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    • 5. 发明授权
    • Method and system for displaying a mouse pointer
    • 显示鼠标指针的方法和系统
    • US06392676B1
    • 2002-05-21
    • US09522285
    • 2000-03-09
    • Hidetoshi MoriSatoru YamadaEiki ShibataSteven C. Ihde
    • Hidetoshi MoriSatoru YamadaEiki ShibataSteven C. Ihde
    • G09G508
    • G06F3/038G06F3/03543G06F3/04892
    • A method and system for displaying a mouse pointer for use with a three-button mouse, whereby a user is notified that a button has been erroneously depressed. Detectors detect an external force applied to a third button. A mouse function determiner uses the detection results to determine a pertinent function allocated to the third button. A mouse pointer shape determiner, in turn, uses the determination results to determine a shape of a mouse pointer corresponding to the pertinent function. In response to the external force, the shape of the mouse pointer currently being displayed is changed. Thus, through visual feedback a user can be apprized of the fact that an external force has been applied to the third button. This will, in turn, notify the user when the wrong button has been depressed.
    • 一种用于显示与三按钮鼠标一起使用的鼠标指针的方法和系统,由此向用户通知按钮被错误地按下。 检测器检测施加到第三个按钮的外力。 鼠标功能确定器使用检测结果来确定分配给第三按钮的相关功能。 鼠标指针形状确定器又使用确定结果来确定对应于相关功能的鼠标指针的形状。 响应于外力,当前正在显示的鼠标指针的形状被改变。 因此,通过视觉反馈,用户可以理解外力已被施加到第三按钮的事实。 这又将在按下错误的按钮时通知用户。
    • 6. 发明授权
    • Apparatus and method for simultaneously transferring a mask pattern to
both sides of a substrate
    • 将掩模图案同时转印到基板的两侧的装置和方法
    • US5929973A
    • 1999-07-27
    • US735082
    • 1996-10-22
    • Yukio KakizakiHidetoshi Mori
    • Yukio KakizakiHidetoshi Mori
    • G03F7/20G03F9/00H01L21/027G03B27/32
    • G03F7/70225G03F7/70275G03F7/70358G03F7/70425G03F9/70
    • Disclosed is a double-side exposure apparatus having a substrate holder for holding a photosensitizable substrate; a first exposure system containing a first light source, a first illumination unit for striking a ray of light emitted from the first light source in a first mask, and a first projection optical unit for projecting an image of the first mask onto a front surface of the photosensitizable substrate; and a second exposure system, mounted at the side opposite to the first exposure system, containing a second light source, a second illumination unit for striking a ray of light emitted from the first light source in a second mask, and a second projection optical unit for projecting an image of the second mask onto a back surface of the photosensitizable substrate; wherein the pattern of the first mask is exposed to the front surface of the photosensitizable substrate and the pattern of the second mask is exposed to the back surface thereof substantially simultaneously with exposure of the pattern of the first mask to the front surface thereof. Also, further disclosed is an exposing method for exposure of both surfaces of a substrate with the double-side exposure apparatus having the structure as described above, which involves aligning a first mask for a first exposing surface of a substrate with a second mask for a second exposing surface of the substrate in a state that no the substrate is interposed between a first projection optical unit for projecting a pattern of the first mask to the first exposing surface of the substrate and a second projection optical unit for projecting a pattern of the second mask to the second exposing surface of the substrate.
    • 公开了一种具有用于保持光敏性基板的基板保持件的双面曝光装置; 包含第一光源的第一曝光系统,用于在第一掩模中击打从第一光源发出的光线的第一照明单元和用于将第一掩模的图像投影到第一掩模的前表面的第一投影光学单元 光敏基材; 以及第二曝光系统,其安装在与所述第一曝光系统相对的一侧,所述第二曝光系统包含第二光源,用于在第二掩模中击打从所述第一光源发出的光线的第二照明单元,以及第二投影光学单元 用于将第二掩模的图像投影到可光敏化基板的背面上; 其中所述第一掩模的图案暴露于所述可光敏化基板的前表面,并且所述第二掩模的图案基本上与所述第一掩模的图案暴露于其前表面同时暴露于其背面。 此外,进一步公开了一种曝光方法,用于利用具有上述结构的双面曝光装置对基板的两个表面进行曝光,其包括将用于基板的第一曝光表面的第一掩模与用于基板的第二掩模对准 在基板被插入到用于将第一掩模的图案投影到基板的第一曝光表面的第一投影光学单元之间的状态下的基板的第二曝光表面和用于将第二掩模的图案投影到第二投影光学单元的第二投影光学单元 掩模到基板的第二曝光表面。