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    • 2. 发明申请
    • Image display
    • 图像显示
    • US20070216279A1
    • 2007-09-20
    • US11657694
    • 2007-01-25
    • Naohiro HoriuchiTakuya TakahashiTakaaki SuzukiEtsuko NishimuraToshiaki Kusunoki
    • Naohiro HoriuchiTakuya TakahashiTakaaki SuzukiEtsuko NishimuraToshiaki Kusunoki
    • H01J19/06H01J1/62
    • H01J31/127H01J29/04
    • It is an object of the present invention to provide an image display using a thin film electronic source having a structure for separating picture elements in a self-alignment manner. The structure of bus wiring (scanning line) for powering the electronic source is formed by a stacked structure including a lower layer 17 made of an alloy of CrMo, an intermediate layer 18 made of Al or an alloy of Al, and an upper layer 19 made of Cr, from a cathode substrate 10. The CrMo alloy in the lower layer 17 includes 30 wt % or more of Mo. Such a stacked structure can be used to process one side of the lower layer 17 to form an undercut relative to the intermediate layer 18. The undercut serves as a picture element separating structure in sputtering of an upper electrode 13 of the electronic source and achieves picture element separation in a self-alignment manner.
    • 本发明的目的是提供一种使用具有以自对准方式分离图像元素的结构的薄膜电子源的图像显示。 用于为电子源供电的总线布线(扫描线)的结构通过堆叠结构形成,该堆叠结构包括由AlM或Al合金制成的中间层18和CrMo的合金制成的下层17和上层19 由阴极基板10制成。 下层17中的CrMo合金包括30重量%以上的Mo。这种堆叠结构可用于处理下层17的一侧以相对于中间层18形成底切。 底切用作电子源的上电极13的溅射中的像素分离结构,以自对准的方式实现像素分离。
    • 6. 发明授权
    • Liquid crystal display device and process of manufacture
    • 液晶显示装置及制造工艺
    • US08599352B2
    • 2013-12-03
    • US13596205
    • 2012-08-28
    • Takaaki SuzukiTakuya Takahashi
    • Takaaki SuzukiTakuya Takahashi
    • G02F1/1343
    • H01L27/124G02F1/1368H01L29/458
    • A liquid crystal display device and method includes a pair of substrates with liquid crystal sandwiched therebetween, a plurality of intersecting scanning signal lines and image signal lines, a thin film transistor formed corresponding to each intersection, a pixel electrode which is formed in a pixel region and connected to the thin film transistor, a gate insulating film, and a protective insulating film. At least one of the scanning signal lines and the image signal lines are each formed of a laminated film including a first layer and a second layer, wherein the first layer is formed of a copper film having a purity of at least 99.5%, and the second layer is formed of an alloy film containing copper as a main component. The first layer and the second layer are collectively subjected to wet etching with an etchant having a predetermined pH.
    • 一种液晶显示装置和方法,包括一对夹在其间的液晶的基板,多个相交的扫描信号线和图像信号线,对应于每个交点形成的薄膜晶体管,形成在像素区域中的像素电极 并连接到薄膜晶体管,栅极绝缘膜和保护绝缘膜。 扫描信号线和图像信号线中的至少一个各自由包括第一层和第二层的层叠膜形成,其中第一层由纯度为至少99.5%的铜膜形成,并且 第二层由含有铜作为主要成分的合金膜形成。 第一层和第二层用具有预定pH的蚀刻剂共同进行湿蚀刻。
    • 7. 发明授权
    • Liquid crystal display device and process of manufacture
    • 液晶显示装置及制造工艺
    • US08259275B2
    • 2012-09-04
    • US12540400
    • 2009-08-13
    • Takaaki SuzukiTakuya Takahashi
    • Takaaki SuzukiTakuya Takahashi
    • G02F1/1343
    • H01L27/124G02F1/1368H01L29/458
    • Provided is a liquid crystal display device capable of significantly reducing occurrence of a failure such as an interlayer short-circuit. In the liquid crystal device, a first layer formed of a copper film having a purity of 99.5% or more and a second layer formed of an alloy film containing copper as a main component are successively formed on a glass substrate or a substrate on which a transparent conductive film containing indium is formed. The alloy film serving as the second layer is made of an alloy containing copper as a main component, which has a higher etching rate in a wet etching process compared with that of copper. Accordingly, a patterned cross-section of the copper film having a large film thickness can be etched in a tapered shape, to thereby improve coverage of an insulating film or the like laminated on a wiring pattern.
    • 提供了能够显着减少诸如层间短路的故障的发生的液晶显示装置。 在液晶装置中,在玻璃基板或基板上依次形成由纯度为99.5%以上的铜膜形成的第一层和由含有铜作为主要成分的合金膜形成的第二层, 形成含有铟的透明导电膜。 作为第二层的合金膜由含有铜作为主要成分的合金制成,与铜相比,在湿蚀刻工艺中具有较高的蚀刻速率。 因此,可以以锥形形状蚀刻具有大膜厚度的铜膜的图案化横截面,从而提高层叠在布线图案上的绝缘膜等的覆盖。