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1. 发明授权

US5803444A Coiled wave spring and production method thereof 失效
标题翻译：卷簧及其制作方法
公开(公告)号：US5803444A
公开(公告)日：1998-09-08
申请号：US812004
申请日：1997-03-05
申请人： Minoru Shibuya , Masayoshi Shimoseki , Minoru Sawayama , Seiichi Inukai
发明人： Minoru Shibuya , Masayoshi Shimoseki , Minoru Sawayama , Seiichi Inukai
IPC分类号： F16F1/02 , F16F1/32 , F16F1/06
CPC分类号： F16F1/328 , Y10T29/49609
摘要： A coiled wave spring obtained by winding a corrugated wire into a coil shape, wherein mutually overlapping top portions and mutually overlapping base portions of the spring are in mutual contact and predetermined gaps are defined between mutually overlapping slope portions which connect the top and base portions, the first loop of the spring, that is, on the upper side, and the second loop, that is, on the lower side, are in mutual contact in an axial direction thereof only between the top portions and between the base portions, and the gaps are defined between the slope portions to prevent mutual contact. When the spring receives a load and undergoes deformation, the top portions and the base portions come into mutual contact, respectively, but hardly generate friction. Since the gaps are defined between the mutually overlapping slope portions, friction does not occur at these portions, either.
摘要翻译：通过将波纹线卷绕成线圈形状而获得的线圈波形弹簧，其中弹簧的相互重叠的顶部和相互重叠的基部相互接触，并且在连接顶部和底部的相互重叠的倾斜部分之间限定预定的间隙，弹簧的第一回路，即在上侧，第二回路，即下侧，仅在顶部之间和基部之间在其轴向方向上相互接触，并且，在斜坡部分之间限定间隙以防止相互接触。当弹簧受到载荷并发生变形时，顶部和基部分别相互接触，但几乎不产生摩擦。由于在相互重叠的倾斜部分之间限定了间隙，因此也不会在这些部分产生摩擦。

2. 发明授权

US09310525B2 Antireflection film and optical device 有权
标题翻译：防反射膜和光学装置
公开(公告)号：US09310525B2
公开(公告)日：2016-04-12
申请号：US13434111
申请日：2012-03-29
申请人： Minoru Shibuya , Terufusa Kunisada , Naoki Yamashita
发明人： Minoru Shibuya , Terufusa Kunisada , Naoki Yamashita
IPC分类号： B32B3/26 , B32B7/02 , G02B1/11
CPC分类号： G02B1/11 , Y10T428/24942
摘要： An object of the present invention is to provide an antireflection film and an optical device having excellent antireflection characteristics against a light beam having a wide wavelength range at a wide range of an incident angle, and also having practically sufficient durability. To achieve the above object, the present invention adopts an antireflection film having an optical two-layer structure composed of an intermediate layer provided on a base material and a low refractive index layer provided on a surface of the intermediate layer, wherein the low refractive index layer is a layer obtained by binding hollow silica by a binder, a refractive index n(1) thereof is between 1.15 and 1.24 inclusive, and a refractive index n(2) of the intermediate layer satisfies a relation in the expression (1) below assuming a refractive index of the base material n(sub). n(1)×√{square root over (n(sub))}×0.930≦n(2)≦n(1)×√{square root over (n(sub))}×0.985 (1).
摘要翻译：本发明的目的是提供一种抗反射膜和对具有宽波长范围的光束在入射角宽的范围内具有优异的防反射特性的光学装置，并且还具有实际上足够的耐久性。为了实现上述目的，本发明采用具有由设置在基材上的中间层和设置在中间层的表面上的低折射率层构成的光学二层结构的抗反射膜，其中低折射率层是通过粘合剂结合中空二氧化硅而获得的层，其折射率n（1）在1.15和1.24之间，并且中间层的折射率n（2）满足以下表达式（1）中的关系假设基材n（sub）的折射率。 n（1）×√{平方根（n（sub））}×0.930＆nlE; n（2）＆nlE; n（1）×√{平方根（n（sub））}×0.985（1）。

3. 发明申请

US20120229906A1 Anti-Reflection Optical Element and Method for Manufacturing Anti-Reflection Optical Element 审中-公开
标题翻译：防反射光学元件及制造防反射光学元件的方法
公开(公告)号：US20120229906A1
公开(公告)日：2012-09-13
申请号：US13416350
申请日：2012-03-09
申请人： Masaaki Miyahara , Terufusa Kunisada , Minoru Shibuya
发明人： Masaaki Miyahara , Terufusa Kunisada , Minoru Shibuya
IPC分类号： G02B5/00 , C23C16/44 , B05D5/06 , B82Y20/00
CPC分类号： G02B1/118 , B32B3/30 , B32B27/281 , B32B27/286 , B32B27/308 , B32B27/325 , B32B27/365 , B32B2551/00 , B82Y20/00 , G02B2207/101
摘要： An object of the present invention is to provide an anti-reflection optical element excellent in durability in the environment high-temperature and high-humidity and scratch resistance while maintaining the anti-reflection performance of a concave-convex nanostructure.To achieve the object, an anti-reflection optical element 1 comprising a concave-convex nanostructure 20 that reduces reflection of incident light on an optical surface 11 of a base optical element 1 comprising a cover layer 30 made of a light-transmitting material that covers an outer surface of the concave-convex nanostructure 20, wherein a peak of convex portion 21 of the concave-convex nanostructure 20 is covered with the cover layer 30 in the state where a space 40 is provided between the cover layer 30 and concave portions 22 of the concave-convex nanostructure 20 is employed.
摘要翻译：本发明的目的在于提供一种在保持防凹凸型纳米结构的抗反射性能的同时，在高温，高湿，耐划伤的环境下耐久性优异的抗反射光学元件。为了实现该目的，提供一种抗反射光学元件1，其包括凹入纳米结构20，其减少入射光在基底光学元件1的光学表面11上的反射，该基底光学元件1包括覆盖层30，覆盖层30覆盖凹凸状纳米结构体20的外表面，其中，在覆盖层30与凹部22之间设置空间40的状态下，覆盖层30覆盖凹凸状纳米结构体20的凸部21的峰的凹凸纳米结构体20。

4. 发明申请

US20120251803A1 Antireflection Film and Optical Device 有权
标题翻译：防反射膜和光学装置
公开(公告)号：US20120251803A1
公开(公告)日：2012-10-04
申请号：US13434111
申请日：2012-03-29
申请人： Minoru Shibuya , Terufusa Kunisada , Naoki Yamashita
发明人： Minoru Shibuya , Terufusa Kunisada , Naoki Yamashita
IPC分类号： B32B3/26 , B32B7/02
CPC分类号： G02B1/11 , Y10T428/24942
摘要： An object of the present invention is to provide an antireflection film and an optical device having excellent antireflection characteristics against a light beam having a wide wavelength range at a wide range of an incident angle, and also having practically sufficient durability. To achieve the above object, the present invention adopts an antireflection film having an optical two-layer structure composed of an intermediate layer provided on a base material and a low refractive index layer provided on a surface of the intermediate layer, wherein the low refractive index layer is a layer obtained by binding hollow silica by a binder, a refractive index n(1) thereof is between 1.15 and 1.24 inclusive, and a refractive index n(2) of the intermediate layer satisfies a relation in the expression (1) below assuming a refractive index of the base material n(sub). n(1)×√{square root over (n(sub))}×0.930≦n(2)≦n(1)×√{square root over (n(sub))}×0.985 (1)
摘要翻译：本发明的目的是提供一种抗反射膜和对具有宽波长范围的光束在入射角宽的范围内具有优异的防反射特性的光学装置，并且还具有实际上足够的耐久性。为了实现上述目的，本发明采用具有由设置在基材上的中间层和设置在中间层的表面上的低折射率层构成的光学二层结构的抗反射膜，其中低折射率层是通过粘合剂结合中空二氧化硅而获得的层，其折射率n（1）在1.15和1.24之间，并且中间层的折射率n（2）满足以下表达式（1）中的关系假设基材n（sub）的折射率。 n（1）×√{平方根（n（sub））}×0.930＆nlE; n（2）＆nlE; n（1）×√{平方根（n（sub））}×0.985（1）

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