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1. 发明授权

US4070694A Picture image information band compression and transmission system 失效
标题翻译：图像信息带压缩和传输系统
公开(公告)号：US4070694A
公开(公告)日：1978-01-24
申请号：US643383
申请日：1975-12-22
申请人： Masaharu Sakamoto , Masahiro Aoki
发明人： Masaharu Sakamoto , Masahiro Aoki
IPC分类号： G06T9/00 , H04N1/415 , H04N1/417 , H04N7/12
CPC分类号： H04N1/415 , G06T9/005 , H04N1/417
摘要： A picture image information band compression and transmission process includes the steps of providing one set of three scanning lines making information of the first scanning line of each one set as an estimation scanning line, estimating a picture element to be estimated by four consecutive picture elements, preparing estimated picture image informations, and translating the estimation reference scanning line and two estimated picture image information into run length codes and into mode codes, respectively, and compressing and transmitting the run length codes.
摘要翻译：图像信息带压缩和发送处理包括以下步骤：提供一组三条扫描线，使得每一组的第一扫描线的信息作为估计扫描线，估计要由四个连续的图像元素估计的像素，准备估计图像信息，并将估计参考扫描线和两个估计图像信息分别转换成游程长度代码并转换成模式代码，并压缩和传送游程长度代码。

2. 发明授权

US08539390B2 Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge 失效
标题翻译：基于边缘长宽比的制造形状损失考虑到边缘的连接边缘对，确定平版印刷掩模的可制造性
公开(公告)号：US08539390B2
公开(公告)日：2013-09-17
申请号：US13017593
申请日：2011-01-31
申请人： Tadanobu Inoue , Alan E. Rosenbluth , Kehan Tian , David O. Melville , Masaharu Sakamoto
发明人： Tadanobu Inoue , Alan E. Rosenbluth , Kehan Tian , David O. Melville , Masaharu Sakamoto
IPC分类号： G06F17/50 , G06F19/00 , G21K5/00 , G03F1/00 , G03F1/36 , G03F1/38
CPC分类号： G06F17/5081 , G03F1/0069 , G03F1/30 , G03F1/36 , G03F1/38 , G03F1/70 , G06F19/00 , G21K5/00
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the mask, for determining a manufacturing penalty in making the mask. The manufacturability of the mask, including the manufacturing penalty in making the mask, is determined based on the target edge pairs as selected, and is dependent on the manufacturing penalty in making the mask. Determining the manufacturability of the mask includes, for a selected edge pair having first and second edges that are at least substantially parallel to one another, determining a manufacturing shape penalty owing to an aspect ratio of the first edge relative to a size of a gap between the first edge and the second edge. This penalty takes into account a pair of connected edges of the first edge that are at least substantially parallel to the first edge.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从掩模的掩模布局数据中选择目标边对，用于确定制作掩模时的制造损失。基于所选择的目标边缘对来确定掩模的可制造性，包括制造掩模时的制造损失，并且取决于制造掩模时的制造损失。确定掩模的可制造性包括：对于具有至少基本上彼此平行的第一和第二边缘的所选边缘对，由于第一边缘的纵横比相对于第一边缘的宽度比，第一边缘和第二边缘。这种惩罚考虑到第一边缘的至少基本平行于第一边缘的一对连接的边缘。

3. 发明授权

US08028254B2 Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale 有权
标题翻译：使用连续的衍生物确定平版印刷掩模的可制造性，表征连续刻度上的可制造性
公开(公告)号：US08028254B2
公开(公告)日：2011-09-27
申请号：US12334488
申请日：2008-12-14
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/76 , G03F1/36
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the lithographic mask, for determining a manufacturing penalty in making the lithographic mask. The mask layout data includes polygons, where each polygon has a number of edges. Each target edge pair is defined by two of the edges of one or more of the polygons. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined. Determining the manufacturing penalty is based on the target edge pairs as selected. Determining the manufacturability of the lithographic mask uses continuous derivatives characterizing the manufacturability of the lithographic mask on a continuous scale. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从光刻掩模的掩模布局数据中选择目标边缘对，以确定在制作光刻掩模时的制造损失。掩模布局数据包括多边形，其中每个多边形具有多个边。每个目标边对由一个或多个多边形的两个边缘定义。确定了光刻掩模的可制造性，包括制造光刻掩模的制造损失。确定制造损失是基于所选择的目标边缘对。确定平版印刷掩模的可制造性使用连续的衍生物来表征平版印刷掩模的可制造性在连续尺度上。输出光刻掩模的可制造性。光刻掩模的可制造性取决于制造光刻掩模的制造损失。

4. 发明授权

US07934063B2 Invoking externally assisted calls from an isolated environment 有权
标题翻译：从孤立的环境调用外部辅助呼叫
公开(公告)号：US07934063B2
公开(公告)日：2011-04-26
申请号：US11693406
申请日：2007-03-29
申请人： Masana Murase , Wilfred E. Plouffe, Jr. , Masaharu Sakamoto , Kanna Shimizu , Vladimir Zbarsky
发明人： Masana Murase , Wilfred E. Plouffe, Jr. , Masaharu Sakamoto , Kanna Shimizu , Vladimir Zbarsky
IPC分类号： G06F13/28
CPC分类号： G06F9/544
摘要： A method of invoking power processor element (PPE) serviced C library functions on a synergistic processing element (SPE) running in isolated mode. When the SPE initiates a PPE-serviced function, an SPE stub routine allocates a parameter buffer in an open area of a local store (LS) memory within the SPE. The LS memory includes an open area accessible to the PPE, and an isolated area inaccessible to the PPE. The SPE stub routine copies function parameters corresponding to the PPE-serviced function to a buffer within the open area of the LS memory, and writes a message word, which contains an identification variable of the PPE-serviced function and a location variable of the function parameters, to the open area. When execution is temporarily suspended on the SPE, the PPE reads the message word from the open area of the LS memory and executes the PPE-serviced function.
摘要翻译：一种在隔离模式下运行的协同处理元件（SPE）上调用功率处理器元件（PPE）服务C库函数的方法。当SPE启动PPE服务功能时，SPE stub例程在SPE内的本地存储（LS）存储器的打开区域中分配参数缓冲区。 LS存储器包括PPE可访问的开放区域和PPE无法访问的隔离区域。 SPE存根例程将对应于PPE服务功能的功能参数复制到LS存储器的开放区域内的缓冲区，并写入一个消息字，其中包含PPE服务功能的标识变量和功能的位置变量参数，到开放区域。当执行暂停在SPE上时，PPE从LS存储器的打开区域读取消息字，并执行PPE服务功能。

5. 发明授权

US5671330A Speech synthesis using glottal closure instants determined from adaptively-thresholded wavelet transforms 失效
标题翻译：使用自适应阈值小波变换确定声门闭合时刻的语音合成
公开(公告)号：US5671330A
公开(公告)日：1997-09-23
申请号：US500793
申请日：1995-07-11
申请人： Masaharu Sakamoto , Mei Kobayashi , Takashi Saito , Masafumi Nishimura
发明人： Masaharu Sakamoto , Mei Kobayashi , Takashi Saito , Masafumi Nishimura
IPC分类号： G10L15/02 , G06F17/14 , G10L11/00 , G10L13/00 , G10L13/06 , G10L13/08 , G10L21/06 , G10L5/04
CPC分类号： G10L13/07 , G10L13/04 , G10L25/27
摘要： A speech synthesis system making use of a pitch-synchronous waveform overlap method to realize stable speech synthesis processing in which pitch shaking is negligible. The present invention is characterized in that glottal closure instants are used as reference points (pitch marks) for overlapping. Since the glottal closure instants can be extracted stably and accurately by using dyadic Wavelet conversion, speech in which pitch shaking is negligible and rumbling sounds are minimized can be synthesized stably. In addition, more flexible waveform separation becomes possible by setting the reference point for overlapping and the reference point for waveform separation to different positions. The extraction of glottal closure instants is performed by searching the local peaks of the dyadic Wavelet conversion, but preferably a threshold value for searching for the local peaks of the dyadic Wavelet conversion is adaptively controlled each time dyadic Wavelet conversion is obtained.
摘要翻译：一种使用音调同步波形重叠方法的语音合成系统来实现音调抖动可忽略的稳定语音合成处理。本发明的特征在于，将声门关闭时刻用作用于重叠的参考点（间距标记）。由于可以通过使用二次小波变换来稳定和准确地提取声门闭合时刻，因此可以稳定地合成音调抖动可忽略且隆隆声音最小化的语音。此外，通过将重叠的参考点和波形分离的参考点设置到不同的位置，可以实现更灵活的波形分离。通过搜索二次小波变换的局部峰值来执行声门闭合时刻的提取，但是优选地，每次获得二次小波变换时，自适应地控制用于搜索二次小波变换的局部峰值的阈值。

6. 外观设计

USD366220S Handheld position detecting and indicating receiver 失效
公开(公告)号：USD366220S
公开(公告)日：1996-01-16
申请号：US36652
申请日：1995-03-24
申请人： Masaharu Sakamoto
设计人： Masaharu Sakamoto

7. 发明授权

US5364445A Recovery method of rhodium 失效
标题翻译：铑的回收方法
公开(公告)号：US5364445A
公开(公告)日：1994-11-15
申请号：US102153
申请日：1993-08-04
申请人： Masaharu Sakamoto , Tomoyuki Mori , Akio Tsuboi
发明人： Masaharu Sakamoto , Tomoyuki Mori , Akio Tsuboi
IPC分类号： C22B11/00 , C22B3/16 , C22B3/44 , C22B61/00
CPC分类号： C22B11/04 , C22B3/44 , Y02P10/234
摘要： A method for recovering rhodium comprising the steps of: adding a basic compound to an organic solution containing a rhodium complex containing at least one type of organophosphorus compound as a ligand and an organophosphorus compound, combusting the resultant mixture to ash under a controlled temperature of less than 1,000.degree. C.; and cleaning the ash using a cleaning solution containing a reducing agent.
摘要翻译：一种回收铑的方法，包括以下步骤：将碱性化合物加入到含有至少一种有机磷化合物作为配体的铑配合物和有机磷化合物的有机溶液中，将所得混合物在较少的控制温度下燃烧超过1000℃。并使用含有还原剂的清洗溶液清洗灰分。

8. 发明授权

US4683560A Microprocessor controlled focussing servo acquisition 失效
标题翻译：微处理器控制聚焦伺服采集
公开(公告)号：US4683560A
公开(公告)日：1987-07-28
申请号：US561631
申请日：1983-12-15
申请人： Toyoaki Takeuchi , Ken Ohshima , Hideyuki Kenjyo , Yoshiaki Ikeda , Masaharu Sakamoto
发明人： Toyoaki Takeuchi , Ken Ohshima , Hideyuki Kenjyo , Yoshiaki Ikeda , Masaharu Sakamoto
IPC分类号： G02B7/28 , G11B7/085 , G11B7/095
CPC分类号： G11B7/085
摘要： In an auto-focussing system, an actuator which moves together with an objective lens is vertically movable against a rotating optical disc and radiates a light beam so as to form a light spot on an information plane of the disc. A focus servo unit moves the actuator so that an optical distance between the actuator and the disc is within a proper distance region and performs the focus control of the light spot on the disc. While the actuator is approaching the optical disc, an auto-focus/focus servo controller initially makes the servo unit nonoperative and, when the actuator reaches a too-far position in a suitable servo loop distance region specified by a servo loop of the focus servo unit, the controller temporarily stops the movement of the actuator and then moves the actuator again from the too-far position by only a predetermined distance, thereby causing the actuator to be located within the focus loop distance region.
摘要翻译：在自动聚焦系统中，与物镜一起移动的致动器可以相对于旋转的光盘上下移动并且辐射光束，以在光盘的信息平面上形成光点。聚焦伺服单元使致动器移动，使得致动器和盘之间的光学距离在适当的距离区域内，并执行光盘上的光点的聚焦控制。当致动器接近光盘时，自动对焦/聚焦伺服控制器最初使得伺服单元不起作用，并且当致动器在由聚焦伺服的伺服环路指定的合适的伺服环路距离区域中达到太远位置时控制器暂时停止致动器的移动，然后使致动器再次从太远位置移动预定距离，从而使致动器位于聚焦环距离区域内。

9. 发明授权

US4607359A Optical recording/reproducing apparatus 失效
标题翻译：光记录/重放装置
公开(公告)号：US4607359A
公开(公告)日：1986-08-19
申请号：US575045
申请日：1984-01-30
申请人： Nobuhide Matsubayashi , Kiichi Kato , Masaharu Sakamoto
发明人： Nobuhide Matsubayashi , Kiichi Kato , Masaharu Sakamoto
IPC分类号： G11B7/135 , G11B7/09 , G11B7/12 , G11B7/125 , G11B7/1359 , G11B7/1378 , G11B7/1381 , G11B7/08
CPC分类号： G11B7/0903 , G11B7/1359 , G11B7/1378 , G11B7/1381
摘要： An optical recording/reproducing apparatus has a beam emitting device adapted to emit at least two light beams in directions at a minute angle to each other. The light beams are condensed by a condensing member onto slightly separated two points on a disk and reflected by the disk. The light beams from the disk are polarized to a prism by a polarizing device. The prism refracts the light beams from the polarizing device, thereby increasing the relative angle between the light beams. The refracted light beams are converged by a converging lens on a detector.
摘要翻译：光学记录/再现装置具有适于在至少两个彼此以小角度的方向发射的光束的发射装置。光束被聚光部件聚集在盘上略微分开的两个点上，并被光盘反射。来自盘的光束通过偏振装置偏振到棱镜。棱镜折射来自偏振装置的光束，从而增加光束之间的相对角度。折射光束被会聚透镜会聚在检测器上。

10. 发明授权

US4508450A System for checking defects on a flat surface of an object 失效
标题翻译：用于检查物体平坦表面上的缺陷的系统
公开(公告)号：US4508450A
公开(公告)日：1985-04-02
申请号：US362621
申请日：1982-03-29
申请人： Ken Ohshima , Masaharu Sakamoto
发明人： Ken Ohshima , Masaharu Sakamoto
IPC分类号： G01N21/88 , G01N21/95 , G11B7/0037
CPC分类号： G01N21/9506 , G11B7/00375 , G01N2021/8861 , G01N2021/8874 , G01N21/9501 , G01N2201/1045
摘要： A checking system for checking defects on an optically flat surface of an object to be checked is adapted to spirally scan the surface of the object with a laser beam which is projected from an optical head. The laser beam is reflected from the surface of the object and converted by a photodetector to an electric signal. The level of the electric signal is compared with a reference level to produce a defect signal. The rotation of the object is detected by a position sensor. A counter counts a position signal in response to the defect signal and the contents of the counter is stored, as data representing a defect start position, in a defect position memory. The length data of the defect signal is counted and stored in a defect length memory. Predetermined defect position data is read out of a defect position memory, while defect length data corresponding to the defect position data is read out of the defect length memory. Position data associated with an area to be displayed is compared with defect position data. When both data coincide with each other, the corresponding defect length data is counted down. During the down count period, defect picture element data is stored in a refresh memory. The picture element data stored in the refresh memory is delivered to a CRT where it is displayed as defect data.
摘要翻译：用于检查待检查物体的光学平坦表面上的缺陷的检查系统适于用从光学头投影的激光束螺旋地扫描物体的表面。激光束从物体的表面反射并由光电检测器转换成电信号。将电信号的电平与参考电平进行比较以产生缺陷信号。物体的旋转由位置传感器检测。计数器响应于缺陷信号对位置信号进行计数，并且将计数器的内容作为表示缺陷开始位置的数据存储在缺陷位置存储器中。将缺陷信号的长度数据计数并存储在缺陷长度存储器中。从缺陷位置存储器中读出预定缺陷位置数据，同时从缺陷位置数据读出与缺陷位置数据对应的缺陷长度数据。与要显示的区域相关联的位置数据与缺陷位置数据进行比较。当两个数据彼此一致时，相应的缺陷长度数据被倒计数。在向下计数期间，将缺陷像素数据存储在刷新存储器中。存储在刷新存储器中的图像元素数据被传送到CRT，其被显示为缺陷数据。

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