会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • MICRO-BALANCE SENSOR INTEGRATED WITH ATOMIC LAYER DEPOSITION CHAMBER
    • 微平衡传感器与原子层沉积室集成
    • US20140053779A1
    • 2014-02-27
    • US13591498
    • 2012-08-22
    • Alex B. F. MartinsonJoseph A. LiberaJeffrey W. ElamShannon C. Riha
    • Alex B. F. MartinsonJoseph A. LiberaJeffrey W. ElamShannon C. Riha
    • C23C16/44C23C16/50
    • C23C16/45525C23C16/52
    • The invention is directed to QCM measurements in monitoring ALD processes. Previously, significant barriers remain in the ALD processes and accurate execution. To turn this exclusively dedicated in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of ALD tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the feasibility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.
    • 本发明涉及在监测ALD过程中的QCM测量。 此前,ALD流程仍然存在重大障碍,准确执行。 将这种专门的原位技术转化为常规表征方法,开发了一个完整的QCM夹具。 这种新设计可以在各种ALD工具上轻松实现,允许快速进行样品交换,防止背面沉积,并最大限度地减少占地面积和流量扰动。 与以前的QCM设计不同,快速热平衡使得诸如温度依赖性研究和非原位样品交换等任务进一步凸显了该QCM设计的日常使用的可行性。 最后,在连续和准静态ALD模式下工作的流行商业工具中,证明了ALD反应器中薄膜生长速率的原位测绘。