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    • 7. 发明授权
    • X-ray inspection of ball contacts and internal vias
    • 球形触点和内部通孔的X射线检查
    • US06442234B1
    • 2002-08-27
    • US09677845
    • 2000-10-03
    • David B. MorkenEdward S. Alcid
    • David B. MorkenEdward S. Alcid
    • G01N2302
    • G01N23/04
    • A method for performing inspection of raised electrical contacts, such as BGA and flip-chip-type contacts, and associated underlying vias. An electrical or electronic device or component having a major surface is provided including an array of closely spaced apart BGA flip-chip-type raised contacts with respective underlying vias. An area-of-interest (AOI), including at least one BGA or flip-chip-type contact/via structure is selected. The row containing the AOI is isolated, by computed tomography imaging, via electrical testing, or by removal, for example, from the electrical or electronic device or component. The AOI is mounted on an X-ray transparent substrate; and X-ray transmission imaging of the AOI is performed to inspect the at least one BGA or flip-chip-type contact/via structure for the presence of misalignments, voids, and delaminations.
    • 用于执行诸如BGA和倒装芯片型触点之类的升高的电触点的检查方法以及相关的底部通孔。 提供具有主表面的电气或电子设备或部件,其包括具有相应底部通孔的紧密间隔开的BGA倒装芯片型凸起触头的阵列。 选择感兴趣区域(AOI),包括至少一个BGA或倒装片型接触/通孔结构。 包含AOI的行通过计算机断层扫描成像,通过电气测试或通过例如从电气或电子设备或部件移除来隔离。 AOI安装在X射线透明基板上; 并且进行AOI的X射线透射成像以检查至少一个BGA或倒装芯片型接触/通孔结构以存在不对准,空隙和分层的存在。