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    • 2. 发明申请
    • SUBSTRATE HOLDING APPARATUS, AND INSPECTION OR PROCESSING APPARATUS
    • 基板控制装置,检查或处理装置
    • US20100196127A1
    • 2010-08-05
    • US12754927
    • 2010-04-06
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • H01L21/68
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。
    • 3. 发明授权
    • Substrate holding apparatus, and inspection or processing apparatus
    • 基板保持装置,检查或处理装置
    • US07723709B2
    • 2010-05-25
    • US11896291
    • 2007-08-30
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • G01N21/86G01V8/00
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。
    • 5. 发明授权
    • Synthetic paper with multi-layer structure and excellent printing
property
    • 合成纸具有多层结构和优异的印刷性能
    • US5667872A
    • 1997-09-16
    • US395835
    • 1995-02-28
    • Akihiko OhnoAtsushi IshigeHiroshi KoyamaKoichi Asami
    • Akihiko OhnoAtsushi IshigeHiroshi KoyamaKoichi Asami
    • B32B27/00B32B27/20B32B27/32
    • B32B27/32Y10T428/24355Y10T428/24372Y10T428/2438Y10T428/249986Y10T428/2998Y10T428/31909Y10T428/31913
    • A synthetic paper with a multi-layer structure comprising a biaxially stretched film of an olefinic polymer having a melting point (the peak temperature of the DSC curve) of from 130.degree. C. to 210.degree. C. containing from 5 to 40% by weight inorganic fine powders having a mean particle size of from 0.01 to 10 .mu.m as a base material layer (A) having adhered to at least one surface thereof a uniaxially stretched layer (B) having a surface roughness of from 0.3 to 1.5 .mu.m, with the uniaxially stretched layer (B) comprising a propylene .alpha.-olefin copolymer or a high-density polyethylene having a melting point (the peak temperature of the DSC curve) of from 120.degree. C. to 160.degree. C. which is at least 5.degree. C. lower than the melting point of the olefinic polymer of the base material layer (A) and from 8 to 65% by weight inorganic fine powders having a mean particle size of from 0.01 to 5 .mu.m, wherein the surfaces of the inorganic fine powders contained in the uniaxially stretched layer (B) are coated with the propylene .alpha.-olefin copolymer or the high-density polyethylene.
    • 一种具有多层结构的合成纸,其包含熔融点(DSC曲线的峰值温度)为130〜210℃的含有5〜40重量%的烯烃聚合物的双轴拉伸膜 作为基材层(A)的平均粒径为0.01〜10μm的无机细粉末,其表面粗糙度为0.3〜1.5μm的单轴拉伸层(B) 与包含丙烯-α-烯烃共聚物的单轴拉伸层(B)或熔点(DSC曲线的峰值温度)为120℃至160℃的高密度聚乙烯,其为至少5 ℃,低于基材层(A)的烯烃聚合物的熔点和8〜65重量%的平均粒径为0.01〜5μm的无机细粉末,其中无机 包含在单轴拉伸层(B )涂覆有丙烯α-烯烃共聚物或高密度聚乙烯。
    • 8. 发明申请
    • SUBSTRATE HOLDING APPARATUS, AND INSPECTION OR PROCESSING APPARATUS
    • 基板控制装置,检查或处理装置
    • US20110260080A1
    • 2011-10-27
    • US13175429
    • 2011-07-01
    • Kazuhiro ZAMAKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZAMAKoichi AsamiYusuke Miyazaki
    • G01N21/86B25B1/00
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。
    • 10. 发明申请
    • SUBSTRATE HOLDING APPARATUS, AND INSPECTION OR PROCESSING APPARATUS
    • 基板控制装置,检查或处理装置
    • US20120205850A1
    • 2012-08-16
    • US13454897
    • 2012-04-24
    • Kazuhiro ZAMAKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZAMAKoichi AsamiYusuke Miyazaki
    • B23Q1/25
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。