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1. 发明授权

US5595855A Radiation sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5595855A
公开(公告)日：1997-01-21
申请号：US390045
申请日：1995-02-17
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Natsumi Suehiro , Takanori Kudo , Seiya Masuda , Yuko Nozaki , Hiroshi Okazaki , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Natsumi Suehiro , Takanori Kudo , Seiya Masuda , Yuko Nozaki , Hiroshi Okazaki , Georg Pawlowski
IPC分类号： C08L25/00 , C08L25/18 , C08L59/00 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , G03C1/72
CPC分类号： G03F7/038 , G03F7/0045
摘要： A chemically amplified radiation sensitive composition comprising: (a) a copolymer such as poly(4-hydroxystyrene-co-styrene), (b) a dissolution inhibitor such as polyacetal or (b') a crosslinking agent, (c) a radiation sensitive compound capable of generating an acid upon exposure to actinic radiation, (d) a radiation sensitive base capable of stabilizing the width of lines throughout steps from exposure to post-exposure bake treatment, and (e) a solvent for dissolving the components (a) to (d), can realize fine lines and spaces down to 0.22 microns, for example, using KrF laser, and possesses excellent heat and etch resistance and adhesiveness to substrates, and produces patterns with low standing waves arising due to substrate reflectiveness of exposed light.
摘要翻译：一种化学增强的辐射敏感组合物，其包含：（a）共聚物如聚（4-羟基苯乙烯 - 共 - 苯乙烯），（b）溶解抑制剂如聚缩醛或（b'）交联剂，（c）能够在暴露于光化辐射下产生酸的化合物，（d）能够在暴露于曝光后烘烤处理的步骤中稳定整个条纹宽度的辐射敏感性基质，和（e）用于溶解组分的溶剂（a）至（d），可以实现例如使用KrF激光器至0.22微米的细线和间隔，并且具有优异的耐热和耐蚀刻性以及与衬底的粘附性，并且由于曝光的衬底反射性而产生具有低驻波的图案。

2. 发明授权

US5843319A Positive-working radiation-sensitive mixture 失效
标题翻译：正面工作的辐射敏感混合物
公开(公告)号：US5843319A
公开(公告)日：1998-12-01
申请号：US902072
申请日：1997-07-29
申请人： Klaus Juergen Przybilla , Takanori Kudo , Seiya Masuda , Yoshiaki Kinoshita , Natsumi Suehiro , Munirathna Padmanaban , Hiroshi Okazaki , Hajime Endo , Ralph Dammel , Georg Pawlowski
发明人： Klaus Juergen Przybilla , Takanori Kudo , Seiya Masuda , Yoshiaki Kinoshita , Natsumi Suehiro , Munirathna Padmanaban , Hiroshi Okazaki , Hajime Endo , Ralph Dammel , Georg Pawlowski
IPC分类号： G03F7/004 , G03F7/039 , B01D15/00 , B01J39/00 , C02F1/42
CPC分类号： G03F7/0045 , G03F7/039
摘要： A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl; Y represents (CH.sub.2).sub.n (wherein n is 0 or 1), O or S; R.sup.8 and R.sup.9 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; R.sup.10 and R.sup.11 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; n is 5 or 6; and X.sub.2.sup.- represents a basic anion having a pK.sub.B value of -3 to +5; comprising the steps of: (a) dissolving a sulfonium salt (B) in a metal-ion free polar or non-polar solvent to form a solution, said sulfonium salt (B) being selected from said formulae II-V, wherein R.sup.5 to R.sup.11, Y and n of said sulfonium salt (B) have the sane meaning as above and X.sub.2.sup.- represents a non-nucleophilic anion; (b) contacting said solution for a sufficient amount of time with a basic ion-exchange resin having a quaternary ammonium group to replace the anion of (B) with a hydroxide ion and to form a sulfonium hydroxide solution; (c) separating said sulfonium hydroxide solution from the resin; and optionally (d) adding an active hydrogen containing compound or its base-labile precursor to said sulfonium hydroxide solution to yield a solution of the sulfonium compound (A) wherein X.sub.2.sup.- represents a basic anion other than a hydroxy ion.
摘要翻译：制备式II-V的碱性或非碱性锍化合物（A）的溶液的方法：[SR5R6R7] + X2-Ⅱ其中R5，R6和R7各自独立地独立地表示C1-C18烷基，芳基或杂芳基或被烷基，烷基芳基，芳基，卤素，烷氧基，苯氧基，苯硫酚，苯基磺酰基或苯基磺酰基单 - ，二 - 或三 - 取代的芳基苯基磺酰基; Y表示（CH 2）n（其中n为0或1），O或S; R8和R9代表C1-C4烷基，烷氧基或卤素; R10和R11表示C1-C4烷基，烷氧基或卤素; n为5或6; X2-表示pKB值为-3〜+5的碱性阴离子; 包括以下步骤：（a）将锍盐（B）溶解在无金属离子的极性或非极性溶剂中以形成溶液，所述锍盐（B）选自所述式II-V，其中R5至所述锍盐（B）的R 11，Y和n具有如上所述的正义，X2-表示非亲核阴离子; （b）用具有季铵基团的碱性离子交换树脂将所述溶液接触足够的时间以用氢氧根离子代替（B）的阴离子并形成氢氧化锍溶液; （c）从树脂中分离出氢氧化锍溶液; 和任选地（d）在所述氢氧化锍溶液中加入含活性氢的化合物或其碱不稳定的前体，得到其中X2代表羟基离子以外的碱性阴离子的锍化合物（A）的溶液。

3. 发明授权

US5663035A Radiation-sensitive mixture comprising a basic iodonium compound 失效
标题翻译：包含碱性碘鎓化合物的辐射敏感性混合物
公开(公告)号：US5663035A
公开(公告)日：1997-09-02
申请号：US420787
申请日：1995-04-12
申请人： Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
发明人： Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045
摘要： A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.
摘要翻译：用于生产半导体元件的辐射敏感性混合物，其具有高灵敏度和高分辨率，其可以通过碱性水溶液开发，并且其基于新的概念，其中稳定的酸潜像由使用辐射分解碱。该混合物的特征在于包含作为必需组分的a）不溶于水但可溶于碱性水溶液的粘合剂; b1）具有至少一个可被酸切割的键的化合物，或b2）具有至少一个键的化合物，其通过酸与化合物a）交联; c）当照射时产生酸的化合物; 和d）碱性碘鎓化合物。

4. 发明授权

US5641594A Colored, photosensitive resin composition 失效
标题翻译：彩色，感光性树脂组合物
公开(公告)号：US5641594A
公开(公告)日：1997-06-24
申请号：US507301
申请日：1995-08-25
申请人： Takanori Kudo , Yuko Nozaki , Kazuya Nagao , Yuki Nanjo , Hiroshi Okazaki , Yoshiaki Kinoshita , Seiya Masuda , Munirathna Padmanaban , Natsumi Suehiro
发明人： Takanori Kudo , Yuko Nozaki , Kazuya Nagao , Yuki Nanjo , Hiroshi Okazaki , Yoshiaki Kinoshita , Seiya Masuda , Munirathna Padmanaban , Natsumi Suehiro
IPC分类号： G03F7/00 , G03F7/008 , G03F7/031 , G03C5/56 , G03F7/012 , G03F7/033
CPC分类号： G03F7/008 , G03F7/0007 , G03F7/031
摘要： A colored, photosensitive resin composition of a pigment dispersing-type is disclosed.The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of producing a nitrene when irradiated with an actinic radiation, (c) a pigment, and (d) a solvent. Preferably, the composition further contains (e) a heat crosslinking agent and/or (f) a compound having a polymerizable double bond in addition to the above ingredients.According to the present invention, the production of a color filter need not be performed in an inert gas atmosphere, does not require an oxygen barrier film and does not require heating during the period of from the exposure step to the development step. Thus, the use of the composition permits the color filter production steps to be made significantly simple so that the composition provides a great value in industrial utilization.
摘要翻译： PCT No.PCT / JP94 / 02085 Sec。 371日期1995年8月25日 102（e）日期1995年8月25日PCT 1994年12月12日PCT PCT。公开号WO95 / 18399 日期：1995年7月6日公开了一种着色的颜料分散型感光性树脂组合物。着色的感光性树脂组合物的特征在于，含有（a）具有异羟基或酚羟基的聚合物，（b）当用光化辐射照射时能够产生硝酸的化合物，（c）颜料，（d）溶剂。优选地，除了上述成分之外，组合物还含有（e）热交联剂和/或（f）具有可聚合双键的化合物。根据本发明，滤色器的制造不需要在惰性气体气氛中进行，在从曝光步骤到显影步骤的期间，不需要氧阻隔膜，不需要加热。因此，使用该组合物可以使滤色器制造步骤显着简单，从而使组合物在工业应用中提供了巨大的价值。

5. 发明授权

US5738972A Radiation sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5738972A
公开(公告)日：1998-04-14
申请号：US864375
申请日：1997-05-28
申请人： Munirathna Padmanaban , Natsumi Suehiro , Yoshiaki Kinoshita , Satoru Funato , Seiya Masuda , Hiroshi Okazaki , Georg Pawlowski
发明人： Munirathna Padmanaban , Natsumi Suehiro , Yoshiaki Kinoshita , Satoru Funato , Seiya Masuda , Hiroshi Okazaki , Georg Pawlowski
IPC分类号： G03F7/00 , G03F7/004 , G03F7/033 , G03F7/039 , G03F7/085 , H01L21/027 , G03F7/38
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A chemically amplified resist material comprising: a) a homopolymer or a copolymer of hydroxystyrene or hydroxystyrene partly protected by a group sensitive to an acid such as a tetrahydropyranyl or t-butoxycarbonyl group, b) a dissolution inhibitor such as poly(N,O-acetal) or phenol or bisphenol protected by a group cleavable with an acid, c) a photosensitive compound capable of generating an acid upon exposure, d) a base capable of degrading upon radiation to regulate the line width in a period between the exposure step and the processing steps after exposure, e) a low-molecular weight phenolic or polyphenolic compound having a structure represented by the following general formula or a mixture of the phenolic or polyphenolic compounds: ##STR1## where n is an integer of 1 to 5, m is an integer of 0 to 4, n+m.ltoreq.5, and p is an integer of 1 to 10, each R is a C.sub.1 -C.sub.12 alkyl group or an unsubstituted or substituted cycloalkyl group or a C.sub.1 -C.sub.5 hydroxyalkyl group, provided that hydrogen atoms may be substituted with a halogen atom and, when m is not less than 2, each R may be the same or different; A represents a hydrocarbon atomic grouping, having a valence of p, including an unsubstituted or substituted C.sub.1 -C.sub.100 alicyclic, chain aliphatic, or aromatic hydrocarbon or a combination thereof with the carbon atoms being optionally substituted with an oxygen atom, provided that when p is 1, A may represent a hydrogen atom and, when p is 2, A may represent --S--, --SO--, --SO.sub.2 --, --O--, --CO--, or a direct bond, and f) a solvent for dissolving the components a) to e).
摘要翻译：一种化学放大抗蚀剂材料，包括：a）部分由对酸如四氢吡喃基或叔丁氧基羰基敏感的基团部分保护的羟基苯乙烯或羟基苯乙烯的均聚物或共聚物，b）溶解抑制剂如聚（N，乙缩醛）或苯酚或双酚被被一个酸可裂解的基团保护，c）一种能够在暴露时产生酸的感光性化合物，d）能够在辐射下降解以在曝光步骤和曝光后的处理步骤，e）具有由以下通式表示的结构的低分子量酚或多酚化合物或酚类或多酚化合物的混合物：n为0〜4的整数，n + m = 5 ，p为1〜10的整数，R为C1-C12烷基或未取代或取代的环烷基或C1-C5羟烷基，条件是氢原子可被卤素原子取代， en不小于2，每个R可以相同或不同; A表示具有p价的烃原子团，包括未取代或取代的C1-C100脂环族，链脂族或芳族烃或其任选被氧原子取代的碳原子的组合，条件是当p为 1中，A可以表示氢原子，当p为2时，A可以表示-S-，-SO-，-SO2-，-O-，-CO-或直接键，f）溶解溶剂组件a）至e）。

6. 发明授权

US5691100A Pattern forming material including photoacid and photobase generators for large exposure latitude 失效
标题翻译：图案形成材料包括光致酸和光碱发生器，用于大曝光宽容度
公开(公告)号：US5691100A
公开(公告)日：1997-11-25
申请号：US623735
申请日：1996-03-29
申请人： Takanori Kudo , Seiya Masuda , Yoshiaki Kinoshita , Klaus Przybilla , Natsumi Endo , Natsumi Suehiro , Hiroshi Okazaki
发明人： Takanori Kudo , Seiya Masuda , Yoshiaki Kinoshita , Klaus Przybilla , Natsumi Endo , Natsumi Suehiro , Hiroshi Okazaki
IPC分类号： G03F7/004 , G03C1/54 , G03C1/56 , G03C1/685
CPC分类号： G03F7/0045 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.
摘要翻译：提供了用于形成图案的材料，其具有宽的曝光宽容度，并且不太可能导致图案的尺寸变化随着曝光的变化。该材料包含（A）具有在活性束照射时产生酸的能力的化合物，（B）能够产生碱或增加其碱度的化合物，（C）具有至少一个键的化合物可以与酸和/或（D）不溶于水但可溶于碱性水溶液的化合物。

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