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    • 1. 发明授权
    • Nanowire article and processes for making and using same
    • 纳米线的制作和使用过程
    • US09460921B2
    • 2016-10-04
    • US14679249
    • 2015-04-06
    • NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYMatthew D. BrubakerWilliam M. Old
    • Kristine A. BertnessMatthew D. BrubakerWilliam M. Old
    • B82Y35/00B82Y40/00H01L21/18C30B29/40H01L21/02
    • H01L21/02603B82Y10/00B82Y35/00B82Y40/00C30B29/403C30B29/406H01L21/02381H01L21/02433H01L21/02439H01L21/02458H01L21/02507H01L21/0254H01L21/02642H01L29/0665
    • A nanowire article includes a substrate; a plurality of nanowires disposed on the substrate, the nanowires comprising a semiconductor nitride, the semiconductor comprising an element selected from group 3 of the periodic table; and a superlattice layer interposed between the substrate and the plurality of gallium nitride nanowires. A process for producing a nanowire article includes disposing a superlattice layer on a substrate; disposing a first buffer layer on the superlattice layer; contacting the first buffer layer with a precursor; and forming a plurality of nanowires from the precursor on the first buffer layer to form the nanowire article, the nanowires comprising a semiconductor nitride, the semiconductor comprising an element selected from group 3 of the periodic table. A process for producing a nanowire article includes nitrogenating a substrate to form a nitrogenated layer on the substrate; contacting the nitrogenated layer with a precursor; and forming a plurality of gallium nitride nanowires from the precursor on the nitrogenated layer to form the nanowire article in an absence of a catalyst, wherein individual gallium nitride nanowires of the plurality of gallium nitride nanowires include a length axis that is substantially perpendicular to the nitrogenated layer.
    • 纳米线制品包括基材; 设置在所述衬底上的多个纳米线,所述纳米线包括半导体氮化物,所述半导体包括选自周期表第3组的元素; 以及插入在所述基板和所述多个氮化镓纳米线之间的超晶格层。 制造纳米线制品的方法包括在基材上设置超晶格层; 在超晶格层上设置第一缓冲层; 使第一缓冲层与前体接触; 以及从所述第一缓冲层上的所述前体形成多个纳米线以形成所述纳米线制品,所述纳米线包含半导体氮化物,所述半导体包含选自周期表第3族的元素。 一种纳米线制品的制造方法,包括使基材氮化以在基材上形成氮化层; 使氮化层与前体接触; 以及在不存在催化剂的情况下从所述氮化层上的所述前体形成多个氮化镓纳米线,以在不存在催化剂的情况下形成所述纳米线制品,其中所述多个氮化镓纳米线中的各个氮化镓纳米线包括基本上垂直于所述氮化物 层。
    • 2. 发明申请
    • NANOWIRE ARTICLE AND PROCESSES FOR MAKING AND USING SAME
    • 纳米制品和制造和使用它们的方法
    • US20150214050A1
    • 2015-07-30
    • US14679249
    • 2015-04-06
    • MATTHEW D. BRUBAKERWILLIAM M. OLDNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
    • Kristine A. BertnessMatthew D. BrubakerWilliam M. Old
    • H01L21/02
    • H01L21/02603B82Y10/00B82Y35/00B82Y40/00C30B29/403C30B29/406H01L21/02381H01L21/02433H01L21/02439H01L21/02458H01L21/02507H01L21/0254H01L21/02642H01L29/0665
    • A nanowire article includes a substrate; a plurality of nanowires disposed on the substrate, the nanowires comprising a semiconductor nitride, the semiconductor comprising an element selected from group 3 of the periodic table; and a superlattice layer interposed between the substrate and the plurality of gallium nitride nanowires. A process for producing a nanowire article includes disposing a superlattice layer on a substrate; disposing a first buffer layer on the superlattice layer; contacting the first buffer layer with a precursor; and forming a plurality of nanowires from the precursor on the first buffer layer to form the nanowire article, the nanowires comprising a semiconductor nitride, the semiconductor comprising an element selected from group 3 of the periodic table. A process for producing a nanowire article includes nitrogenating a substrate to form a nitrogenated layer on the substrate; contacting the nitrogenated layer with a precursor; and forming a plurality of gallium nitride nanowires from the precursor on the nitrogenated layer to form the nanowire article in an absence of a catalyst, wherein individual gallium nitride nanowires of the plurality of gallium nitride nanowires include a length axis that is substantially perpendicular to the nitrogenated layer.
    • 纳米线制品包括基材; 设置在所述衬底上的多个纳米线,所述纳米线包括半导体氮化物,所述半导体包括选自周期表第3组的元素; 以及插入在所述基板和所述多个氮化镓纳米线之间的超晶格层。 制造纳米线制品的方法包括在基材上设置超晶格层; 在超晶格层上设置第一缓冲层; 使第一缓冲层与前体接触; 以及从所述第一缓冲层上的所述前体形成多个纳米线以形成所述纳米线制品,所述纳米线包含半导体氮化物,所述半导体包含选自周期表第3族的元素。 一种纳米线制品的制造方法,包括使基材氮化以在基材上形成氮化层; 使氮化层与前体接触; 以及在不存在催化剂的情况下从所述氮化层上的所述前体形成多个氮化镓纳米线,以在不存在催化剂的情况下形成所述纳米线制品,其中所述多个氮化镓纳米线中的各个氮化镓纳米线包括基本上垂直于所述氮化物 层。
    • 4. 发明授权
    • Methods and systems for peak detection and quantitation
    • 用于峰检测和定量的方法和系统
    • US07279679B2
    • 2007-10-09
    • US11145459
    • 2005-06-02
    • William M. OldDean R. Thompson
    • William M. OldDean R. Thompson
    • H01J49/44
    • G01N33/6848G01N30/72G01N30/8631G06F19/703G06F19/707H01J49/0036Y10T436/24
    • Methods, systems and computer readable media for identifying peaks in a three-dimensional mass spectrometry/elution time dataset. The dataset is represented as a matrix of intensity values with column and row positions corresponding to specific elution time and m/z value, respectively. Peaks may be detected using a watershed image segmentation technique. Further provided are methods, systems and recordable media for creating a mask matrix to be overlaid on a large three-dimensional dataset represented as an image matrix, to identify a much smaller portion of the three dimensional dataset of interest, and to greatly reduce the amount of subsequent processing required for processing data of interest. The mask matrix has the same dimension as the image matrix and includes areas corresponding to one or more peaks identified by the watershed segmentation technique.
    • 用于识别三维质谱/洗脱时间数据集中的峰的方法,系统和计算机可读介质。 数据集表示为强度值的矩阵,其列和行位置分别对应于特定的洗脱时间和m / z值。 可以使用分水岭图像分割技术来检测峰。 还提供了用于创建掩模矩阵以覆盖在表示为图像矩阵的大型三维数据集上的方法,系统和可记录介质,以识别感兴趣的三维数据集的更小部分,并且大大减少 处理感兴趣的数据所需的后续处理。 掩模矩阵具有与图像矩阵相同的维度,并且包括对应于由分水岭分割技术识别的一个或多个峰值的区域。