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1. 发明申请

US20050096700A1 Pelvis correction apparatus 失效
标题翻译：骨盆矫正装置
公开(公告)号：US20050096700A1
公开(公告)日：2005-05-05
申请号：US10697025
申请日：2003-10-31
申请人： Masaru Tanaka , Masato Tanaka
发明人： Masaru Tanaka , Masato Tanaka
IPC分类号： A61F5/01
CPC分类号： A61F5/0193
摘要： A pelvis correction apparatus is disclosed, by which appropriate pelvis correction therapy is performed with application of sufficient pressing force at a predetermined angle to a patient by simple operation irrespective of therapist's skill The apparatus includes a bed, pressing bars which moves from both sides of the bed toward a pelvis of the patient on the bed with a predetermined inclination angle, the pressing bars having pressing members on one ends, the pressing members brought into contact with the patient to convey pressing force to the pelvis, and a member for urging the movement of the pressing bars.
摘要翻译：公开了一种骨盆矫正装置，其中通过简单的操作向患者施加足够的按压力来执行适当的骨盆矫正治疗，而与治疗师的技能无关。该装置包括床，从两侧移动的按压杆以预定的倾斜角度朝床上朝向患者的骨盆方向移动，按压杆在一端具有按压构件，按压构件与患者接触以将压力传送到骨盆，以及用于推动运动的构件的压杆。

2. 发明授权

US07060046B2 Pelvis correction apparatus 失效
标题翻译：骨盆矫正装置
公开(公告)号：US07060046B2
公开(公告)日：2006-06-13
申请号：US10697025
申请日：2003-10-31
申请人： Masaru Tanaka , Masato Tanaka
发明人： Masaru Tanaka , Masato Tanaka
IPC分类号： A61F5/00
CPC分类号： A61F5/0193
摘要： A pelvis correction apparatus is disclosed, by which appropriate pelvis correction therapy is performed with application of sufficient pressing force at a predetermined angle to a patient by simple operation irrespective of therapist's skill. The apparatus includes a bed, pressing bars which moves from both sides of the bed toward a pelvis of the patient on the bed with a predetermined inclination angle, the pressing bars having pressing members on one ends, the pressing members brought into contact with the patient to convey pressing force to the pelvis, and a member for urging the movement of the pressing bars.
摘要翻译：公开了一种骨盆矫正装置，通过简单的操作，无论治疗师的技能如何，通过适当的骨盆矫正治疗以对患者施加预定角度的足够的按压力进行。所述装置包括床，所述按压杆以预定的倾斜角从所述床的两侧朝向所述患者的所述患者的骨盆移动，所述按压杆在一端具有按压构件，所述按压构件与所述患者接触将压力传送到骨盆，以及用于促使按压杆的移动的构件。

3. 发明申请

US20110011123A1 REFRIGERATION APPARATUS 审中-公开
标题翻译：制冷装置
公开(公告)号：US20110011123A1
公开(公告)日：2011-01-20
申请号：US12920595
申请日：2009-03-05
申请人： Hideki Matsuura , Masaru Tanaka , Hideki Hara , Kouji Shibaike , Youichi Ohnuma
发明人： Hideki Matsuura , Masaru Tanaka , Hideki Hara , Kouji Shibaike , Youichi Ohnuma
IPC分类号： F25B43/00 , F25B1/00
CPC分类号： C09K5/045 , C09K2205/126 , C10M171/008 , C10M2207/2835 , C10M2209/043 , C10M2209/1033 , C10N2220/302 , C10N2230/02 , C10N2230/41 , C10N2230/43 , C10N2240/30 , F04B39/023 , F04C18/0215 , F04C23/008 , F04C2210/10 , F04C2210/1022 , F04C2210/26 , F04C2210/263 , F05C2225/00 , F05C2225/02 , F05C2225/04 , F05C2225/06 , F25B9/002
摘要： In a refrigeration apparatus including a refrigerant circuit in which refrigerant represented by Molecular Formula 1: C3HmFn (note that “m” and “n” are integers equal to or greater than 1 and equal to or less than 5, and a relationship represented by an expression m+n=6 is satisfied) and having a single double bond in a molecular structure, or refrigerant mixture containing the refrigerant is used, predetermined functional resin components arranged so as to contact refrigerant of the refrigerant circuit are made of any of polytetrafluoroethylene, polyphenylene sulfide, phenolic resin, polyamide resin, chloroprene rubber, silicone rubber, hydrogenated nitrile rubber, fluorine-containing rubber, and hydrin rubber.
摘要翻译：在包含分子式1：C3HmFn所示的制冷剂（注意“m”和“n”为1以上且为5以下的整数的制冷剂回路的制冷装置中，表达式m + n = 6），并且在分子结构中具有单个双键，或者使用包含制冷剂的制冷剂混合物，布置成接触制冷剂回路的制冷剂的预定功能性树脂组分由聚四氟乙烯，聚苯硫醚，酚醛树脂，聚酰胺树脂，氯丁二烯橡胶，硅橡胶，氢化丁腈橡胶，含氟橡胶和hydrin橡胶。

4. 发明申请

US20100092724A1 PROCESS FOR PRODUCING CARBON STRUCTURAL BODY, CARBON STRUCTURAL BODY, AND AGGREGATE AND DISPERSION OF CARBON STRUCTURAL BODIES 审中-公开
标题翻译：生产碳结构体，碳结构体的方法，碳结构体的聚集和分散
公开(公告)号：US20100092724A1
公开(公告)日：2010-04-15
申请号：US12094474
申请日：2006-11-21
申请人： Toshifumi Shiroya , Hiroyuki Aikyou , Masaki Yamamoto , Jun Enda , Masatsugu Shimomura , Sadaaki Yamamoto , Kuniharu Ijiro , Kenji Hijikata , Hiroshi Yabu , Yasutaka Matsuo , Masaru Tanaka
发明人： Toshifumi Shiroya , Hiroyuki Aikyou , Masaki Yamamoto , Jun Enda , Masatsugu Shimomura , Sadaaki Yamamoto , Kuniharu Ijiro , Kenji Hijikata , Hiroshi Yabu , Yasutaka Matsuo , Masaru Tanaka
IPC分类号： B32B3/10 , C01B31/02 , B32B3/26 , B32B3/00
CPC分类号： C04B38/0006 , C01B32/05 , C04B35/524 , C04B35/63424 , C04B35/6344 , C04B35/63444 , C04B35/6346 , C04B35/63464 , C04B35/63468 , C04B2111/00793 , C04B2111/0081 , C04B2235/94 , C04B2235/945 , Y10T428/24273 , Y10T428/24355 , Y10T428/24612 , Y10T428/249921 , C04B38/0054
摘要： A process for producing a carbon structural body is provided, with which a carbon structural body having any of various nanostructures can be produced inexpensively and efficiently. The method includes forming a carbon-containing material into a pattern, coating the obtained pattern with a proto-shaped mold, and calcining and carbonizing the coated pattern.
摘要翻译：提供一种碳结构体的制造方法，能够廉价且高效地制造具有各种纳米结构体的碳结构体。该方法包括将含碳材料形成为图案，用原型模具涂覆所得图案，并对涂布图案进行煅烧和碳化。

5. 发明授权

US07617720B2 Surface position measuring method and surface position measuring device 失效
标题翻译：表面位置测量方法和表面位置测量装置
公开(公告)号：US07617720B2
公开(公告)日：2009-11-17
申请号：US11794761
申请日：2005-12-22
申请人： Takaharu Okajima , Masaru Tanaka , Hiroshi Tokumoto
发明人： Takaharu Okajima , Masaru Tanaka , Hiroshi Tokumoto
IPC分类号： G12B21/08
CPC分类号： G01Q30/04 , G01Q60/32
摘要： A surface position measuring method capable of measuring a position on a soft surface accurately and rapidly (real time), with low invasiveness. The method comprises the steps of measuring the spectrum of thermal oscillation of a cantilever with the distance between a cantilever tip and a sample surface being changed, extracting a fundamental mode component (spectrum area) from the obtained spectrum of thermal oscillation, and measuring a change in the spectrum area of thermal oscillation (spectrum area) with respect to the distance. A position at which the area of the cantilever thermal oscillation spectrum begins to change is evaluated as a position on the sample surface.
摘要翻译：一种表面位置测量方法，能够精确，快速（实时）测量软表面上的位置，具有低侵入性。该方法包括以下步骤：测量悬臂的热振荡频谱，其中悬臂尖和样品表面之间的距离被改变，从所获得的热振荡谱提取基模分量（谱面积），并测量变化在频率范围内的热振荡（频谱面积）相对于距离。悬臂热振动频谱的面积开始变化的位置被评价为样品表面上的位置。

6. 发明申请

US20080092640A1 Surface Position Measuring Method And Surface Position Measuring Device 失效
标题翻译：表面位置测量方法和表面位置测量装置
公开(公告)号：US20080092640A1
公开(公告)日：2008-04-24
申请号：US11794761
申请日：2005-12-22
申请人： Takaharu Okajima , Masaru Tanaka , Hiroshi Tokumoto
发明人： Takaharu Okajima , Masaru Tanaka , Hiroshi Tokumoto
IPC分类号： G01B5/28
CPC分类号： G01Q30/04 , G01Q60/32
摘要： A surface position measuring method capable of measuring a position on a soft surface accurately and rapidly (real time), with low invasiveness. The method comprises the steps of measuring the spectrum of thermal oscillation of a cantilever with the distance between a cantilever tip and a sample surface being changed, extracting a fundamental mode component (spectrum area) from the obtained spectrum of thermal oscillation, and measuring a change in the spectrum area of thermal oscillation (spectrum area) with respect to the distance. A position at which the area of the cantilever thermal oscillation spectrum begins to change is evaluated as a position on the sample surface.
摘要翻译：一种表面位置测量方法，能够精确，快速（实时）测量软表面上的位置，具有低侵入性。该方法包括以下步骤：测量悬臂的热振荡频谱，其中悬臂尖和样品表面之间的距离被改变，从所获得的热振荡谱提取基模分量（谱面积），并测量变化在频率范围内的热振荡（频谱面积）相对于距离。悬臂热振动频谱的面积开始变化的位置被评价为样品表面上的位置。

7. 发明申请

US20070230359A1 Path alarm processing method and device 审中-公开
标题翻译：路径报警处理方法及装置
公开(公告)号：US20070230359A1
公开(公告)日：2007-10-04
申请号：US11485854
申请日：2006-07-13
申请人： Masaru Tanaka
发明人： Masaru Tanaka
IPC分类号： H04J3/14
CPC分类号： H04J3/14
摘要： A path alarm processing method and device perform an alarm mask designation for an ADMIN_STATUS object of a GMPLS path message used upon path setup, and an alarm mask release designation for unused bits of a Sub-TLV object additionally generated. When an alarm generation and its recovery are recognized during alarm monitoring, the alarm mask release designation is confirmed to release an alarm mask. As the above-mentioned alarm mask release designation, at least any one of a lapse of a fixed time by a timer after a path setup, a predetermined message indicating an alarm mask release, and a predetermined number of receptions of the predetermined message can be designated.
摘要翻译：路径报警处理方法和设备对路径建立时使用的GMPLS路径消息的ADMIN_STATUS对象执行报警掩码指定，并且还附加生成Sub-TLV对象的未使用位的报警掩码释放指定。在报警监视期间识别到报警生成及其恢复时，确认报警屏蔽释放指定以释放报警掩码。作为上述警报掩膜释放指定，路径建立后的定时器经过了固定时间，指示警报掩蔽释放的预定消息和预定消息的预定次数的接收中的至少任一个可以是指定

8. 发明授权

US07177555B2 Image forming process and image forming apparatus 有权
标题翻译：图像形成处理和图像形成装置
公开(公告)号：US07177555B2
公开(公告)日：2007-02-13
申请号：US10757526
申请日：2004-01-15
申请人： Bing Shu , Mitsuo Aoki , Haruji Mizuishi , Mikio Ishibashi , Masaru Tanaka , Shinji Tamaki , Hiroshi Mizusawa , Shin Hasegawa
发明人： Bing Shu , Mitsuo Aoki , Haruji Mizuishi , Mikio Ishibashi , Masaru Tanaka , Shinji Tamaki , Hiroshi Mizusawa , Shin Hasegawa
IPC分类号： G03G15/08
CPC分类号： G03G15/0877 , G03G2215/085
摘要： The image forming apparatus comprises a photoconductor, a latent electrostatic image forming unit for forming a latent electrostatic image on the photoconductor, a developing unit for developing the latent electrostatic image using a developer comprising a toner to form a visible image, a transfer unit for transferring the visible image to a recording medium, a cleaning unit for removing the developer remained on the photoconductor surface and a developer amount detection unit for detecting developer amount adhering to the photoconductor surface by a reflecting photosensor, wherein the developer stirring time per copy when one copy is made from an original, is 2 to 6 times the developer stirring time per copy when two or more copies are made from the original, wherein the toner comprises at least a binder resin and a wax, and the dynamic frictional coefficient of the toner is 0.15 to 0.45.
摘要翻译：图像形成装置包括光电导体，用于在感光体上形成静电潜像的静电潜像形成单元，用于使用包含调色剂的显影剂显影静电潜像以形成可见图像的显影单元，用于转印的转印单元可见图像到记录介质，用于除去显影剂残留在感光体表面上的清洁单元和显影剂量检测单元，用于通过反射光电传感器检测粘附到感光体表面的显影剂量，其中当一个拷贝由原件制成，当从原件制造两份或多份复印件时，为每份复印的显影剂搅拌时间的2至6倍，其中调色剂至少包含粘合剂树脂和蜡，并且调色剂的动态摩擦系数为 0.15〜0.45。

9. 发明申请

US20060180995A1 Sheet feeding apparatus and image forming apparatus 有权
公开(公告)号：US20060180995A1
公开(公告)日：2006-08-17
申请号：US11325359
申请日：2006-01-05
申请人： Makoto Izumi , Yasuhiro Uchida , Masaru Tanaka
发明人： Makoto Izumi , Yasuhiro Uchida , Masaru Tanaka
IPC分类号： B65H1/00
CPC分类号： G03G15/6529 , G03G2215/00544
摘要： A sheet feeding apparatus main body for containing sheets in the inside thereof includes: a first cover and a second cover which are openable and closable; and a detecting sensor for detecting an opening and closing of the first cover. The detecting sensor does not detect closing of the first cover when the first cover is closed in a state in which the second cover is opened and detects closing of the first cover when the first cover is closed in a state in which the second cover is closed.

10. 发明授权

US06290563B1 Organic electroluminescence display device and producing method thereof 有权
标题翻译：有机电致发光显示装置及其制造方法
公开(公告)号：US06290563B1
公开(公告)日：2001-09-18
申请号：US09653379
申请日：2000-09-01
申请人： Mitsufumi Codama , Masaru Tanaka
发明人： Mitsufumi Codama , Masaru Tanaka
IPC分类号： H04B3310
CPC分类号： H01L27/3237 , H01L27/3239 , H01L27/3283 , H01L51/5212 , H01L51/5253 , Y10S428/917
摘要： In manufacturing of an organic electroluminescence (EL) display device, after first electrodes are formed on a substrate, insulating films are formed on the first electrodes except regions corresponding to light emitting portions. Spacers are formed on the insulating films, and overhanging portions are formed so as to overhang the spacers. Thus, element isolating structure portions for isolating organic EL elements are formed. Then, organic EL films, second electrodes, and protecting films are sequentially formed between the spacers. In the thus formed light emitting portions of the organic EL display device, the bending angle of a bending portion of a pattern of the element isolating structure portion is larger than 90°.
摘要翻译：在有机电致发光（EL）显示装置的制造中，在基板上形成第一电极之后，除了对应于发光部分的区域之外，在第一电极上形成绝缘膜。隔板形成在绝缘膜上，并且形成悬伸部分以使其间隔开。因此，形成用于隔离有机EL元件的元件隔离结构部分。然后，在间隔物之间依次形成有机EL膜，第二电极和保护膜。在这样形成的有机EL显示装置的发光部分中，元件隔离结构部分的图案的弯曲部分的弯曲角度大于90°。

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