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1. 发明授权

US06359125B1 Process for preparing peptide nucleic acid probe using polymeric photoacid generator 失效
标题翻译：使用聚合光致酸发生器制备肽核酸探针的方法
公开(公告)号：US06359125B1
公开(公告)日：2002-03-19
申请号：US09762611
申请日：2001-02-07
申请人： Min-Hwan Kim , Do-Yun Kim , Bong-Seok Moon , Jae-Chan Park , Young-Hee Kim , Seung-Joo Seo
发明人： Min-Hwan Kim , Do-Yun Kim , Bong-Seok Moon , Jae-Chan Park , Young-Hee Kim , Seung-Joo Seo
IPC分类号： C12Q168
CPC分类号： B82Y30/00 , B01J2219/00432 , B01J2219/00497 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00675 , B01J2219/00711 , B01J2219/00729 , C07B2200/11 , C07K14/003 , C40B50/14 , C40B60/14 , Y02P20/55
摘要： The present invention relates to a process for preparing arrays of oligopeptide nucleic acid probes immobilized on a solid matrix by employing polymeric photoacid generator. Arrays of peptide nucleic acid probes of the invention are prepared by the steps of: (i) derivatizing the surface of a solid matrix with aminoalkyloxysilane in alcohol and attaching a linker with acid-labile protecting group on the solid matrix; (ii) coating the solid matrix with polymeric photoacid generator (PAG); (iii) exposing the solid matrix thus coated to light to generate acid for eliminating acid-labile protecting group; (iv) washing the solid matrix with alkaline solution or organic solvent and removing residual polymeric photoacid generator; and, (v) attaching a monomeric peptide nucleic acid with acid-labile protecting group to the solid matrix, and repeating the previous Steps of (ii) to (v). In accordance with the present invention, neutral peptide nucleic acid probes, as the promising substitute for conventional negatively-charged oligonucleotide probes, can be prepared by employing polymeric photoacid generator in a simple and efficient manner, while overcoming the problems confronted in the prior art DNA chip fabrication using PR system and PPA system.
摘要翻译：本发明涉及通过使用聚合光致酸发生剂制备固定在固体基质上的寡肽核酸探针阵列的方法。通过以下步骤制备本发明的肽核酸探针的阵列：（i）用醇中的氨基烷氧基硅烷将固体基质的表面衍生化，并在固体基质上连接具有酸不稳定保护基的连接体; （ii）用聚合物光酸发生剂（PAG）涂覆固体基质; （iii）将由此涂覆的固体基质曝光以产生酸以消除酸不稳定保护基团; （iv）用碱性溶液或有机溶剂洗涤固体基质，除去残留的聚合光致酸发生剂; 和（v）将具有酸不稳定保护基团的单体肽核酸连接到固体基质上，并重复（ii）至（v）的先前步骤。根据本发明，作为常规带负电荷的寡核苷酸探针的前景替代物的中性肽核酸探针可以通过以简单有效的方式使用聚合光致酸发生剂来制备，同时克服现有技术DNA中所面临的问题使用PR系统和PPA系统的芯片制造。

2. 发明授权

US06660479B2 Process for preparing peptide nucleic acid probe using polymeric photoacid generator 失效
公开(公告)号：US06660479B2
公开(公告)日：2003-12-09
申请号：US10073071
申请日：2002-02-07
申请人： Min-Hwan Kim , Do-Yun Kim , Bong-Seok Moon , Jae-Chan Park , Young-Hee Kim , Seung-Joo Seo
发明人： Min-Hwan Kim , Do-Yun Kim , Bong-Seok Moon , Jae-Chan Park , Young-Hee Kim , Seung-Joo Seo
IPC分类号： C12Q168
CPC分类号： B82Y30/00 , B01J2219/00432 , B01J2219/00497 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00637 , B01J2219/00659 , B01J2219/00675 , B01J2219/00711 , B01J2219/00729 , C07B2200/11 , C07K14/003 , C40B50/14 , C40B60/14 , Y02P20/55
摘要： Disclosed is a process for preparing arrays of oligopeptide nucleic acid probes immobilized on a solid matrix by employing polymeric photoacid generator. Arrays of peptide nucleic acid probes of the invention are prepared by the steps of: (i) derivatizing the surface of a solid matrix with aminoalkyloxysilane in alcohol and attaching a linker with acid-labile protecting group on the solid matrix; (ii) coating the solid matrix with polymeric photoacid generator(PAG); (iii) exposing the solid matrix thus coated to light to generate acid for eliminating acid-labile protecting group; (iv) washing the solid matrix with alkaline solution or organic solvent and removing residual polymeric photoacid generator; and, (v) attaching a monomeric peptide nucleic acid with acid-labile protecting group to the solid matrix, and repeating the previous Steps of (ii) to (v). In accordance with the present invention, neutral peptide nucleic acid probes, as the promising substitute for conventional negatively-charged oligonucleotide probes, can be prepared by employing polymeric photoacid generator in a simple and efficient manner, while overcoming the problems confronted in the prior art DNA chip fabrication using PR system and PPA system.

3. 再颁专利

USRE42299E1 Polymer comprising terminal sulfonic acid group, and polymer electrolyte and fuel cell using the same 有权
标题翻译：包含末端磺酸基团的聚合物和使用其的聚合物电解质和燃料电池
公开(公告)号：USRE42299E1
公开(公告)日：2011-04-19
申请号：US12787924
申请日：2010-05-26
申请人： Do-yun Kim , Min-ju Jeong , Myung-sup Jung , Bong-Seok Moon
发明人： Do-yun Kim , Min-ju Jeong , Myung-sup Jung , Bong-Seok Moon
IPC分类号： C08F8/18
CPC分类号： H01M8/1023 , C08F8/00 , C08F8/36 , C08F12/22 , C08F12/30 , C08F12/32 , C08G69/26 , C08G69/48 , C08G73/10 , C08G73/101 , C08G73/1039 , C08G73/1064 , C08G73/1067 , C08J5/2231 , C08J5/2256 , C08J2325/18 , C08J2377/06 , C08J2379/08 , H01M8/1027 , H01M8/103 , H01M2300/0082 , C08F112/14
摘要： The present invention is related to a polymer comprising terminal sulfonic acid groups, which has a high ionic conductivity and good structural stability, does not decompose even under low humidity conditions, and is inexpensive to produce. Furthermore, the present invention is related to a polymer electrolyte and a fuel cell using the same. The polymer of the present invention has a substituent comprising a terminal sulfonic acid group comprising Formula (1) at a side chain: where n may be a number in the range of about 1 to about 5.
摘要翻译：本发明涉及具有高离子导电性和良好的结构稳定性的末端磺酸基的聚合物，即使在低湿度条件下也不分解，制造成本低廉。此外，本发明涉及聚合物电解质和使用其的燃料电池。本发明的聚合物具有包含在侧链包括式（1）的末端磺酸基团的取代基：其中n可以是约1至约5的数值。

4. 发明授权

US06395450B1 Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US06395450B1
公开(公告)日：2002-05-28
申请号：US09583547
申请日：2000-06-01
申请人： Jae-Geun Park , Chang-Ho Noh , Bong-Seok Moon , Sang-Kyun Lee , Seong-Yun Moon
发明人： Jae-Geun Park , Chang-Ho Noh , Bong-Seok Moon , Sang-Kyun Lee , Seong-Yun Moon
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/122
摘要： A positive working photoresist composition includes at least one thermally cross-linkable photoacid generator, a binder polymer, and a solvent in which the binder polymer and photoacid generator are dissolved. The photoacid generator is represented by the general formula (I): wherein X is methanesulfonate, trifluoromethanesulfonate, 4-toluenesulfonate, 10-camphorsulfonate, cyclohexane sulfamate, perfluoro-1-butanesulfonate, perfluorooctanesulfonate, F, Cl, Br, SbF6, BF4, PF4, or AsF6, R1 is hydrogen or methyl, and R2 is alkyl of C1-10 or vinyloxyethyl. The binder polymer represented by the general formula (II): wherein R1 and R2 are different from each other and are selected from the group consisting of acid labile groups, hydrogen, methoxy, ethoxy, n-butoxy and t-butoxy, R3 is hydrogen or alkyl of C1-10, R4 is hydrogen or methyl, 0
摘要翻译：正性光致抗蚀剂组合物包括至少一种可热交联的光酸产生剂，粘合剂聚合物和其中溶解有粘合剂聚合物和光致酸产生剂的溶剂。光致酸发生剂由通式（I）表示：其中X为甲磺酸酯，三氟甲磺酸酯，4-甲苯磺酸酯，10-樟脑磺酸酯，环己烷氨基磺酸酯，全氟-1-丁磺酸酯，全氟辛烷磺酸酯，F，Cl，Br，SbF6，BF4，PF4，或AsF 6，R 1是氢或甲基，R 2是C 1-10的烷基或乙烯氧基乙基。由通式（II）表示的粘合剂聚合物：其中R1和R2彼此不同，并且选自酸不稳定基团，氢，甲氧基，乙氧基，正丁氧基和叔丁氧基，R 3是氢或C 1-10的烷基，R 4是氢或甲基，0 <0 <= 0,1 <= p <= 0.7,0 < q <= 0.7，0 <= r <= 0.3，其中p，q和r不同时为0。

5. 发明申请

US20080166656A1 Positive Photoresist Composition 有权
标题翻译：正光致抗蚀剂组成
公开(公告)号：US20080166656A1
公开(公告)日：2008-07-10
申请号：US11884185
申请日：2005-12-21
申请人： Bong-Seok Moon , Hyo-Jeong Kim , Jin-Gon Kim , Yang-Hyun Yoo , Min-Ji Kim , Mi-Kyeong Jeong , Kwon-Yil Yoo , Nak-Chil Jung , Seon-Ho Kim
发明人： Bong-Seok Moon , Hyo-Jeong Kim , Jin-Gon Kim , Yang-Hyun Yoo , Min-Ji Kim , Mi-Kyeong Jeong , Kwon-Yil Yoo , Nak-Chil Jung , Seon-Ho Kim
IPC分类号： G03F7/004
CPC分类号： G03F7/0233 , G03F7/0751 , G03F7/40 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.
摘要翻译：公开了用于液晶显示器的正性光致抗蚀剂组合物。本发明的正性光致抗蚀剂组合物包含3〜50重量％的具有一定结构的粘合剂树脂，2〜40重量％的光活性化合物和10〜94重量％的有机溶剂。根据本发明的正性光致抗蚀剂组合物可用于形成液晶显示器，金属图案化，凸块，孔钻和UV外涂层的有机绝缘体的图案，因为它具有良好的基本物理性能，例如UV透射率，膜保留，图案稳定性，耐化学性等，以及优异的耐热性。

6. 发明授权

US07514203B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US07514203B2
公开(公告)日：2009-04-07
申请号：US11884185
申请日：2005-12-21
申请人： Bong-Seok Moon , Hyo-Jeong Kim , Jin-Gon Kim , Yang-Hyun Yoo , Min-Ji Kim , Mi-Kyeong Jeong , Kwon-Yil Yoo , Nak-Chil Jung , Seon-Ho Kim
发明人： Bong-Seok Moon , Hyo-Jeong Kim , Jin-Gon Kim , Yang-Hyun Yoo , Min-Ji Kim , Mi-Kyeong Jeong , Kwon-Yil Yoo , Nak-Chil Jung , Seon-Ho Kim
IPC分类号： G03C1/73 , G03F7/039
CPC分类号： G03F7/0233 , G03F7/0751 , G03F7/40 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.
摘要翻译：公开了用于液晶显示器的正性光致抗蚀剂组合物。本发明的正性光致抗蚀剂组合物包含3〜50重量％的具有一定结构的粘合剂树脂，2〜40重量％的光活性化合物和10〜94重量％的有机溶剂。根据本发明的正性光致抗蚀剂组合物可用于形成液晶显示器，金属图案化，凸块，孔钻和UV外涂层的有机绝缘体的图案，因为它具有良好的基本物理性能，例如UV透射率，膜保留，图案稳定性，耐化学性等，以及优异的耐热性。

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