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    • 1. 发明授权
    • Image forming apparatus and holding method of image carrier
    • 图像载体的图像形成装置和保持方法
    • US06980760B2
    • 2005-12-27
    • US10629619
    • 2003-07-30
    • Masaya OkamotoKeiji Sasaki
    • Masaya OkamotoKeiji Sasaki
    • G03G15/01G03G15/08G03G15/16
    • G03G15/0131G03G15/0813G03G2215/0177
    • An image forming apparatus is included of a pivotally rotated photosensitive drum, a developing roller for developing an electrostatic latent image formed on this photosensitive drum, and an intermediate transfer belt for temporarily holding the toner image which has been developed to be formed by the developing roller. This developing roller is equipped with a tracking roller which abuts against the photosensitive drum so as to keep a distance between the developing roller and the photosensitive drum as a constant distance. A direction of weight “a” produced by this tracking roller with respect to the photosensitive drum may be positioned within a so-called “wrap range” corresponding to an abutting range between the intermediate transfer belt and the photosensitive drum.
    • 包括转动感光鼓的图像形成装置,用于显影形成在该感光鼓上的静电潜像的显影辊和用于暂时保持由显影辊形成的调色剂图像的中间转印带 。 该显影辊配备有跟踪感光鼓的跟踪辊,以便以恒定距离保持显影辊和感光鼓之间的距离。 由该跟踪辊相对于感光鼓产生的重量“a”的方向可以位于对应于中间转印带和感光鼓之间的邻接范围的所谓的“包围范围”内。
    • 4. 发明申请
    • Metal Structure and Production Method Therefor
    • 金属结构及其制造方法
    • US20080160287A1
    • 2008-07-03
    • US11884614
    • 2006-02-16
    • Hiroaki MisawaKosei UenoYasuyuki TsuboiKeiji Sasaki
    • Hiroaki MisawaKosei UenoYasuyuki TsuboiKeiji Sasaki
    • B32B5/16G03F7/00B08B3/12
    • G02B5/3058B82Y20/00G01N21/554G02B5/008Y10T428/24917Y10T428/25
    • A metal structure capable of significantly increasing wavelength selectivity and polarization electivity for an incident light, and a production method thereof. First, a solid transparent substrate (glass substrate) (10) is cleaned and dried (S100). The surface of the substrate (10) is spin-coated with a positive electron lithography-use resist solution and then baked, and the resist solution is removed to form a resist thin film (20) on the substrate (10) (S200). A specified pattern is drawn on the resist thin film (20) with an electron beam, and the film is developed, rinsed and dried (S300). Then, metals such as chromium and then gold are formed sequentially on the substrate (10) by sputtering (S400). And, excessive resist materials are removed from the surface of the substrate (10) (S500), whereby metal nano-rod array (40) is completed. The metal nano-rod array (40) has a structure in which many metal nano-rods having their sizes precisely controlled are integrated on the substrate (10) at constant fine intervals and with their directions aligned in one axial direction.
    • 能够显着提高入射光的波长选择性和极化电位的金属结构体及其制造方法。 首先,清洁干燥固体透明基板(玻璃基板)(10)(S100)。 用正电子光刻用抗蚀剂溶液旋涂基板(10)的表面,然后烘烤,除去抗蚀剂溶液,以在基板(10)上形成抗蚀剂薄膜(20)(S 200) 。 用电子束在抗蚀剂薄膜(20)上绘制规定的图案,并将该膜显影,漂洗和干燥(S 300)。 然后,通过溅射在基板(10)上依次形成诸如铬,然后金属的金属(S 400)。 并且,从基板(10)的表面除去过量的抗蚀剂材料(S 500),从而完成金属纳米棒阵列(40)。 金属纳米棒阵列(40)具有这样的结构,其中许多具有精确控制的尺寸的金属纳米棒以恒定的细微间隔并且沿着一个轴向对齐在基底(10)上。
    • 9. 发明授权
    • Electronic apparatus and program storage medium
    • 电子设备和程序存储介质
    • US08090494B2
    • 2012-01-03
    • US12463484
    • 2009-05-11
    • Keiji Sasaki
    • Keiji Sasaki
    • G06F19/00
    • G06F11/1441G11C29/44G11C29/56008G11C2029/0407G11C2029/4402
    • An electronic control unit executes a program to perform a failure diagnosis as well as a vehicle control. On boot-up, diagnosis associated data is read from a backup memory and written in a RAM. The diagnosis associated data represents a failure diagnosis result previously backed up in the backup memory. When performing a failure diagnosis, the diagnosis associated data in the RAM is updated if needed, and an update flag is turned ON at updating. The presence of the update is checked using the update flag. Each time the update flag turns ON, the update flag is turned OFF and a timer is set to zero. The timer starts to measure an elapsed time. When the timer value exceeds a threshold value, it is determined that a predetermined time elapsed since the diagnosis associated data was previously updated. The diagnosis associated data in the RAM is then backed up.
    • 电子控制单元执行程序以执行故障诊断以及车辆控制。 在启动时,从备份存储器读取诊断相关数据并写入RAM。 诊断相关数据表示先前备份在备份存储器中的故障诊断结果。 当执行故障诊断时,如果需要,则更新RAM中的诊断相关数据,并且在更新时更新标志被打开。 使用更新标志检查更新的存在。 每当更新标志变为ON时,更新标志被关闭,定时器被设置为零。 计时器开始测量经过的时间。 当定时器值超过阈值时,确定自诊断相关联的数据以前已经更新了经过的预定时间。 然后备份RAM中的诊断相关数据。
    • 10. 发明授权
    • Metal structure and production method therefor
    • 金属结构及其生产方法
    • US07824761B2
    • 2010-11-02
    • US11884614
    • 2006-02-16
    • Hiroaki MisawaKosei UenoYasuyuki TsuboiKeiji Sasaki
    • Hiroaki MisawaKosei UenoYasuyuki TsuboiKeiji Sasaki
    • B32B9/00
    • G02B5/3058B82Y20/00G01N21/554G02B5/008Y10T428/24917Y10T428/25
    • A metal structure capable of significantly increasing wavelength selectivity and polarization electivity for an incident light, and a production method thereof. First, a solid transparent substrate (glass substrate) (10) is cleaned and dried (S100). The surface of the substrate (10) is spin-coated with a positive electron lithography-use resist solution and then baked, and the resist solution is removed to form a resist thin film (20) on the substrate (10) (S200). A specified pattern is drawn on the resist thin film (20) with an electron beam, and the film is developed, rinsed and dried (S300). Then, metals such as chromium and then gold are formed sequentially on the substrate (10) by sputtering (S400). And, excessive resist materials are removed from the surface of the substrate (10) (S500), whereby metal nano-rod array (40) is completed. The metal nano-rod array (40) has a structure in which many metal nano-rods having their sizes precisely controlled are integrated on the substrate (10) at constant fine intervals and with their directions aligned in one axial direction.
    • 能够显着提高入射光的波长选择性和极化电位的金属结构体及其制造方法。 首先,清洁并干燥固体透明基板(玻璃基板)(10)(S100)。 用正电子光刻用抗蚀剂溶液旋涂基板(10)的表面,然后烘烤,除去抗蚀剂溶液,以在基板(10)上形成抗蚀剂薄膜(20)(S200)。 用电子束在抗蚀剂薄膜(20)上绘制规定的图案,并将该膜显影,漂洗和干燥(S300)。 然后,通过溅射在基板(10)上依次形成诸如铬,然后金的金属(S400)。 并且,从基板(10)的表面除去过量的抗蚀剂材料(S500),由此完成金属纳米棒阵列(40)。 金属纳米棒阵列(40)具有这样的结构,其中许多具有精确控制的尺寸的金属纳米棒以恒定的精细间隔并且沿着一个轴向对齐而集成在基板(10)上。