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1. 发明申请

US20160312355A1 APPARATUS FOR STABLY EVAPORATION DEPOSITING UNIFORM THIN FILMS 审中-公开
标题翻译：用于稳定蒸发沉积均匀薄膜的装置
公开(公告)号：US20160312355A1
公开(公告)日：2016-10-27
申请号：US15201620
申请日：2016-07-05
申请人： NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： SHIH-CHANG LIANG , WEI-CHIEH HUANG , CHAO-NAN WEI , CUO-YO NI , HUI-YUN BOR
IPC分类号： C23C14/24
CPC分类号： C23C14/24 , C23C14/243
摘要： In a method and apparatus for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.
摘要翻译：在用于蒸发沉积均匀薄膜的方法和装置中，在保持恒定沉积速率的同时，将膜沉积在真空环境的基板上。一个盖子安装在蒸发容器的墙壁上。当蒸发材料被加热到蒸发状态并且蒸发容器的内部达到第一蒸气饱和压力时，蒸发材料的蒸气朝向压力稳定室流动。当压力稳定室达到小于第一蒸汽饱和压力的第二蒸气饱和压力时，真空环境的真空背景压力小于第二蒸汽饱和压力，使得蒸发材料蒸汽从压力稳定由于压力差，以恒定速率朝向真空环境室，以便使基板蒸发。

2. 发明申请

US20160097117A1 METHOD AND APPARATUS FOR STABLY EVAPORATION DEPOSITING UNIFORM THIN FILMS 有权
标题翻译：用于稳定蒸发沉积均匀薄膜的方法和装置
公开(公告)号：US20160097117A1
公开(公告)日：2016-04-07
申请号：US14716882
申请日：2015-05-20
申请人： NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： SHIH-CHANG LIANG , WEI-CHIEH HUANG , CHAO-NAN WEI , CUO-YO NI , HUI-YUN BOR
IPC分类号： C23C14/24
CPC分类号： C23C14/24 , C23C14/243
摘要： In a method and apparatus for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.
摘要翻译：在用于蒸发沉积均匀薄膜的方法和装置中，在保持恒定沉积速率的同时，将膜沉积在真空环境的基板上。一个盖子安装在蒸发容器的墙壁上。当蒸发材料被加热到蒸发状态并且蒸发容器的内部达到第一蒸气饱和压力时，蒸发材料的蒸气朝向压力稳定室流动。当压力稳定室达到小于第一蒸汽饱和压力的第二蒸气饱和压力时，真空环境的真空背景压力小于第二蒸汽饱和压力，使得蒸发材料蒸汽从压力稳定由于压力差，以恒定速率朝向真空环境室，以便使基板蒸发。

3. 发明申请

US20160047033A1 LINEAR EVAPORATION APPARATUS FOR IMPROVING UNIFORMITY OF THIN FILMS AND UTILIZATION OF EVAPORATION MATERIALS 有权
标题翻译：线性蒸发装置，用于改善薄膜的均匀性和蒸发材料的利用
公开(公告)号：US20160047033A1
公开(公告)日：2016-02-18
申请号：US14715618
申请日：2015-05-19
申请人： NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： SHIH-CHANG LIANG , WEI-CHIEH HUANG , CHAO-NAN WEI , CUO-YO NI , HUI-YUN BOR
IPC分类号： C23C14/24
CPC分类号： C23C14/243 , C23C14/0623
摘要： A linear evaporation apparatus includes a thermal insulation chamber, and crucibles, evaporation material heaters and a mixing chamber installed in the thermal insulation chamber. The mixing chamber includes a flow limiting and adjusting layer, a flow channel adjusting member, a mixed layer and a linear evaporation layer. The flow limiting and adjusting layer is a rectangular sheet with flow limit holes corresponsive to the crucibles respectively; the flow channel adjusting member is an interconnected structure having at least one flow inlet corresponsive to some of the flow limit holes and at least one flow outlet, and the mixed layer is a substantially I-shaped sheet structure, and the linear evaporation layer is a rectangular sheet having a linear source evaporation opening tapered from both ends to the middle, so as to improve the uniformity of the thin film and the utilization of the evaporation materials.
摘要翻译：线性蒸发装置包括隔热室，坩埚，蒸发材料加热器和安装在隔热室中的混合室。混合室包括流动限制和调节层，流路调节构件，混合层和线性蒸发层。流量限制和调节层是分别与坩埚相对应的流动极限孔的矩形片材; 流动通道调节构件是具有与一些流动限制孔和至少一个流出口相对应的至少一个流入口的互连结构，并且混合层是基本上为I形的片状结构，并且线性蒸发层为具有从两端向中间逐渐变细的线性源蒸发口的矩形片材，以提高薄膜的均匀性和蒸发材料的利用。

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