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    • 1. 发明授权
    • MOPA light source
    • MOPA光源
    • US08369004B2
    • 2013-02-05
    • US12790323
    • 2010-05-28
    • Motoki Kakui
    • Motoki Kakui
    • H01S3/101H01S3/067H01S3/30
    • H01S3/302H01S3/06758H01S3/094061H01S3/09408H01S3/10023H01S3/1618H01S3/2316
    • The present invention relates to a MOPA light source capable of obtaining pulse output by wavelength-conversion of pulse light of fundamental light wave using a simple configuration, and suppressing optical output using a simple method when processing is not performed. The fundamental light wave outputted from a seed light source is amplified in an optical amplification fiber. The amplified fundamental light wave is inputted to one end of a passive optical fiber, and propagates in the passive optical fiber. In the passive optical fiber, stimulated Raman scattering occurs upon propagation of the fundamental light wave. The light of fundamental light wave and light of stimulated Raman-scattered components are outputted from the other end of the passive optical fiber. The light outputted from the passive optical fiber is collimated by a lens, and is then inputted to a branching filter. The light inputted to the branching filter is wavelength-separated into light of stimulated Raman-scattered components having wavelengths longer than that of the fundamental light wave, and light having wavelengths equal to or less than that of the fundamental light wave.
    • 本发明涉及一种能够通过简单的结构获得基波光脉冲光的波长转换的脉冲输出的MOPA光源,并且在不进行处理时通过简单的方法抑制光输出。 从种子光源输出的基波光在光放大光纤中放大。 放大的基波光被输入到无源光纤的一端,并在无源光纤中传播。 在无源光纤中,受激拉曼散射在基波光的传播时发生。 从被动光纤的另一端输出受激拉曼散射分量的基波光和光的光。 从无源光纤输出的光被透镜准直,然后被输入到分支滤波器。 输入到分波器的光被波长分离成具有比基波光波长长的波长的受激拉曼散射分量的光,以及具有等于或小于基波光波长的波长的光。
    • 2. 发明授权
    • Method and apparatus of measuring backward light, and laser processing method
    • 测量反光的方法和装置,以及激光加工方法
    • US08080773B2
    • 2011-12-20
    • US12392331
    • 2009-02-25
    • Shinobu TamaokiMotoki KakuiKazuo Nakamae
    • Shinobu TamaokiMotoki KakuiKazuo Nakamae
    • G01J1/32
    • G01J1/20B23K26/705
    • The present invention relates to a method of measuring backward light, which is constructed for checking, prior to laser processing, backward light that propagates backward through an isolator included in a laser processing apparatus. The present invention also relates to a laser processing method and the like. A laser processing apparatus has an optical head provided with a laser light source part, light guide, and isolator. The optical head has an emitting optical system, irradiation optical system, and light collecting optical system. The method of measuring backward light uses a photodetector to detect, from reference light introduced from a measurement light source into the optical head, the power of an optical component that has passed through the isolator, while changing the position of the measurement light source. The laser processing method performs laser processing by using the laser processing apparatus that has the optical head in which the arrangement of optical components is adjusted beforehand on the basis of the result of detection or result of measurement.
    • 本发明涉及一种测量向后光的方法,其被构造用于在激光加工之前检查通过包括在激光加工设备中的隔离器向后传播的向后光。 本发明还涉及一种激光加工方法等。 激光加工设备具有设置有激光光源部分,光导和隔离器的光学头。 光头具有发射光学系统,照射光学系统和聚光光学系统。 逆向光的测量方法使用光检测器,在测量光源的位置改变的同时,从测量光源引入光头的参考光检测已经通过隔离器的光学部件的功率。 激光加工方法通过使用具有基于检测结果或测量结果预先调整光学部件的布置的光头的激光加工装置进行激光加工。
    • 3. 发明授权
    • Laser processing apparatus and laser processing method
    • 激光加工设备和激光加工方法
    • US08039778B2
    • 2011-10-18
    • US12256974
    • 2008-10-23
    • Motoki KakuiKazuo NakamaeShinobu Tamaoki
    • Motoki KakuiKazuo NakamaeShinobu Tamaoki
    • G01J1/32
    • B23K26/03B23K26/082B23K2101/32B23K2101/36
    • The present invention relates to a laser processing apparatus and the like having a structure for implementing at the same time both an efficient laser processing in the place where a laser beam is difficult to reach and a laser processing without damages in the place where the laser beam is easy to reach. This laser processing apparatus comprises a laser light source, an irradiation optical system applying a laser beam to an object while scanning the laser beam, a photo-detector detecting the laser beam applied from the irradiation optical system, and a control section of making switching between a continuous oscillation and a pulse oscillation of the laser beam at the laser light source. In particular, the control section makes a continuous oscillation of the laser beam with respect to the laser light source in the case in which the laser beam applied from the irradiation optical system is detected at the photo-detector; while it makes a pulse oscillation of the laser beam with respect to the laser light source in the case in which no laser beam applied from the irradiation optical system is detected at the photo-detector.
    • 激光加工装置本发明涉及一种激光加工装置等,其结构是同时实现在激光束难以到达的地方进行有效的激光加工,激光加工在激光加工的地方 很容易到达。 该激光加工装置包括:激光光源,在扫描激光束的同时向物体施加激光的照射光学系统;检测从照射光学系统施加的激光束的光检测器;以及控制部, 在激光光源处的激光束的连续振荡和脉冲振荡。 特别地,在从光检测器检测到从照射光学系统施加的激光束的情况下,控制部分使激光束相对于激光光源连续振荡; 而在光检测器未检测到从照射光学系统施加的激光束的情况下,激光束相对于激光光源的脉冲振荡。
    • 4. 发明授权
    • Optical amplification module and laser light source designed to suppress photodarkening
    • 光放大模块和激光光源旨在抑制光暗化
    • US07982945B2
    • 2011-07-19
    • US12423097
    • 2009-04-14
    • Shinobu TamaokiMotoki Kakui
    • Shinobu TamaokiMotoki Kakui
    • H04B10/17
    • H01S3/06758H01S3/06716H01S3/094003H01S3/094007
    • The present invention relates to an optical amplification module having a construction which effectively suppresses photodarkening, and to a laser light source including the same. The laser light source comprises a light source for outputting light to be amplified, and an optical amplification module. The optical amplification module comprises two types of optical amplification media having different rare earth element concentrations, and a pumping light source. The low concentration medium and the high concentration medium are disposed in the propagation direction of pumping light such that the population inversion of the low concentration medium is higher than that of the high concentration medium. Hence, by arranging two types of optical amplification media with different rare earth concentrations such that the population inversion of the low concentration medium is higher than that of the high concentration medium, sufficient overall gain of the laser light source can be obtained while effectively suppressing photodarkening in the two types of optical amplification media.
    • 本发明涉及具有有效抑制光暗化的结构的光放大模块及涉及包括该光放大模块的激光光源。 激光光源包括用于输出要放大的光的光源和光放大模块。 光放大模块包括具有不同稀土元素浓度的两种类型的光放大介质和泵浦光源。 低浓度培养基和高浓度培养基配置在泵浦光的传播方向,使得低浓度培养基的群体倒置高于高浓度培养基。 因此,通过布置具有不同稀土浓度的两种类型的光学放大介质,使得低浓度介质的群体反转高于高浓度介质的群体反转,可以在有效抑制光暗化的同时获得激光源的足够的总体增益 在两种类型的光放大介质中。
    • 5. 发明申请
    • LASER PROCESSING METHOD AND LASER PROCESSING DEVICE
    • 激光加工方法和激光加工装置
    • US20110148002A1
    • 2011-06-23
    • US13059592
    • 2009-10-23
    • Motoki KakuiKazuo NakamaeShinobu Tamaoki
    • Motoki KakuiKazuo NakamaeShinobu Tamaoki
    • B29C35/08
    • H05K3/0035B23K26/0622B23K26/082B23K26/389B23K26/40B23K2103/172B23K2103/42B23K2103/50H01S3/067
    • The present invention relates to a laser processing method and the like which use no wavelength conversion technique by nonlinear optical crystals when selectively removing an insulating layer of a printed board, while employing only one wavelength throughout the entire removal processing. A laser processing apparatus (1), preferably used in the laser processing method, has a MOPA structure and comprises a seed light source (100), a YbDF (110), a bandpass filter (120), a YbDF (130), a bandpass filter (140), a YbDF (150), a YbDF (160), and so forth. The laser processing method according to the present invention is a laser processing method of removing an insulating layer comprised of a resin laminated on a conductor layer by irradiating it with pulsed laser light outputted from the laser processing apparatus (1) and uses laser light having a wavelength at which the light absorbed by the conductor layer is less than 10%, and sets the fluence per one pulse to a fracture damage threshold of the insulating layer or higher.
    • 本发明涉及在选择性地去除印刷电路板的绝缘层时采用非线性光学晶体的波长转换技术的激光加工方法等,而在整个去除处理中仅使用一个波长。 优选用于激光加工方法的激光加工装置(1)具有MOPA结构,包括种子光源(100),YbDF(110),带通滤光器(120),YbDF(130), 带通滤波器(140),YbDF(150),YbDF(160)等。 根据本发明的激光加工方法是通过用从激光加工设备(1)输出的脉冲激光照射层压在导体层上的由树脂构成的绝缘层的激光加工方法,并使用具有 由导体层吸收的光的波长小于10%,并且将每个脉冲的注量设定为绝缘层的断裂损伤阈值或更高。
    • 6. 发明授权
    • Optical gain waveguide and method of controlling the same
    • 光增益波导及其控制方法
    • US07586673B2
    • 2009-09-08
    • US11365810
    • 2006-03-02
    • Takahiro MurataMotoki KakuiTetsuya Haruna
    • Takahiro MurataMotoki KakuiTetsuya Haruna
    • H01S3/00
    • H01S3/094003H01S3/06716
    • The present invention relates to an optical gain waveguide having excellent gain flatness in C-band, and excellent tolerance against variations of a pumping light wavelength as well, and a method of controlling the same. The optical gain waveguide includes an optical waveguide region which is doped with Er element which can be pumped by irradiating pumping light with a wavelength of 976 nm or less, or a wavelength of 981 nm or more. A population inversion of Er is optimized so that a gain variation in the C-band becomes minimum, by the irradiation of the pumping light. At this time, a relative gain variation of the optical gain waveguide, which is defined by a peak gain value and a minimum gain value in the wavelength region of 1,530 nm to 1,560 nm becomes smaller than 11.5%. In addition, in the optical gain waveguide, a width of wavelength range producing the relative gain variation smaller than 11% is 36 nm or more.
    • 本发明涉及一种具有优异的C波段增益平坦度的光增益波导,以及对泵浦光波长变化的良好公差及其控制方法。 光增益波导包括掺杂有Er元素的光波导区域,其可以通过照射波长976nm或更小或波长981nm或更大的泵浦光来泵浦。 通过照射泵浦光来优化Er的群体反演,使得C波段的增益变化最小。 此时,由1530nm至1,560nm的波长区域中的峰值增益值和最小增益值定义的光增益波导的相对增益变化小于11.5%。 此外,在光增益波导中,产生小于11%的相对增益变化的波长范围的宽度为36nm以上。
    • 7. 发明申请
    • Laser processing method and laser processing apparatus
    • 激光加工方法和激光加工设备
    • US20080210886A1
    • 2008-09-04
    • US11878973
    • 2007-07-30
    • Kazuo NakamaeMotoki KakuiShinobu Tamaoki
    • Kazuo NakamaeMotoki KakuiShinobu Tamaoki
    • G21K5/10
    • B23K26/03B23K26/032B23K26/046B23K26/048B23K26/0665B23K26/0861B23K26/53
    • The present invention relates to a laser processing method and the like having a structure for making it possible to process an object to be processed in various ways while accurately adjusting the installation state of the object. The method irradiates the object with plural adjustment laser light beams that are set in a specific positional relationship against a converging point of processing laser light beam, and adjusts the state of installation of the object while monitoring irradiation areas of the adjustment laser light beams on the surface of the object. Each irradiation directions of adjustment laser light beams is different from that of the processing laser light beam. By reflecting the irradiation condition of the adjustment laser light beam and monitored information of the irradiation areas in positional adjustment of the object, the installation state of the object can be adjusted in accordance with various kinds of processing.
    • 本发明涉及一种激光加工方法等,其具有能够在精确地调整物体的安装状态的情况下以各种方式处理待处理物体的结构。 该方法以与处理用激光的会聚点为特定的位置关系设定的多个调整用激光照射物体,并且在监视被调节激光的照射区域的同时调整对象的安装状态 物体的表面。 调整激光的各照射方向与加工用激光的不同。 通过在对象的位置调整中反映调整激光的照射条件和照射区域的监视信息,可以根据各种处理来调整物体的安装状态。
    • 8. 发明申请
    • Laser processing method and laser processing apparatus
    • 激光加工方法和激光加工设备
    • US20080180788A1
    • 2008-07-31
    • US11902966
    • 2007-09-26
    • Motoki KakuiKeiji Fuse
    • Motoki KakuiKeiji Fuse
    • H01S3/09
    • H01S3/06754B23K26/067B23K26/0676B23K26/073H01S3/005H01S3/094023H01S3/094069H01S3/09408H01S3/09415H01S3/1618
    • The present invention relates to a laser processing method and laser processing apparatus for enabling improvement and maintenance of homogenization of a beam intensity distribution in an irradiated region. The laser processing apparatus comprises, at least, an ASE light generation section for emitting ASE light, and a homogenizer for splitting the ASE light into multiple beams. The ASE generation section for emitting the ASE light as processing laser light is provided, and whereby the deterioration of homogenization due to inter-beam interference is suppressed. The homogenization of beam intensity distribution is improved by locating a condenser lens relative to an object such that the object is shifted from a focus position of the condenser lens in the homogenizer, by intentionally deteriorating a beam quality M2 of the ASE light itself emitted from the ASE light generation section to about 2 to 10, or by a combination of these, in laser processing.
    • 激光加工方法及激光加工装置技术领域本发明涉及激光加工方法和激光加工装置,其能够改善和维持照射区域中的光束强度分布的均匀化。 激光加工装置至少包括用于发射ASE光的ASE光发生部分和用于将ASE光分解成多个光束的均质器。 提供了用于发射ASE光作为处理激光的ASE生成部,抑制了由于束间干涉而产生的均匀化的劣化。 光束强度分布的均匀化通过将聚光透镜相对于物体定位,使得物体从均匀器中的聚光透镜的焦点位置偏移,故意地劣化光束质量M 2 的ASE光自身从ASE光产生部分发射到约2至10个,或通过这些的组合在激光加工中。
    • 10. 发明申请
    • Fouling removing method
    • 污垢去除方法
    • US20080072924A1
    • 2008-03-27
    • US11882168
    • 2007-07-31
    • Kazuo NakamaeMotoki KakuiShinobu Tamaoki
    • Kazuo NakamaeMotoki KakuiShinobu Tamaoki
    • B08B6/00
    • B08B7/0042
    • The present invention relates to a fouling removing method which removes a fouling, comprised of a chemical compound containing carbon, on an object surface by laser light irradiation. The fouling removing method irradiates the fouling on the object surface with laser light while blowing a supporting gas on this area. This structure allows the supporting gas and a fouling material to react with each other when burning the fouling by laser irradiation, so as to generate a carbon-containing gas, and the supporting gas to blow away carbonized residues generated on the object surface. This drastically reduces the carbonized residues on the exposed surface of the object having removed the fouling.
    • 本发明涉及一种污垢去除方法,其通过激光照射在物体表面上除去由含有碳的化合物组成的污垢。 污垢清除方法在该区域吹送支撑气体的同时用激光照射物体表面上的污垢。 这种结构允许支持气体和结垢材料在通过激光照射燃烧结垢时彼此反应,以产生含碳气体,并且支撑气体吹走在物体表面上产生的碳化残余物。 这大大减少了去除污垢的物体的暴露表面上的碳化残余物。