会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • System and Methods For Nano-Scale Manufacturing
    • 纳米级制造系统与方法
    • US20140239529A1
    • 2014-08-28
    • US14042618
    • 2013-09-30
    • Nanonex Corporation
    • Hua TanLin HuYi YaoStephen Y. Chou
    • B29C59/00
    • G03F7/0002G03F9/703
    • A system and method for patterning a substrate includes a mold holding fixture for holding a mold with nanostructures and a substrate holding fixture for holding a substrate having a molding surface, a stage assembly has two or more independent axis movements for moving either the mold or the substrate therein, a contact force sensor sensing a contact force between the mold surface and the molding surface, a chamber for holding the mold and substrate and for the applying of a pressure inside that is higher or lower than atmospheric pressure, a pressure regulator and a manifold for changing the pressure inside the chamber, a door on the chamber housing provides for selectively allowing the substrate and the mold to pass there through, and means to divide the chamber into two fluidly separate sub-chambers.
    • 用于图案化基板的系统和方法包括用于保持具有纳米结构的模具的模具保持固定件和用于保持具有模制表面的基板的基板保持夹具,台架组件具有两个或更多个独立的轴线运动,用于移动模具或 基板,其中感测模具表面和模制表面之间的接触力的接触力传感器,用于保持模具和基板并用于施加高于或低于大气压力的压力的室,压力调节器和 用于改变腔室内的压力的歧管,腔室壳体上的门提供选择性地允许衬底和模具通过其中,以及将腔室分成两个流体分离的子室的手段。