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1. 发明授权

US5631112A Multiple exposure method for photo-exposing photosensitive layers upon high step height topography substrate layers 失效
标题翻译：在高阶高度地形基底层上曝光感光层的多重曝光方法
公开(公告)号：US5631112A
公开(公告)日：1997-05-20
申请号：US726033
申请日：1996-10-07
申请人： Ming-Horn Tsai , Bin Liu , Shih-Yin Lan
发明人： Ming-Horn Tsai , Bin Liu , Shih-Yin Lan
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70475 , G03F7/2022
摘要： A method for photo-exposing a blanket conformal photosensitive layer upon a high step height topography substrate layer. There is first provided a high step height topography substrate layer having a blanket conformal photosensitive layer formed thereupon. The high step height topography substrate layer has a first region having a first step height separated from a third region having a third step height by a second region having a second step height. The second step height is intermediate to the first step height and the third step height. The blanket conformal photosensitive layer is photo-exposed to form a first pattern upon the first region and the second region through use of a first reticle and a first photo-exposure condition. The first photo-exposure condition provides a first depth of focus suitable for at least the first region. In a separate process step, the blanket conformal photosensitive layer is photo-exposed to form a second pattern upon the second region and the third region through use of a second reticle and a second photo-exposure condition. The second photo-exposure condition provides a second depth of focus suitable for at least the third region. The first pattern upon the second region and the second pattern upon the second region overlap.
摘要翻译：一种用于在高阶高度地形衬底层上曝光毯状保形感光层的方法。首先提供了具有在其上形成的覆盖层保形感光层的高阶高度地形基底层。高台阶高度地形基底层具有第一区域，第一区域具有与具有第三台阶高度的第三区域分离的第一台阶高度与具有第二台阶高度的第二区域。第二步高度处于第一步高度和第三步高度的中间。通过使用第一掩模版和第一光曝光条件，在第一区域和第二区域上曝光毯状保形感光层以形成第一图案。第一曝光条件提供适于至少第一区域的第一焦点深度。在单独的工艺步骤中，通过使用第二掩模版和第二曝光条件，在第二区域和第三区域上曝光毯状保形光敏层以形成第二图案。第二曝光条件提供适于至少第三区域的第二焦点深度。第二区域上的第一图案和第二区域上的第二图案重叠。

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