例如从单个钢U型通道形成离子源体，或者由组成其的分段构成。这些技术可以单独使用或以各种组合使用。

2. 发明授权

US07598500B2 Ion source and metals used in making components thereof and method of making same 失效
标题翻译：用于制造组分的离子源和金属及其制备方法
公开(公告)号：US07598500B2
公开(公告)日：2009-10-06
申请号：US11523089
申请日：2006-09-19
申请人： Nestor P. Murphy , David E. Rock , Hugh A. Walton , Maximo Frati
发明人： Nestor P. Murphy , David E. Rock , Hugh A. Walton , Maximo Frati
IPC分类号： H01J27/14
CPC分类号： H01J27/143
摘要： An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.
摘要翻译：离子源能够产生和/或发射可用于在衬底上沉积层或执行其它功能的离子束。在某些示例性实施例中，提供了用于降低与产生离子源和/或其元件相关的成本的技术。这样的技术可以包括例如从1018个软钢和/或分段件形成内部和/或外部阴极。这些技术也可以包括例如从单个钢U型通道形成离子源体，或者由组成其的分段构成。这些技术可以单独使用或以各种组合使用。

3. 发明授权

US07405411B2 Ion source with multi-piece outer cathode 失效
标题翻译：离子源带多片外阴极
公开(公告)号：US07405411B2
公开(公告)日：2008-07-29
申请号：US11123228
申请日：2005-05-06
申请人： Hugh A. Walton
发明人： Hugh A. Walton
IPC分类号： H01J29/04
CPC分类号： H01J27/143 , H01J27/024 , H01J2237/083
摘要： In certain example embodiments of this invention, there is provided an ion source including an anode and a cathode. In certain example embodiments, a multi-piece outer cathode is provided. The multi-piece outer cathode allows precision adjustments to be made, thereby permitting adjustment of the magnetic gap between the inner and outer cathodes. This allows improved performance to be realized, and/or prolonged operating life of certain components. This may also permit multiple types of gap adjustment to be performed with different sized outer cathode end pieces. In certain example embodiments, cathode fabrication costs may also be reduced.
摘要翻译：在本发明的某些示例性实施例中，提供了一种包括阳极和阴极的离子源。在某些示例性实施例中，提供多片外部阴极。多片外阴极允许进行精密调节，从而允许调节内阴极和外阴极之间的磁隙。这允许实现改进的性能，和/或延长某些部件的使用寿命。这也可以允许用不同尺寸的外部阴极端部件执行多种类型的间隙调节。在某些示例性实施例中，也可以降低阴极制造成本。

4. 发明授权

US07198699B2 Sputter coating apparatus including ion beam source(s), and corresponding method 有权
标题翻译：包括离子束源的溅射涂布装置及相应的方法
公开(公告)号：US07198699B2
公开(公告)日：2007-04-03
申请号：US10429967
申请日：2003-05-06
申请人： Scott V. Thomsen , Hugh A. Walton
发明人： Scott V. Thomsen , Hugh A. Walton
IPC分类号： C23C14/35 , C23C16/00
CPC分类号： C03C17/3618 , C03C17/002 , C03C17/36 , C03C17/3634 , C03C17/3644 , C03C17/366 , C03C2217/78 , C23C14/562 , C23C16/26
摘要： A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain example embodiments, the first coating may be deposited via sputtering while the second coating is deposited via ion beam deposition. In such a manner, it is possible to coat both sides of the substrate in a single apparatus in an efficient manner. In other embodiments, the coating apparatus may sputter a coating onto a first side of the substrate and ion beam mill at least one surface of the substrate as the substrate passes through the coating apparatus. In other embodiments of this invention, a dual mode chamber may be provided that is adapted to receive a removable ion beam module on one side of a substrate and a removable sputtering module on the other side of the substrate. The different removable modules may or may not be used simultaneously in different embodiments of this invention.
摘要翻译：涂覆设备将第一涂层（单层或多层）沉积到穿过设备的基底（例如玻璃基底）的第一侧上，并将第二涂层（单层或多层）沉积到底物。在某些示例性实施例中，可以通过溅射沉积第一涂层，同时通过离子束沉积沉积第二涂层。以这种方式，可以以有效的方式在单个装置中涂覆基板的两侧。在其它实施例中，涂层设备可以在衬底的第一侧上溅射涂层，并且当衬底通过涂覆设备时，将衬底的至少一个表面离子束研磨。在本发明的其它实施例中，可以提供双模腔室，其适于在衬底的一侧上接收可去除的离子束模块和在衬底的另一侧上的可移除的溅射模块。在本发明的不同实施例中，不同的可移除模块可以同时使用也可以不使用。

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