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    • 2. 发明授权
    • Pressure wave generator and temperature controlling method thereof
    • 压力波发生器及其温度控制方法
    • US08130593B2
    • 2012-03-06
    • US12521120
    • 2007-12-17
    • Masato HayashiMasami YakabeNobuyoshi Koshida
    • Masato HayashiMasami YakabeNobuyoshi Koshida
    • B06B1/06G10K15/04
    • G10K15/04
    • A pressure wave generator (1) includes a thermally conductive substrate (2), a heat insulating layer (3) formed on one main surface of the substrate (2), an insulator layer (5) formed on the heat insulating layer (3), and a heat generator (4) formed on the insulator layer (5) to generate heat when a current containing an alternating component is applied thereto. The heat insulating layer (3) is formed containing at least one of silicon nitride (Si3N4), silicon dioxide (SiO2), aluminum oxide (Al2O3), magnesium oxide (MgO), diamond crystalline carbon (C), aluminum nitride (AlN), and silicon carbide (SiC). The heat generator (4) is formed containing, for example, gold (Au) or tungsten (W).
    • 压力波发生器(1)包括导热基板(2),形成在基板(2)的一个主表面上的绝热层(3),形成在绝热层(3)上的绝缘体层(5) 以及形成在所述绝缘体层(5)上的热发生器(4),以在施加包含交替分量的电流时产生热量。 该绝热层(3)形成为含有氮化硅(Si 3 N 4),二氧化硅(SiO 2),氧化铝(Al 2 O 3),氧化镁(MgO),金刚石结晶碳(C),氮化铝(AlN) ,和碳化硅(SiC)。 形成有例如金(Au)或钨(W)的发热体(4)。
    • 6. 发明申请
    • SILICON-BASED BLUE-GREEN PHOSPHORESCENT MATERIAL OF WHICH LUMINESCENCE PEAK CAN BE CONTROLLED BY EXCITATION WAVELENGTH AND PROCESS FOR PRODUCING SILICON-BASED BLUE-GREEN PHOSPHORESCENT MATERIAL
    • 通过激发波长控制光亮度的硅基蓝绿色荧光材料和生产基于硅的蓝绿色磷光体材料的方法
    • US20110204290A1
    • 2011-08-25
    • US13061592
    • 2009-08-26
    • Nobuyoshi KoshidaBernard Gelloz
    • Nobuyoshi KoshidaBernard Gelloz
    • C09K11/59B82Y30/00B82Y40/00
    • C09K11/59
    • Provided is a silicon-based blue phosphorescent material having a longer luminescence lifetime, a high luminescence intensity, and excellent long-term stability and reproducibility. A method for producing a silicon-based blue-green phosphorescent material controllable by an excitation wavelength, which comprises a first step of anodizing the surface of silicon to prepare a nanocrystal silicon or a nanostructure silicon, a second step of processing the nanocrystal silicon or the nanostructure silicon prepared in the first step for rapid thermal oxidation, and a third step of processing the nanocrystal silicon or nanostructure silicon having been processed for rapid thermal oxidation in the second step, for high-pressure water vapor annealing. Further, a silicon-based blue-green phosphorescent material controllable by an excitation wavelength, which comprises a silicon oxide film in which numerous nanoscale crystal silicon or nanostructure silicon embedded therein, and which has a transition property between molecular energy levels through triplet excitons having a relaxation time of not shorter than 1 ms, or luminescence transition through quasi-stable excitation or trap having a relaxation time of not shorter than 1 ms.
    • 具有发光寿命长,发光强度高,长期稳定性和再现性优异的硅系蓝色磷光材料。 一种可由激发波长控制的硅基蓝绿色磷光发光材料的制造方法,其特征在于,包括对硅表面进行阳极氧化以制备纳米晶体硅或纳米结构硅的第一工序,将纳米晶硅或第 在第一步中制备的用于快速热氧化的纳米结构硅,以及在第二步骤中处理用于快速热氧化的纳米晶体硅或纳米结构硅的第三步骤,用于高压水蒸气退火。 此外,由激发波长控制的硅基蓝绿色磷光材料,其包含其中嵌入有许多纳米级晶体硅或纳米结构硅的氧化硅膜,并且其具有通过三线态激子的分子能级之间的转移特性,具有 不小于1ms的弛豫时间,或具有不小于1ms的弛豫时间的准稳态激发或阱的发光跃迁。
    • 8. 发明申请
    • Thermally excited sound wave generating device
    • 热激声波发生装置
    • US20050201575A1
    • 2005-09-15
    • US10524585
    • 2004-02-27
    • Nobuyoshi KoshidaKenji Tsubaki
    • Nobuyoshi KoshidaKenji Tsubaki
    • G10K15/04H04R23/00H04R25/00
    • H04R23/002G10K15/04
    • A thermally induced sound wave generating device comprising a thermally conductive substrate, a head insulation layer formed on one surface of the substrate, and a heating element thin film formed on the heat insulation layer and in the form of an electrically driven metal film, and wherein when the heat conductivity of the thermally conductive substrate is set as αs and its heat capacity is set as Cs, and the thermal conductivity of the beat insulation layer is set as αI and its heat capacity is set as CI, relation of 1/100≧αICI/αSCS and αSCS≧100×106 is realized. This is a new technical means capable of greatly improving the function of a pressure generating device based on thermal induction.
    • 一种热诱导声波发生装置,包括导热基板,形成在所述基板的一个表面上的磁头绝缘层和形成在所述绝热层上并以电驱动的金属膜的形式的加热元件薄膜, 当将导热性基板的导热率设定为αS,将其热容设定为C ,将隔热层的导热率设定为 其热容量被设定为C I I I,其中,1/100> = 1 > /> S /> S和/或S / S> 实现了。 这是一种能够大大提高基于热感应的压力发生装置的功能的新的技术手段。
    • 9. 发明授权
    • Method of fabricating silicon emitter with a low porosity heavily doped contact layer
    • 制造具有低孔隙率重掺杂接触层的硅发射器的方法
    • US06939728B2
    • 2005-09-06
    • US10439642
    • 2003-05-15
    • Xia ShengNobuyoshi KoshidaHuei-Pei Kuo
    • Xia ShengNobuyoshi KoshidaHuei-Pei Kuo
    • H01J1/312H01J1/308H01J9/02H10L21/00
    • H01J1/308H01J9/022Y10S438/96
    • A high emission electron emitter and a method of fabricating a high emission electron emitter are disclosed. A high emission electron emitter includes an electron injection layer, an active layer of high porosity porous silicon material in contact with the electron injection layer, a contact layer of low porosity porous silicon material in contact with the active layer and including an interface surface with a heavily doped region, and an optional top electrode in contact with the contact layer. The contact layer reduces contact resistance between the active layer and the top electrode and the heavily doped region reduces resistivity of the contact layer thereby increasing electron emission efficiency and stable electron emission from the top electrode. The electron injection layer is made from an electrically conductive material such as n+ semiconductor, n+ single crystal silicon, a metal, a silicide, or a nitride. The active layer and the contact layer are formed in a layer of silicon material that is deposited on the electron injection layer and then electrochemically anodized in a hydrofluoric acid solution. Prior to the anodization, the interface surface can be doped to form the heavily doped region. The layer of silicon material can be porous epitaxial silicon, porous polysilicon, porous amorphous silicon, and porous silicon carbide.
    • 公开了高发射电子发射体和制造高发射电子发射体的方法。 高发射电子发射体包括电子注入层,与电子注入层接触的高孔隙率多孔硅材料的有源层,与活性层接触的低孔隙率多孔硅材料的接触层, 重掺杂区域和与接触层接触的可选顶部电极。 接触层降低了有源层和顶部电极之间的接触电阻,并且重掺杂区域降低了接触层的电阻率,从而提高了电子发射效率和从顶部电极稳定的电子发射。 电子注入层由诸如n +半导体,n +单晶硅,金属,硅化物或氮化物的导电材料制成。 有源层和接触层形成在沉积在电子注入层上的硅材料层中,然后在氢氟酸溶液中电化学阳极氧化。 在阳极氧化之前,可以将界面表面掺杂以形成重掺杂区域。 硅材料层可以是多孔外延硅,多孔多晶硅,多孔非晶硅和多孔碳化硅。