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    • 1. 发明授权
    • Waveguide structure and related fabrication method
    • 波导结构及相关制造方法
    • US08655138B2
    • 2014-02-18
    • US13104440
    • 2011-05-10
    • Michal LipsonAlexander GondarenkoNicholas Sherwood
    • Michal LipsonAlexander GondarenkoNicholas Sherwood
    • G02B6/10G02B6/26G02B6/42
    • G02B6/136
    • A method for fabricating a waveguide structure (i.e., preferably an optical waveguide structure) uses a two mask process step sequence for forming a waveguide layer over a substrate. A first mask within the two mask step process sequence is used to etch the substrate to provide a pillar within the substrate. A second mask within the two mask process step sequence is self aligned to, and covers a top and at least a portion of the sidewalls of, the pillar. The second mask is used as a thermal oxidation mask that provides an optical waveguide layer from a top portion of the pillar that is separated from a thinned substrate derived from the substrate by a waveguide isolation layer formed from thermal oxidation of at least a bottom portion of the pillar. Under conditions of manufacturing economy, and as a result of the processing sequence, the waveguide layer is formed with a non-planar bottom surface including a valley in the bottom surface of the waveguide layer and the substrate is formed with a non-planar top surface including a peak in the top surface of the substrate that corresponds with the valley in the bottom surface of the waveguide layer.
    • 用于制造波导结构(即,优选地,光波导结构)的方法使用用于在衬底上形成波导层的两个掩模处理步骤序列。 使用两个掩模步骤处理序列内的第一掩模来蚀刻衬底以在衬底内提供柱。 两个掩模工艺步骤序列内的第二个掩模是自对准的并且覆盖了柱的顶部和侧壁的至少一部分。 第二掩模用作热氧化掩模,其从柱的顶部提供光波导层,其通过由至少底部的热氧化形成的波导隔离层与从基板衍生的薄化基板分离 支柱。 在制造经济条件下,作为加工顺序的结果,波导层形成有非平面底面,其包括在波导层的底表面中的谷部,并且基板形成有非平面顶表面 包括在与波导层的底表面中的谷相对应的衬底的顶表面中的峰。
    • 2. 发明申请
    • WAVEGUIDE STRUCTURE AND RELATED FABRICATION METHOD
    • 波形结构及相关制造方法
    • US20110280539A1
    • 2011-11-17
    • US13104440
    • 2011-05-10
    • Michal LipsonAlexander GondarenkoNicholas Sherwood
    • Michal LipsonAlexander GondarenkoNicholas Sherwood
    • G02B6/10C23F1/02
    • G02B6/136
    • A method for fabricating a waveguide structure (i.e., preferably an optical waveguide structure) uses a two mask process step sequence for forming a waveguide layer over a substrate. A first mask within the two mask step process sequence is used to etch the substrate to provide a pillar within the substrate. A second mask within the two mask process step sequence is self aligned to, and covers a top and at least a portion of the sidewalls of, the pillar. The second mask is used as a thermal oxidation mask that provides an optical waveguide layer from a top portion of the pillar that is separated from a thinned substrate derived from the substrate by a waveguide isolation layer formed from thermal oxidation of at least a bottom portion of the pillar. Under conditions of manufacturing economy, and as a result of the processing sequence, the waveguide layer is formed with a non-planar bottom surface including a valley in the bottom surface of the waveguide layer and the substrate is formed with a non-planar top surface including a peak in the top surface of the substrate that corresponds with the valley in the bottom surface of the waveguide layer.
    • 用于制造波导结构(即,优选地,光波导结构)的方法使用用于在衬底上形成波导层的两个掩模处理步骤序列。 使用两个掩模步骤处理序列内的第一掩模来蚀刻衬底以在衬底内提供柱。 两个掩模工艺步骤序列内的第二个掩模是自对准的并且覆盖了柱的顶部和侧壁的至少一部分。 第二掩模用作热氧化掩模,其从柱的顶部提供光波导层,其通过由至少底部的热氧化形成的波导隔离层与从基板衍生的薄化基板分离 支柱。 在制造经济条件下,作为加工顺序的结果,波导层形成有非平面底面,其包括在波导层的底表面中的谷部,并且基板形成有非平面顶表面 包括在与波导层的底表面中的谷相对应的衬底的顶表面中的峰。