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    • 2. 发明授权
    • Bipolar transistors with high voltage MOS transistors in a single
substrate
    • 在单个衬底中具有高压MOS晶体管的双极晶体管
    • US5229308A
    • 1993-07-20
    • US878141
    • 1992-05-04
    • Tuan A. VoMohamad M. MojaradiSteven A. Buhler
    • Tuan A. VoMohamad M. MojaradiSteven A. Buhler
    • H01L21/8249
    • H01L21/8249Y10S148/009
    • A method of manufacturing a semiconductor device having a bipolar transistor for ordinary logic operation, as well as a high voltage MOS transistor which are provided in a single semiconductor substrate. The process includes the steps of making high voltage MOS transistors which comprises the steps of n-well fabrication, first drift region fabrication, second drift region fabrication, source and drain contact region fabrication and making bipolar transistors within the same silicon substrate as the high voltage MOS transistors which includes the step of base region fabrication where the steps for fabricating the second drift region of the high voltage MOS transistor and the base region of the bipolar transistor are combined so that both regions are created simultaneously.
    • 一种用于普通逻辑运算的半导体器件的制造方法以及设置在单个半导体衬底中的高压MOS晶体管。 该方法包括制造高电压MOS晶体管的步骤,其包括以下步骤:n阱制造,第一漂移区制造,第二漂移区制造,源极和漏极接触区域制造以及在与高电压相同的硅衬底内制造双极晶体管 MOS晶体管包括基极区制造步骤,其中组合用于制造高压MOS晶体管的第二漂移区和双极晶体管的基极区的步骤,使得两个区域同时产生。