专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 再颁专利

USRE31743E AC Etching of aluminum capacitor foil 失效
标题翻译： AC电镀铝箔蚀刻
公开(公告)号：USRE31743E
公开(公告)日：1984-11-20
申请号：US294251
申请日：1981-08-19
申请人： Mulk R. Arora , John J. Randall, Jr.
发明人： Mulk R. Arora , John J. Randall, Jr.
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum electrolytic capacitor foil is etched in a bath containing 0.7 to 2.0 M hydrochloric acid, 0.2 to 0.5 M hydrated aluminum trichloride, and 0.02 to 0.4 M phosphate ion while subjected to the action of alternating current at 35.degree. to 55.degree. C.

2. 发明授权

US4332651A AC Etching of aluminum capacitor foil 失效
标题翻译： AC电镀铝箔蚀刻
公开(公告)号：US4332651A
公开(公告)日：1982-06-01
申请号：US265296
申请日：1981-05-20
申请人： Richard A. Bemis , Clinton E. Hutchins , Edward J. Markland , Mulk R. Arora
发明人： Richard A. Bemis , Clinton E. Hutchins , Edward J. Markland , Mulk R. Arora
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055 , C25F3/14
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum capacitor foil is etched in a bath at 30.degree. to 45.degree. C. containing 0.5 to 1.8 M hydrochloric acid, 0.05 to 0.3 M phosphoric acid, 0.2 to 0.5 aluminum chloride and 0.09 to 1.0 M alkali or alkaline earth metal chloride while being subjected to alternating current at 15 to 36 Hz frequency.
摘要翻译：铝电容器箔在含有0.5至1.8M盐酸，0.05至0.3M磷酸，0.2至0.5氯化铝和0.09至1.0M碱金属或碱土金属氯化物的30至45℃的浴中进行蚀刻，同时进行以15至36赫兹频率交流。

3. 发明授权

US4474657A Single step electro chemical etch process for high volt aluminum anode foil 失效
标题翻译：高压铝阳极箔的单步电化学蚀刻工艺
公开(公告)号：US4474657A
公开(公告)日：1984-10-02
申请号：US563345
申请日：1983-12-20
申请人： Mulk R. Arora
发明人： Mulk R. Arora
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum electrolytic capacitor foil of a high cubic texture etched by passing the foil through an electrolyte bath containing 3% hydrochloric acid and 1% aluminum as aluminum chloride under the influence of a direct current and at a temperature of 75.degree. C. The foil thus etched has a significantly higher capacitance resulting from a greater density of tunnels, an elongation of the tunnels, and a fairly linear tunnel structure in the foil.
摘要翻译：通过在直流电和75℃的温度下使箔通过含有3％盐酸和1％铝作为氯化铝的电解液，蚀刻出高立方体结构的铝电解电容器箔。如此蚀刻的箔具有较大的隧道密度，隧道的伸长率以及箔中相当线性的隧道结构产生的较高的电容。

4. 发明授权

US4376686A AC Etching of aluminum capacitor foil 失效
标题翻译： AC电镀铝箔蚀刻
公开(公告)号：US4376686A
公开(公告)日：1983-03-15
申请号：US321973
申请日：1981-11-16
申请人： Mulk R. Arora
发明人： Mulk R. Arora
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum capacitor foil is etched using AC current and an etchant bath comprising 0.8 to 1.5 M hydrochloric acid, 0.4 to 0.5 M aluminum chloride, 0.04 to 0.3 M nitric acid, and 0.05 to 0.2 M tartaric acid. The frequency of the alternating current is 12 to 20 Hz, and the bath temperature is 30.degree. to 40.degree. C.
摘要翻译：使用AC电流和包含0.8至1.5M盐酸，0.4至0.5M氯化铝，0.04至0.3M硝酸和0.05至0.2M酒石酸的蚀刻液蚀刻铝电容器箔。交流电频率为12〜20Hz，浴温为30〜40℃。

5. 发明授权

US4105807A Production of thin, stable, solid electrolyte films of high ionic conductivity 失效
标题翻译：生产具有高离子电导率的薄，稳定，固体电解质膜
公开(公告)号：US4105807A
公开(公告)日：1978-08-08
申请号：US599897
申请日：1975-07-28
申请人： Mulk R. Arora
发明人： Mulk R. Arora
IPC分类号： H01L23/58 , H01M6/18 , C23C15/00 , C23C11/08
CPC分类号： H01M6/18 , H01L23/58 , H01L2224/32225 , H01L2224/45144 , H01L2224/48227 , H01L2224/48472 , H01L2224/73265
摘要： Production of thin stable films of oxy-anion-substituted silver iodide solid electrolytes, such as Ag.sub.19 I.sub.15 P.sub.2 O.sub.7, on a substrate, such films having good ionic conductivity at room temperature, by vaporizing such oxy-anion-substituted silver iodide elecytrolyte material, or a mixture of the components thereof in stoichiometric proportions, by flash evaporation of such electrolyte material at high temperature, preferably ranging from about 1,400.degree. to about 1,600.degree. C., or by RF sputtering, preferably at electrode potentials ranging from about 700 to about 900 volts, and maintaining the substrate on which the solid electrolyte film is deposited, at certain elevated temperatures, preferably ranging from about 140.degree. to about 150.degree. C., to permit recombination and deposition of the vaporized constituents of the electrolyte material on the substrate, to form a thin film of the solid electrolyte such that the solid electrolyte film thus formed is neither iodine-rich nor iodine-poor, relative to the proper stoichiometry for such solid electrolyte.
摘要翻译：在基底上制备氧阴离子取代的碘化银固体电解质如Ag19I15P2O7的薄稳定膜，通过蒸发这种氧阴离子取代的碘化银电解质材料或混合物在室温下具有良好的离子导电性的这种膜的组分以化学计量比例，通过在高温下，优选约1400℃至1600℃左右的这种电解质材料的闪蒸，或通过RF溅射，优选在约700至约900伏范围内的电极电位，并且在一定的升高的温度下，优选在约140℃至约150℃范围内保持其上沉积固体电解质膜的基材，以允许电解质材料的汽化组分在基底上重组和沉积，形成固体电解质的薄膜，使得由此形成的固体电解质膜既不富含碘也不是贫碘对于这种固体电解质的适当化学计量。

6. 发明授权

US4525249A Two step electro chemical and chemical etch process for high volt aluminum anode foil 失效
标题翻译：用于高压铝阳极箔的两步电化学和化学蚀刻工艺
公开(公告)号：US4525249A
公开(公告)日：1985-06-25
申请号：US631667
申请日：1984-07-16
申请人： Mulk R. Arora
发明人： Mulk R. Arora
IPC分类号： C23F1/20 , C25D11/16 , C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum electrolytic capacitor anode foil of a high cubic texture etched in a two step process by treating the foil in an electrolyte bath containing 3% hydrochloric acid and 1% aluminum as aluminum chloride under the influence of a direct current and at a temperature of 75.degree. C., and in a second step treating said etched foil in an aqueous bath of 8% nitric acid and 2.6% aluminum as a nitrate at a temperature of 85.degree. C. for 5 to 7 minutes. The foil thus etched has a significantly higher capacitance resulting from a greater density of tunnels, an elongation of the tunnels, and a fairly linear tunnel structure.
摘要翻译：在直流电和75℃的温度下，通过在含有3％盐酸和1％铝作为氯化铝的电解液浴中处理箔，在两步法中蚀刻高立方结构的铝电解电容器阳极箔在第二步中，在85℃的温度下，以8％硝酸和2.6％铝作为硝酸盐的水浴处理所述蚀刻箔5至7分钟。因此蚀刻的箔具有由较大的隧道密度，隧道的伸长率以及相当线性的隧道结构产生的显着更高的电容。

7. 发明授权

US4518471A Two step electrochemical etch process for high volt aluminum anode foil 失效
标题翻译：高压铝阳极箔的两步电化学蚀刻工艺
公开(公告)号：US4518471A
公开(公告)日：1985-05-21
申请号：US645876
申请日：1984-08-29
申请人： Mulk R. Arora
发明人： Mulk R. Arora
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum electrolytic capacitor anode foil of a high cubic texture is etched using a two step process by treating the foil in an electrolyte bath containing 3% hydrochloric acid and 1% aluminum as aluminum chloride under the influence of a direct current of high current density and at a temperature of 75.degree. C., and in a second step treating said etched foil in a similar bath with a much lower current density and at a temperature of 80.degree. to 82.5.degree. C. The foil thus etched has a significantly higher capacitance resulting from a greater density of tunnels, and a fairly linear tunnel structure.
摘要翻译：在高电流密度的直流电的影响下，使用两步法蚀刻含有3％盐酸和1％铝作为氯化铝的电解液中的箔的铝电解电容器阳极箔，温度为75℃，并且在第二步中以相当低的电流密度和80至82.5℃的温度处理所述蚀刻的箔。由此蚀刻的箔具有显着较高的电容，由隧道密度较大，隧道结构相当直线。

8. 发明授权

US4381231A DC Etching of aluminum electrolytic capacitor foil 失效
标题翻译：直流蚀刻铝电解电容箔
公开(公告)号：US4381231A
公开(公告)日：1983-04-26
申请号：US321510
申请日：1981-11-16
申请人： Mulk R. Arora
发明人： Mulk R. Arora
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum electrolytic capacitor foil is etched by passing the foil through an electrolyte bath containing 2.5 moles/liter of sodium chloride and 0.08 to 0.48 moles/liter of boric acid or 0.05 to 0.07 moles/liter of a citrate ion source under the influence of direct current and at a temperature of 90.degree. to 95.degree. C. The foil thus etched has a central metallic core which results in improved mechanical properties.
摘要翻译：铝电解电容器箔通过在直流电的影响下使箔通过含有2.5摩尔/升氯化钠和0.08至0.48摩尔/升硼酸或0.05至0.07摩尔/升柠檬酸根离子源的电解液并且在90℃至95℃的温度下进行。如此蚀刻的箔具有中心金属芯，其导致改善的机械性能。

9. 发明授权

US4332652A AC Etching of aluminum capacitor foil 失效
标题翻译： AC电镀铝箔蚀刻
公开(公告)号：US4332652A
公开(公告)日：1982-06-01
申请号：US280659
申请日：1981-07-06
申请人： Mulk R. Arora , Edward J. Paquette , Allan B. McPherson
发明人： Mulk R. Arora , Edward J. Paquette , Allan B. McPherson
IPC分类号： C25F3/04 , H01G9/04 , H01G9/055
CPC分类号： H01G9/055 , C25F3/04
摘要： Aluminum electrolytic capacitor foil is etched in a bath containing 0.5 to 1.8 M hydrochloric acid, 0.2 to 0.5 M aluminum chloride, 0.03 to 0.3 M phosphoric acid, and 0.05 to 0.3 M nitric acid, the molar ratio of said nitric acid to said phosphoric acid being 0.3-5, while subjected to the action of alternating current at 28.degree. to 45.degree. C.
摘要翻译：在包含0.5至1.8M盐酸，0.2至0.5M氯化铝，0.03至0.3M磷酸和0.05至0.3M硝酸的浴中蚀刻铝电解电容器箔，所述硝酸与所述磷酸的摩尔比为0.3-5，同时在28℃至45℃下进行交流电动作。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式