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1. 发明申请

US20090169781A1 Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom 审中-公开
标题翻译：低热导率低密度热解氮化硼材料，制造方法和由其制成的制品
公开(公告)号：US20090169781A1
公开(公告)日：2009-07-02
申请号：US12006206
申请日：2007-12-31
申请人： Marc Schaepkens , Demetrius Sarigiannis , Douglas Longworth
发明人： Marc Schaepkens , Demetrius Sarigiannis , Douglas Longworth
IPC分类号： C01B21/064 , C23C16/34 , B32B1/08
CPC分类号： C23C16/342 , C23C16/01 , C30B11/002 , C30B25/00 , C30B29/403 , C30B35/002 , Y10T428/131
摘要： A pyrolytic boron-nitride material is disclosed having an in-plane thermal conductivity of no more than about 30 W/m-K and a through-plane thermal conductivity of no more than about 2 W/m-K. The density is less than 1.85 g/cc.
摘要翻译：公开了一种热分解氮化硼材料，其面内导热率不超过约30W / m-K，通孔热导率不超过约2W / m-K。密度小于1.85g / cc。

2. 发明申请

US20060185590A1 High temperature chemical vapor deposition apparatus 审中-公开
标题翻译：高温化学气相沉积装置
公开(公告)号：US20060185590A1
公开(公告)日：2006-08-24
申请号：US11291558
申请日：2005-12-01
申请人： Marc Schaepkens , Demetrius Sarigiannis , Lakshmipathy Muralidharan
发明人： Marc Schaepkens , Demetrius Sarigiannis , Lakshmipathy Muralidharan
IPC分类号： C23C16/00
CPC分类号： C23C16/342 , C23C16/45591
摘要： Embodiments for an apparatus and method for depositing one or more layers onto a substrate or a freestanding shape inside a reaction chamber operating at a temperature of at least 700° C. and 10 torr are provided. The apparatus is provided with means for defining a volume space in the reaction chamber for pre-reacting the reactant feeds forming at least a reaction precursor in a gaseous form, and a volume space for depositing a coating layer of uniform thickness on the substrate from the reacted precursor. In one embodiment, the means for defining the two different zones comprises a distribution medium separating the pre-reaction zone from the deposition zone, for uniform distribution of the reacted precursor on the substrate. In another embodiment, the means for defining the two different zones comprises a plurality of reactant feed jets or injectors, for creating a jet-interaction zone or pre-reactant zone separate from a deposition zone, for deposing the reacted precursor on the substrate.
摘要翻译：提供了用于在至少700℃和10托的温度下操作的反应室内将一个或多个层沉积到基底或独立形状上的装置和方法的实施例。该装置设置有用于限定反应室中的体积空间的装置，用于使至少形成气态反应前体的反应物进料预反应，以及用于在基板上沉积具有均匀厚度的涂层的体积空间反应前体。在一个实施方案中，用于限定两个不同区域的装置包括将预反应区域与沉积区域分离的分配介质，用于将反应的前体均匀分布在基底上。在另一个实施方案中，用于限定两个不同区域的装置包括多个反应物进料射流或喷射器，用于产生与沉积区分离的喷射相互作用区域或预反应物区域，用于使基底上的反应前体脱落。

3. 发明申请

US20060185591A1 High temperature chemical vapor deposition apparatus 审中-公开
标题翻译：高温化学气相沉积装置
公开(公告)号：US20060185591A1
公开(公告)日：2006-08-24
申请号：US11344854
申请日：2006-02-01
申请人： Lakshmipathy Muralidharan , Demetrius Sarigiannis , Patricia Hubbard , Marc Schaepkens , Atul Pant
发明人： Lakshmipathy Muralidharan , Demetrius Sarigiannis , Patricia Hubbard , Marc Schaepkens , Atul Pant
IPC分类号： C23C16/00
CPC分类号： C23C16/342 , C23C16/452 , C23C16/45514 , C23C16/45578 , C23C16/4558
摘要： Embodiments for an apparatus and method for depositing one or more layers onto a substrate or a freestanding shape inside a reaction chamber operating at a temperature of at least 700° C. and 100 torr are provided. The apparatus is provided with a feeding system having injection means for differential pre-reactions and/or pre-treating of a plurality of gases or gas mixtures, tailoring the distribution of a plurality of gas-phase species, yielding a deposit that is substantially uniform in thickness and chemical composition along the substrate surface. In one embodiment, the apparatus further comprises a sacrificial substrate that further helps achieving thickness and chemical uniformity on the substrate, by imitating a continuous surface to deposit on and thus preventing any disturbances in the flow pattern especially towards the edge of the substrate.
摘要翻译：提供了一种用于在至少700℃和100托的温度下操作的反应室内将一个或多个层沉积到基底或独立形状上的装置和方法的实施例。该装置设置有具有用于差分预反应和/或预处理多种气体或气体混合物的注射装置的进料系统，调整多种气相物质的分布，产生基本均匀的沉积物沿着基板表面的厚度和化学成分。在一个实施例中，该设备还包括牺牲衬底，其进一步有助于实现衬底上的厚度和化学均匀性，通过模仿连续表面沉积在衬底上，从而防止流动图案中的任何干扰，特别是朝向衬底的边缘。

4. 发明申请

US20080016684A1 CORROSION RESISTANT WAFER PROCESSING APPARATUS AND METHOD FOR MAKING THEREOF 审中-公开
标题翻译：耐腐蚀波浪加工设备及其制造方法
公开(公告)号：US20080016684A1
公开(公告)日：2008-01-24
申请号：US11557905
申请日：2006-11-08
申请人： Benjamin J. Olechnowicz , David M. Rusinko , Wei Fan , Demetrius Sarigiannis , Marc Schaepkens , Douglas A. Longworth
发明人： Benjamin J. Olechnowicz , David M. Rusinko , Wei Fan , Demetrius Sarigiannis , Marc Schaepkens , Douglas A. Longworth
IPC分类号： H01R43/00
CPC分类号： H01L21/67103 , C03C3/062 , C03C4/20 , H01L21/6875 , H01L21/68757 , H01L21/68785 , Y10T29/53213
摘要： A wafer processing apparatus characterized by having corrosion resistant connections for its electrical connections, gas feed-through channels, recessed areas, raised areas, MESA, through-holes such as lift-pin holes, threaded bolt holes, blind holes, and the like, with the special configurations employing connectors and fillers having excellent chemical resistant properties and optimized CTEs, i.e., having a coefficient of thermal expansion (CTE) that closely matches the CTE of the base substrate layer, the electrode(s), as well as the CTE of coating layer. In one embodiment, a nickel plated molybdenum insert is employed.
摘要翻译：一种晶片处理装置，其特征在于具有用于其电连接，气体馈通通道，凹陷区域，凸起区域，MESA，诸如提升针孔，螺纹孔，盲孔等通孔的耐腐蚀连接，具有采用具有优异的耐化学性能和优化的CTE的连接器和填料的特殊构造，即具有与基底衬底层，电极以及CTE的CTE密切匹配的热膨胀系数（CTE）的涂层。在一个实施例中，使用镀镍的钼插入件。

5. 发明授权

US08940397B2 Weatherable and abrasion resistant coating systems for polymeric substrates 有权
标题翻译：适用于聚合物基材的耐候耐磨涂层系统
公开(公告)号：US08940397B2
公开(公告)日：2015-01-27
申请号：US13036348
申请日：2011-02-28
申请人： Honnaiah Mallesha , Anantharaman Dhanabalan , Robert F. Hayes , Narayana Padmanabha Iyer , Marc Schaepkens
发明人： Honnaiah Mallesha , Anantharaman Dhanabalan , Robert F. Hayes , Narayana Padmanabha Iyer , Marc Schaepkens
IPC分类号： C08K3/22 , C09D7/12 , C09D169/00 , C08L75/08 , C09D175/08 , C08G18/10 , C08G18/44 , C08J7/04 , C09D175/06 , B05D1/00 , B05D5/00 , B05D7/02 , B05D7/00 , C08L75/04 , C08K3/00 , C08K3/20
CPC分类号： C09D169/00 , B05D1/62 , B05D5/00 , B05D7/02 , B05D7/52 , C08G18/10 , C08G18/44 , C08J7/042 , C08J2469/00 , C08J2475/04 , C08K3/014 , C08K3/20 , C08K3/22 , C08K2003/2213 , C08K2003/2241 , C08K2003/2244 , C08K2003/2296 , C08L75/04 , C08L75/08 , C09D7/61 , C09D175/06 , C09D175/08 , Y10T428/31507 , C08G18/718
摘要： Disclosed herein is a primer composition comprising an inorganic UV absorbing agent and a polymer selected from (i) a copolycarbonate, and (ii) a polyurethane obtained by reaction of a polyisocyanate and a copolycarbonate diol. Also disclosed is a coated article comprising a polymeric substrate, a primer layer disposed on at least one surface of said substrate, and an abrasion-resistant layer disposed on said primer layer, where the primer layer is made from the primer composition of the invention.
摘要翻译：本文公开了包含无机UV吸收剂和选自（i）共聚碳酸酯和（ii）通过多异氰酸酯和共聚碳酸酯二醇反应获得的聚氨酯的聚合物的底漆组合物。还公开了一种涂覆制品，其包括聚合物基材，设置在所述基材的至少一个表面上的底漆层和设置在所述底漆层上的耐磨层，其中底漆层由本发明的底漆组合物制成。

6. 发明授权

US08236424B2 Multilayer coating package on flexible substrates for electro-optical devices 有权
标题翻译：用于电光器件的柔性基板上的多层涂层封装
公开(公告)号：US08236424B2
公开(公告)日：2012-08-07
申请号：US12352386
申请日：2009-01-12
申请人： Marc Schaepkens , Gregory Ronald Gillette , Charles Dominic Iacovangelo
发明人： Marc Schaepkens , Gregory Ronald Gillette , Charles Dominic Iacovangelo
IPC分类号： C08G63/00 , C08G63/02
CPC分类号： H01L31/0203 , C23C14/022 , C23C14/06 , H01L31/0216 , H01L31/0392 , H01L31/03926 , H01L33/44 , H01L51/5256 , H01L2251/5338 , Y02E10/50 , Y10T428/31507 , Y10T428/31663 , Y10T428/31855
摘要： An electro-optical device having at least one base and a multilayer coating surface disposed on at least one surface of the base. The at least one base may comprise either an optically or electronically active portion or a flexible polymeric material. The multilayer coating set comprises at least one organic layer and at least one inorganic layer. The base and multilayer coating set are transparent. The multilayer coating set provides a barrier to moisture and oxygen and provides chemical resistance. The multilayer coating set is also mechanically flexible and thermally stable up to a glass transition temperature of the base.
摘要翻译：一种具有至少一个基底和设置在基底的至少一个表面上的多层涂层表面的电光装置。所述至少一个基底可以包括光学或电子活性部分或柔性聚合材料。多层涂层组包括至少一个有机层和至少一个无机层。基底和多层涂层是透明的。多层涂层提供了水分和氧气的屏障，并提供耐化学性。该多层涂层组合也是机械柔性且热稳定的，直到基底的玻璃化转变温度。

7. 发明授权

US07777160B2 Electrode tuning method and apparatus for a layered heater structure 有权
标题翻译：用于层状加热器结构的电极调谐方法和装置
公开(公告)号：US07777160B2
公开(公告)日：2010-08-17
申请号：US12002381
申请日：2007-12-17
申请人： Wei Fan , Benjamin J. Olechnowicz , Marc Schaepkens , David M. Rusinko, Jr. , Xiang Liu , John T. Mariner
发明人： Wei Fan , Benjamin J. Olechnowicz , Marc Schaepkens , David M. Rusinko, Jr. , Xiang Liu , John T. Mariner
IPC分类号： H05B3/68 , C23C16/00
CPC分类号： H01L21/68735 , H01L21/67103 , H05B3/143
摘要： A layered heater structure including an electrode layer and a localized tuning method for tuning the electrode layer of a layered heater structure with high precision is provided. The localized tuning method tunes the electrode layer to its proper local resistance to minimize temperature offsets on the heater surface and thus provide a desired thermal profile that is in marked contrast to conventional, non-localized resistance tuning approaches based on thickness trimming practices, such as grinding or blasting, or resistivity adjustment, such as local heat treatment.
摘要翻译：提供了包括电极层和用于高精度地调谐层状加热器结构的电极层的局部调谐方法的层状加热器结构。局部调谐方法将电极层调整到其适当的局部电阻以最小化加热器表面上的温度偏移，并因此提供期望的热分布，其与基于厚度修整实践的常规非局部电阻调谐方法形成鲜明对比，例如研磨或爆破，或电阻率调整，如局部热处理。

8. 发明申请

US20100053841A1 WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY 有权
标题翻译：具有可调节电阻率的加工装置
公开(公告)号：US20100053841A1
公开(公告)日：2010-03-04
申请号：US12204079
申请日：2008-09-04
申请人： David Michael Rusinko, JR. , Marc Schaepkens , Wanxue Zeng
发明人： David Michael Rusinko, JR. , Marc Schaepkens , Wanxue Zeng
IPC分类号： H01L21/683
CPC分类号： H01L21/683 , H01L21/6831 , H01L21/6833
摘要： An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.
摘要翻译：公开了具有耐蚀刻涂层的物品。该物品是加热元件，晶片载体或静电卡盘。该制品具有由陶瓷或其他材料制成的基底，并且还具有用于电阻加热或电磁夹持的两个或更多个电极。耐腐蚀涂层具有由具有不同电体积电阻率的材料制成的多个区域，使得整个涂层具有可以通过改变每个区域的相对尺寸来调整的体电阻率。

9. 发明申请

US20090021150A1 BARRIER COATINGS 有权
标题翻译：遮瑕涂层
公开(公告)号：US20090021150A1
公开(公告)日：2009-01-22
申请号：US12124548
申请日：2008-05-21
申请人： Tae Won KIM , Christian Maria Anton Heller , Marc Schaepkens , Ahmet Gun Erlat , Min Yan
发明人： Tae Won KIM , Christian Maria Anton Heller , Marc Schaepkens , Ahmet Gun Erlat , Min Yan
IPC分类号： H01J1/62 , B32B9/00
CPC分类号： H01L51/5256 , Y10T428/31504 , Y10T428/31667 , Y10T428/31928
摘要： A barrier coating of organic-inorganic composition, the barrier coating having optical properties that are substantially uniform along an axis of light transmission, said axis oriented substantially perpendicular to the surface of the coating.
摘要翻译：有机 - 无机组合物的阻挡涂层，所述阻挡涂层具有沿着光透射轴线基本均匀的光学性质，所述轴线基本上垂直于所述涂层的表面定向。

10. 发明申请

US20080009417A1 COATING COMPOSITION, ARTICLE, AND ASSOCIATED METHOD 审中-公开
标题翻译：涂料组合物，制品及相关方法
公开(公告)号：US20080009417A1
公开(公告)日：2008-01-10
申请号：US11560953
申请日：2006-11-17
申请人： Victor Lienkong Lou , George Theodore Dalakos , Marc Schaepkens
发明人： Victor Lienkong Lou , George Theodore Dalakos , Marc Schaepkens
IPC分类号： H01L39/24
CPC分类号： H01L21/68757 , C03C3/062 , C03C3/095 , C03C4/20
摘要： A processing apparatus for use in a corrosive operating environment at a temperature range of 25-1500° C. is provided. The apparatus has protective coating structure that includes a glassy material. The glassy material includes at least one of yttrium, cerium, or gadolinium; and aluminum and silicon. The coating composition resists etching by a harsh environment.
摘要翻译：提供一种用于在25-1500℃的温度范围内的腐蚀性操作环境中的加工设备。该装置具有包括玻璃状材料的保护涂层结构。玻璃状材料包括钇，铈或钆中的至少一种; 和铝和硅。涂料组合物可以抵抗恶劣环境的蚀刻。

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