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1. 发明授权

US06522674B1 Pulsed laser control system 有权
标题翻译：脉冲激光控制系统
公开(公告)号：US06522674B1
公开(公告)日：2003-02-18
申请号：US09666139
申请日：2000-09-20
申请人： Motoki Niwano , Shoichi Sakanishi , Takeshi Okamoto , Hideyuki Hayashi , Hiroshi Tanaka
发明人： Motoki Niwano , Shoichi Sakanishi , Takeshi Okamoto , Hideyuki Hayashi , Hiroshi Tanaka
IPC分类号： H01S300
CPC分类号： H01S3/225 , H01S3/1024 , H01S3/104 , H01S3/137
摘要： The pulsed laser control system comprises a plurality of controllers (2) through (6) for controlling devices (21) through (30) constituting the pulsed laser apparatus (1); parallel communication lines (P1) to (P4) for parallel connection of the plurality of controllers (2) through (6); an Ethernet (S) for serial connection of the plurality of controllers (2) through (6); parallel communication line (PP) for parallel connection between the external apparatus (10) and the main controller (2); and an Ethernet (SS) for serial connection between the external apparatus (10) and the main controller (2); wherein the parallel communication lines (P1) to (P4) and (PP) transmit signals for which realtime performance is required. With this construction, even if design changes are frequently made to a pulsed laser apparatus, the changes can be made easily and with little expansion space. Moreover, management of the devices constituting the pulsed laser apparatus can be easily performed.
摘要翻译：脉冲激光控制系统包括用于控制构成脉冲激光装置（1）的装置（21）至（30）的多个控制器（2）至（6）。并行通信线路（P1）至（P4），用于并联连接多个控制器（2）至（6）; 用于多个控制器（2）至（6）的串行连接的以太网（S）; 并联通信线（PP），用于外部设备（10）和主控制器（2）之间并联; 以及用于外部设备（10）和主控制器（2）之间的串行连接的以太网（SS）; 其中并行通信线路（P1）至（P4）和（PP）发送需要实时性能的信号。通过这种结构，即使经常对脉冲激光装置进行设计变更，也能够容易地进行变更，而且扩展空间小。此外，可以容易地执行构成脉冲激光装置的装置的管理。

2. 发明申请

US20130051412A1 LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS, AND METHOD FOR CONTROLLING THE LASER APPARATUS 有权
标题翻译：激光装置，包括激光装置的极端超紫外光发光系统以及用于控制激光装置的方法
公开(公告)号：US20130051412A1
公开(公告)日：2013-02-28
申请号：US13696497
申请日：2012-02-08
申请人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
发明人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
IPC分类号： H01S3/13
CPC分类号： H01S3/10046 , G03F7/70025 , G03F7/70033 , H01S3/0085 , H01S3/09702 , H01S3/10007 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4025 , H05G2/005 , H05G2/008
摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.
摘要翻译：激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

3. 发明授权

US08811436B2 Laser apparatus, extreme ultraviolet light generation system including the laser apparatus, and method for controlling the laser apparatus 有权
标题翻译：激光装置，包括激光装置的极紫外光发生系统和用于控制激光装置的方法
公开(公告)号：US08811436B2
公开(公告)日：2014-08-19
申请号：US13696497
申请日：2012-02-08
申请人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
发明人： Kenichi Miyao , Motoki Niwano , Osamu Wakabayashi
IPC分类号： H01S3/13
CPC分类号： H01S3/10046 , G03F7/70025 , G03F7/70033 , H01S3/0085 , H01S3/09702 , H01S3/10007 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/4025 , H05G2/005 , H05G2/008
摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.
摘要翻译：激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

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