专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120092987A1 ROUTING APPARATUS AND NETWORK APPARATUS 有权
标题翻译：路由设备和网络设备
公开(公告)号：US20120092987A1
公开(公告)日：2012-04-19
申请号：US13092919
申请日：2011-04-23
申请人： Moo-Kyoung CHUNG , Soo-Jung RYU , Woong SEO , Ho-Young KIM , Young-Chul CHO
发明人： Moo-Kyoung CHUNG , Soo-Jung RYU , Woong SEO , Ho-Young KIM , Young-Chul CHO
IPC分类号： H04L12/56 , H04L12/26
CPC分类号： H04L45/60
摘要： A routing apparatus and a network apparatus that are capable of improving general system performance by compressing/decompressing data and transmitting the result of the compression/decompression, are provided. The routing apparatus may compress and/or decompress input data, and may transmit the compressed and/or decompressed input data.
摘要翻译：提供能够通过压缩/解压缩数据和发送压缩/解压缩的结果来提高一般系统性能的路由设备和网络设备。路由设备可以压缩和/或解压缩输入数据，并且可以传送压缩和/或解压缩的输入数据。

2. 发明申请

US20140071027A1 DISPLAY DEVICE AND DRIVING METHOD THEREOF 有权
标题翻译：显示装置及其驱动方法
公开(公告)号：US20140071027A1
公开(公告)日：2014-03-13
申请号：US13751263
申请日：2013-01-28
申请人： Guang hai JIN , Dong-Gyu KIM , Kwan-Wook JUNG , Ho-Young KIM , June-Woo LEE , In-Ho CHOI
发明人： Guang hai JIN , Dong-Gyu KIM , Kwan-Wook JUNG , Ho-Young KIM , June-Woo LEE , In-Ho CHOI
IPC分类号： G09G3/32
CPC分类号： G09G3/3233 , G09G3/3291 , G09G2300/0852 , G09G2300/0861
摘要： A display device includes a plurality of pixels, each pixel including an organic light emitting diode (OLED) and a driving transistor, a sustain power supply unit applying a first sustain voltage to a plurality of data lines connected to the plurality of pixels, and a data driver applying one of a data signal and a second sustain voltage to the plurality of data lines. For each pixel, the sustain power supply unit applies the first sustain voltage as a first level voltage to reset a gate voltage of the driving transistor and applies the first sustain voltage as a second level voltage to increase the gate voltage of the driving transistor. When an anode voltage of the OLED in each pixel is discharged to be reset, the anode voltage of the OLED is controlled according to a voltage difference between the first level voltage and the second level voltage.
摘要翻译：显示装置包括多个像素，每个像素包括有机发光二极管（OLED）和驱动晶体管，维持电源单元对连接到多个像素的多个数据线施加第一维持电压，以及数据驱动器将数据信号和第二维持电压中的一个施加到多条数据线。对于每个像素，维持电源单元施加第一维持电压作为第一电平电压以复位驱动晶体管的栅极电压，并施加第一维持电压作为第二电平电压以增加驱动晶体管的栅极电压。当每个像素中的OLED的阳极电压被放电以被复位时，OLED的阳极电压根据第一电平电压和第二电平电压之间的电压差来控制。

3. 发明申请

US20120223011A1 SUPERHYDROPHOBIC/AMPHIPHILIC(OLEOPHILIC) SURFACE WITH NANO STRUCTURE AND THE FABRICATION METHOD THEREOF 有权
标题翻译：具有纳米结构的超级离子/表面活性剂（OLEOPHILIC）表面及其制备方法
公开(公告)号：US20120223011A1
公开(公告)日：2012-09-06
申请号：US13215542
申请日：2011-08-23
申请人： Myoung-Woon MOON , Kwang Ryeol LEE , Bong Su SHIN , Ho-Young KIM
发明人： Myoung-Woon MOON , Kwang Ryeol LEE , Bong Su SHIN , Ho-Young KIM
IPC分类号： B01D39/14 , C23C16/50 , B32B3/00 , B05D1/36 , B82Y40/00 , B82Y30/00
CPC分类号： B82Y30/00 , B82Y40/00 , D04H1/4382 , Y10T428/24355
摘要： Disclosed is a structure having a superhydrophobic and amphiphilic(oleophilic) surface and a fabrication method thereof. A polymer surface body disclosed herein may include high aspect ratio nanostructures on a surface thereof, wherein an aspect ration of the high aspect ratio nanostructure is 1 to 100, and may include a hydrophobic thin film on the high aspect ratio nanostructure. A method of fabricating a polymer surface body disclosed herein may include performing a surface modification treatment on a polymer to form a high aspect ratio nanostructure having an aspect ration of 1 to 100, and forming a hydrophobic thin film on a surface containing the nanostructures.
摘要翻译：公开了具有超疏水性和两亲性（亲油性）表面的结构及其制造方法。本文公开的聚合物表面体可以包括其表面上的高纵横比纳米结构，其中高纵横比纳米结构的方面比例为1至100，并且可以在高纵横比纳米结构上包括疏水性薄膜。制造本文公开的聚合物表面体的方法可以包括对聚合物进行表面改性处理以形成具有1至100的纵横比的高纵横比纳米结构，并在包含纳米结构的表面上形成疏水性薄膜。

4. 发明申请

US20230119739A1 METHOD OF COATING A PHOTORESIST AND APPARATUS FOR PERFORMING THE SAME 有权
公开(公告)号：US20230119739A1
公开(公告)日：2023-04-20
申请号：US17718648
申请日：2022-04-12
申请人： Sunghwan KIM , Ho-Young KIM , Seok HEO , Dongwook KIM , Sungjin KIM , Chaehung LIM , Jaekyung PARK , Jae Hong LEE , Junyoung LEE
发明人： Sunghwan KIM , Ho-Young KIM , Seok HEO , Dongwook KIM , Sungjin KIM , Chaehung LIM , Jaekyung PARK , Jae Hong LEE , Junyoung LEE
IPC分类号： G03F7/16 , G03F7/20
摘要： In a method of coating a photoresist, the photoresist may be provided to an upper surface of a rotating wafer. A hovering solution may be injected to an edge portion of the photoresist under a condition that the hovering solution may be hovered with respect to the edge portion of the photoresist with an air layer being interposed between the hovering solution and the edge portion of the photoresist to limit and/or prevent a bead of the photoresist from being formed on an edge portion of the upper surface of the wafer. Thus, the photoresist having a uniform thickness may be coated on the upper surface of the wafer to improve a yield of a semiconductor device by increasing an effective area of the edge portion of the wafer.

5. 发明申请

US20150097251A1 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20150097251A1
公开(公告)日：2015-04-09
申请号：US14569597
申请日：2014-12-12
申请人： Byoung-Ho KWON , Cheol KIM , Ho-Young KIM , Se-Jung PARK , Myeong-Cheol KIM , Bo-Kyeong KANG , Bo-Un YOON , Jae-Kwang CHOI , Si-Young CHOI , Suk-Hoon JEONG , Geum-Jung SEONG , Hee-Don JEONG , Yong-Joon CHOI , Ji-Eun HAN
发明人： Byoung-Ho KWON , Cheol KIM , Ho-Young KIM , Se-Jung PARK , Myeong-Cheol KIM , Bo-Kyeong KANG , Bo-Un YOON , Jae-Kwang CHOI , Si-Young CHOI , Suk-Hoon JEONG , Geum-Jung SEONG , Hee-Don JEONG , Yong-Joon CHOI , Ji-Eun HAN
IPC分类号： H01L27/088 , H01L21/8234 , H01L29/66
CPC分类号： H01L29/7853 , H01L21/30604 , H01L21/3065 , H01L21/3085 , H01L21/823431 , H01L21/823437 , H01L21/823481 , H01L21/823807 , H01L21/823814 , H01L21/823821 , H01L21/845 , H01L27/0886 , H01L27/1211 , H01L29/0673 , H01L29/42364 , H01L29/4238 , H01L29/49 , H01L29/66545 , H01L29/6656 , H01L29/66795 , H01L29/78 , H01L29/785
摘要： Semiconductor devices may include a semiconductor substrate with a first semiconductor fin aligned end-to-end with a second semiconductor with a recess between facing ends of the first and second semiconductor fins. A first insulator pattern is formed adjacent sidewalls of the first and second semiconductor fins and a second insulator pattern is formed within the first recess. The second insulator pattern may have a top surface higher than a top surface of the first insulator pattern, such as to the height of the top surface of the fins (or higher or lower). First and second gates extend along sidewalls and a top surface of the first semiconductor fin. A dummy gate electrode may be formed on the top surface of the second insulator. Methods for manufacture of the same and modifications are also disclosed.
摘要翻译：半导体器件可以包括具有第一半导体鳍片的半导体衬底，第一半导体鳍片端对端与第二半导体对准，第二半导体在第一和第二半导体鳍片的相对端之间具有凹陷。第一绝缘体图案形成在第一和第二半导体鳍片的相邻侧壁附近，并且在第一凹部内形成第二绝缘体图案。第二绝缘体图案可以具有高于第一绝缘体图案的顶表面的顶表面，例如高于鳍片（或更高或更低）的顶表面的高度。第一和第二栅极沿第一半导体鳍片的侧壁和顶表面延伸。可以在第二绝缘体的顶表面上形成伪栅电极。还公开了其制造方法和修改方案。

6. 发明申请

US20120152460A1 TEST MASK SET AND MASK SET 审中-公开
标题翻译：测试面膜设置和面膜设置
公开(公告)号：US20120152460A1
公开(公告)日：2012-06-21
申请号：US13238308
申请日：2011-09-21
申请人： Ho-Young KIM , Seung-Jae LEE , Bo-Un YOON
发明人： Ho-Young KIM , Seung-Jae LEE , Bo-Un YOON
IPC分类号： C23F1/08
CPC分类号： G03F1/50 , G03F1/44 , H01L21/28 , H01L29/165 , H01L29/66545 , H01L29/66628
摘要： A test mask set includes a first test mask having a plurality of gate pattern areas disposed therein, each of the plurality of gate pattern areas having one or more gate patterns; and a second test mask having a plurality of active pattern areas disposed therein, each of the plurality of active pattern areas having one or more active patterns. The gate patterns formed in different areas among the plurality of gate pattern areas differ in at least one of a gate spacing or a gate width. The active patterns formed in different areas among the plurality of active pattern areas differ in at least one of an active spacing or an active width
摘要翻译：测试掩模组包括第一测试掩模，其中设置有多个栅极图案区域，多个栅极图案区域中的每一个具有一个或多个栅极图案; 以及设置在其中的多个有源图案区域的第二测试掩模，所述多个有源图案区域中的每一个具有一个或多个活动图案。形成在多个栅极图案区域中的不同区域中的栅极图案在栅极间隔或栅极宽度中的至少一个方面不同。形成在多个有源图案区域中的不同区域中的活动图案在有效间隔或有效宽度中的至少一个方面不同

7. 发明申请

US20100176736A1 METHOD OF DRIVING A LIGHT SOURCE, LIGHT SOURCE ASSEMBLY FOR PERFORMING THE METHOD, AND LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME 失效
标题翻译：驱动光源的方法，用于执行该方法的光源组件和具有该光源的液晶显示装置
公开(公告)号：US20100176736A1
公开(公告)日：2010-07-15
申请号：US12362939
申请日：2009-01-30
申请人： Jong-Jae LEE , Hyeon-Yong JANG , Ho-Young KIM , Hyung-Ku KANG
发明人： Jong-Jae LEE , Hyeon-Yong JANG , Ho-Young KIM , Hyung-Ku KANG
IPC分类号： H05B37/02
CPC分类号： H05B41/2855 , Y02B20/186
摘要： A method of driving a light source includes; converting an externally supplied direct current voltage into a first alternating current voltage, boosting the first alternating current voltage to a second alternating current voltage having a higher voltage than the first alternating current voltage, turning on the light source using the second alternating current voltage, detecting an arc noise detection voltage by adding arc noise generated from a high voltage terminal of the light source and arc noise generated from a low voltage terminal of the light source, and blocking the high voltage from being provided to the light source based on the detected arc noise detection voltage.
摘要翻译：驱动光源的方法包括：将外部供应的直流电压转换成第一交流电压，将第一交流电压升压到具有比第一交流电压更高的电压的第二交流电压，使用第二交流电压接通光源，检测通过添加从光源的高电压端子产生的电弧噪声和从光源的低电压端子产生的电弧噪声，并且基于检测的电弧阻挡高电压而被提供给光源的电弧噪声检测电压噪声检测电压。

8. 发明申请

US20100124817A1 METHOD OF FABRICATING SELF-ALIGNED CONTACT PAD USING CHEMICAL MECHANICAL POLISHING PROCESS 有权
标题翻译：使用化学机械抛光工艺制作自对准接触垫的方法
公开(公告)号：US20100124817A1
公开(公告)日：2010-05-20
申请号：US12694715
申请日：2010-01-27
申请人： Ho-Young KIM , Chang-Ki HONG , Bo-Un YOON , Joon-Sang PARK
发明人： Ho-Young KIM , Chang-Ki HONG , Bo-Un YOON , Joon-Sang PARK
IPC分类号： H01L21/3213 , H01L21/28
CPC分类号： H01L21/76897 , H01L21/7684 , H01L27/10873 , H01L27/10885
摘要： A method of fabricating a self-aligned contact pad (SAC) includes forming stacks of a conductive line and a capping layer on a semiconductor substrate, spacers covering sidewalls of the stacks, and an insulation layer filling gaps between the stacks and exposing the top of the capping layer, etching the capping layer to form damascene grooves, forming a plurality of first etching masks with a material different from that of the capping layer to fill the damascene grooves without covering the top of the insulation layer, and forming a second etching mask having an opening region that exposes some of the first etching masks and a portion of the insulation layer located between the first etching masks. The method further includes etching the portion of the insulation layer exposed by the opening region using the first and second etching masks to form a plurality of opening holes, removing the second etching mask, forming a conductive layer filling the opening holes to cover the remaining first etching masks and performing a chemical mechanical polishing (CMP) process on the conductive layer using the capping layer as a polishing end point to remove the first etching masks such that a plurality of SAC pads separated from each other are formed that fill the opening holes.
摘要翻译：一种制造自对准接触焊盘（SAC）的方法包括在半导体衬底上形成导电线和覆盖层的叠层，覆盖堆叠的侧壁的间隔物和填充堆叠之间的间隙的绝缘层，覆盖层，蚀刻覆盖层以形成镶嵌槽，用不同于覆盖层的材料形成多个第一蚀刻掩模以填充镶嵌槽而不覆盖绝缘层的顶部，以及形成第二蚀刻掩模具有暴露一些第一蚀刻掩模的开口区域和位于第一蚀刻掩模之间的绝缘层的一部分。该方法还包括使用第一和第二蚀刻掩模蚀刻由开口区域暴露的绝缘层的部分，以形成多个开孔，去除第二蚀刻掩模，形成填充开孔的导电层以覆盖剩余的第一蚀刻掩模并使用覆盖层作为抛光终点在导电层上进行化学机械抛光（CMP）工艺，以去除第一蚀刻掩模，从而形成填充开孔的彼此分离的多个SAC焊盘。

9. 发明申请

US20170148979A1 METHOD OF FORMING MAGNETIC PATTERNS, AND METHOD OF MANUFACTURING MAGNETIC MEMORY DEVICES 审中-公开
公开(公告)号：US20170148979A1
公开(公告)日：2017-05-25
申请号：US15259198
申请日：2016-09-08
申请人： Ho-Young KIM , Jin-Hye BAE , Hoon HAN , Won-Jun LEE , Chang-Kyu LEE , Geun-Joo BAEK , Jung-Ig JEON
发明人： Ho-Young KIM , Jin-Hye BAE , Hoon HAN , Won-Jun LEE , Chang-Kyu LEE , Geun-Joo BAEK , Jung-Ig JEON
IPC分类号： H01L43/08 , H01L27/22 , G11C11/16 , H01L43/10 , H01L43/12 , H01L43/02
CPC分类号： H01L43/08 , G11C11/161 , H01L27/228 , H01L43/02 , H01L43/10 , H01L43/12
摘要： A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式