专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5758530A Hot rolling mill 失效
标题翻译：热轧机
公开(公告)号：US5758530A
公开(公告)日：1998-06-02
申请号：US681983
申请日：1996-07-30
申请人： Masashi Yoshikawa , Keiji Mizuta , Ritsuo Hashimoto , Kazuo Morimoto , Hironori Fujioka , Jyun Sakamoto , Shinji Hirai , Jyunsou Fukumori , Shinsaku Kimura , Akira Kaya
发明人： Masashi Yoshikawa , Keiji Mizuta , Ritsuo Hashimoto , Kazuo Morimoto , Hironori Fujioka , Jyun Sakamoto , Shinji Hirai , Jyunsou Fukumori , Shinsaku Kimura , Akira Kaya
IPC分类号： B21B1/26 , B21B1/46 , B21B45/02 , B21B45/08 , B21B45/04 , B21C43/00
CPC分类号： B21B45/08 , B21B1/26 , B21B1/463 , B21B45/0233
摘要： A hot rolling line is constructed by a pair or a plurality of pairs of rolling rolls disposed opposingly on an upper side and on a lower side of a workpiece (1) to be rolled that is pinched in between the rollers. A descaling apparatus (5) has jet flow nozzles disposed so that two jetted flows, being liquid, gas or plasma, are opposing flows so as to collide with the surface of a strip on the upstream side of the rolling rolls and then collide with each other. The jet flow nozzles are disposed, so as to incline in a direction to face each other so that the angle of inclination is 15.degree. to 60.degree. from the horizontal direction of the strip surface.
摘要翻译：热轧生产线由一对或多对辊对构成，辊对相对地被夹在辊之间的待轧制工件（1）的上侧和下侧。除锈装置（5）具有喷射流动喷嘴，其设置为两个喷射的液体，气体或等离子体的流动是相对的流动，以便与轧辊的上游侧的条带的表面碰撞，然后与每个其他。喷射流动喷嘴设置成相对于彼此面对的方向倾斜，使得倾斜角度与带状表面的水平方向成15°至60°。

2. 发明申请

US20080295766A1 Liquid wiping apparatus 有权
标题翻译：液体擦拭装置
公开(公告)号：US20080295766A1
公开(公告)日：2008-12-04
申请号：US12081020
申请日：2008-04-09
申请人： Masashi Yoshikawa , Tatsuya Hirano , Hironori Fujioka , Takanori Nagai
发明人： Masashi Yoshikawa , Tatsuya Hirano , Hironori Fujioka , Takanori Nagai
IPC分类号： B05C11/02 , B05D3/04 , B05D3/12
CPC分类号： C23C2/20
摘要： A liquid wiping apparatus that can eliminate the increase in the thickness of membranous liquid and defects in the surface quality resulting from the attachment of splash onto the surface of a metallic strip and can improve the productivity in a manner of accelerating the line speed is provided. The liquid wiping apparatus includes blade wipers for contacting with a molten metal having been attached onto the metallic strip 1 to mechanically wipe the molten metal. In the liquid wiping apparatus, a pressure applying unit 7 of the static pressure pad type using gas is installed at the outlet side of the blade wiper 6 in the strip running direction, and phase-mixed flow of gas/liquid 15 is produced in membranous liquid running between the blade wiper 6 and the strip 1.
摘要翻译：提供了一种液体擦拭装置，其可以消除膜状液体的厚度增加和由于溅射附着到金属带的表面而导致的表面质量的缺陷，并且可以以提高线速度的方式提高生产率。液体擦拭装置包括用于与已经附着到金属带1上的熔融金属接触的刮板擦拭器，以机械地擦拭熔融金属。在液体擦拭装置中，使用气体的静压垫型的加压单元7沿着带状行进方向安装在刮水器6的出口侧，气体/液体15的相混合流体以膜状产生液体在叶片刮水器6和条带1之间运行。

3. 发明申请

US20050247262A1 Liquid wiping apparatus 审中-公开
标题翻译：液体擦拭装置
公开(公告)号：US20050247262A1
公开(公告)日：2005-11-10
申请号：US11092576
申请日：2005-03-29
申请人： Masashi Yoshikawa , Tatsuya Hirano , Hironori Fujioka , Takanori Nagai
发明人： Masashi Yoshikawa , Tatsuya Hirano , Hironori Fujioka , Takanori Nagai
IPC分类号： C23C2/22 , C23C2/20 , B05C11/02 , B05D3/04 , B05D3/12
CPC分类号： C23C2/20
摘要： The present invention provides a liquid wiping apparatus that can eliminate the increase in the thickness of membranous liquid and defects in the surface quality resulting from the attachment of splash onto the surface of a metallic strip and can improve the productivity in a manner of accelerating the line speed. The liquid wiping apparatus according to this invention includes blade wipers for contacting with a molten metal having been attached onto the metallic strip 1 to mechanically wipe the molten metal. In the liquid wiping apparatus, a pressure applying means 7 of the static pressure pad type using gas is installed at the outlet side of the blade wiper 6 in the strip running direction, and phase-mixed flow of gas/liquid 15 is produced in membranous liquid running between the blade wiper 6 and the strop 1.
摘要翻译：本发明提供一种液体擦拭装置，其可以消除膜状液体的厚度增加和由于溅射附着到金属带的表面而导致的表面质量的缺陷，并且可以以加速线的方式提高生产率速度。根据本发明的液体擦拭装置包括用于与已经附着到金属条1上的熔融金属接触的刮板刮板，以机械地擦拭熔融金属。在液体擦拭装置中，使用气体的静压垫型的加压装置7沿着剥离运行方向安装在刮板6的出口侧，气体/液体15的相混合流体以膜状产生在叶片刮水器6和支柱1之间运行的液体。

4. 发明申请

US20100224120A1 GAS WIPING APPARATUS 有权
标题翻译：气体擦拭装置
公开(公告)号：US20100224120A1
公开(公告)日：2010-09-09
申请号：US12716440
申请日：2010-03-03
申请人： Hironori FUJIOKA , Takashi Yonekura , Masashi Yoshikawa
发明人： Hironori FUJIOKA , Takashi Yonekura , Masashi Yoshikawa
IPC分类号： B05C11/06
CPC分类号： C23C2/20
摘要： In a gas wiping apparatus which blows gas through a wiping nozzle onto front and rear surfaces of a steel plate going out from a molten metal coating pot and running upward and which thereby controls a deposit mass, the wiping nozzle is separated into upper and lower lips, blocking faces partially closing a gas supply channel are formed in the upper and lower lips at vertically different positions on the opposite sides from each other in a gas outlet width direction, and the upper and lower lips are provided in such a manner as to be movable in a width direction of the steel plate.
摘要翻译：在通过擦拭喷嘴将气体吹送到从熔融金属涂覆锅出来并向上运行并由此控制沉积物质的钢板的前表面和后表面上的气体擦拭装置中，擦拭喷嘴被分离成上下唇在气体出口宽度方向上的相对侧的垂直不同位置的上唇和下唇形成有部分封闭气体供给通道的阻挡面，并且上唇和下唇设置成可在钢板的宽度方向上移动。

5. 发明授权

US08079323B2 Liquid wiping apparatus 有权
标题翻译：液体擦拭装置
公开(公告)号：US08079323B2
公开(公告)日：2011-12-20
申请号：US12081020
申请日：2008-04-09
申请人： Masashi Yoshikawa , Tatsuya Hirano , Hironori Fujioka , Takanori Nagai
发明人： Masashi Yoshikawa , Tatsuya Hirano , Hironori Fujioka , Takanori Nagai
IPC分类号： B05C11/06
CPC分类号： C23C2/20
摘要： A liquid wiping apparatus that can eliminate the increase in the thickness of membranous liquid and defects in the surface quality resulting from the attachment of splash onto the surface of a metallic strip and can improve the productivity in a manner of accelerating the line speed is provided. The liquid wiping apparatus includes blade wipers for contacting with a molten metal having been attached onto the metallic strip 1 to mechanically wipe the molten metal. In the liquid wiping apparatus, a pressure applying unit 7 of the static pressure pad type using gas is installed at the outlet side of the blade wiper 6 in the strip running direction, and phase-mixed flow of gas/liquid 15 is produced in membranous liquid running between the blade wiper 6 and the strip 1.
摘要翻译：提供了一种液体擦拭装置，其可以消除膜状液体的厚度增加和由于溅射附着到金属带的表面而导致的表面质量的缺陷，并且可以以提高线速度的方式提高生产率。液体擦拭装置包括用于与已经附着到金属带1上的熔融金属接触的刮板擦拭器，以机械地擦拭熔融金属。在液体擦拭装置中，使用气体的静压垫型的加压单元7沿着带状行进方向安装在刮水器6的出口侧，气体/液体15的相混合流体以膜状产生液体在叶片刮水器6和条带1之间运行。

6. 发明授权

US08616148B2 Gas wiping apparatus 有权
标题翻译：气体擦拭装置
公开(公告)号：US08616148B2
公开(公告)日：2013-12-31
申请号：US12775537
申请日：2010-05-07
申请人： Hironori Fujioka , Takashi Yonekura , Masashi Yoshikawa
发明人： Hironori Fujioka , Takashi Yonekura , Masashi Yoshikawa
IPC分类号： B05C11/06
CPC分类号： C23C2/20
摘要： In a gas wiping apparatus for blowing a gas on the front side and the back side of a strip, which exits from a hot-dip plating bath and travels upward, from wiping nozzles to adjust the amount of a plating deposit, the wiping nozzles are supported to be linearly movable beyond the width of the nozzles in the plate width direction of the strip.
摘要翻译：在用于吹扫从热浸镀浴离开并向上行进的条带的前侧和后侧的气体擦拭装置中，从擦拭喷嘴调节镀层的量，擦拭喷嘴是被支撑为能够沿着条带的板宽度方向上的喷嘴的宽度线性移动。

7. 发明授权

US08429834B2 Gas wiping apparatus 有权
标题翻译：气体擦拭装置
公开(公告)号：US08429834B2
公开(公告)日：2013-04-30
申请号：US12716440
申请日：2010-03-03
申请人： Hironori Fujioka , Takashi Yonekura , Masashi Yoshikawa
发明人： Hironori Fujioka , Takashi Yonekura , Masashi Yoshikawa
IPC分类号： F26B13/00
CPC分类号： C23C2/20
摘要： In a gas wiping apparatus which blows gas through a wiping nozzle onto front and rear surfaces of a steel plate going out from a molten metal coating pot and running upward and which thereby controls a deposit mass, the wiping nozzle is separated into upper and lower lips, blocking faces partially closing a gas supply channel are formed in the upper and lower lips at vertically different positions on the opposite sides from each other in a gas outlet width direction, and the upper and lower lips are provided in such a manner as to be movable in a width direction of the steel plate.
摘要翻译：在通过擦拭喷嘴将气体吹送到从熔融金属涂覆锅出来并向上运行并由此控制沉积物质的钢板的前表面和后表面上的气体擦拭装置中，擦拭喷嘴被分离成上下唇在气体出口宽度方向上的相对侧的垂直不同位置的上唇和下唇形成有部分封闭气体供给通道的阻挡面，并且上唇和下唇设置成可在钢板的宽度方向上移动。

8. 发明申请

US20100282161A1 GAS WIPING APPARATUS 有权
标题翻译：气体擦拭装置
公开(公告)号：US20100282161A1
公开(公告)日：2010-11-11
申请号：US12775537
申请日：2010-05-07
申请人： Hironori FUJIOKA , Takashi Yonekura , Masashi Yoshikawa
发明人： Hironori FUJIOKA , Takashi Yonekura , Masashi Yoshikawa
IPC分类号： B05C11/06
CPC分类号： C23C2/20
摘要： In a gas wiping apparatus for blowing a gas on the front side and the back side of a strip, which exits from a hot-dip plating bath and travels upward, from wiping nozzles to adjust the amount of a plating deposit, the wiping nozzles are supported to be linearly movable beyond the width of the nozzles in the plate width direction of the strip.
摘要翻译：在用于吹扫从热浸镀浴离开并向上行进的条带的前侧和后侧的气体擦拭装置中，从擦拭喷嘴调节镀层的量，擦拭喷嘴是被支撑为能够沿着条带的板宽度方向上的喷嘴的宽度线性移动。

9. 发明授权

US5648155A Magnetic recording medium 失效
标题翻译：磁记录介质
公开(公告)号：US5648155A
公开(公告)日：1997-07-15
申请号：US389318
申请日：1995-02-16
申请人： Kenji Tokui , Yoshiteru Matsubayashi , Masashi Yoshikawa , Jyunji Oshita , Yuji Ohata
发明人： Kenji Tokui , Yoshiteru Matsubayashi , Masashi Yoshikawa , Jyunji Oshita , Yuji Ohata
IPC分类号： G11B5/70 , G11B5/716 , G11B5/66 , B32B5/16
CPC分类号： G11B5/70 , G11B5/716 , Y10S428/90 , Y10T428/25 , Y10T428/256 , Y10T428/257
摘要： The present invention provides a thin magnetic tape for allowing a long play without degrading electro-magnetic transfer characteristics and mechanical strength of the magnetic tape. The magnetic tape comprises a base film, an an under layer provided on the base film, and a magnetic layer containing magnetic particles coated on the under layer. The under layer contains magnetic plate-particles each having a configuration such that a ratio of a major axis to a minor axis observed in a plate-like surface is preferred to be approximately 1 and a ratio of the major axis to a thickness off the magnetic particles is to be 5.about.10 so that the under layer has Young's modulus of not less than 2.0.times.10.sup.10 N/m.sup.2 in a longitudinal direction of the magnetic tape and has virtually the same value in a traversing direction thereof. The magnetic plate-particles have an easy axis of magnetization in a longitudinal direction of the magnetic tape to improve the electro-magnetic transfer characteristics and mechanical strength thereof by forming magnetic flux coupling between the magnetic plate-particles in the under layer and the magnetic particles in the magnetic layer.
摘要翻译：本发明提供一种薄磁带，用于在不降低电磁转印特性和磁带的机械强度的情况下长时间播放。磁带包括基膜，设置在基膜上的底层和包含涂覆在下层上的磁性颗粒的磁性层。底层包含磁性板颗粒，每个磁性板颗粒具有这样的构造，使得在板状表面中观察到的长轴与短轴的比率优选为约1，并且长轴与磁性的厚度之比颗粒为5°，使得底层在磁带的纵向上的杨氏模量不小于2.0×10 10 N / m 2，并且在其横向上具有实际上相同的值。磁性板粒子在磁带的长度方向上具有容易的磁化轴，通过在下层的磁性板粒子与磁性粒子之间形成磁通量耦合来提高其电磁转移特性和机械强度在磁性层中。

10. 外观设计

USD355031S Catheter 失效
公开(公告)号：USD355031S
公开(公告)日：1995-01-31
申请号：US000457
申请日：1992-10-15
申请人： Masashi Yoshikawa
设计人： Masashi Yoshikawa

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式