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1. 发明申请

US20110207053A1 EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE 有权
标题翻译：曝光方法及制作半导体器件的方法
公开(公告)号：US20110207053A1
公开(公告)日：2011-08-25
申请号：US13017615
申请日：2011-01-31
申请人： Masahiko Minemura , Seiji Makino , Kanji Takeuchi , Noboru Sugiyama , Kozo Ogino
发明人： Masahiko Minemura , Seiji Makino , Kanji Takeuchi , Noboru Sugiyama , Kozo Ogino
IPC分类号： G03F7/20 , G21K5/10
CPC分类号： G03F7/7045 , G03F7/705 , H01J2237/31757 , H01J2237/31761
摘要： An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.
摘要翻译：曝光方法包括基于目标图案生成掩模版曝光图案，基于掩模版曝光图案执行光刻模拟，以产生模拟通过掩模版曝光形成的抗蚀剂图案的模拟图案，产生目标图案与模拟之间的差分数据基于差分数据产生第一电子束曝光图案，基于掩模版曝光图案生成掩模版，通过使用掩模版执行关于抗蚀剂的光学曝光处理，并且执行电子束曝光处理相对于基于第一电子束曝光图案的抗蚀剂。

2. 发明授权

US08298732B2 Exposure method and method of making a semiconductor device 有权
标题翻译：制造半导体器件的曝光方法和方法
公开(公告)号：US08298732B2
公开(公告)日：2012-10-30
申请号：US13017615
申请日：2011-01-31
申请人： Masahiko Minemura , Seiji Makino , Kanji Takeuchi , Noboru Sugiyama , Kozo Ogino
发明人： Masahiko Minemura , Seiji Makino , Kanji Takeuchi , Noboru Sugiyama , Kozo Ogino
IPC分类号： G03C5/00
CPC分类号： G03F7/7045 , G03F7/705 , H01J2237/31757 , H01J2237/31761
摘要： An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.
摘要翻译：曝光方法包括基于目标图案生成掩模版曝光图案，基于掩模版曝光图案执行光刻模拟，以产生模拟通过掩模版曝光形成的抗蚀剂图案的模拟图案，产生目标图案与模拟之间的差分数据基于差分数据产生第一电子束曝光图案，基于掩模版曝光图案生成掩模版，通过使用掩模版执行关于抗蚀剂的光学曝光处理，并且执行电子束曝光处理相对于基于第一电子束曝光图案的抗蚀剂。

3. 发明申请

US20110233814A1 Extrusion Molding Method of Resin-Molded Article and Resin Extrusion Molding Apparatus 审中-公开
标题翻译：树脂模制品和树脂挤出成型设备的挤出成型方法
公开(公告)号：US20110233814A1
公开(公告)日：2011-09-29
申请号：US13071554
申请日：2011-03-25
申请人： Koji Matsuda , Seiji Makino
发明人： Koji Matsuda , Seiji Makino
IPC分类号： B29C47/08
CPC分类号： B29C48/256 , B29C48/001 , B29C48/0022 , B29C48/12 , B29C2793/0027
摘要： An extrusion molding method of a resin-molded article is provided. A resin extrusion molding apparatus includes an extruder, a die, a sizing device, a take-up device and a cutting machine. During the resin-molded article is extrusion-molded, a replacement die is made to stand by at a standby position laterally adjacent to the die and a replacement sizing unit is made to stand by at a standby position laterally adjacent to a sizing unit which coincides with an extrusion line of the sizing device. After the resin extrusion molding apparatus is stopped, the die is detached from the extruder and the replacement die is moved to and attached to the extruder, and the sizing unit is moved to a position laterally deviated from the extrusion line and the replacement sizing unit is moved to a position which coincides with the extrusion line. Upper and lower endless rotary bodies of the take-up device are laterally moved to make one of a plurality of supporting faces of pads coincide with the extrusion line. After the replacement of the die, the replacement of the sizing device and the replacement of the take-up device are completed, the resin extrusion molding apparatus is restarted.
摘要翻译：提供了树脂成型品的挤出成型方法。树脂挤出成型装置包括挤出机，模具，定径装置，卷取装置和切割机。在将树脂成形品挤出成型的同时，使替换模具在与模具横向相邻的待机位置处待机，并且使替换尺寸单元在与定型单元横向相邻的待机位置处待机，具有上浆装置的挤出生产线。在树脂挤出成型装置停止之后，将模具与挤出机分离，并将更换模具移动并附着到挤出机上，并将定型单元移动到横向偏离挤出生产线的位置，更换上浆单元为移动到与挤出生产线重合的位置。卷取装置的上下无级旋转体被横向移动，使得垫片的多个支撑面之一与挤出线重合。在更换模具之后，完成尺寸调节装置的更换和卷取装置的更换，重新开始树脂挤出成型装置。

4. 发明授权

US07242095B2 Semiconductor device having a dummy pattern 有权
标题翻译：具有虚拟图案的半导体器件
公开(公告)号：US07242095B2
公开(公告)日：2007-07-10
申请号：US11062489
申请日：2005-02-23
申请人： Katsuji Tabara , Seiji Makino , Takahisa Ito
发明人： Katsuji Tabara , Seiji Makino , Takahisa Ito
IPC分类号： H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device includes a substrate, a circuit pattern formed on the substrate, and a plurality of dummy patterns formed on the substrate in addition to the circuit pattern, wherein the plurality of dummy patterns include a plurality of marker dummy patterns in an array thereof, the marker dummy patterns being distinguishable from other dummy patterns and are distributed irregularly in the array of the dummy patterns.
摘要翻译：半导体器件包括基板，形成在基板上的电路图案，以及除了电路图案之外还形成在基板上的多个虚设图案，其中多个虚设图案包括阵列中的多个标记虚设图案，标记虚拟图案与其他虚拟图案可区分，并且不规则地分布在虚拟图案的阵列中。

5. 发明授权

US07146035B2 Pattern image comparison method, pattern image comparison device, and program 有权
公开(公告)号：US07146035B2
公开(公告)日：2006-12-05
申请号：US10393980
申请日：2003-03-24
申请人： Tomoyuki Okada , Seiji Makino , Kouichi Suzuki , Takahisa Ito
发明人： Tomoyuki Okada , Seiji Makino , Kouichi Suzuki , Takahisa Ito
IPC分类号： G06K9/00 , G06K9/62 , G06K9/68
CPC分类号： G03F1/84 , G06T7/0002 , G06T7/001 , G06T7/62 , G06T7/66 , G06T2207/30148
摘要： A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.

6. 发明授权

US5153639A Film supplying apparatus 失效
标题翻译：电影供应装置
公开(公告)号：US5153639A
公开(公告)日：1992-10-06
申请号：US831111
申请日：1992-02-04
申请人： Toshiro Tahara , Seiji Makino , Tadashi Seto , Izumi Seto , Shigeru Yoshino , Matsuyuki Miwa
发明人： Toshiro Tahara , Seiji Makino , Tadashi Seto , Izumi Seto , Shigeru Yoshino , Matsuyuki Miwa
IPC分类号： G03B27/62
CPC分类号： G03B27/6285
摘要： A film supplying apparatus includes a holding member for holding the vicinity of leading end portions of strips of negative film placed therein in a superposed state with a longitudinal direction of the negative film set in a curved configuration, and a pressing device for pressing an innermost ones, as viewed in a curved state, of the strips of negative film against a feed roller via the holding member. Accordingly, as the feed roller is rotated in the negative film feeding direction, the strips of film starting with the innermost one, as viewed in the curved state, of the strips of negative film are consecutively fed to a printer. In this case, since a force acting in a direction in which the curved shape of the film is reduced is applied to the negative film being fed, no large friction occurs with respect to the remaining film.
摘要翻译：薄膜供给装置包括：保持构件，用于将负片的纵向方向的叠置状态放置在其中的负片的前端部附近保持为弯曲构造;以及按压装置，用于按压最内侧的在弯曲状态下，通过保持构件将负片条与馈送辊相对。因此，当进给辊在负片进给方向上旋转时，从弯曲状态看最内侧的薄膜条连续供给打印机。在这种情况下，由于作用在膜的弯曲形状的方向上的力被施加到被供给的负片上，所以相对于剩余的膜不会发生大的摩擦。

7. 发明授权

US08280147B2 Pattern verification method, pattern verification apparatus, and pattern verification program 有权
标题翻译：模式验证方法，模式验证装置和模式验证程序
公开(公告)号：US08280147B2
公开(公告)日：2012-10-02
申请号：US12700820
申请日：2010-02-05
申请人： Mitsufumi Naoe , Toru Miyauchi , Tomoyuki Okada , Seiji Makino , Koichi Suzuki , Masakazu Ohseki
发明人： Mitsufumi Naoe , Toru Miyauchi , Tomoyuki Okada , Seiji Makino , Koichi Suzuki , Masakazu Ohseki
IPC分类号： G06K9/00
CPC分类号： G03F1/36
摘要： A pattern verification apparatus includes a correction section creating a plurality of first data pieces; a determination section performing light intensity simulation to create a plurality of plots, determine whether or not each of the plurality of simulation result plots falls within an allowable range, and recognize two or more simulation result plots which do not fall within the allowable range as a plurality of second data pieces; an extraction section extracting a reference pattern of the plurality of original design patterns corresponding to the plurality of second data pieces; and a classifying section classifying the plurality of second data pieces into categories of the reference pattern.
摘要翻译：图案验证装置包括：校正部，其创建多个第一数据片; 确定部分执行光强度模拟以创建多个绘图，确定所述多个模拟结果图中的每一个是否落在允许范围内，并且将不在所述容许范围内的两个或更多个模拟结果图识别为多个第二数据片; 提取部分，提取与所述多个第二数据片段对应的所述多个原始设计图案的参考图案; 以及分类部，将所述多个第二数据段分类为所述参考图案的分类。

8. 发明申请

US20100232679A1 PATTERN VERIFICATION METHOD, PATTERN VERIFICATION APPARATUS, AND PATTERN VERIFICATION PROGRAM 有权
标题翻译：图案验证方法，图案验证装置和图案验证程序
公开(公告)号：US20100232679A1
公开(公告)日：2010-09-16
申请号：US12700820
申请日：2010-02-05
申请人： Mitsufumi Naoe , Toru Miyauchi , Tomoyuki Okada , Seiji Makino , Koichi Suzuki , Masakazu Ohseki
发明人： Mitsufumi Naoe , Toru Miyauchi , Tomoyuki Okada , Seiji Makino , Koichi Suzuki , Masakazu Ohseki
IPC分类号： G06K9/62
CPC分类号： G03F1/36
摘要： A pattern verification apparatus includes a correction section creating a plurality of first data pieces; a determination section performing light intensity simulation to create a plurality of plots, determine whether or not each of the plurality of simulation result plots falls within an allowable range, and recognize two or more simulation result plots which do not fall within the allowable range as a plurality of second data pieces; an extraction section extracting a reference pattern of the plurality of original design patterns corresponding to the plurality of second data pieces; and a classifying section classifying the plurality of second data pieces into categories of the reference pattern.
摘要翻译：图案验证装置包括：校正部，其创建多个第一数据片; 确定部分执行光强度模拟以创建多个绘图，确定所述多个模拟结果图中的每一个是否落在允许范围内，并且将不在所述容许范围内的两个或更多个模拟结果图识别为多个第二数据片; 提取部分，提取与所述多个第二数据片段对应的所述多个原始设计图案的参考图案; 以及分类部，将所述多个第二数据段分类为所述参考图案的分类。

9. 发明授权

US5855968A Liquid crystal display device and method for producing the same 失效
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US5855968A
公开(公告)日：1999-01-05
申请号：US950514
申请日：1997-10-22
申请人： Mitsuaki Hirata , Akihiro Nammatsu , Noriko Watanabe , Shigeaki Mizushima , Seiji Makino , Hiroko Iwagoe , Kei Oyobe
发明人： Mitsuaki Hirata , Akihiro Nammatsu , Noriko Watanabe , Shigeaki Mizushima , Seiji Makino , Hiroko Iwagoe , Kei Oyobe
IPC分类号： G02F1/1337 , H05H1/00 , B05D3/00 , B05D5/06
CPC分类号： G02F1/133753 , G02F1/133788 , G02F2001/133757 , G02F2001/133761
摘要： A liquid crystal display device which includes a pair of substrates; a liquid crystal layer sandwiched between the pair of substrates; and an electrode for applying a voltage to the liquid crystal layer is disclosed. The liquid crystal layers includes liquid crystal molecules, and is divided into a plurality of regions having different twist angles from one another.
摘要翻译：一种液晶显示装置，包括一对基板; 夹在所述一对基板之间的液晶层; 并且公开了向液晶层施加电压的电极。液晶层包括液晶分子，并且被分成彼此具有不同扭转角度的多个区域。

10. 发明授权

US5850273A Liquid crystal display device, method and apparatus for fabricating the same 失效
标题翻译：液晶显示装置，其制造方法和装置
公开(公告)号：US5850273A
公开(公告)日：1998-12-15
申请号：US711912
申请日：1996-09-12
申请人： Shin-Ichi Terashita , Nobuaki Yamada , Takako Adachi , Akihiro Nammatsu , Seiji Makino , Shigeaki Mizushima
发明人： Shin-Ichi Terashita , Nobuaki Yamada , Takako Adachi , Akihiro Nammatsu , Seiji Makino , Shigeaki Mizushima
IPC分类号： G02F1/1337 , G02F1/141
CPC分类号： G02F1/133753 , G02F1/133788 , G02F2001/133761
摘要： A liquid crystal display device includes: a first substrate; a second substrate; a liquid crystal layer interposed between the first and the second substrates; a plurality of electrodes for applying a voltage to the liquid crystal layer; a first alignment film provided on a surface of the first substrate in contact with the liquid crystal layer; a second alignment film provided on a surface of the second substrate in contact with the liquid crystal layer; and a plurality of pixels. The liquid crystal layer in each of the pixels includes first and second liquid crystal regions, liquid crystal molecules in the first and the second liquid crystal regions have an identical twisting direction. Pretilt angles of liquid crystal molecules in the first alignment region and the second alignment region on the first and the second alignment films differ from each other, and the liquid crystal display device is fabricated by a method including the step of irradiating light onto a predetermined area of each of the first and the second alignment films in a gas containing an organic compound.
摘要翻译：液晶显示装置包括：第一基板; 第二基板; 介于所述第一和第二基板之间的液晶层; 用于向液晶层施加电压的多个电极; 设置在与所述液晶层接触的所述第一基板的表面上的第一取向膜; 设置在与所述液晶层接触的所述第二基板的表面上的第二取向膜; 和多个像素。每个像素中的液晶层包括第一和第二液晶区域，第一和第二液晶区域中的液晶分子具有相同的扭转方向。第一取向区域中的第一取向区域和第二取向区域中的液晶分子的倾斜角度彼此不同，并且液晶显示装置通过包括以下步骤的方法制造：将光照射到预定区域在包含有机化合物的气体中的第一和第二取向膜中的每一个。

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