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1. 发明授权

US07267724B2 Thin-film disposition apparatus 有权
标题翻译：薄膜配置装置
公开(公告)号：US07267724B2
公开(公告)日：2007-09-11
申请号：US09862458
申请日：2001-05-23
申请人： Masahiko Tanaka , Manabu Ikemoto , Naoaki Yokogawa
发明人： Masahiko Tanaka , Manabu Ikemoto , Naoaki Yokogawa
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565 , H01J37/32623
摘要： A dividing plate for a thin-film deposition apparatus divides the interior of the vacuum reaction chamber into a plasma discharge space and a film deposition process space, by fixing or connecting a plurality of laminated plates together by securely bonding them over the entire area of their interfacial surfaces, or a large portion thereof.
摘要翻译：用于薄膜沉积设备的分隔板将真空反应室的内部分成等离子体放电空间和薄膜沉积处理空间，通过将它们固定或连接在一起，将它们固定或连接在一起，将它们牢固地粘合在它们的整个区域上界面或其大部分。

2. 发明申请

US20080017500A1 THIN-FILM DISPOSITION APPARATUS 审中-公开
标题翻译：薄膜处理设备
公开(公告)号：US20080017500A1
公开(公告)日：2008-01-24
申请号：US11834717
申请日：2007-08-07
申请人： Masahiko Tanaka , Manabu Ikemoto , Naoaki Yokogawa
发明人： Masahiko Tanaka , Manabu Ikemoto , Naoaki Yokogawa
IPC分类号： C23C16/54 , C23C16/00
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565 , H01J37/32623
摘要： A dividing plate for a thin-film deposition apparatus divides the interior of the vacuum reaction chamber into a plasma discharge space and a film deposition process space, by fixing or connecting a plurality of laminated plates together by securely bonding them over the entire area of their interfacial surfaces, or a large portion thereof.
摘要翻译：用于薄膜沉积设备的分隔板将真空反应室的内部分成等离子体放电空间和薄膜沉积处理空间，通过将它们固定或连接在一起，将它们固定或连接在一起，将它们牢固地粘合在它们的整个区域上界面或其大部分。

3. 发明授权

US07981216B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US07981216B2
公开(公告)日：2011-07-19
申请号：US10907023
申请日：2005-03-16
申请人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
发明人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
IPC分类号： C23C16/505
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565
摘要： A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.
摘要翻译：一种真空处理装置，包括反应器和具有多个通孔的分隔板，通过该通孔使自由基通过所述通孔并将反应器分离成等离子体产生空间和基板处理空间，所述方法如成膜方法通过将气体输送到等离子体产生空间中以产生等离子体，在由此产生的等离子体产生自由基的同时在放置在基板处理空间中的基板上进行，并且通过分隔板上的多个通孔输送自由基进入基板工艺空间。分隔板包括具有多个通孔的分隔体和设置在分隔体的等离子体产生空间侧的控制板，并且在与分隔板上的多个通孔对应的位置具有自由通过孔。

4. 发明申请

US20050217576A1 Vacuum Processing Apparatus 有权
标题翻译：真空处理设备
公开(公告)号：US20050217576A1
公开(公告)日：2005-10-06
申请号：US10907023
申请日：2005-03-16
申请人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
发明人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
IPC分类号： C23C16/505 , C23C16/44 , C23C16/452 , C23C16/455 , H01J37/32 , H01L21/31 , C23C16/00
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565
摘要： A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.
摘要翻译：一种真空处理装置，包括反应器和具有多个通孔的分隔板，通过该通孔使自由基通过所述通孔并将反应器分离成等离子体产生空间和基板处理空间，所述方法如成膜方法通过将气体输送到等离子体产生空间中以产生等离子体，在由此产生的等离子体产生自由基的同时在放置在基板处理空间中的基板上进行，并且通过分隔板上的多个通孔输送自由基进入基板工艺空间。分隔板包括具有多个通孔的分隔体和设置在分隔体的等离子体产生空间侧的控制板，并且在与分隔板上的多个通孔对应的位置具有自由通过孔。

5. 发明授权

US08570615B2 Image scanning device 有权
标题翻译：图像扫描装置
公开(公告)号：US08570615B2
公开(公告)日：2013-10-29
申请号：US13080732
申请日：2011-04-06
申请人： Akira Yamamura , Masahiko Tanaka , Kenji Sawada , Yuichi Akahori
发明人： Akira Yamamura , Masahiko Tanaka , Kenji Sawada , Yuichi Akahori
IPC分类号： H04N1/04
CPC分类号： H04N1/02815 , H04N1/0285 , H04N1/02885
摘要： An image scanning device includes: a light source; a light guide for converting light from the light source into a linear light beam and applying the linear light beam onto a reading position; an image reading element for receiving the light beam reflected from the reading position; and a light intensity sensor for detecting an intensity of the light emitted from the light source.
摘要翻译：一种图像扫描装置，包括：光源; 用于将来自光源的光转换成线性光束并将线性光束施加到读取位置的光导体; 用于接收从读取位置反射的光束的图像读取元件; 以及光强度传感器，用于检测从光源发射的光的强度。

6. 发明授权

US08508814B2 Image reading apparatus 有权
标题翻译：图像读取装置
公开(公告)号：US08508814B2
公开(公告)日：2013-08-13
申请号：US12816429
申请日：2010-06-16
申请人： Masahiko Tanaka
发明人： Masahiko Tanaka
IPC分类号： H04N1/04 , H04N1/387 , H04N1/46 , G06F15/00 , G06F3/12 , G06K15/00 , G03B27/54
CPC分类号： H04N1/02815 , H04N1/0285 , H04N1/02855 , H04N1/02865
摘要： An image reading apparatus for reading an image of a document optically by illuminating a document with light emitted from a plurality of light emitting elements arranged linearly and by reading light reflected from the document. The image reading apparatus has a first light emitting element for emitting light in a first direction, a second light emitting element for emitting light in a second direction and one substrate for supporting the first light emitting element and the second light emitting element thereon.
摘要翻译：一种图像读取装置，用于通过用从线性布置的多个发光元件发射的光和通过读取从文档反射的光来照射文件来光学读取原稿的图像。图像读取装置具有用于沿第一方向发光的第一发光元件，用于沿第二方向发光的第二发光元件和用于支撑第一发光元件和第二发光元件的基板。

7. 发明申请

US20060254516A1 Heating element CVD system and heating element CVD metod using the same 审中-公开
标题翻译：加热元件CVD系统和使用其的加热元件CVD
公开(公告)号：US20060254516A1
公开(公告)日：2006-11-16
申请号：US11489522
申请日：2006-07-20
申请人： Minoru Karasawa , Keiji Ishibashi , Masahiko Tanaka
发明人： Minoru Karasawa , Keiji Ishibashi , Masahiko Tanaka
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H01L21/67098 , C23C16/24 , C23C16/44
摘要： A heating element CVD system and a heating element CVD method which are capable of forming a high quality polycrystalline silicon film (polysilicon film) as a device in the case of producing a silicon film by using a heating element CVD system. The heating element CVD system and the heating element CVD method heat and maintain the inner surface of the structure surrounding the space between the substrate holder and the heating element to be at least 200° C. or higher, preferably at least 350° C. or higher during the formation of the silicon film on the substrate.
摘要翻译：能够通过使用加热元件CVD系统制造硅膜的情况下能够形成高品质多晶硅膜（多晶硅膜）的加热元件CVD系统和加热元件CVD方法。加热元件CVD系统和加热元件CVD法加热并保持围绕衬底保持器和加热元件之间的空间的结构的内表面至少为200℃以上，优选为至少350℃，或者在衬底上形成硅膜时更高。

8. 发明授权

US07070101B2 Loop antenna and contactless IC card read/write apparatus 失效
标题翻译：环形天线和非接触式IC卡读/写设备
公开(公告)号：US07070101B2
公开(公告)日：2006-07-04
申请号：US10885723
申请日：2004-07-08
申请人： Futoshi Deguchi , Hiroshi Yoshinaga , Masahiko Tanaka , Hiroaki Haruyama
发明人： Futoshi Deguchi , Hiroshi Yoshinaga , Masahiko Tanaka , Hiroaki Haruyama
IPC分类号： G06K7/08
CPC分类号： G06K7/10336 , G06K7/10316
摘要： To provide a loop antenna capable of attenuating the distant electric field with the attenuation of the magnetic flux in the vicinity of an electromagnetic wave restrained, and a contactless IC card read/write apparatus.A loop antenna 10 has an electromagnetic wave shield 1 over at least one side of the loop antenna, the electromagnetic wave shield 1 comprising a plurality of electric conductors 2, a ground contact 3 for grounding the plurality of electric conductors and a lead wire 4 for connecting the plurality of electric conductors 2 to the ground contact 3. The plurality of electric conductors 2 are electrically connected via the lead wire 4 to the ground contact 3 and the plurality of electric conductors 2 are arranged so that the paths of the respective electric conductors 2 from any of their given points to the ground contact 3 via the lead wire 4 are determined uniformly.
摘要翻译：提供能够衰减受限制的电磁波附近的磁通的衰减的远距离电场的环形天线，以及非接触式IC卡读写装置。环形天线10在环形天线的至少一侧具有电磁波屏蔽1，电磁波屏蔽1包括多个电导体2，用于使多个电导体接地的接地触头3和用于将多个电导体2连接到接地触点3.多个电导体2经由引线4电连接到接地触点3，并且多个电导体2被布置成使得各个导体均匀地确定了从它们给定的点到任何一个通过引线4到达接地触头3的2。

9. 发明申请

US20050170090A1 Chemical vapor deposition apparatus and film deposition method 失效
标题翻译：化学气相沉积装置和薄膜沉积方法
公开(公告)号：US20050170090A1
公开(公告)日：2005-08-04
申请号：US11047725
申请日：2005-02-02
申请人： Masahiko Tanaka
发明人： Masahiko Tanaka
IPC分类号： H01L21/205 , C23C16/00 , C23C16/455 , C23C16/458 , H01L21/285
CPC分类号： C23C16/4583 , C23C16/45504 , C23C16/45521
摘要： A chemical vapor deposition apparatus has a vacuum processing chamber, a susceptor for holding a plurality of substrates each placed with a film deposition surface thereof facing downward; a heater disposed above the susceptor; a first barrier gas supply port for supplying a barrier gas to the upper surface of the susceptor; and a second barrier gas supply port for supplying the barrier gas to the upper surface of the heater. The barrier gas supplied from the first barrier gas supply port and the barrier gas supplied from the second barrier gas supply port have their flow rates controlled independently. By properly setting the ratio between the amount of the barrier gas supplied from the first barrier gas supply port and the amount of the barrier gas supplied from the second barrier gas supply port and the ratio between the amount of the barrier gas supplied and the amount of a raw material gas supplied, it becomes possible to form a film which is reduced in the number of particles adhered thereto.
摘要翻译：化学气相沉积装置具有真空处理室，用于保持多个基板的基座，每个基板的薄膜沉积表面面向下放置; 设置在基座上方的加热器; 用于向所述基座的上表面供给阻挡气体的第一阻挡气体供给口; 以及用于将阻挡气体供给到加热器的上表面的第二阻挡气体供给口。从第一势垒气体供给口供给的阻挡气体和从第二势垒气体供给口供给的势垒气体，其流量独立地被控制。通过适当地设定从第一势垒气体供给口供给的阻挡气体的量与从第二阻挡气体供给口供给的阻挡气体的量之间的比例与供给的阻隔气体的量之间的比例，提供原料气体，可以形成减少附着于其上的颗粒数量的膜。

10. 发明申请

US20050009896A1 Drugs comprising combination of antithrombotic agent with pyrazolone derivative 失效
标题翻译：包含抗血栓形成剂与吡唑啉酮衍生物的组合的药物
公开(公告)号：US20050009896A1
公开(公告)日：2005-01-13
申请号：US10489507
申请日：2002-09-13
申请人： Keiichi Yamada , Katsumi Kurita , Tadashi Tanaka , Masahiko Tanaka , Jyunichi Eguchi , Satoshi Yuki , Narihiko Yoshii
发明人： Keiichi Yamada , Katsumi Kurita , Tadashi Tanaka , Masahiko Tanaka , Jyunichi Eguchi , Satoshi Yuki , Narihiko Yoshii
IPC分类号： A61K31/415 , A61K45/06 , A61P9/10 , C07D231/20 , C07D231/22 , C07D231/26 , C07D231/28 , C07D231/56 , A61K31/727 , A61K31/4152 , A61K31/557 , A61K31/60
CPC分类号： C07D231/56 , A61K31/415 , A61K31/4174 , A61K31/4545 , C07D231/20 , C07D231/22 , C07D231/26 , C07D231/28 , A61K2300/00
摘要： It is intended to provide drugs for treating and/or preventing ischemic diseases which are safe and have little side effects. Namely, drugs comprising a combination of an antithrombotic agent and a pyrazolone derivative defined in the description or its pharmaceutically acceptable salt.
摘要翻译：旨在提供用于治疗和/或预防安全性并且副作用小的缺血性疾病的药物。即，包含本说明书中定义的抗血栓形成剂和吡唑啉酮衍生物的组合的药物或其药学上可接受的盐。

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