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    • 1. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE
    • 液晶显示装置
    • US20120057111A1
    • 2012-03-08
    • US13224476
    • 2011-09-02
    • Masahiro OHKUBOKoichi IgetaGo SaitouKatsuhiro Kato
    • Masahiro OHKUBOKoichi IgetaGo SaitouKatsuhiro Kato
    • G02F1/1339G02F1/1335
    • G02F1/13394G02F1/133514G02F1/1339G02F2001/133519
    • The liquid crystal display device according to the present invention is a liquid crystal display device provided with a liquid crystal display panel having; a first substrate; a second substrate; a sealing material provided between the first substrate and the second substrate so that the first substrate and the second substrate are pasted together; and a liquid crystal layer sealed in the region surrounded by the sealing material between the first substrate and the second substrate, wherein the second substrate has a color filter and a protective film for covering the color filter on the surface of the second substrate on the liquid crystal layer side, and an end of the protective film is located inside an end of the second substrate and between the two sides of the sealing material, which are opposite to each other (outer wall surface and inner wall surface).
    • 根据本发明的液晶显示装置是具有液晶显示面板的液晶显示装置, 第一衬底; 第二基板; 设置在第一基板和第二基板之间的密封材料,使得第一基板和第二基板被粘贴在一起; 以及密封在由所述第一基板和所述第二基板之间的密封材料包围的区域中的液晶层,其中所述第二基板具有滤色器和用于在所述液体上的所述第二基板的表面上覆盖所述滤色器的保护膜 晶体层侧,并且保护膜的端部位于第二基板的端部内部,并且彼此相对的密封材料的两侧(外壁表面和内壁表面)之间。
    • 3. 发明授权
    • ESD protection device
    • ESD保护装置
    • US07649229B2
    • 2010-01-19
    • US11730081
    • 2007-03-29
    • Katsuhiro Kato
    • Katsuhiro Kato
    • H01L23/60
    • H01L27/0266H01L29/41725H01L29/4238H01L29/456H01L29/78
    • A semiconductor device capable of preventing an electrostatic surge without increasing a leak current. In the semiconductor device, a protection circuit for protecting an internal circuit is provided between a source line and a ground line. The protection circuit has a protection transistor of which the drain is connected to the source line and the source and gate are connected to the ground line. The protection transistor is configured by integrally forming two types of transistor structural portions. The latter of the transistor structural portions is longer than the former thereof in gate length. In addition, the sum of gate widths of the latter transistor structural portions is larger than the sum of gate widths of the former transistor structural portions.
    • 一种能够在不增加泄漏电流的情况下防止静电浪涌的半导体器件。 在半导体器件中,在源极线和接地线之间设置有用于保护内部电路的保护电路。 保护电路具有保护晶体管,漏极连接到源极线,源极和栅极连接到地线。 保护晶体管通过一体地形成两种晶体管结构部分而构成。 晶体管结构部分中的后者在栅极长度上比其前者长。 此外,后一晶体管结构部分的栅极宽度之和大于前一晶体管结构部分的栅极宽度之和。
    • 6. 发明授权
    • Electrostatic-breakdown-preventive and protective circuit for semiconductor-device
    • 半导体器件的防静电和保护电路
    • US06710991B2
    • 2004-03-23
    • US10305954
    • 2002-11-29
    • Katsuhiro Kato
    • Katsuhiro Kato
    • H02H320
    • H01L27/0266H01L2924/0002H01L2924/00
    • The present invention provides a compact electrostatic-breakdown-preventive and protective circuit for a semiconductor-device capable of performing high-speed operations. In the electrostatic-breakdown-preventive and protective circuit for a semiconductor-device of the invention, a protective transistor is provided between a power-source line and a ground line for an input/output circuit, a position between a power-source line and ground line for a circuit block A, a position between a power-source line and a ground line for a circuit block B, and a position between a power-source line and a ground line for an input/output circuit. A PMOS protective transistor is provided between the power-source line for the circuit block A and the power-source line for the circuit block B, and an NMOS protective transistor is provided between the ground lines in an internal-circuit region in the vicinity of a signal line (protective resistor).
    • 本发明提供一种能够执行高速操作的用于半导体器件的紧凑型防静电和保护电路。 在本发明的半导体装置用静电防止和保护电路中,在电源线和输入输出电路的接地线之间设置保护晶体管,电源线与电源线之间的位置 用于电路块A的接地线,用于电路块B的电源线和接地线之间的位置,以及用于输入/输出电路的电源线和接地线之间的位置。 在电路块A的电源线和电路块B的电源线之间设置PMOS保护晶体管,并且NMOS保护晶体管设置在接地线之间的内部电路区域 信号线(保护电阻)。
    • 8. 发明授权
    • Semiconductor integrated circuit device
    • 半导体集成电路器件
    • US06534831B2
    • 2003-03-18
    • US09811391
    • 2001-03-20
    • Katsuhiro Kato
    • Katsuhiro Kato
    • H01L2972
    • H01L29/78639H01L27/1203
    • A trench 312a passing through an impurity area 301a of a circuit element formed at a semiconductor layer 306 of an SOI substrate 314 and extending to a conductive layer 311 formed at a semiconductor substrate 304 is provided. Inside the trench 312a, a conductor 310a for electrically connecting the impurity area 301a of the circuit element and the conductive layer 311 is formed. By adopting this structure, it becomes possible to promptly transmit a surge voltage applied through an external connector terminal 101 to the semiconductor substrate 304 to prevent breakdown at the buried insulator layer. Thus, the buried insulator layer in a semiconductor integrated circuit device having an SOI structure is protected by providing a protective element under the impurity area of the integrated circuit element to assure a high degree of reliability while enabling high-speed drive and higher integration.
    • 提供穿过形成在SOI衬底314的半导体层306并延伸到形成在半导体衬底304上的导电层311的电路元件的杂质区域301a的沟槽312a。 在沟槽312a的内部,形成用于电连接电路元件的杂质区域301a和导电层311的导体310a。 通过采用这种结构,可以将通过外部连接器端子101施加的浪涌电压迅速发送到半导体衬底304,以防止在埋层绝缘体层处的击穿。 因此,通过在集成电路元件的杂质区域下方设置保护元件来保护具有SOI结构的半导体集成电路器件中的掩埋绝缘体层,以确保高可靠性,同时实现高速驱动和更高集成度。