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1. 发明申请

US20110134308A1 AUTOFOCUS DEVICE AND AUTOFOCUSING METHOD FOR AN IMAGING DEVICE 有权
标题翻译：自动装置和用于成像装置的自动对焦方法
公开(公告)号：US20110134308A1
公开(公告)日：2011-06-09
申请号：US12863824
申请日：2009-01-20
申请人： Michael Arnz , Mikhail Levtonov , Gerd Klose , Volkmar Betz
发明人： Michael Arnz , Mikhail Levtonov , Gerd Klose , Volkmar Betz
IPC分类号： H04N5/232
CPC分类号： G02B21/244 , G02B21/245
摘要： An autofocus device for an imaging device is provided, which has an imaging optic having a first focal plane and an object table for moving an object to be imaged relative to the first focal plane, wherein said autofocus device comprises a) an image recording module having a second focal plane, the location thereof relative to the first focal plane being known, b) a lighting module (BM) for imaging a focusing image along a lighting beam path in a focusing image plane such that, if the object is positioned in a target position at a predetermined distance to the second focal plane, the lighting beam path is folded because of reflection on the object and the focusing image, which lies in the focusing image plane, intersects the second focal plane or lies therein, and c) a control module, which activates the object table to focus the imaging device so that the object is positioned in the target position, from a signal of the image recording module, which the image recording module generates on the basis of the recording thereof of the focusing image when the object is positioned in the target position, derives the deviation of the object position from the target position, and, based on the derived deviation, the predetermined distance, and the relative location of the first and second focal planes, activates the object table so that the object is positioned in the first focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有成像光学元件，该成像光学元件具有第一焦平面和用于相对于第一焦平面移动待成像物体的物体台，其中所述自动对焦装置包括：a）图像记录模块，第二焦平面，其相对于第一焦平面的位置是已知的，b）用于在聚焦图像平面中沿照明光束路径对聚焦图像进行成像的照明模块（BM），使得如果物体位于目标位置与第二焦平面成预定距离，由于物体上的反射和位于聚焦图像平面中的聚焦图像与第二焦平面相交或位于其中的聚焦图像折叠点亮光束路径，以及c）控制模块，其从图像记录模块生成的图像记录模块的信号激活对象表以聚焦成像装置，使得对象位于目标位置基于当对象位于目标位置时对聚焦图像的记录，导出对象位置与目标位置的偏差，并且基于导出的偏差，预定距离和相对位置的第一和第二焦平面激活对象表，使得对象位于第一焦平面中。

2. 发明授权

US09229209B2 Autofocus device and autofocusing method for an imaging device 有权
标题翻译：用于成像装置的自动对焦装置和自动对焦方法
公开(公告)号：US09229209B2
公开(公告)日：2016-01-05
申请号：US12863824
申请日：2009-01-20
申请人： Michael Arnz , Mikhail Levtonov , Gerd Klose , Volkmar Betz
发明人： Michael Arnz , Mikhail Levtonov , Gerd Klose , Volkmar Betz
IPC分类号： H04N5/232 , G02B21/24
CPC分类号： G02B21/244 , G02B21/245
摘要： An autofocus device for an imaging device is provided, which has an imaging optic having a first focal plane and an object table for moving an object to be imaged relative to the first focal plane, wherein said autofocus device comprises a) an image recording module having a second focal plane, the location thereof relative to the first focal plane being known, b) a lighting module (BM) for imaging a focusing image along a lighting beam path in a focusing image plane such that, if the object is positioned in a target position at a predetermined distance to the second focal plane, the lighting beam path is folded because of reflection on the object and the focusing image, which lies in the focusing image plane, intersects the second focal plane or lies therein, and c) a control module, which activates the object table to focus the imaging device so that the object is positioned in the target position, from a signal of the image recording module, which the image recording module generates on the basis of the recording thereof of the focusing image when the object is positioned in the target position, derives the deviation of the object position from the target position, and, based on the derived deviation, the predetermined distance, and the relative location of the first and second focal planes, activates the object table so that the object is positioned in the first focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有成像光学元件，该成像光学元件具有第一焦平面和用于相对于第一焦平面移动待成像物体的物体台，其中所述自动对焦装置包括：a）图像记录模块，第二焦平面，其相对于第一焦平面的位置是已知的，b）用于在聚焦图像平面中沿照明光束路径对聚焦图像进行成像的照明模块（BM），使得如果物体位于目标位置与第二焦平面成预定距离，由于物体上的反射和位于聚焦图像平面中的聚焦图像与第二焦平面相交或位于其中的聚焦图像折叠点亮光束路径，以及c）控制模块，其从图像记录模块生成的图像记录模块的信号激活对象表以聚焦成像装置，使得对象位于目标位置基于当对象位于目标位置时对聚焦图像的记录，导出对象位置与目标位置的偏差，并且基于导出的偏差，预定距离和相对位置的第一和第二焦平面激活对象表，使得对象位于第一焦平面中。

3. 发明申请

US20100208935A1 METHOD AND APPARATUS FOR DETERMINING THE RELATIVE OVERLAY SHIFT OF STACKED LAYERS 有权
标题翻译：用于确定堆叠层相对叠加的方法和装置
公开(公告)号：US20100208935A1
公开(公告)日：2010-08-19
申请号：US12599127
申请日：2008-03-07
申请人： Michael Arnz , Gerd Klose
发明人： Michael Arnz , Gerd Klose
IPC分类号： G06K9/00 , G03F7/20
CPC分类号： G03F7/70633
摘要： A method is provided for determining the relative overlay shift of stacked layers, said method comprising the steps of: a) providing a reference image including a reference pattern that comprises first and second pattern elements; b) providing a measurement image of a measurement pattern, which comprises a first pattern element formed by a first one of the layers and a second pattern element formed by a second one of the layers; c) weighting the reference or measurement image such that a weighted first image is generated, in which the first pattern element is emphasized relative to the second pattern element; d) determining the relative shift of the first pattern element on the basis of the weighted first image and of the measurement or reference image not weighted in step c); e) weighting the reference or measurement image such that a weighted second image is generated, in which the second pattern element is emphasized relative to the first pattern element; f) determining the relative shift of the second pattern element on the basis of the weighted second image and of the measurement or reference image not weighted in step e); g) determining the relative overlay shift on the basis of the relative shifts determined in steps d) and f).
摘要翻译：提供了一种用于确定堆叠层的相对重叠移位的方法，所述方法包括以下步骤：a）提供包括包括第一和第二图案元素的参考图案的参考图像; b）提供测量图案的测量图像，其包括由所述层中的第一层形成的第一图案元素和由所述层中的第二层形成的第二图案元素; c）对所述参考或测量图像进行加权，使得生成加权的第一图像，其中所述第一图案元素相对于所述第二图案元素被加强; d）基于加权的第一图像和在步骤c）中未加权的测量或参考图像来确定第一图案元素的相对移位; e）对所述参考或测量图像进行加权，使得生成加权的第二图像，其中相对于所述第一图案元素强调所述第二图案元素; f）基于加权的第二图像和在步骤e）中未加权的测量或参考图像来确定第二图案元素的相对移位; g）基于在步骤d）和f）中确定的相对移动来确定相对重叠移位。

4. 发明授权

US07755748B2 Device and method for range-resolved determination of scattered light, and an illumination mask 有权
标题翻译：用于范围分辨确定散射光的装置和方法以及照明掩模
公开(公告)号：US07755748B2
公开(公告)日：2010-07-13
申请号：US12181774
申请日：2008-07-29
申请人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
发明人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
IPC分类号： G01B9/00
CPC分类号： G03F7/70591 , G03F7/70941
摘要： A scattered light measurement device includes an illumination mask providing measuring radiation on an entrance side (1a) of a test component (1) and a detection part (3-6) for detection of light scattered by the test component and disposed on an exit side (1b) of the test component. The illumination mask includes at least one scattered light measurement structure, wherein the scattered light measurement structure has a scattered light marker zone and wherein the scattered light marker zone has a rotationally non-symmetric shape.
摘要翻译：散射光测量装置包括照射掩模，其在测试部件（1）的入口侧（1a）和检测部（3-6）上提供测量辐射，用于检测由测试部件散射的光并且设置在出射侧（1b）。照明掩模包括至少一个散射光测量结构，其中散射光测量结构具有散射光标记区，并且其中散射光标记区具有旋转非对称形状。

5. 发明申请

US20100153059A1 APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASK 审中-公开
标题翻译：用于测量标记标记位置的装置和方法
公开(公告)号：US20100153059A1
公开(公告)日：2010-06-17
申请号：US12594373
申请日：2008-03-11
申请人： Gerd Klose , Michael Arnz , Albrecht Hof , Helmut Krause , Ulrich Stroessner , Matthias Manger , Uwe Schellhorn , Karl-Heinz Bechstein
发明人： Gerd Klose , Michael Arnz , Albrecht Hof , Helmut Krause , Ulrich Stroessner , Matthias Manger , Uwe Schellhorn , Karl-Heinz Bechstein
IPC分类号： G06F15/00 , G01B21/20
CPC分类号： G01N21/95692 , G01N2021/95676 , G03F1/84
摘要： An apparatus for measuring the positions of marks on a mask is provided, said apparatus comprising a mask holder for holding the mask, a recording unit for recording the marks of the mask held by the mask holder, an actuating module for moving the mask holder and the recording unit relative to each other, and an evaluating module, which numerically calculates the gravity-induced sagging of the mask in the mask holder and determines the positions of the marks on the mask, based on the calculated sagging, the recordings made by the recording unit and the relative movement between the mask holder and the recording unit, wherein, prior to calculating said sagging, the present position of the mask in the mask holder is determined and is taken into consideration in said numerical calculation, and/or the geometrical dimensions of the mask are taken into consideration in said numerical calculation of sagging.
摘要翻译：提供了一种用于测量掩模上的标记位置的装置，所述装置包括用于保持掩模的掩模保持器，用于记录由掩模保持器保持的掩模的标记的记录单元，用于移动掩模保持器的致动模块和所述记录单元相对于所述记录单元，以及评估模块，其对所述掩模保持器中的所述掩模的重力引起的下垂进行数值计算，并基于所计算的下垂来确定所述掩模上的所述标记的位置，记录单元和掩模保持器和记录单元之间的相对运动，其中，在计算所述下垂之前，确定掩模保持器中掩模的当前位置并在所述数值计算中被考虑，和/或几何在下垂的数值计算中考虑到面罩的尺寸。

6. 发明申请

US20050264819A1 Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask 有权
标题翻译：用于范围分辨的散射光确定装置，操作方法，照明掩模和图像场掩模
公开(公告)号：US20050264819A1
公开(公告)日：2005-12-01
申请号：US10960082
申请日：2004-10-08
申请人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
发明人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
IPC分类号： G03F7/20 , G01N21/47
CPC分类号： G03F7/70591 , G03F7/70941
摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.
摘要翻译：一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域，提供相关联的图像场掩模和相应的设备。还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处外部暗场区域，其定义了最大散射范围。该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

7. 发明授权

US08260033B2 Method and apparatus for determining the relative overlay shift of stacked layers 有权
标题翻译：用于确定堆叠层的相对重叠移位的方法和装置
公开(公告)号：US08260033B2
公开(公告)日：2012-09-04
申请号：US12599127
申请日：2008-03-07
申请人： Michael Arnz , Gerd Klose
发明人： Michael Arnz , Gerd Klose
IPC分类号： G06K9/00
CPC分类号： G03F7/70633
摘要： A method is provided for determining the relative overlay shift of stacked layers, said method comprising the steps of: a) providing a reference image including a reference pattern that comprises first and second pattern elements; b) providing a measurement image of a measurement pattern, which comprises a first pattern element formed by a first one of the layers and a second pattern element formed by a second one of the layers; c) weighting the reference or measurement image such that a weighted first image is generated, in which the first pattern element is emphasized relative to the second pattern element; d) determining the relative shift of the first pattern element on the basis of the weighted first image and of the measurement or reference image not weighted in step c); e) weighting the reference or measurement image such that a weighted second image is generated, in which the second pattern element is emphasized relative to the first pattern element; f) determining the relative shift of the second pattern element on the basis of the weighted second image and of the measurement or reference image not weighted in step e); g) determining the relative overlay shift on the basis of the relative shifts determined in steps d) and f).
摘要翻译：提供了一种用于确定堆叠层的相对重叠移位的方法，所述方法包括以下步骤：a）提供包括包括第一和第二图案元素的参考图案的参考图像; b）提供测量图案的测量图像，其包括由所述层中的第一层形成的第一图案元素和由所述层中的第二层形成的第二图案元素; c）对所述参考或测量图像进行加权，使得生成加权的第一图像，其中所述第一图案元素相对于所述第二图案元素被加强; d）基于加权的第一图像和在步骤c）中未加权的测量或参考图像来确定第一图案元素的相对移位; e）对所述参考或测量图像进行加权，使得生成加权的第二图像，其中相对于所述第一图案元素强调所述第二图案元素; f）基于加权的第二图像和在步骤e）中未加权的测量或参考图像来确定第二图案元素的相对移位; g）基于在步骤d）和f）中确定的相对移动来确定相对重叠移位。

8. 发明申请

US20120063666A1 Method For Determining The Registration Of A Structure On A Photomask And Apparatus To Perform The Method 有权
标题翻译：用于确定光掩模上的结构的注册和执行该方法的装置的方法
公开(公告)号：US20120063666A1
公开(公告)日：2012-03-15
申请号：US13229396
申请日：2011-09-09
申请人： Michael Arnz , Dirk Seidel , Gerd Klose
发明人： Michael Arnz , Dirk Seidel , Gerd Klose
IPC分类号： G06K9/00
CPC分类号： G01B11/26 , G01B11/00 , G03F1/42 , G03F1/84
摘要： A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.
摘要翻译：一种用于确定掩模上的特征的配准误差的方法，包括提供通过位置测量装置捕获的第一空间图像，并且至少包括从掩模的图案规格模拟第二空间图像的特征考虑到引起第一空间图像失真的至少一个效应，以及确定特征的登记误差作为第一空间图像中的特征的位置与第一空间图像的位置的距离，至少包括该特征功能在第二个航空图像。还提供了一种用于从掩模的图案规格和用于执行该方法的位置测量装置模拟空中图像的方法。

9. 发明申请

US20100104128A1 METHOD AND APPARATUS FOR DETERMINING THE POSITION OF A STRUCTURE ON A CARRIER RELATIVE TO A REFERENCE POINT OF THE CARRIER 有权
标题翻译：用于确定载体相对于载体的参考点的结构位置的方法和装置
公开(公告)号：US20100104128A1
公开(公告)日：2010-04-29
申请号：US12518288
申请日：2007-11-20
申请人： Michael Arnz , Gerd Klose , Michael Totzeck
发明人： Michael Arnz , Gerd Klose , Michael Totzeck
IPC分类号： G06K9/00
CPC分类号： G03F9/7092 , G03F1/84 , G03F7/70625 , G03F9/7088 , G06K9/3216 , G06K9/6203 , G06K2009/3225 , G06T7/74 , G06T2207/30148
摘要： A method is provided for determining the position of a structure on a carrier, relative to a reference point of the carrier, said method comprising the steps of: a) providing an image including a reference structure; b) recording an image of the structure on the carrier by means of a recording device, with a known recording position relative to the reference points; c) superimposing the two images to form one superimposed image; d) determining the image distance of the two structures in the superimposed image; e) shifting the two structures in the superimposed image relative to one another, depending on the determined image distance; f) checking whether the determined image distance is below a predetermined maximum value; wherein, if the image distance is below the maximum value, the method is continued in step g), and, if the image distance is not below the maximum value, steps d)-f) are repeated, taking into account the determined image distance/distances: g) determining the position of the structure relative to the reference point, on the basis of the recording position in step b) and of the image distance/image distances determined in step(s) d).
摘要翻译：提供了一种用于确定载体上的结构相对于载体的参考点的位置的方法，所述方法包括以下步骤：a）提供包括参考结构的图像; b）通过记录装置将结构的图像记录在载体上，具有相对于参考点的已知记录位置; c）叠加两个图像以形成一个叠加的图像; d）确定叠加图像中两个结构的图像距离; e）根据确定的图像距离，相对于彼此移动叠加图像中的两个结构; f）检查确定的图像距离是否低于预定的最大值; 其中，如果图像距离低于最大值，则在步骤g）中继续该方法，并且如果图像距离不低于最大值，则重复步骤d）-f），同时考虑所确定的图像距离 /距离 g）基于步骤b）中的记录位置和步骤（d）中确定的图像距离/图像距离来确定结构相对于参考点的位置。

10. 发明授权

US08473237B2 Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage 有权
标题翻译：用于校准包括样品台的计量系统和计量系统的样品台的方法
公开(公告)号：US08473237B2
公开(公告)日：2013-06-25
申请号：US12726908
申请日：2010-03-18
申请人： Alexander Huebel , Matthias Manger , Gerd Klose , Uwe Schellhorn , Michael Arnz
发明人： Alexander Huebel , Matthias Manger , Gerd Klose , Uwe Schellhorn , Michael Arnz
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01B11/03 , G01B21/042
摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.
摘要翻译：提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内使用光学系统测量样品的校准位置和标记位置。使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。考虑到测量的标记位置，基于模型确定校准参数的值。

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