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    • 3. 发明申请
    • Device and Method for Vaporizing Temperature Sensitive Materials
    • 蒸发温度敏感材料的装置和方法
    • US20100206233A1
    • 2010-08-19
    • US12768312
    • 2010-04-27
    • Michael LongRandolph C. BrostJeremy M. GraceDennis R. FreemanNeil P. ReddenBruce E. Koppe
    • Michael LongRandolph C. BrostJeremy M. GraceDennis R. FreemanNeil P. ReddenBruce E. Koppe
    • C23C16/00
    • C23C14/243C23C14/12H01L51/001H01L51/0059H01L51/0077H01L51/0081
    • A device vaporizes organic materials onto a substrate surface to form a film. The device includes a vaporization apparatus to receive a quantity of organic material that can have one or more components each having a different vaporization temperature, the vaporization apparatus having a first region and a second region spaced from the first region; a cooling unit to actively cool the organic material in the first region so that each of the one or more organic components is maintained well below its vaporization temperature to reduce degradation of the organic material; heating unit to heat the second region of the vaporization apparatus above the vaporization temperature of each of the one or more organic components; and a metering unit having a permeable member to meter organic material at a controlled rate from the first region into the second region so that a thin cross section of the organic material is heated at a desired rate-dependent vaporization temperature, whereby organic material vaporizes and forms a film on the substrate surface.
    • 装置将有机材料蒸发到基材表面上以形成膜。 该装置包括一个蒸发装置,用于接收一定量的有机材料,该有机材料可以具有各自具有不同蒸发温度的一种或多种组分,该蒸发装置具有第一区域和与该第一区域间隔开的第二区域; 冷却单元,用于主动冷却第一区域中的有机材料,使得一种或多种有机组分中的每一种保持在低于其蒸发温度以降低有机材料的降解; 加热单元以将所述蒸发装置的所述第二区域加热到所述一个或多个有机组分中的每一个的蒸发温度之上; 以及计量单元,其具有以从第一区域到第二区域的受控速率计量有机材料的渗透构件,使得有机材料的薄横截面以期望的速率依赖性蒸发温度被加热,由此有机材料蒸发, 在基板表面上形成膜。
    • 4. 发明授权
    • Method for coating an organic layer onto a substrate in a vacuum chamber
    • 在真空室中将有机层涂布在基材上的方法
    • US07364772B2
    • 2008-04-29
    • US10805847
    • 2004-03-22
    • Michael LongJeremy M. GraceBruce E. KoppeDennis R. FreemanNeil P. ReddenRobert F. Zwaap
    • Michael LongJeremy M. GraceBruce E. KoppeDennis R. FreemanNeil P. ReddenRobert F. Zwaap
    • C23C16/455
    • C23C14/24C23C14/12C23C14/243C23C14/26
    • A vapor deposition source for use in vacuum chamber for coating an organic layer on a substrate of an OLED device, includes a manifold including side and bottom walls defining a chamber for receiving organic material, and an aperture plate disposed between the side walls, the aperture plate having a plurality of spaced apart apertures for emitting vaporized organic material; the aperture plate including conductive material which in response to an electrical current produces heat; means for heating the organic material to a temperature which causes its vaporization, and heating the side walls of the manifold; and an electrical insulator coupling the aperture plate to the side walls for concentrating heat in the unsupported region of the aperture plate adjacent to the apertures, whereby the distance between the aperture plate and the substrate can be reduced to provide high coating thickness uniformity on the substrate. A method for coating an organic layer on onto a substrate in a vacuum chamber includes providing a manifold including side and bottom walls defining a chamber for receiving organic material. and an aperture plate disposed between the side walls, the aperture elate having a plurality of spaced apart apertures for emitting vaporized organic material; heating the organic material to a temperature which causes its vaporization, and the side walls of the manifold, the aperture plate includes a first aperture plate emissive surface that radiates energy into the chamber and a second aperture plate emissive surface that radiates less energy to the substrate wherein the second aperture elate emissive surface has an emissivity lower than the first aperture plate emissive surface; and concentrating heat in an unsupported region of the aperture plate adjacent to the apertures by providing an electrical insulator coupling the aperture plate to the side walls.
    • 用于在OLED器件的衬底上涂覆有机层的真空室中的气相沉积源包括:歧管,其包括限定用于接收有机材料的腔室的侧壁和底壁;以及设置在侧壁之间的孔板, 板具有多个间隔开的孔,用于发射蒸发的有机材料; 包括响应于电流的导电材料的孔板产生热量; 用于将有机材料加热到导致其蒸发的温度并加热歧管的侧壁的装置; 以及将孔板连接到侧壁上的电绝缘体,用于将热量集中在邻近孔的孔板的未支撑区域中,由此可以减小孔板和基板之间的距离,以在基板上提供高的涂层厚度均匀性 。 在真空室中将有机层涂覆到基底上的方法包括提供歧管,其包括限定用于接收有机材料的室的侧壁和底壁。 以及设置在所述侧壁之间的孔板,所述孔口具有多个间隔开的孔,用于发射蒸发的有机材料; 将有机材料加热到导致其蒸发的温度,并且歧管的侧壁,孔板包括将能量辐射到腔室中的第一孔板发射表面和向衬底辐射较少能量的第二孔板发射表面 其中所述第二孔径发光表面具有低于所述第一孔板发射表面的发射率; 并且通过提供将孔板联接到侧壁的电绝缘体将热量集中在邻近孔的孔板的未支撑区域中。
    • 6. 发明授权
    • Thermal physical vapor deposition source with minimized internal condensation effects
    • 热物理气相沉积源,内部冷凝效果最小
    • US06893939B1
    • 2005-05-17
    • US10786859
    • 2004-02-25
    • Jeremy M. GraceDennis R. FreemanJustin H. KlugNeil P. Redden
    • Jeremy M. GraceDennis R. FreemanJustin H. KlugNeil P. Redden
    • C23C14/00C23C14/12C23C14/24H01L21/76H01L51/00H01L51/40H01L51/56
    • C23C14/24C23C14/12C23C14/243H01L51/001
    • A thermal physical vapor deposition source for depositing material onto a substrate includes an elongated container for receiving the material, the container having a conductance CB in the elongated direction, and a heater for heating the material in the container to vaporize the material to a partial pressure Pm. The container has at least one member defining a plurality of apertures arranged along the length of the member, the apertures having a total conductance CA, wherein C A C B ≤ 0.5 ; and end heaters for heating each side of the container to reduce condensation of material onto the container.
    • 用于将材料沉积到衬底上的热物理气相沉积源包括用于接收材料的细长容器,容器在细长方向上具有导电性C B,以及用于加热容器中的材料的加热器 以使材料气化成分压P m。 所述容器具有至少一个构件,其限定沿所述构件的长度布置的多个孔,所述孔具有总电导C A A,其中 > 和最终加热器用于加热容器的每一侧以减少材料在容器上的冷凝。
        • 7. 发明授权
        • Purifying organic materials for physical vapor deposition
        • 净化有机物质进行物理气相沉积
        • US07842341B2
        • 2010-11-30
        • US11272320
        • 2005-11-10
        • Michael L. BorosonRonald S. CokMichael LongDennis R. FreemanJeremy M. Grace
        • Michael L. BorosonRonald S. CokMichael LongDennis R. FreemanJeremy M. Grace
        • C23C16/00B05D3/06
        • C23C14/246C23C14/12C23C14/564
        • A method for evaporating a plurality of purified organic materials in a thermal physical vapor deposition system, comprising the steps of: mixing predetermined amounts of first and second organic materials to form a mixture of materials at a predetermined ratio; processing at least one of the organic materials at less than the sublimation temperature of the at least one of the organic materials before or after mixing to remove a first contaminant, wherein if processing is after mixing, the processing temperature is lower than the sublimation temperature of each of the organic materials; providing a thermal physical vapor deposition source; transferring the purified mixture of organic materials into the thermal physical vapor deposition source while maintaining the purified mixture of organic materials in a controlled, contaminant-free environment; and using the source to evaporate the purified mixture of organic materials.
        • 一种用于在热物理气相沉积系统中蒸发多个纯化的有机材料的方法,包括以下步骤:混合预定量的第一和第二有机材料以形成预定比例的材料混合物; 在混合之前或之后以少于有机材料的升华温度处理至少一种有机材料以除去第一污染物,其中如果在混合后进行处理,则处理温度低于 每种有机材料; 提供热物理气相沉积源; 将有机材料的纯化混合物转移到热物理气相沉积源中,同时将有机材料的纯化混合物保持在受控的无污染环境中; 并使用源蒸发有机材料的纯化混合物。
        • 8. 发明授权
        • Vaporization source with baffle
        • 蒸气源带挡板
        • US07166169B2
        • 2007-01-23
        • US11032899
        • 2005-01-11
        • Dennis R. FreemanNeil P. Redden
        • Dennis R. FreemanNeil P. Redden
        • C23C14/24
        • C23C14/243C23C14/12
        • A vapor deposition source for depositing organic material includes a boat having a cavity for holding organic material and an aperture plate, having a plurality of spaced apertures, for enclosing the boat. The vapor deposition source also includes a heating element provided in the cavity between the aperture plate and the organic material, and a baffle member in contact with the heating element and having at least three surfaces which absorb energy from the heating element, the first surface redirecting energy to the aperture plate and the second and third surfaces redirecting energy to the boat walls and the organic material.
        • 用于沉积有机材料的气相沉积源包括具有用于保持有机材料的腔体和孔板的舟皿,具有用于封闭船的多个间隔开的孔。 气相沉积源还包括设置在孔板和有机材料之间的空腔中的加热元件和与加热元件接触并具有至少三个吸收来自加热元件的能量的表面的挡板构件,第一表面重定向 能量到孔板,第二和第三表面将能量重新引导到船的壁和有机材料。
        • 9. 发明授权
        • High-efficiency plasma treatment of polyolefins
        • 高效等离子体处理聚烯烃
        • US06399159B1
        • 2002-06-04
        • US09575490
        • 2000-05-19
        • Jeremy M. GraceLouis J. GerenserKurt D. SieberMichael J. HeinslerHengzhong K. ZhuangDennis R. FreemanMark M. Romach
        • Jeremy M. GraceLouis J. GerenserKurt D. SieberMichael J. HeinslerHengzhong K. ZhuangDennis R. FreemanMark M. Romach
        • H05H100
        • G03C1/915B29C59/14B29K2067/00B29L2031/7644B41M5/508
        • A method and apparatus are taught for treating polyolefin containing or polyolefin-coated webs or laminates for obtaining the proper surface characteristics to promote adhesion of photosensitive coating materials and/or layers typically coated thereon. The web is passed through a high-voltage sheath region or dark space of the plasma generated by a powered electrode residing in a discharge zone. The frequency of the driving voltage must be above a lower bound dictated by the properties of the paper support and the plasma, and it must be below an upper bound beyond which the sheath voltages drop significantly and it is observed that the benefits of this approach diminish. The dark space is generated by a treatment electrode in a treatment zone. There is a counter electrode having a surface area in said treatment zone which is at least as great as the surface area of the treatment electrode. A power supply is included for driving the treatment electrode with an oscillating high voltage at a frequency less than about 2 MHz and greater than 1/tc where tc is the charging time of a web surface exposed to a rms ion current in the plasma.
        • 教导了一种用于处理含聚烯烃或聚烯烃涂布的卷筒纸或层压板以获得适当的表面特性以促进通常涂覆在其上的感光涂层材料和/或层的粘合的方法和装置。 纸幅通过位于放电区域的动力电极产生的等离子体的高压鞘区域或暗空间。 驱动电压的频率必须高于由纸支架和等离子体的性质决定的下限,并且必须低于上限,超过该上限,护套电压显着下降,并且观察到该方法的好处减少了 。 黑暗空间由处理区域中的处理电极产生。 在所述处理区域中具有至少与处理电极的表面积一样大的对电极。 包括用于以小于约2MHz和大于1 / tc的频率的振荡高电压驱动处理电极的电源,其中tc是暴露于等离子体中的有效电离离子电流的幅材表面的充电时间。
        • 10. 发明授权
        • High-efficiency plasma treatment of paper
        • 高效等离子体处理纸张
        • US06565930B1
        • 2003-05-20
        • US09574772
        • 2000-05-19
        • Jeremy M. GraceLouis J. GerenserChristine J. Landry-ColtrainKurt D. SieberMichael J. HeinslerDennis R. Freeman
        • Jeremy M. GraceLouis J. GerenserChristine J. Landry-ColtrainKurt D. SieberMichael J. HeinslerDennis R. Freeman
        • C08F252
        • G03C1/915B29C59/14B29K2067/00B29L2031/7644B41M5/508
        • A method and apparatus are taught for treating paper webs for obtaining the proper surface characteristics to promote adhesion of nonphotosensitive coating materials and/or layers typically coated thereon. The web is passed through a high-voltage sheath region or dark space of the plasma generated by a powered electrode residing in a discharge zone. The frequency of the driving voltage must be above a lower bound dictated by the properties of the paper support and the plasma, and it must be below an upper bound beyond which the sheath voltages drop significantly and it is observed that the benefits of this approach diminish. The dark space is generated by a treatment electrode in a treatment zone. There is a counter electrode having a surface area in said treatment zone which is at least as great as the surface area of the treatment electrode. A power supply is included for driving the treatment electrode with an oscillating high voltage at a frequency less than about 2 MHz and greater than 1/tc where tc is the charging time of a web surface exposed to a rms ion current in the plasma.
        • 教导了一种处理纸幅以获得适当的表面特性以促进通常涂覆在其上的非感光涂层材料和/或层的粘附的方法和装置。 纸幅通过位于放电区域的动力电极产生的等离子体的高压鞘区域或暗空间。 驱动电压的频率必须高于由纸支架和等离子体的性质决定的下限,并且必须低于上限,超过该上限,护套电压显着下降,并且观察到该方法的好处减少了 。 黑暗空间由处理区域中的处理电极产生。 在所述处理区域中具有至少与处理电极的表面积一样大的对电极。 包括用于以小于约2MHz和大于1 / tc的频率的振荡高电压驱动处理电极的电源,其中tc是暴露于等离子体中的有效电离离子电流的幅材表面的充电时间。