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1. 发明申请

US20090053533A1 CORROSION-RESISTANT MEMBER AND PROCESS OF PRODUCING THE SAME 审中-公开
标题翻译：耐腐蚀成员及其生产方法
公开(公告)号：US20090053533A1
公开(公告)日：2009-02-26
申请号：US12256960
申请日：2008-10-23
申请人： Masanori Abe , Koyata Takahashi
发明人： Masanori Abe , Koyata Takahashi
IPC分类号： B32B17/06 , C23C4/06 , B32B18/00
CPC分类号： C23C4/12 , C04B35/58028 , C04B35/583 , C04B35/597 , C04B35/62695 , C04B2235/3206 , C04B2235/3225 , C04B2235/3232 , C04B2235/3244 , C04B2235/386 , C04B2235/3873 , C04B2235/5436 , C23C4/10 , C23C4/134
摘要： A corrosion-resistant member comprising a base material having formed thereon a spayed coating having high corrosion resistance to corrosive gases or plasma, and a process of producing the same are disclosed. The corrosion-resistant member comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 2a element, and at least one element selected from the group consisting of Al, B, Zr and Ti, or comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti.
摘要翻译：一种耐腐蚀构件及其制造方法，其特征在于，包括在其上形成有对腐蚀性气体或等离子体具有高耐蚀性的喷涂涂层的基材。耐腐蚀构件包括在其上形成有喷涂涂层的基材，喷涂的涂层形成在基体材料的暴露于腐蚀性气体或等离子体的部位上，并且包含Si，O，N，第2a族元素，并且在至少一种选自Al，B，Zr和Ti的元素，或包括在其上形成有喷涂涂层的基材，喷涂的涂层形成在待暴露于腐蚀性气体或等离子体的基材的位置上，包括Si，O，N，第3a族元素和选自B，Zr和Ti中的至少一种元素。

2. 发明授权

US07504164B2 Corrosion-resistant member and process of producing the same 失效
标题翻译：耐腐蚀构件及其制造方法
公开(公告)号：US07504164B2
公开(公告)日：2009-03-17
申请号：US11085202
申请日：2005-03-22
申请人： Masanori Abe , Koyata Takahashi
发明人： Masanori Abe , Koyata Takahashi
IPC分类号： B32B9/00
CPC分类号： C23C4/12 , C04B35/58028 , C04B35/583 , C04B35/597 , C04B35/62695 , C04B2235/3206 , C04B2235/3225 , C04B2235/3232 , C04B2235/3244 , C04B2235/386 , C04B2235/3873 , C04B2235/5436 , C23C4/10 , C23C4/134
摘要： A corrosion-resistant member comprising a base material having formed thereon a spayed coating having high corrosion resistance to corrosive gases or plasma, and a process of producing the same are disclosed. The corrosion-resistant member comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 2a element, and at least one element selected from the group consisting of Al, B, Zr and Ti, or comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti.
摘要翻译：一种耐腐蚀构件及其制造方法，其特征在于，包括在其上形成有对腐蚀性气体或等离子体具有高耐蚀性的喷涂涂层的基材。耐腐蚀构件包括在其上形成有喷涂涂层的基材，喷涂的涂层形成在基体材料的暴露于腐蚀性气体或等离子体的部位上，并且包含Si，O，N，第2a族元素，并且在至少一种选自Al，B，Zr和Ti的元素，或包括在其上形成有喷涂涂层的基材，喷涂的涂层形成在待暴露于腐蚀性气体或等离子体的基材的位置上，包括Si，O，N，第3a族元素和选自B，Zr和Ti中的至少一种元素。

3. 发明授权

US06902814B2 Quartz glass parts, ceramic parts and process of producing those 失效
标题翻译：石英玻璃零件，陶瓷零件及生产工艺
公开(公告)号：US06902814B2
公开(公告)日：2005-06-07
申请号：US10289402
申请日：2002-11-07
申请人： Koyata Takahashi , Michio Okamoto , Masanori Abe
发明人： Koyata Takahashi , Michio Okamoto , Masanori Abe
IPC分类号： C03C17/23 , C03C17/00 , C03C17/245 , C04B41/45 , C04B41/81 , C23C16/44 , B32B17/00 , B32B9/00 , C23C4/10
CPC分类号： C04B41/009 , C03C17/007 , C03C17/245 , C03C2217/214 , C03C2217/22 , C03C2217/23 , C03C2217/42 , C03C2217/77 , C03C2218/15 , C03C2218/153 , C04B41/4527 , C04B41/81 , C23C16/4404 , Y02T50/67 , Y10T428/24926 , Y10T428/266 , Y10T428/315 , C04B41/5031 , C04B41/53 , C04B41/5042 , C04B41/5046 , C04B35/10
摘要： In quartz glass parts and ceramic parts that are used in film-deposition devices and pre-cleaning devices in the production of semiconductors, etc., there are problems such as peeling off of the parts themselves during the use, peeling off of film-like substances adhered to the part surfaces, contamination of the products and short life time of the parts caused by corrosion of the part surfaces by plasma, and reduction in the productivity by frequent exchange of the parts. In quartz glass parts and ceramic parts that are used in film-deposition devices and pre-cleaning devices in the production of semiconductors, etc., with respect to parts, the surface of which is constituted of a ceramic thermal sprayed coating, ones having the ceramic thermal sprayed coating having a surface roughness Ra of from 5 to 20 μm are high in adherence of a film-like adherence, ones having the ceramic thermal sprayed coating having a surface roughness Ra of from 1 to 5 μm are high in plasma resistance, and ones in which grooves having a large anchor effect to the thermal sprayed coating is formed on a substrate on which the ceramic thermal sprayed coating is formed are free from peeling off of the ceramic thermal sprayed coating from the substrate and are high in durability.
摘要翻译：在用于半导体制造中的成膜装置和预清洗装置等的石英玻璃部件和陶瓷部件中，存在使用中剥离部件本身的问题，膜剥离等粘附在零件表面上的物质，由于等离子体的部件表面的腐蚀引起的产品污染和零件的使用寿命短，并且通过频繁地更换部件来降低生产率。在用于薄膜沉积装置的石英玻璃部件和陶瓷部件以及半导体等的制造中的预清洁装置相对于部件，其表面由陶瓷喷镀涂层构成，其具有具有5〜20μm的表面粗糙度Ra的陶瓷热喷涂层的膜粘附性高，具有1〜5μm的表面粗糙度Ra的陶瓷热喷涂层的耐热等离子体性高，并且在其上形成有陶瓷热喷涂层的基板上形成具有对喷镀涂层具有大的锚固效应的凹槽的基板，从基板上剥离陶瓷热喷涂层并且耐久性高。

4. 发明申请

US20060019103A1 Corrosion-resistant member and method forproducing same 审中-公开
标题翻译：耐腐蚀构件及其制造方法
公开(公告)号：US20060019103A1
公开(公告)日：2006-01-26
申请号：US10540839
申请日：2004-01-26
申请人： Masanori Abe , Koyata Takahashi , Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hashimoto , Masanori Kohgo
发明人： Masanori Abe , Koyata Takahashi , Kazuyoshi Arai , Tsutomu Takahata , Shinkichi Hashimoto , Masanori Kohgo
IPC分类号： B32B17/06 , B32B15/00 , B32B19/00
CPC分类号： C03C17/04 , C03C3/062 , C03C3/083 , C03C3/085 , C03C3/095 , C03C8/02 , C03C15/00 , C03C17/002 , C03C17/007 , C03C17/3417 , C03C19/00 , C03C2217/78 , C23C4/10 , C23C4/11 , C23D5/04 , Y02T50/67 , Y02T50/6765
摘要： Members to be used in CVD devices, plasma treatment devices, etc. are exhausted by reaction with a corrosive gas or etching with plasma, and therefore, there were encountered problems such as staining of products due to the generation of particles and a reduction of the yield productivity. Also, glasses resistant to corrosive gases or plasma are weak in the heat resistance, and therefore, applications to be employed were limited. Members containing a heat-resisting base material having coated thereon a corrosion resistant glass containing at least one element selected from the group consisting of elements of the group 2a, group 3a and group 4a, especially an aluminosilicate or zirconia silicate based glass sprayed coating have high corrosion resistance to corrosive gases and plasma and high heat resistance and are less in the generation of particles.
摘要翻译：用于CVD装置，等离子体处理装置等的部件通过与腐蚀性气体的反应或用等离子体蚀刻而耗尽，因此存在由于产生颗粒而导致的产品染色和减少的问题产量生产力。此外，耐腐蚀性气体或等离子体的玻璃的耐热性差，因此，使用的应用受到限制。含有耐热基材的构件包含至少一种选自组2a，组3a和组4a的元素，特别是铝硅酸盐或氧化锆硅酸盐基玻璃喷涂的元素的耐蚀玻璃的耐腐蚀玻璃具有高的对腐蚀性气体和等离子体的耐腐蚀性和高耐热性，并且在产生颗粒时较少。

5. 发明申请

US20050214580A1 Corrosion-resistant member and process of producing the same 失效
标题翻译：耐腐蚀构件及其制造方法
公开(公告)号：US20050214580A1
公开(公告)日：2005-09-29
申请号：US11085202
申请日：2005-03-22
申请人： Masanori Abe , Koyata Takahashi
发明人： Masanori Abe , Koyata Takahashi
IPC分类号： C23C4/10 , C23C4/12 , B32B9/00 , B05D1/02 , B05D7/00
CPC分类号： C23C4/12 , C04B35/58028 , C04B35/583 , C04B35/597 , C04B35/62695 , C04B2235/3206 , C04B2235/3225 , C04B2235/3232 , C04B2235/3244 , C04B2235/386 , C04B2235/3873 , C04B2235/5436 , C23C4/10 , C23C4/134
摘要： A corrosion-resistant member comprising a base material having formed thereon a spayed coating having high corrosion resistance to corrosive gases or plasma, and a process of producing the same are disclosed. The corrosion-resistant member comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 2a element, and at least one element selected from the group consisting of Al, B, Zr and Ti, or comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti.
摘要翻译：一种耐腐蚀构件及其制造方法，其特征在于，包括在其上形成有对腐蚀性气体或等离子体具有高耐蚀性的喷涂涂层的基材。耐腐蚀构件包括在其上形成有喷涂涂层的基材，喷涂的涂层形成在基体材料的暴露于腐蚀性气体或等离子体的部位上，并且包含Si，O，N，第2a族元素，并且在至少一种选自Al，B，Zr和Ti的元素，或包括在其上形成有喷涂涂层的基材，喷涂的涂层形成在待暴露于腐蚀性气体或等离子体的基材的位置上，包含Si，O，N，第3a族元素和选自B，Zr和Ti中的至少一种元素。

6. 发明授权

US07338699B2 Island projection-modified part, method for producing the same, and apparatus comprising the same 有权
标题翻译：岛投影改型部件，其制造方法及其制造方法
公开(公告)号：US07338699B2
公开(公告)日：2008-03-04
申请号：US10695802
申请日：2003-10-30
申请人： Koyata Takahashi , Masanori Kohgo , Osamu Matsunaga
发明人： Koyata Takahashi , Masanori Kohgo , Osamu Matsunaga
IPC分类号： B32B5/12
CPC分类号： C23C16/4404 , C23C4/01 , C23C4/02 , C23C4/18 , C23C28/023 , C23C28/042 , Y10S156/914 , Y10S156/916 , Y10T428/24355 , Y10T428/24421 , Y10T428/26 , Y10T428/263
摘要： In film-forming devices and plasma-processing devices, filmy matter adheres to the surfaces of the inner parts and it peels to cause dust and particles in the devices. In the devices, the dust and particles contaminate the objects for film formation thereon or the objects to be processed with plasma. For preventing the objects from being contaminated with them, the inner parts of the devices must be frequently exchanged every time when they have received any minor filmy matter thereon, and this lowers the productivity in the devices. When a modified glass part of which the surface is modified with spherical or bell-like island projections having a width and a height of from a few μm to a few hundreds μm is used in a film-forming device and in a plasma-processing device, then its ability to hold the filmy substance having adhered thereto is good and its resistance to plasma is also good. Therefore, the surface-modified part does not produce dust and particles and solves the problem of contamination of products. In addition, since the surface-modified part of the type has few pores and therefore releases few particles and little gas. Moreover, since the stress to be caused by the thermal expansion difference between the island projections and the substrate of the surface-modified part is small, the part does not peel even when heated, and it is favorable to vacuum devices.
摘要翻译：在成膜装置和等离子体处理装置中，薄膜物质粘附到内部部件的表面，并且其剥离以在装置中引起灰尘和颗粒。在设备中，灰尘和颗粒污染用于其上形成膜的物体或用等离子体处理的物体。为了防止物体被污染，设备的内部部件必须经常在其上接收到任何微小的薄膜物质时频繁更换，从而降低了设备的生产率。在膜形成装置和等离子体处理装置中使用其表面用球状或钟状岛状突起改性的改性玻璃部分，其宽度和高度为几毫米至几百微米则其粘附有薄膜物质的能力良好，耐等离子体性也良好。因此，表面改性部不产生灰尘和颗粒，解决产品污染的问题。另外，由于表面改性部分的孔隙少，因此几乎没有颗粒和少量的气体。此外，由于岛状突起与表面改性部的基板之间的热膨胀差引起的应力小，所以即使在加热的情况下也不会剥离，有利于真空装置。

7. 发明授权

US10174419B2 Gallium nitride sintered body or gallium nitride molded article, and method for producing same 有权
公开(公告)号：US10174419B2
公开(公告)日：2019-01-08
申请号：US13992486
申请日：2011-12-20
申请人： Masami Mesuda , Keitaro Matsumaru , Koyata Takahashi , Ryou Kikuchi , Tetsuo Shibutami
发明人： Masami Mesuda , Keitaro Matsumaru , Koyata Takahashi , Ryou Kikuchi , Tetsuo Shibutami
IPC分类号： C23C14/34 , H01J37/34 , C04B35/58 , C04B35/626 , C04B35/645 , C04B37/02 , C04B41/88 , C04B41/00 , C04B41/51 , C22C29/16
摘要： The present invention provides a gallium nitride sintered body and a gallium nitride molded article which have high density and low oxygen content without using a special apparatus. According to the first embodiment, a gallium nitride sintered body, which is characterized by having density of 2.5 g/cm3 to less than 5.0 g/cm3 and an intensity ratio of the gallium oxide peak of the (002) plane to the gallium nitride peak of the (002) plane of less than 3%, which is determined by X-ray diffraction analysis, can be obtained. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga+N), of 55% to 80%, can be obtained.

8. 发明授权

US06798734B1 Optical recording medium having address pits in the header region connecting with each other 失效
标题翻译：具有彼此连接的头部区域中的地址坑的光学记录介质
公开(公告)号：US06798734B1
公开(公告)日：2004-09-28
申请号：US09787811
申请日：2001-07-03
申请人： Tatsuo Kawasaki , Koyata Takahashi , Kenichi Sekimoto , Toru Futami , Shigeru Hiramatsu , Mutsumi Asano , Yuji Kawara , Tsuyoshi Tanaka
发明人： Tatsuo Kawasaki , Koyata Takahashi , Kenichi Sekimoto , Toru Futami , Shigeru Hiramatsu , Mutsumi Asano , Yuji Kawara , Tsuyoshi Tanaka
IPC分类号： G11B724
CPC分类号： G11B7/24085 , G11B7/00718 , G11B7/00745 , G11B7/08505
摘要： An optical recording medium able to reproduce address information during seeking in which an optical head moves between tracks, to increase seek speed, to improve recording/reproduction speed and to obtain a good header reproducing signal is achieved by that the concave portions or convex portions constituting a reproducing signal in seeking reproduced even during seek and/or constituting a timing signal for writing a header signal are connected to each other in a direction orthogonal to the tracks, when these concave portions and/or convex portions are placed in positions equivalent to each other in the adjacent tracks.
摘要翻译：一种光学记录介质，其能够在光头在轨道之间移动的寻道期间再现地址信息，从而提高寻道速度，提高记录/再现速度并获得良好的标题再现信号，通过构成即使在搜索期间再寻求再现信号和/或构成用于写入标题信号的定时信号的再现信号在与轨道正交的方向上彼此连接，当这些凹部和/或凸部位于相当于每个其他在相邻的轨道。

9. 发明申请

US20110244239A1 CERAMIC BEADS WITH SMOOTH SURFACES AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译：具有平滑表面的陶瓷珠及其制造方法
公开(公告)号：US20110244239A1
公开(公告)日：2011-10-06
申请号：US13133304
申请日：2009-12-08
申请人： Masanori Kohgo , Koyata Takahashi
发明人： Masanori Kohgo , Koyata Takahashi
IPC分类号： B32B3/00 , H05B6/00
CPC分类号： B01J19/088 , B01J2219/0879 , B01J2219/0894 , C01G25/02 , C04B35/486 , C04B35/62665 , C04B2235/3225 , C04B2235/3246 , C04B2235/528 , C04B2235/5436 , C04B2235/5481 , C04B2235/77 , C04B2235/963
摘要： A subject for the invention is to provide a process for ceramic bead production in which ceramic beads with smooth surfaces are obtained by a simpler method without using a complicated process involving, for example, a DC plasma/radio-frequency plasma combination or a two-stage radio-frequency plasma. Another subject is to provide such ceramic beads. The invention relates to a technique in which a preheated raw ceramic material is introduced into a laminar-flow thermal plasma obtained using a high-voltage type direct-current (DC) plasma gun and is cooled and solidified and the resultant ceramic beads are collected. It is preferred that the raw ceramic material should be preheated by passing the raw material through a refractory tube which runs through a furnace, while sending the raw ceramic material with a carrier gas, and that the preheated raw-material powder should be introduced into and treated with the thermal plasma under such conditions that the resultant ceramic beads are discharged from the thermal plasma at a discharge angle of 60° or larger with the thermal plasma. Thus, satisfactory ceramic beads which have smooth surfaces and have few crack defects and few internal void defects are obtained.
摘要翻译：本发明的主题是提供一种陶瓷珠生产方法，其中通过简单的方法获得具有平滑表面的陶瓷珠粒，而不需要使用涉及例如DC等离子体/射频等离子体组合或二次电池的复杂工艺，级射频等离子体。另一个目的是提供这种陶瓷珠。本发明涉及将预热的原料陶瓷材料引入使用高压型直流（DC）等离子体枪获得的层流热等离子体中并冷却固化并收集所得陶瓷珠的技术。优选原料陶瓷材料应通过使原料通过穿过炉的耐火管，同时用载气送出原料陶瓷材料，并将预热的原料粉末引入和在使用热等离子体以60°以上的放电角从热等离子体排出的条件下，用热等离子体进行处理。因此，获得了具有光滑表面并且具有少量裂纹缺陷和少量内部空隙缺陷的令人满意的陶瓷珠。

10. 发明申请

US20050084654A1 Component for vacuum apparatus, production method thereof and apparatus using the same 失效
标题翻译：真空装置用部件及其制造方法及使用该装置的装置
公开(公告)号：US20050084654A1
公开(公告)日：2005-04-21
申请号：US10964893
申请日：2004-10-15
申请人： Koyata Takahashi , Osamu Matsunaga , Michio Okamoto
发明人： Koyata Takahashi , Osamu Matsunaga , Michio Okamoto
IPC分类号： C03C17/25 , C03C15/00 , C03C19/00 , C23C4/02 , C23C4/06 , C23C4/10 , C23C14/56 , C23C16/44 , H01J5/10 , H01L21/306 , B32B1/00
CPC分类号： H01J37/32495 , C23C4/02 , C23C4/06 , C23C4/10 , C23C14/564 , C23C16/4404 , H01J5/10 , Y10T428/24372 , Y10T428/2438 , Y10T428/24413 , Y10T428/24421 , Y10T428/2991
摘要： A component for a vacuum apparatus for use in a plasma processing apparatus or a film forming apparatus for a semiconductor or the like, in which a surface is covered with a ceramic and/or metallic thermal spray film and projection-shaped particles of a width of 10-300 μm, a height of 4-600 μm and an average height/width ratio of 0.4 or higher are present within a range of 20-20,000 particle/mm2 on the surface of the thermal spray film. The thermal spray film has a porosity of 10-40%, shows a high adhering property to a film-shaped substance, is free from a product contamination by particles generated by a peeling of the film-shaped substance and can be continuously used over a prolonged period.
摘要翻译：用于等离子体处理装置的真空装置的部件或用于半导体等的成膜装置，其中表面被陶瓷和/或金属热喷涂膜覆盖，并且宽度为 10-300微米，高度为4-600μm，平均高宽比为0.4或更高，存在于热喷涂表面上20-20,000粒/ mm 2的范围内电影。热喷涂膜具有10-40％的孔隙度，对膜状物质具有高附着性，不受由膜状物质的剥离而产生的颗粒污染的产物，可以连续使用长时间

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