专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5994023A Acid-sensitive substance and photosensitive compositions therewith 失效
标题翻译：酸敏感物质及其感光组合物
公开(公告)号：US5994023A
公开(公告)日：1999-11-30
申请号：US897672
申请日：1997-07-21
申请人： Marc Van Damme , Joan Vermeersch , Stefan Van Steenkiste , Etienne Schacht
发明人： Marc Van Damme , Joan Vermeersch , Stefan Van Steenkiste , Etienne Schacht
IPC分类号： B41C1/10 , G03F7/004 , G03F7/039 , G03F7/021 , G03F7/09
CPC分类号： B41C1/1008 , G03F7/0045 , G03F7/039 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , Y10S430/145
摘要： According to the present invention there is provided a polymer not comprising maleic acid derivatives having acid labile groups pendant from the polymer backbone, characterized in that said pendant groups are represented by--L--(C.dbd.O)--O--(C.dbd.O)--O--C--R.sup.1 R.sup.2 R.sup.3,wherein L represents a divalent linking group bonded to the polymer backbone, R.sup.1 represents an alkyl group of which the linking C atom comprises at least one hydrogen and R.sup.2 and R.sup.3 each independently represent a hydrogen or an alkyl group or R.sup.1 and R.sup.2 or R.sup.2 and R.sup.3 form together a ring compound still with the proviso that the linking C atom of R.sup.1 comprises at least one hydrogen.According to the present invention there is further provided a novel photosensitive composition comprising a latent Bronsted acid and a polymer having acid labile groups pendant from the polymer backbone as described above.
摘要翻译：根据本发明，提供了不包含从聚合物主链悬挂的具有酸不稳定基团的马来酸衍生物的聚合物，其特征在于所述侧基由-L-（C = O）-O-（C = O） -OC-R 1 R 2 R 3，其中L表示与聚合物骨架结合的二价连接基团，R 1表示连接C原子包含至少一个氢的烷基，R 2和R 3各自独立地表示氢或烷基或R 1和 R 2或R 2和R 3一起形成环化合物，条件是R 1的连接C原子包含至少一个氢。根据本发明，还提供了一种新颖的光敏组合物，其包含潜在的布朗斯台德酸和如上所述从聚合物主链悬挂的具有酸不稳定基团的聚合物。

2. 发明授权

US5851724A Method for producing lithographic plates with imaging elements comprising a photosensitive acid precursor 失效
标题翻译：用于制造具有包含光敏酸前体的成像元件的平版印刷版的方法
公开(公告)号：US5851724A
公开(公告)日：1998-12-22
申请号：US521045
申请日：1995-08-29
申请人： Marc Van Damme , Joan Vermeersch , Etienne Schacht , Stefan Vansteenkiste
发明人： Marc Van Damme , Joan Vermeersch , Etienne Schacht , Stefan Vansteenkiste
IPC分类号： G03F7/004 , G03F7/00 , G03F7/34 , G03F7/11
CPC分类号： G03F7/346
摘要： The present invention provides a method for obtaining a lithographic printing plate comprising the steps of: (a) image-wise or information-wise exposing a photosensitive imaging element comprising on a hydrophilic surface of a support a hydrophobic photosensitive layer contiguous to said hydrophilic surface, comprising (i) a photosensitive acid precursor and (ii) a hydrophobic polymeric binder and (b) developing said exposed imaging element by the steps of: (i) laminating before or after said exposure an uppermost layer of said imaging element to a receptor layer and (ii) peeling away the receptor layer from the hydrophilic surface of the support thus transferring said hydrophobic photosensitive composition patternwise to the receptor layer, characterized in that said hydrophobic photosensitive layer comprises as photosensitive acid precursor a non-ionic photosensitive precursor of a sulphonic acid or a non-ionic photosensitive precursor of an optionally partially esterified phosphonic acid or a non-ionic photosensitive precursor of an optionally partially esterified phosphoric acid, the latter phosphonic or phosphoric acid precursors in the absence of an acid-sensitive composition of (a) low molecular weight compound(s).
摘要翻译：本发明提供一种获得平版印刷版的方法，包括以下步骤：（a）将包含在支持物的亲水表面上的感光成像元件成像或信息地曝光与所述亲水表面邻接的疏水感光层，包括（i）感光酸前体和（ii）疏水聚合物粘合剂和（b）通过以下步骤显影所述暴露的成像元件：（i）在所述曝光之前或之后将所述成像元件的最上层层合到受体层并且（ii）将接收层从支撑物的亲水表面剥离，从而将所述疏水光敏组合物图案转移到受体层，其特征在于，所述疏水光敏层包含作为感光酸前体的磺酸的非离子感光性前体或任选部分酯化的膦酸的非离子光敏前体酸或非任选部分酯化的磷酸的非离子感光性前体，后者的膦酸或磷酸前体在不存在（a）低分子量化合物的酸敏感组合物的情况下进行。

3. 发明授权

US07467587B2 Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material 有权
标题翻译：在热敏正性平版印刷版材料上精确曝光小点的方法
公开(公告)号：US07467587B2
公开(公告)日：2008-12-23
申请号：US11114210
申请日：2005-04-21
申请人： Joan Vermeersch , Wim Sap , Marc Van Damme
发明人： Joan Vermeersch , Wim Sap , Marc Van Damme
IPC分类号： B41C1/10 , B41M1/06 , G03F7/00
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.
摘要翻译：公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上的物理区域的能量密度，由在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。从而避免由于过度曝光导致的微点损失。

4. 发明授权

US06248503B1 Method for making positive working printing plates from a heat mode sensitive imaging element 有权
标题翻译：从热模式敏感成像元件制造正性印刷版的方法
公开(公告)号：US06248503B1
公开(公告)日：2001-06-19
申请号：US09186613
申请日：1998-11-06
申请人： Joan Vermeersch , Marc Van Damme , Andreas Elsässer , Inge Claes
发明人： Joan Vermeersch , Marc Van Damme , Andreas Elsässer , Inge Claes
IPC分类号： G03F7004
CPC分类号： B41C1/10 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a method for making a lithographic printing plate comprising the steps of a) exposing imagewise to IR-radiation a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable by an alkaline developer and contains a compound capable of converting light into heat, wherein said first layer and said top layer may be one and the same layer; and b) developing said imagewise exposed heat mode imaging element with said alkaline developer whereby the exposed areas of the first and the top layer, which may be the same, are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said alkaline developer has a pH of at least 12 and a surface tension of at least 30 mN/m.
摘要翻译：根据本发明，提供了一种制备平版印刷版的方法，包括以下步骤：a）将具有亲水表面的光学成像元件的热模式成像元件成像曝光于包含聚合物的第一层，所述第一层可溶于碱性水溶液和位于与第一层相同的一侧的顶层，该顶层不能被碱性显影剂穿透，并且含有能够将光转化成热的化合物，其中所述第一层和所述顶层可以是同一层; 和b）用所述碱性显影剂显影所述成像曝光的热模式成像元件，由此第一层和顶层的可能相同的暴露区域被溶解，并且第一层的未曝光区域保持未溶解，其特征在于所述碱性显影剂具有至少12的pH和至少30mN / m的表面张力。

5. 发明授权

US06192799B1 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06192799B1
公开(公告)日：2001-02-27
申请号：US09267681
申请日：1999-03-15
申请人： Marc Van Damme , Joan Vermeersch , Guido Hauquier , Eric Verschueren
发明人： Marc Van Damme , Joan Vermeersch , Guido Hauquier , Eric Verschueren
IPC分类号： B41C110
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer that is soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer that is IR-sensitive and unpenetrable for an alkaline developer; characterized in that at least one of the first layer and the top layer includes a surfactant.
摘要翻译：根据本发明，提供了一种热模式成像元件，用于制造在具有亲水表面的平版印刷基底上的平版印刷版，第一层包括可溶于碱性水溶液的聚合物和位于同一侧的顶层的光刻基底作为对于碱性显影剂是IR敏感且不透气的第一层; 其特征在于，所述第一层和所述顶层中的至少一个包括表面活性剂。

6. 发明授权

US6152036A Heat mode sensitive imaging element for making positive working printing plates 失效
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US6152036A
公开(公告)日：2000-11-28
申请号：US280659
申请日：1999-03-29
申请人： Eric Verschueren , Huub Van Aert , Joan Vermeersch , Marc Van Damme , Guido Hauquier
发明人： Eric Verschueren , Huub Van Aert , Joan Vermeersch , Marc Van Damme , Guido Hauquier
IPC分类号： B41C1/10 , B41M5/36 , G03F7/00
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41C2210/26 , B41C2210/264
摘要： The present invention is directed to a heat mode imaging element for making a lithographic printing plate including on a lithographic base with a hydrophilic surface, a first layer including a polymer, soluble in an aqueous alkaline solution, and a top layer on the same side of the lithographic base as the first layer. The top layer is IR-sensitive and unpenetrable for an alkaline developer. The first layer and the top layer may be one and the same layer. The top layer is characterized in that it contains at least one compound containing epoxy units in an amount between 20 and 500 mg/m.sup.2 and a hardener.
摘要翻译：本发明涉及一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的光刻基底上，包含可溶于碱性水溶液的聚合物的第一层和位于同一侧的顶层光刻基底为第一层。顶层对于碱性显影剂是IR敏感的和不可穿透的。第一层和顶层可以是同一层。顶层的特征在于其含有至少一种含有20-500mg / m 2的环氧单元的化合物和一种硬化剂。

7. 发明授权

US6096481A Method for making a lithographic printing plate involving on press development 有权
公开(公告)号：US6096481A
公开(公告)日：2000-08-01
申请号：US440165
申请日：1999-11-15
申请人： Joan Vermeersch , Marc Van Damme
发明人： Joan Vermeersch , Marc Van Damme
IPC分类号： B41C1/10 , B41M5/36 , G03F7/004
CPC分类号： B41M5/366 , B41C1/1025 , B41C2201/04 , B41C2201/14 , B41C2210/04 , B41C2210/08 , B41C2210/24
摘要： The present invention provides a method for making a lithographic printing plate comprising the steps of:(1) image-wise exposing to light an imaging element comprising (i) on a hydrophilic surface of a lithographic base an image forming layer comprising hydrophobic thermoplastic polymer particles capable of coalescing under the influence of heat and dispersed in a hydrophilic binder and (ii) a compound capable of converting light to heat, said compound being comprised in said image forming layer or a layer adjacent thereto;(2) and developing a thus obtained image-wise exposed imaging element by mounting it on a print cylinder of a printing press and supplying an aqueous dampening liquid and/or ink to said image forming layer while rotating said print cylinder.

8. 发明授权

US6080523A Imaging element for producing a lithographic plate therewith 失效
标题翻译：用于制造平版印刷版的成像元件
公开(公告)号：US6080523A
公开(公告)日：2000-06-27
申请号：US235318
申请日：1999-01-22
申请人： Joan Vermeersch , Marc Van Damme , Dirk Kokkelenberg , Inge Claes
发明人： Joan Vermeersch , Marc Van Damme , Dirk Kokkelenberg , Inge Claes
IPC分类号： G03F1/00 , G03F7/11
CPC分类号： G03F7/202
摘要： According to the present invention there is provided an imaging element comprising on a support having a hydrophilic surface in the order given a photosensitive layer insoluble in an aqueous alkaline solution and capable of becoming soluble in said aqueous alkaline solution upon exposure with actinic light and a thermosensitive layer comprising a masking dye rendering said thermosensitive layer opaque to light for which said photosensitive layer has spectral sensitivity and said imaging element further comprising a compound A capable of converting light into heat comprised in said thermosensitive layer or a layer adjacent thereto, characterized in that said thermosensitive layer further comprises thermoplastic particles of a hydrophobic polymer.
摘要翻译：根据本发明，提供了一种成像元件，其包含在具有亲水表面的支持体上，其顺序为给定不溶于碱性水溶液的感光层，并且当用光化学曝光并且能够变得易溶于碱性水溶液时，所述掩模染料使所述热敏层不透光，所述光敏层对于所述感光层具有光谱灵敏度的光，并且所述成像元件还包含能够将光转换成包含在所述热敏层中的热或与其相邻的层的化合物A，其特征在于所述热敏层还包括疏水性聚合物的热塑性颗粒。

9. 发明授权

US5922507A Imaging element comprising a two-phase layer having a disperse hydrophobic photopolymerisable phase 失效
标题翻译：成像元件包括具有分散的疏水性可光聚合相的两相层
公开(公告)号：US5922507A
公开(公告)日：1999-07-13
申请号：US805940
申请日：1997-02-25
申请人： Marc Van Damme , Joan Vermeersch , Wolfgang Podszun , Norbert Lui
发明人： Marc Van Damme , Joan Vermeersch , Wolfgang Podszun , Norbert Lui
IPC分类号： G03F7/00 , G03F7/004 , G03F7/027 , G03F7/11 , G03F7/26 , G03F7/033
CPC分类号： G03F7/027 , G03F7/0046 , G03F7/26 , Y10S430/11 , Y10S430/15
摘要： The present invention provides a photosensitive imaging element comprising on a support a two-phase layer, said two-phase layer comprising a disperse hydrophobic photopolymerizable. phase and a hydrophilic continuous phase, characterized in that the hydrophobic photopolymerizable phase comprises a multifunctional monomer with a perfluoroalkyl or perfluoroalkenyl group.
摘要翻译：本发明提供了一种光敏成像元件，其在载体上包含两相层，所述两相层包含分散的疏水性光聚合物。相和亲水连续相，其特征在于疏水性光聚合相包含具有全氟烷基或全氟烯基的多官能单体。

10. 发明授权

US5922506A Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith 失效
标题翻译：包含疏水性光聚合组合物的成像元件及其制造平版印刷版的方法
公开(公告)号：US5922506A
公开(公告)日：1999-07-13
申请号：US539960
申请日：1995-10-06
申请人： Yvan Hoogmartens , Marc Van Damme , Joan Vermeersch , Yves Verburgh
发明人： Yvan Hoogmartens , Marc Van Damme , Joan Vermeersch , Yves Verburgh
IPC分类号： G03F7/004 , G03F7/00 , G03F7/027 , G03F7/028 , G03F7/033 , G03F7/038 , G03F7/039 , G03F7/09 , G03F7/095 , G03F7/34 , G03C1/76 , G03F7/26
CPC分类号： G03F7/0955 , G03F7/34
摘要： The present invention provides a negative-working photosensitive imaging element comprising on a hydrophilic surface of a support in the order given (i) a hydrophobic photopolymerizable composition capable of being irradiated with actinic light through the support and/or through the front and containing at least one unsaturated compound with at least one polymerizable ethylenically unsaturated group, at least one hydrophobic thermoplastic polymer and at least one photoinitiator, and (ii) optionally a receptor layer, characterized in that said hydrophobic photopolymerizable composition comprises in the order given (i) a polymerizable layer contiguous to said hydrophilic surface and comprising at least part of said at least one unsaturated compound and (ii) a hydrophobic photosensitive layer contiguous to said polymerizable layer comprising at least part of said at least one hydrophobic thermoplastic polymer and of said at least one photoinitiator.The present invention also provides a method for obtaining a lithographic plate of high quality with said imaging element.
摘要翻译：本发明提供一种负性光敏成像元件，其按照以下顺序包含在载体的亲水性表面上：（i）疏水性光聚合性组合物，其能够通过载体和/或通过前面并通过前部照射光化学光，并且至少含有一种具有至少一个可聚合烯键式不饱和基团的不饱和化合物，至少一种疏水性热塑性聚合物和至少一种光引发剂，和（ii）任选的受体层，其特征在于所述疏水性可光聚合组合物按照下列顺序包含：（i）所述至少一部分所述至少一种不饱和化合物和（ii）与所述可聚合层邻接的疏水光敏层，其包含至少部分所述至少一种疏水性热塑性聚合物和所述至少一种光引发剂。本发明还提供了一种利用所述成像元件获得高质量的平版印刷版的方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式