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1. 发明申请

US20100251439A1 Large area, homogeneous array fabrication including leveling with use of bright spots 失效
标题翻译：大面积，均匀的阵列制造，包括使用亮点的流平
公开(公告)号：US20100251439A1
公开(公告)日：2010-09-30
申请号：US12656312
申请日：2010-01-25
申请人： Nabil A. Amro , Raymond Sanedrin
发明人： Nabil A. Amro , Raymond Sanedrin
IPC分类号： G01Q60/38 , G01Q70/08
CPC分类号： G03F7/0002 , G01Q80/00 , G03F9/7034
摘要： Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.
摘要翻译：更好的平整程序，在小规模的图案化，包括纳米尺度。一种方法，包括：提供包括其上的尖端的悬臂的至少一个阵列，其中所述悬臂包括在观察时在所述尖端附近的至少一个相对亮点或至少两个相对较亮的点，提供衬底，使所述阵列和所述衬底相对于彼此，其中观察到靠近尖端的相对亮点以确定尖端和基底的接触。

2. 发明申请

US20100229264A1 Large area, homogeneous array fabrication including controlled tip loading vapor deposition 审中-公开
标题翻译：大面积均匀的阵列制造，包括受控的尖端加载气相沉积
公开(公告)号：US20100229264A1
公开(公告)日：2010-09-09
申请号：US12656311
申请日：2010-01-25
申请人： Nabil A. Amro , Raymond Sanedrin
发明人： Nabil A. Amro , Raymond Sanedrin
IPC分类号： G01Q60/38 , G01Q70/08 , G01Q70/16
CPC分类号： G03F7/0002 , G01Q80/00
摘要： Improved methods for loading arrays of tips with a material for subsequent deposition of the material from the tip to the substrate. Tip loading can be done by controlled vapor deposition which reduces the amount of non-specific material deposition onto a substrate. Improved nanoscale and microscale engineering and lithography can be achieved. Applications include better cellular studies including stem cell studies and stem cell differentiation control.
摘要翻译：改进的用于将材料阵列装载到材料的方法，用于将材料从尖端沉积到衬底。尖端加载可以通过控制气相沉积来实现，这减少了非特异性材料沉积到基底上的量。可以实现改进的纳米尺度和微尺度工程和光刻。应用包括更好的细胞研究，包括干细胞研究和干细胞分化控制。

3. 发明授权

US08214916B2 Large area, homogeneous array fabrication including leveling with use of bright spots 失效
标题翻译：大面积，均匀的阵列制造，包括使用亮点的流平
公开(公告)号：US08214916B2
公开(公告)日：2012-07-03
申请号：US12656312
申请日：2010-01-25
申请人： Nabil A. Amro , Raymond Sanedrin
发明人： Nabil A. Amro , Raymond Sanedrin
IPC分类号： G01Q20/02
CPC分类号： G03F7/0002 , G01Q80/00 , G03F9/7034
摘要： Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.
摘要翻译：更好的平整程序，在小规模的图案化，包括纳米尺度。一种方法，包括：提供包括其上的尖端的悬臂的至少一个阵列，其中所述悬臂包括在观察时在所述尖端附近的至少一个相对亮点或至少两个相对较亮的点，提供衬底，使所述阵列和所述衬底相对于彼此，其中观察到靠近尖端的相对亮点以确定尖端和基底的接触。

4. 发明申请

US20100227063A1 Large area, homogeneous array fabrication including substrate temperature control 审中-公开
标题翻译：大面积，均匀阵列制造，包括基板温度控制
公开(公告)号：US20100227063A1
公开(公告)日：2010-09-09
申请号：US12656313
申请日：2010-01-25
申请人： Nabil A. Amro , Raymond Sanedrin , Jeffrey R. Rendlen , Michael R. Nelson
发明人： Nabil A. Amro , Raymond Sanedrin , Jeffrey R. Rendlen , Michael R. Nelson
IPC分类号： B05D5/00 , F25B29/00
CPC分类号： G03F7/0002
摘要： Improved patterning at small scale including nanoscale. A method comprising: providing at least one cantilever comprising at least one tip thereon, and a material deposited on the tip, contacting the cantilever with a substrate so that the material is deposited from the tip onto the substrate to form a material deposit, wherein the temperature of the substrate is adapted to control a size of the material deposit. A device comprising: at least one heat sink, at least one heating or cooling stage, at least one vacuum system, wherein the device is adapted to function with a substrate to be subjected to a material deposition and to keep the substrate temperature substantially constant during deposition.
摘要翻译：改进了小尺寸的图案，包括纳米级。一种方法，包括：提供包括至少一个尖端的至少一个悬臂和沉积在所述尖端上的材料，使所述悬臂与基底接触，使得所述材料从所述尖端沉积到所述基底上以形成材料沉积物，其中衬底的温度适于控制材料沉积物的尺寸。一种装置，包括：至少一个散热器，至少一个加热或冷却台，至少一个真空系统，其中所述装置适于与待进行材料沉积的基板起作用，并且使基板温度在沉积

5. 发明申请

US20100221505A1 Large area, homogeneous array fabrication including homogeneous substrates 审中-公开
标题翻译：大面积均匀的阵列制造包括均匀的基底
公开(公告)号：US20100221505A1
公开(公告)日：2010-09-02
申请号：US12656310
申请日：2010-01-25
申请人： Nabil A. Amro , Raymond Sanedrin , Earl J. Gubbins
发明人： Nabil A. Amro , Raymond Sanedrin , Earl J. Gubbins
IPC分类号： B32B3/10 , B05D5/00
CPC分类号： G03F7/0002 , Y10T428/24802
摘要： An article comprising: at least one solid substrate comprising at least one surface providing a surface area of at least one square millimeter, wherein the surface comprises a homogeneous array of material deposits which covers at least 90% of the surface area. Edge-to-edge patterning and large area substrates can be achieved. Applications include growth of cells.
摘要翻译：一种制品，包括：至少一个固体基质，其包含提供至少一平方毫米的表面积的至少一个表面，其中所述表面包含覆盖至少90％的表面积的材料沉积物的均匀阵列。可以实现边缘到边缘的图案化和大面积的基板。应用包括细胞生长。

6. 发明申请

US20120141731A1 FABRICATION OF MICROSTRUCTURES AND NANOSTRUCTURES USING ETCHING RESIST 审中-公开
标题翻译：使用蚀刻电阻制造微结构和纳米结构
公开(公告)号：US20120141731A1
公开(公告)日：2012-06-07
申请号：US11958350
申请日：2007-12-17
申请人： Chad A. Mirkin , Ling Huang , Raymond Sanedrin
发明人： Chad A. Mirkin , Ling Huang , Raymond Sanedrin
IPC分类号： B32B3/00 , H01L21/306 , B44C1/22 , C23F1/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C23F1/02 , C23F1/14 , Y10T428/24355
摘要： Nanostructures and microstructures are formed by patterning methods such as Dip Pen Nanolithography (DPN) or microcontact printing of organic molecules functioning as a resist on a substrate followed by an etching step. The etch resist is a patterning composition and can contain on a substrate including polyethylene glycol (PEG). Positive and negative etch methods can be used.
摘要翻译：纳米结构和微结构通过诸如Dip Pen Nanoithography（DPN）的图案化方法或用作基底上的抗蚀剂的有机分子的微接触印刷形成，然后进行蚀刻步骤。抗蚀剂是图案化组合物，并且可以包含在包含聚乙二醇（PEG）的基材上。可以使用正和负蚀刻方法。

7. 发明申请

US20120164564A1 ADVANCED PHOTOMASK REPAIR 审中-公开
标题翻译： ADVANCED PHOTOMASK维修
公开(公告)号：US20120164564A1
公开(公告)日：2012-06-28
申请号：US13381590
申请日：2010-06-29
申请人： Nabil Amro , Raymond Sanedrin , Sandeep Disawal , Joseph S. Fragala
发明人： Nabil Amro , Raymond Sanedrin , Sandeep Disawal , Joseph S. Fragala
IPC分类号： G03F1/72 , C08K5/07 , C08J3/28 , C08K5/05 , C08K5/20 , C08K5/053 , C08K5/057 , C09D183/00
CPC分类号： G03F1/72 , B82Y10/00 , B82Y40/00 , C23C18/06 , C23C18/1204 , C23C18/1254 , C23C18/14 , G03F7/0002
摘要： Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.
摘要翻译：通过直接写入平版印刷与尖锐的尖端和悬臂，对低温或光学固化的先进光掩模进行添加修复。可以调整由墨形成的材料的光学性质（例如n和k值）。溶胶凝胶油墨，包括倍半硅氧烷油墨，可用于形成MoSi组合物。修复的光掩模在正常的光掩模洗涤条件下耐洗涤。 AFM仪器可用于执行添加剂修复以提供高分辨率和注册。

8. 发明申请

US20090181172A1 LITHOGRAPHY OF NANOPARTICLE BASED INKS 审中-公开
标题翻译：基于纳米脂肪的墨水的研究
公开(公告)号：US20090181172A1
公开(公告)日：2009-07-16
申请号：US12251415
申请日：2008-10-14
申请人： Mohamed PARPIA , Emma Tevaarwerk , Nabil Amro , Raymond Sanedrin
发明人： Mohamed PARPIA , Emma Tevaarwerk , Nabil Amro , Raymond Sanedrin
IPC分类号： B05D5/06 , C09D11/00 , B05D3/00 , B05D3/02 , B22F7/04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/322 , C09D11/52
摘要： An ink composition comprising: a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water, and wherein the composition is formulated for slow dry rate and proper viscosity for DPN. Also, a method comprising: depositing a composition onto a cantilever, wherein the composition comprises a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water. The composition can be used in direct writing onto surfaces to form patterns and arrays using cantilevers, microcontact printing, ink jet printing, and other methods. The composition is particularly useful for preparing nanoscale features and forming high quality continuous conductive lines and dots, including silver based lines and dots. Applications include surface repair.
摘要翻译：一种油墨组合物，包括：悬浮在载体中的多个金属纳米颗粒，其中所述载体包含水和至少一种与水混溶的有机溶剂，并且其中所述组合物配制成用于DPN的缓慢干燥速率和适当的粘度。此外，一种方法包括：将组合物沉积在悬臂上，其中所述组合物包含悬浮在载体中的多个金属纳米颗粒，其中所述载体包含水和至少一种可与水混溶的有机溶剂。组合物可用于直接写入表面以形成使用悬臂，微接触印刷，喷墨印刷和其它方法的图案和阵列。该组合物特别可用于制备纳米级特征并形成高质量的连续导电线和点，包括银基线和点。应用包括表面修复。

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