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    • 1. 发明授权
    • Linear aperture deposition apparatus and coating process
    • 线性孔径沉积设备和涂层工艺
    • US06367414B2
    • 2002-04-09
    • US09758839
    • 2001-01-10
    • Matthew R. WitzmanRichard A. Bradley, Jr.Christopher W. LantmanEric R. Cox
    • Matthew R. WitzmanRichard A. Bradley, Jr.Christopher W. LantmanEric R. Cox
    • C23C1414
    • C23C14/243C23C14/562Y10T428/31681
    • A linear aperture deposition apparatus and process are provided for coating substrates with sublimed or evaporated coating materials. The apparatus and process are particularly suited for producing flexible films having an optical interference coating with a very high surface thickness uniformity and which is substantially free of defects from particulate ejection of a source material. The apparatus includes a source box containing a source material, a heating element to sublime or evaporate the source material, and a chimney to direct the source material vapor from the source box to a substrate. A flow restricting baffle having a plurality of holes is positioned between the source material and the substrate to confine and direct the vapor flow, and an optional floating baffle is positioned on the surface of the source material to further restrict the vapor flow, thereby substantially eliminating source material spatter.
    • 提供了一种线性孔径沉积装置和工艺,用于用升华或蒸发的涂层材料涂覆基底。 该设备和方法特别适用于生产具有非常高的表面厚度均匀性的光学干涉涂层的柔性膜,并且基本上没有源材料的颗粒喷射的缺陷。 该装置包括一个包含源材料的源盒,一个使源材料升华或蒸发的加热元件,以及一个将源材料蒸汽从源箱引导到基片上的烟囱。 具有多个孔的流动限制挡板位于源材料和基底之间以限制和引导蒸汽流,并且可选的浮动挡板位于源材料的表面上,以进一步限制蒸气流,从而基本上消除 源材料飞溅。
    • 2. 发明授权
    • Linear aperture deposition apparatus and coating process
    • 线性孔径沉积设备和涂层工艺
    • US06202591B1
    • 2001-03-20
    • US09437684
    • 1999-11-10
    • Matthew R. WitzmanRichard A. Bradley, Jr.Christopher W. LantmanEric R. Cox
    • Matthew R. WitzmanRichard A. Bradley, Jr.Christopher W. LantmanEric R. Cox
    • C23C1414
    • C23C14/243C23C14/562Y10T428/31681
    • A linear aperture deposition apparatus and process are provided for coating substrates with sublimed or evaporated coating materials. The apparatus and process are particularly suited for producing flexible films having an optical interference coating with a very high surface thickness uniformity and which is substantially free of defects from particulate ejection of a source material. The apparatus includes a source box containing a source material, a heating element to sublime or evaporate the source material, and a chimney to direct the source material vapor from the source box to a substrate. A flow restricting baffle having a plurality of holes is positioned between the source material and the substrate to confine and direct the vapor flow, and an optional floating baffle is positioned on the surface of the source material to further restrict the vapor flow, thereby substantially eliminating source material spatter.
    • 提供了一种线性孔径沉积装置和工艺,用于用升华或蒸发的涂层材料涂覆基底。 该设备和方法特别适用于生产具有非常高的表面厚度均匀性的光学干涉涂层的柔性膜,并且基本上没有源材料的颗粒喷射的缺陷。 该装置包括一个包含源材料的源盒,一个使源材料升华或蒸发的加热元件,以及一个将源材料蒸汽从源箱引导到基片上的烟囱。 具有多个孔的流动限制挡板位于源材料和基底之间以限制和引导蒸汽流,并且可选的浮动挡板位于源材料的表面上以进一步限制蒸气流,从而基本上消除 源材料飞溅。
    • 6. 发明授权
    • Color shifting thin film pigments
    • 色移薄膜颜料
    • US06236510B1
    • 2001-05-22
    • US09518007
    • 2000-03-02
    • Richard A. Bradley, Jr.Matthew R. Witzman
    • Richard A. Bradley, Jr.Matthew R. Witzman
    • G02B110
    • C09D5/36C01P2006/62C01P2006/63C01P2006/64C09C1/0015C09C2200/1008C09C2200/1054C09C2200/301C09C2200/302C09C2200/306C09C2220/20G02B5/285Y10S359/90Y10T428/2991Y10T428/2993
    • A color shifting multilayer interference film is provided which may be used to produce flakes for use in colorants having color shifting properties. The flakes can be interspersed into liquid media such as paints or inks which can subsequently be applied to objects or papers to achieve color variations upon shifts in angle of incident light or upon shifts in viewing angle. A five layer design of the interference film includes a first absorber layer, a first dielectric layer on the first absorber layer, a reflector layer on the first dielectric layer, a second dielectric layer on the reflector layer, and a second absorber layer on the second dielectric layer. A three layer design of the interference film includes first and second absorber layers with a dielectric layer therebetween. The dielectric layers are formed to have an optical thickness at a design wavelength that provides a color shift as the angle of incident light or viewing changes.
    • 提供了一种颜色偏移多层干涉膜,其可用于生产用于具有色移特性的着色剂中的薄片。 薄片可以散布在诸如油漆或油墨的液体介质中,随后可以将其施加到物体或纸张上,以在入射光的角度偏移或视角移动时实现颜色变化。 干涉膜的五层设计包括第一吸收层,第一吸收层上的第一电介质层,第一电介质层上的反射层,反射层上的第二电介质层和第二吸收层 电介质层。 干涉膜的三层设计包括其间具有介电层的第一和第二吸收层。 电介质层被形成为具有设计波长的光学厚度,其随着入射光的角度或观察角度的变化而提供色移。