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    • 3. 发明授权
    • Method and apparatus for fabricating resin mats
    • 制造树脂垫的方法和装置
    • US5476567A
    • 1995-12-19
    • US38624
    • 1993-03-26
    • Takahiro FujisawaShigeru Nakamura
    • Takahiro FujisawaShigeru Nakamura
    • B29B15/12B29C70/50D06N7/06B32B31/08B32B31/12B32B31/20
    • B29C70/50B29B15/122Y10T156/1729Y10T156/1732Y10T156/1741
    • A method and apparatus for fabricating resin mats having a plurality of mat layers is provided. Multiple mat sheets are conveyed between two spaced rollers while being impregnated with resin contained in at least one reservoir formed between the rollers and sheets. A resin feeding system supplies resin to a location between the sheets which substantially corresponds to the longitudinal centerlines of the sheets to ensure adequate impregnation of the mat layers while minimizing any residual resin from adhering to the rollers. Dam members are also positioned between the rollers at the longitudinal sides of the sheets to aid in forming the reservoir(s) and also to maintain an appropriate spacing between the rollers. The roller spacing is configured to permit a predetermined degree of slippage between the rollers and the mat layers.
    • 提供了一种用于制造具有多个垫层的树脂垫的方法和装置。 多个垫片在两个隔开的辊之间传送,同时浸渍在容纳在形成在辊和片材之间的至少一个贮存器中的树脂。 树脂供给系统将树脂供应到片材之间的位置,其基本上对应于片材的纵向中心线,以确保垫层的充分浸渍,同时使残留树脂粘附到辊上最小化。 水坝构件也位于板的纵向侧面的辊之间,以帮助形成储存器并且还保持辊之间的适当间隔。 辊间隔被配置为允许辊和垫层之间的预定程度的滑动。
    • 9. 发明授权
    • Method of and apparatus for detecting an end point of plasma treatment
    • 用于检测等离子体处理终点的方法和装置
    • US4615761A
    • 1986-10-07
    • US712032
    • 1985-03-15
    • Keiji TadaTakashi FujiiGen MarumotoKazuhiro JyouoTakahiro Fujisawa
    • Keiji TadaTakashi FujiiGen MarumotoKazuhiro JyouoTakahiro Fujisawa
    • G01N21/62H01J37/32H01L21/306B44C1/22C03C15/00C23F1/02
    • H01J37/32935G01N21/62G01N2201/122
    • The present invention relates to a method of and apparatus for detecting the end point of plasma treatment. The method includes steps: selecting a plasma spectrum having a characteristic wavelength from the plasma spectrum occurring at the time of the plasma treatment reaction of a specimen; computing a secondary differential value of a function of the quantity of the plasma spectrum selected and the plasma treatment reaction time of the specimen; and detecting the end point of the plasma treatment reaction of the specimen by comparing the secondary differential value computed with preset reference values for judgment. The apparatus comprises a means of selecting plasma spectrum having a particular wavelength from the plasma spectrum occurring at the time of the plasma treatment reaction of the specimen, a means of converting the quantity of the plasma spectrum selected into an analog electric signal, a means of converting the analog electric signal into a value of digital data, a means of counting the plasma treatment reaction time of the specimen, a means of secondarily differentiating a function of the value of digital data and the plasma treatment reaction time, a means of making judgment by comparing the secondary differential value with preset reference values for judgment, and a means of giving an instruction for starting judgment to said means. Thus, accurate detection is achieved regardless of which curve is taken by the change in the reaction time of the quantity of plasma spectrum.
    • 本发明涉及一种用于检测等离子体处理终点的方法和装置。 该方法包括以下步骤:从样品的等离子体处理反应时发生的等离子体光谱中选择具有特征波长的等离子体光谱; 计算所选择的等离子体光谱的量和样品的等离子体处理反应时间的函数的二次微分值; 并通过比较用预先设定的基准值进行判断的二次微分值,来检测试样的等离子体处理反应的终点。 该装置包括从样品的等离子体处理反应时出现的等离子体光谱中选择具有特定波长的等离子体光谱的方法,将所选择的等离子体光谱的量转换为模拟电信号的装置, 将模拟电信号转换为数字数据的值,对样本的等离子体处理反应时间进行计数的方法,二次区分数字数据的值和等离子体处理反应时间的功能的手段,进行判断的手段 通过将二次微分值与用于判断的预设参考值进行比较,以及向所述装置发出开始判断的指令的装置。 因此,无论通过等离子体光谱量的反应时间的变化采取哪个曲线,都能实现准确的检测。