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    • 1. 发明授权
    • Electroplating method
    • 电镀法
    • US09376758B2
    • 2016-06-28
    • US13311020
    • 2011-12-05
    • Shingo YasudaFumio KuriyamaMasashi ShimoyamaMizuki NagaiYusuke Tamari
    • Shingo YasudaFumio KuriyamaMasashi ShimoyamaMizuki NagaiYusuke Tamari
    • C25D5/18C25D7/12
    • C25D5/18C25D7/123
    • An electroplating method can securely and efficiently fill a plated metal into deep high-aspect ratio vias in a bottom-up manner without producing defects in the plated metal. The electroplating method includes: immersing a substrate, having vias formed in a surface, and an anode in a plating solution in a plating tank, the anode being disposed opposite the surface of the substrate; and intermittently passing a plating current at a constant current value between the substrate and the anode in such a manner that the supply and the stop of the plating current are repeated, and that the proportion of a current supply time during which the plating current is supplied increases with the progress of plating, thereby filling a plated metal into the vias.
    • 电镀方法可以以自下而上的方式可靠且有效地将电镀金属填充到深高纵横比的通孔中,而不会在电镀金属中产生缺陷。 电镀方法包括:在基板的表面上设置阳极,将具有在表面中形成的通孔的基板和阳极浸入电镀槽中的电镀液中; 并以这样的方式间歇地通过基板和阳极之间的恒定电流值的电镀电流,使得电镀电流的供应和停止重复,并且提供电镀电流的电流供应时间的比例 随着电镀的进行而增加,从而将电镀金属填充到通孔中。
    • 2. 发明申请
    • ELECTROPLATING METHOD
    • 电镀方法
    • US20120255864A1
    • 2012-10-11
    • US13439937
    • 2012-04-05
    • Mizuki NagaiYusuke TamariShingo Yasuda
    • Mizuki NagaiYusuke TamariShingo Yasuda
    • C25D5/34
    • C25D5/34C23C18/1653C23C18/54C25D3/38C25D5/40
    • An electroplating method is capable of reliably embedding via holes with a plated metal such as copper or the like when a substrate with a seed layer of a metal having a greater ionization tendency than hydrogen is electroplated using an acidic plating solution such as a copper sulfate plating solution. The electroplating method including preparing a substrate having via holes covered with a first metal, which has a greater ionization tendency than hydrogen, in a surface thereof, pretreating the substrate by immersing the substrate in a pretreatment solution in which a second metal that is more noble than the first metal or a salt thereof is dissolved, and then electroplating the surface of the substrate to embed the second metal or a third metal in the via holes.
    • 当使用具有比氢的电离倾向大的金属种子层的基板使用诸如硫酸铜电镀的酸性电镀液电镀时,电镀方法能够可靠地嵌入具有诸如铜等的电镀金属的通孔 解。 该电镀方法包括在其表面制备具有覆盖有比氢更大的离子化趋势的第一金属的通孔的基板,通过将基板浸入其中更高贵的第二金属的预处理溶液中来预处理基板 溶解第一金属或其盐,然后电镀基板的表面以将第二金属或第三金属嵌入通孔中。
    • 3. 发明申请
    • ELECTROPLATING METHOD
    • 电镀方法
    • US20120145552A1
    • 2012-06-14
    • US13313154
    • 2011-12-07
    • Mizuki NAGAIYusuke TamariShingo Yasuda
    • Mizuki NAGAIYusuke TamariShingo Yasuda
    • C25D5/02C25D5/34
    • C25D7/123C25D3/38C25D5/08C25D5/18C25D21/12H01L21/2885H01L21/76873H01L21/76898
    • An electroplating method includes: preparing a substrate having via holes formed in a surface; immersing the substrate in a pretreatment solution to carry out pretreatment of the substrate; immersing the substrate in a plating solution without applying a voltage between the substrate and an anode, thereby replacing the pretreatment solution in the via holes with the plating solution; carrying out first-step electroplating of the substrate while controlling the voltage, applied between the substrate and the anode, to be equal to or higher than a voltage which is necessary for an electric current, appropriate to fill a plated metal into the via holes, to flow stably between the substrate and the anode; and carrying outsecond-step electroplating of the substrate while controlling the electric current, flowing between the substrate and the anode, at an electric current appropriate to fill the plated metal into the via holes.
    • 电镀方法包括:制备具有形成在表面上的通孔的基板; 将基材浸渍在预处理溶液中以进行基材的预处理; 将基板浸没在电镀液中,而不在基板和阳极之间施加电压,从而用电镀液替代通孔中的预处理溶液; 在施加在基板和阳极之间的电压的同时进行基板的一步电镀等于或高于适于将电镀金属填充到通孔中的电流所需的电压, 在基板和阳极之间稳定地流动; 并且以适于将电镀金属填充到通孔中的电流来控制基板和阳极之间的电流的同时进行基板的第二阶段电镀。
    • 5. 发明授权
    • Benzamide derivatives
    • 苯甲酰胺衍生物
    • US5395832A
    • 1995-03-07
    • US104095
    • 1993-08-11
    • Yasuo ItoHideo KatoShingo YasudaNobuhiko IwasakiHiroyuki NishinoMakoto Takeshita
    • Yasuo ItoHideo KatoShingo YasudaNobuhiko IwasakiHiroyuki NishinoMakoto Takeshita
    • C07D211/58C07D451/04C07D451/14A61K31/46A61K31/44
    • C07D451/04C07D211/58C07D451/14
    • A benzamide derivative represented by the following formula: ##STR1## wherein R.sup.1 represents a hydrogen atom or a lower alkanoyl group; R.sup.2 represents a hydrogen atom or a halogen atom; R.sup.3 represents a lower alkoxy group; R.sup.4 represents a hydrogen atom or a lower alkyl group; R.sup.5 represents a hydrogen atom, a lower alkyl group, or a lower alkoxy group; A represents C.sub.1 -C.sub.7 alkylene group which may optionally be substituted with a lower alkyl group; X represents a methylene group, an oxygen atom, or a sulfur atom; m represents an integer of from 0 to 3; n represents an integer of from 0 to 3; and p represents an integer of from 0 to 2 and a pharmacologically acceptable salt thereof is provided. These compounds are useful since they have gastrointestinal stimulating activity, and a pharmaceutical composition comprising said compound is useful for the treatment of gastrointestinal diseases.
    • PCT No.PCT / JP92 / 00134 Sec。 371日期:1993年8月11日 102(e)日期1993年8月11日PCT提交1992年2月12日PCT公布。 公开号WO92 / 14705 日本9月3日,1992。一种苯甲酰胺衍生物,由下式表示:其中R1表示氢原子或低级烷酰基; R2表示氢原子或卤素原子; R3表示低级烷氧基; R4代表氢原子或低级烷基; R5表示氢原子,低级烷基或低级烷氧基; A表示可以被低级烷基取代的C1-C7亚烷基; X表示亚甲基,氧原子或硫原子; m表示0〜3的整数, n表示0〜3的整数, p表示0〜2的整数,并且其药理学上可接受的盐。 这些化合物是有用的,因为它们具有胃肠道刺激活性,并且包含所述化合物的药物组合物可用于治疗胃肠道疾病。
    • 9. 发明授权
    • Drawing machine and game apparatus using the same
    • 绘图机和游戏机使用相同
    • US08221235B2
    • 2012-07-17
    • US12084328
    • 2006-10-27
    • Nobuhiro GotoKazuhiro KusudaDaisuke SatoShingo YasudaYuichi Nakahara
    • Nobuhiro GotoKazuhiro KusudaDaisuke SatoShingo YasudaYuichi Nakahara
    • A63F9/24
    • G07F17/3276G07F17/32G07F17/3286
    • The present invention provides a drawing machine and a game apparatus using the same by which it is easier to give the participants of the drawing an impression like drawing is carried out fairly when the computer drawing in which a winning-probability of each of drawing-objects is changed is carried out.A drawing machine for determining a winning-object from a plurality of drawing-objects includes: a winning-probability data storage unit for storing winning-probability data showing respective winning-probabilities of the plurality of drawing-objects; a drawing unit for carrying out a drawing in accordance with the winning-probability of each of the drawing-objects determined by the winning-probability data stored in the winning-probability data storage unit and determining a winning-object from the plurality of drawing-objects; a winning-probability data changing unit for changing the winning-probability data stored in the winning-probability data storage unit; a winning-probability image displaying unit for displaying a winning-probability image showing the winning-probability of each of the drawing-objects determined by the winning-probability data stored in the winning-probability data storage unit; and a winning-probability displaying control unit for changing the winning-probability image displayed on the winning-probability image displaying unit, when the winning-probability data changing unit changes the winning-probability data, so as to correspond to the changed winning-probability data.
    • 本发明提供了一种绘图机和使用该绘图机的游戏装置,其中当每个绘图对象的获胜概率的计算机绘图时,更容易给予绘图的参与者像绘图的印象 被改变了。 用于从多个绘图对象确定获胜对象的绘图机包括:获胜概率数据存储单元,用于存储显示多个绘图对象的各个获胜概率的获胜概率数据; 绘制单元,用于根据存储在获胜概率数据存储单元中的获胜概率数据确定的每个绘制对象的获胜概率执行绘图,并从多个绘制单元确定获胜对象, 物体 获胜概率数据改变单元,用于改变存储在获胜概率数据存储单元中的获胜概率数据; 获胜概率图像显示单元,用于显示表示由获胜概率数据存储单元中存储的获胜概率数据确定的每个绘图对象的获胜概率的获胜概率图像; 以及获胜概率显示控制单元,用于当获胜概率数据改变单元改变获胜概率数据时,改变在获胜概率图像显示单元上显示的获胜概率图像,以便对应于改变的获胜概率 数据。